The invention will now be described with reference to the following Examples. These examples are for illustration only and do not limit the scope of the invention.
Co-extrusion films were produced, which had an elastomer core layer as well as outer layers of polypropylene, having a thickness of 4 μm (micrometers), and were cross-linked by means of electron beams. Elastomer polymer compositions with and without the addition of a reactive plasticizer were studied. The reactive plasticizer was varied in terms of type and amount. The following variations were made:
elastomer polymer composition without the addition of a reactive plasticizer
elastomer polymer composition of film 1 with an addition of 2.5 wt.-% methacrylate-terminated butadiene (mole mass 4450 g/mol; viscosity 100,000 mPas (27° C.))
elastomer polymer composition without the addition of a reactive plasticizer
elastomer polymer composition of film 3 with an addition of 5 wt.-% multi-functional polyester acrylate (viscosity 300 to 900 mPas (25° C.))
elastomer polymer composition of film 3 with an addition of 5 wt.-% acrylate polybutadiene (viscosity 80,000 mPas (25° C.))
The subsequent electron beam cross-linking took place with a radiation intensity of 100 kGy. For a comparison, two non-cross-linked films having the film formulations 1 and 3 were produced.
The cross-linked and non-cross-linked films were pre-stretched with an elongation value of 500%. Elongation measurements were carried out on the pre-stretched films. In the elongation measurements, the films were stretched by 50%, 100%, and 200%, one after the other, and the elongation force was measured. Afterwards, the film was relaxed to an elongation value of 30%, and the elongation force was measured once again. After complete relaxation, the remaining residual elongation was measured. The measurement results are reproduced in the table below.
In another experiment, the influence of the electron beam voltage on the electron penetration depth during electron beam cross-linking was investigated. A film sample having a thickness of 65 μm was used as the basis. At an electron beam voltage of 170 kV, an ionization of 99% was found in the uppermost layer, and an ionization of 92% was found in the lowermost layer. At a setting of 140 kV, this ionization behavior shifts. The uppermost film layer then has a value of 99%, and the lowermost layer has a value of 66%. At this setting, uniform cross-linking throughout the film is not guaranteed.
Accordingly, while only a few embodiments of the present invention have been shown and described, it is obvious that many changes and modifications may be made thereunto without departing from the spirit and scope of the invention.
| Number | Date | Country | Kind |
|---|---|---|---|
| 10 2006 040 181.6 | Aug 2006 | DE | national |