EXPOSURE APPARATUS

Abstract

An exposure apparatus for exposing a pattern of a reticle onto a substrate includes a projection optical system for projecting the pattern onto a substrate, the exposure apparatus exposing the substrate through a flammable liquid that is filled in a space between the substrate and a final lens of the projection optical system closest to the substrate, and an explosion-proof unit for shielding an ignition source that can ignite the liquid or vapor of the liquid, from the liquid and the vapor.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a schematic sectional view of an exposure apparatus according to one aspect of the present invention.

FIG. 2A is a schematic block diagram showing a structure of an explosion-proof means shown in FIG. 1 that includes one metal cabinet shields a whole wafer feeding system. FIG. 2B is a schematic block diagram showing the structure of the explosion-proof means shown in FIG. 1 that includes some metal cabinets shields each unit or motor that can be an ignition source.

FIG. 3 is a schematic sectional view of an exposure apparatus according to another aspect of the present invention.

FIG. 4 is a schematic sectional view of an exposure apparatus according to still another aspect of the present invention.

FIG. 5A is a view showing a liquid-contacting member grounding method for a supply or recovery tank. FIG. 5B is a view showing a liquid-contacting member grounding method for a pipe.

FIG. 6 is a schematic sectional view showing a structure of the wafer stage shown in FIG. 1.

FIG. 7 is a flowchart for explaining manufacture of devices.

FIG. 8 is a detailed flowchart of a wafer process as Step 4 shown in FIG. 7.

Claims

1. An exposure apparatus for exposing a pattern of a reticle onto a substrate, said exposure apparatus comprising: a projection optical system for projecting the pattern onto the substrate, said exposure apparatus exposing the substrate through a flammable liquid that is filled in a space between the substrate and said projection optical system; andan explosion-proof unit for shielding an ignition source that can ignite the liquid or vapor of the liquid, from the liquid and the vapor.

2. An exposure apparatus according to claim 1, further comprising: a chamber for accommodating said projection optical system; anda barrel stool, accommodated in the chamber, for supporting a barrel of said projection optical system, said explosion-proof unit including a partition for dividing, in cooperation with said barrel stool, an internal space of the chamber into a first space in which the reticle is driven, and a second space in which the substrate is driven.

3. An exposure apparatus according to claim 1, wherein said explosion-proof unit includes a housing for housing the ignition source and said housing is filled with compressed inflammable gas or dry air.

4. An exposure apparatus according to claim 1, further comprising: a chamber for accommodating said projection optical system;an electric circuit component arranged outside said chamber; anda connector for electrically connecting said electric circuit component to a member in said chamber.

5. An exposure apparatus for exposing a pattern of a reticle onto a substrate, said exposure apparatus comprising: a projection optical system for projecting the pattern onto the substrate, said exposure apparatus exposing the substrate through a liquid that is filled in a space between the substrate and the projection optical system; andan antistatic unit for preventing an electrification of the liquid or a charged body that contacts the liquid.

6. An exposure apparatus according to claim 5, wherein said antistatic unit includes: a conductive member connected to an accommodation part for accommodating the liquid; anda grounded member connected to the conductive member.

7. An exposure apparatus according to claim 5, wherein said antistatic unit includes: a conductive member connected to a pipe for supplying or recovering the liquid; anda grounded member connected to the conductive member.

8. A device manufacturing method comprising the steps of: exposing a substrate using an exposure apparatus according to claim 1;developing the substrate that has been exposed.

9. A device manufacturing method comprising the steps of: exposing a substrate using an exposure apparatus according to claim 5;developing the substrate that has been exposed.