Claims
- 1. A method of producing finely divided submicron silicon carbide powder comprising at least 10% by weight of 2H-type silicon carbide, comprising reacting a mixture of carbon powders consisting of finely divided particles or an organic compound which is converted into finely divided carbon by heating, with a silicon source selected from the group of sources consisting of silicon, silicon monoxide, silicon dioxide and silicon compounds which are converted into silicon, silicon monoxide or silicon dioxide by heating, said reacting occurring at a temperature of 1,200.degree.-1,500.degree. C. under a reduced pressure having a vacuum degree of not lower than 10 mm Hg in the presence of metallic aluminum or an organic or inorganic aluminum compound which is converted into aluminum by heating, said metallic aluminum or aluminum compound being dispersed homogeneously in said mixture, the amount of said metallic aluminum or aluminum compound, calculated as aluminum, being 1-20 parts by weight based on 100 parts by weight of silicon carbide to be formed.
- 2. A method or producing finely divided submicron silicon carbide powder comprising at least 10% by weight of 2H-type silicon carbide, comprising either reacting a mixture consisting essentially of vapors of a silicon halide and a hydrocarbon or decomposing trichloromethylsilane vapors, said reacting and said decomposing occurring at a temperature of 1,200.degree.-1,500.degree. C. in the presence of a vapor of aluminum halide dispersed homogeneously in said vapors, the amount of said aluminum halide being 0.5-5 parts by weight, calculated as aluminum, based on 100 parts by weight of silicon carbide to be formed.
- 3. A method of producing a high density silicon carbide sintered body, comprising molding a homogeneous powdery mixture consisting essentially of submicron silicon carbide powder and 0.1-2.0% by weight of boron and 0.1-1.0% by weight of free carbon into a shaped article, said submicron silicon carbide powder comprising at least 10% by weight of 2H-type silicon carbide; aluminum present in an effective amount for sintering from 0.3-4.9% by weight, said aluminum being homogeneously dispersed in said silicon carbide powder, said submicron silicon carbide powder having a specific surface area of at least 5 m.sup.2 /g, and the remainder of said powder being .beta.-type silicon carbide, the submicron silicon carbide powder being made by a method comprising reacting a mixture of carbon powders consisting of finely divided particles or an organic compound which is converted into finely divided carbon by heating, with a silicon source selected from the group of sources consisting of silicon, silicon monoxide, silicon dioxide and silicon compounds which are converted into silicon, silicon monoxide or silicon dioxide by heating, said reacting occuring at a temperature of 1,200.degree.-1,500.degree. C. under a reduced pressure having a vacuum degree of not lower than 10 mm Hg, in the presence of metallic aluminum or an organic or an inorganic aluminum compound which is converted into aluminum by heating, said metallic aluminum or aluminum compound being dispersed homogeneously in said mixture, the amount of said metallic aluminum or aluminum compound calculated as aluminum, being 1-20 parts by weight based on 100 parts by weight of silicon carbide to be formed; and sintering the shaped article at a temperature of 1,700.degree.-2,000.degree. C. under an essentially inert atmosphere.
- 4. A method of producing a high density silicon carbide hot pressed body, comprising hot pressing a homogeneous powdery mixture consisting essentially of submicron silicon carbide powder and 0.1-2.0% by weight of boron and 0.1-1.0% by weight of free carbon, under a pressure of 50-700 Kg/cm.sup.2 at a temperature of 1,500.degree.-1,900.degree. C., in an inert atmosphere for a sufficient amount of time to form a solid hot pressed article, said submicron silicon carbide powder comprising at least 10% by weight of 2H-type silicon carbide; aluminum present in an effective amount for sintering from 0.3-4.9% by weight, said aluminum being homogeneously dispersed in said submicron silicon carbide powder, said submicron silicon carbide powder having a specific surface area of at least 5 m.sup.2 g/, and the remainder of said powder being .beta.-type silicon carbide, the submicron silicon carbide powder being made by a method comprising reacting a mixture of carbon powders consisting of finely divided particles or an organic compound which is converted into finely divided carbon by heating, with a silicon source selected from the group of sources consisting of silicon, silicon monoxide, silicon dioxide and silicon compounds which are converted into silicon, silicon monoxide or silicon dioxide by heating, said reacting occurring at a temperature of 1,200.degree.-1,500.degree. C. under a reduced pressure having a vacuum degree of not lower than 10 mm Hg, in the presence of metallic aluminum or an organic or an inorganic aluminum compound which is converted into aluminum by heating, said metallic aluminum or aluminum compound being dispersed homogeneously in said mixture, the amount of said metallic aluminum or aluminum compound calculated as aluminum, being 1-20 parts by weight based on 100 parts by weight of silicon carbide to be formed.
- 5. Finely divided submicron silicon carbide powder consisting essentially of at least 10% by weight of 2H-type silicon carbide; aluminum, present in an effective amount for sintering from 0.3 to 4.9% by weight, said aluminum being homogeneously dispersed in said submicron silicon carbide powder, said submicron silicon carbide powder having a specific surface area of at least 5 m.sup.2 /g, and the remainder of said powder being .beta.-type silicon carbide, the submicron silicon carbide powder being made by a method comprising reacting a mixture of carbon powders consisting of finely divided particles or an organic compound which is converted into finely divided carbon by heating, with a silicon source selected from the group of sources consisting of silicon, silicon monoxide, silicon dioxide and silicon compounds which are converted into silicon, silicon monoxide or silicon dioxide by heating, said reacting occurring at a temperature of 1,200.degree.-1,500.degree. C. under a reduced pressure having a vacuum degree of not lower than 10 mm Hg in the presence of metallic aluminum or an organic or an inorganic aluminum compound which is converted into aluminum by heating, said metallic aluminum or aluminum compound being dispersed homogeneously in said mixture, the amount of said metallic aluminum or aluminum compound calculated as aluminum, being 1-20 parts by weight based on 100 parts by weight of silicon carbide to be formed.
- 6. Finely divided submicron silicon carbide powder consisting essentially of at least 10% by weight of 2H-type silicon carbide; aluminum, present in an effective amount for sintering from 0.3-4.9% by weight, said aluminum being homogeneously dispersed in said submicron silicon carbide powder and the remainder being .beta.-type silicon carbide, said submicron silicon carbide powder having a specific surface area of at least 5 m.sup.2 /g made by a method comprising either reacting a mixture consisting essentially of vapors of a silicon halide and a hydrocarbon or decomposing trichloromethysilane vapors, said reacting and said decomposing occurring at a temperature of 1,200.degree.-1,500.degree. C. in the presence of a vapor of aluminum halide dispersed homogeneously in said vapors, the amount of said aluminum halide being 0.5-5 parts by weight, calculated as aluminum, based on 100 parts by weight of silicon carbide to be formed.
- 7. A high-density silicon carbide sintered body having crystal structures consisting of .beta.-type and 4H-type crystal structures and having a density of at least 85% of theoretical density, made by a method comprising: molding a homogeneous powdery mixture consisting essentially of submicron silicon carbide and 0.1-2.0% by weight of boron and 0.1-1.0% by weight of free carbon into a shaped article, said submicron silicon carbide powder comprising at least 10% by weight of 2H-type silicon carbide; aluminum present in an effective amount for sintering from 0.3 to 4.9% by weight, said aluminum being homogeneously dispersed in said submicron silicon carbide powder, said submicron silicon carbide powder having a specific surface area of at least 5 m.sup.2 /g, and the remainder of said submicron silicon carbide powder being .beta.-type silicon carbide, the submicron silicon carbide powder being made by a method comprising reacting a mixture of carbon powders consisting of finely divided particles or an organic compound which is converted into finely divided carbon by heating, with a silicon source selected from the group of sources consisting of silicon, silicon monoxide, silicon dioxide and silicon compounds which are converted into silicon, silicon monoxide or silicon dioxide by heating, said reacting occurring at a temperature of 1,200.degree.-1,500.degree. C. under a reduced pressure having a vacuum degree of not lower than 10 mm Hg, in the presence of metallic aluminum or an organic or an inorganic aluminum compound which is converted into aluminum by heating, said metallic aluminum or aluminum compound being dispersed homogeneously in said mixture the amount of said metallic aluminum or aluminum compound calculated as aluminum being 1-20 parts by weight based on 100 parts by weight of silicon carbide to be formed; and sintering the shaped article at a temperature of 1,700.degree.-2,000.degree. C. under an essentially inert atmosphere.
- 8. A high-density silicon carbide hot pressed body having crystal structures consisting of .beta.-type and 4H-type crystal structures and having a density of at least 85% of theoretical density, made by a method comprising hot pressing a homogeneous powdery mixture consisting essentially of submicron silicon carbide and 0.1-2.0% by weight of boron and 0.1-1.0% by weight of free carbon, under a pressure of 50-700 kg/cm.sup.2 at a temperature of 1,500.degree.-1,900.degree. C., in an inert atmosphere for a sufficient amount of time to form a solid hot pressed article, said submicron carbide powder comprising at least 10% by weight of 2H-type silicon carbide; aluminum present in an effective amount for sintering from 0.3 to 4.9% by weight, said aluminum being homogeneously dispersed in said submicron silicon carbide powder, said submicron silicon carbide powder having a specific surface area of at least 5 m.sup.2 /g, and the remainder of said submicron silicon carbide powder being .beta.-type silicon carbide, the submicron silicon carbide powder being made by a method comprising reacting a mixture of carbon powders consisting of finely divided particles or an organic compound which is converted into finely divided carbon by heating, with a silicon source selected from the group of sources consisting of silicon, silicon monoxide, silicon dioxide and silicon compounds which are converted into silicon, silicon monoxide or silicon dioxide by heating, said reacting occurring at a temperature of 1,200.degree.-1,500.degree. C., under a reduced pressure having a vacuum degree of not lower than 10 mm Hg, in the presence of metallic aluminum or an organic or an inorganic aluminum compound which is converted to aluminum by heating, said metallic aluminum or aluminum compound being dispersed homogeneously in said mixture, the amount of said metallic aluminum or aluminum compound calculated as aluminum, being 1-20 parts by weight based on 100 parts by weight of silicon carbide to be formed.
- 9. A method of producing a high-density silicon carbide sintered body, comprising molding a homogeneous powdery mixture consisting essentially of submicron silicon carbide powder and 0.1-2.0% by weight of boron and 0.1-1.0% by weight of free carbon into a shaped article, said submicron silicon carbide powder consisting essentially of at least 10% by weight of 2H-type silicon carbide; aluminum present in an effective amount for sintering from 0.3-4.9% by weight, said aluminum being homogeneously dispersed in said silicon carbide powder, said submicron silicon carbide powder having a specific surface area of at least 5 m.sup.2 /g, and the remainder of said submicron silicon carbide powder being .beta.-type silicon carbide, the submicron silicon carbide powder being made by a method comprising either reacting a mixture consisting essentially of vapors of a silicon halide and a hydrocarbon, or decomposing trichloromethylsilane vapors said reacting and said decomposing occurring at a temperature of 1,200.degree.-1,500.degree. C., in the presence of a vapor of aluminum halide dispersed homogeneously in said vapors, the amount of said aluminum halide being 0.5-5 parts by weight, calculated as aluminum, based on 100 parts by weight of silicon carbide to be formed; and sintering the shaped article at a temperature of 1,700.degree.-2,000.degree. C. under an essentially inert atmosphere.
- 10. A method of producing a high-density silicon carbide not pressed body comprising hot pressing a homogeneous powdery mixture consisting essentially of submicron silicon carbide powder and 0.1-2.0% by weight of boron and 0.1-1.0% by weight of free carbon under a pressure of 50-700 kg/cm.sup.2 at a temperature of 1,500.degree.-1,900.degree. C., in an inert atmosphere for a sufficient amount of time to form a solid hot-pressed article, said submicron silicon carbide powder consisting essentially of at least 10% by weight of 2H-type silicon carbide; aluminum present in an effective amount for sintering from 0.3-4.9% by weight, said aluminum being homogeneously dispersed in said submicron silicon carbide powder and the remainder of said submicron silicon carbide powder being .beta.-type silicon carbide, said submicron silicon carbide powder having a specific surface area of at least 5 m.sup.2 /g, the submicron silicon carbide powder being made by a method comprising either reacting a mixture consisting essentially of vapors of a silicon halide and a hydrocarbon, or decomposing trichloromethylsilane vapors, said reacting and said decomposing occurring at a temperature of 1,200.degree.-1,500.degree. C. in the presence of a vapor of aluminum halide dispersed homogeneously in said vapors, the amount of said aluminum halide being 0.5-5 parts by weight, calculated as aluminum based on 100 parts by weight of silicon carbide to be formed.
- 11. A high-density silicon carbide sintered body having crystal structures consisting of .beta.-type and 4H-type crystal structures and having a density of at least 85% of theoretical density made by a method comprising molding a homogeneous powdery mixture consisting essentially of submicron silicon carbide powder and 0.1-2.0% by weight of boron and 0.1-1.0% by weight of free carbon into a shaped article, said submicron silicon carbide powder consisting essentially of at least 10% by weight of 2H-type silicon carbide; aluminum present in an effective amount for sintering from 0.3 to 4.9% by weight, said aluminum being homogeneously dispersed in said silicon carbide powder, said silicon carbide powder having a specific surface area of at least 5 m.sup.2 /g, and the remainder of said submicron silicon carbide powder being .beta.-type silicon carbide, the submicron silicon carbide powder being made by a method comprising either reacting a mixture consisting essentially of vapors of a silicon halide and a hydrocarbon, or decomposing trichloromethylsilane vapors, said reacting and said decomposing occurring at a temperature of 1,200.degree.-1,500.degree. C. in the presence of a vapor of aluminum halide dispersed homogeneously in said vapors, the amount of said aluminum halide being 0.5-5 parts by weight, calculated as aluminum, based on 100 parts by weight of silicon carbide to be formed; and sintering the shaped article at a temperature of 1,700.degree.-2,000.degree. C. under an essentially inert atmosphere.
- 12. A high-density silicon carbide hot pressed body having crystal structures consisting of .beta.-type and 4H-type crystal structures and having a density of at least 85% of theoretical density, made by a method comprising hot pressing a homogeneous powdery mixture consisting essentially of submicron silicon carbide and 0.1-2.0% by weight of boron and 0.1-1.0% by weight of free carbon, under a pressure of 50-700 kg/cm.sup.2 at a temperature of 1,500.degree.-1,900.degree. C. in an inert atmosphere for a sufficient amount of time to form a solid hot-pressed article, said submicron silicon carbide powder consisting essentially of at least 10% by weight of 2H-type silicon carbide; aluminum present in an effective amount for sintering from 0.3 to 4.9% by weight, said aluminum being homogeneously dispersed in said silicon carbide powder and the remainder of said submicron silicon carbide powder being .beta.-type silicon carbide, said submicron silicon carbide powder having a specific surface area of at least 5 m.sup.2 /g, the submicron silicon carbide powder being made by a method comprising either reacting a mixture consisting essentially of vapors of a silicon halide and a hydrocarbon, or decomposing trichloromethylsilane vapors, said reacting and said decomposing occurring at a temperature of 1,200.degree.-1,500.degree. C. in the presence of a vapor of aluminum halide dispersed homogeneously in said vapors, the amount of said aluminum halide being 0.5-5 parts by weight, calculated as aluminum based on 100 parts by weight of silicon carbide to be formed.
Priority Claims (3)
Number |
Date |
Country |
Kind |
53-28597 |
Mar 1978 |
JPX |
|
53-28598 |
Mar 1978 |
JPX |
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53-28600 |
Mar 1978 |
JPX |
|
Parent Case Info
This is a continuation of application Ser. No. 299,929 filed Sept. 8, 1981 which in turn is a Rule 60 continuation of U.S. Ser. No. 154,215, filed May 29, 1980, which is a Rule 60 continuation of U.S. Ser. No. 18,632, filed Mar. 8, 1979 all now abandoned.
US Referenced Citations (4)
Foreign Referenced Citations (2)
Number |
Date |
Country |
1417816 |
Oct 1968 |
DEX |
50-18479 |
Jun 1975 |
JPX |
Non-Patent Literature Citations (3)
Entry |
Merz et al., "Chem. Abstracts", P.10885C, 1959. |
Sokhor et al., "Chem. Abstracts", P.5046b, 1965. |
Pandex et al., "Chem. Abstracts" P.180455a, 1978. |
Continuations (3)
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Number |
Date |
Country |
Parent |
299929 |
Sep 1981 |
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Parent |
154215 |
May 1980 |
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Parent |
18632 |
Mar 1979 |
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