Trehch filling by ionized metal physical vapor deposition; Junqing Lu and Mark J. Kushner. |
Anovel pulsed magnetron sputter technique utilizing high target power densities; Vladimir Kouznetsov etal. |
Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge Karol Macak, et al. |
Evolution of the electron distribution and plasma parameters in a pulse magnetron discharge J.T. Gudmundsson. |
Influenceeof high power densities on the composition of pulsed magnetron plasmas A.P. Ehiasarian et al. |
Novel metallization technique for filling 100 nm wide trenches and vias with very high aspect ratio Othon R. Monteiro. |