1. Field of the Invention
The present invention relates to liquid ejection heads ejecting liquids, methods for manufacturing the liquid ejection heads, and methods for forming structures. The present invention particularly relates to a liquid ejection head that ejects ink toward a recording medium to perform recording, a method for manufacturing the liquid ejection head, and a method for forming a microstructure useful in semiconductor manufacture.
2. Description of the Related Art
An example of a process using a liquid ejection head ejecting a liquid is an ink jet recording process (liquid-ejecting recording process).
In general, ink jet recording heads used for the ink jet recording process include fine discharge ports, liquid passages, and energy-generating elements which are disposed in the liquid passages and which generate energy used to eject a liquid. A method for manufacturing such an ink jet recording head is disclosed in, for example, U.S. Pat. No. 5,478,606.
A pattern for forming passages is formed on a substrate having energy-generating elements using a soluble resin; a covering resin layer, containing an epoxy resin and a cationic photopolymerization initiator, for forming walls of the passage is formed on the pattern; discharge ports are formed on the energy-generating elements by photolithography; the soluble resin is dissolved off; and the covering resin layer is finally cured, whereby the passage walls are formed.
The method disclosed in U.S. Pat. No. 5,478,606 has a certain limitation in patterning accuracy because of a material currently used and is, however, capable of forming passage walls 101 well at a nozzle density of up to 600 dpi as shown in
A possible measure against the problem is to replace the photosensitive material with a high-resolution material. However, it is difficult to immediately develop such a high-resolution material. Another possible measure against the problem is to reduce the thickness of the mold member. An increase in nozzle density to 1,200 dpi leads to a reduction in the length of each passage. This may causes the nozzles to be insufficiently refilled with ink. In order to keep the cross-sectional area of the passage and in order to prevent the insufficient refilling thereof, the height of the passage needs to be high. A reduction in the thickness of the mold member, which is used to form the passage, leads to a reduction in the height of the passage and therefore is practically difficult. The above two measures may be impractical in solving the problem due to an increase in nozzle density.
The present invention provides a liquid ejection head in which passages and discharge ports are densely arranged and are, however, prevented from being communicatively connected to each other and in which walls of the passages are securely bonded to a substrate. The present invention provides a method for manufacturing the liquid ejection head. Furthermore, the present invention provides a method for forming a microstructure useful in manufacturing a semiconductor other than the liquid ejection head.
An aspect of the present invention provides a method for manufacturing a liquid ejection head including a substrate and a member which is disposed above the substrate and which has passages communicatively connected to discharge ports through which a liquid is ejected. The method includes providing first solid layers made of a positive photosensitive resin above the substrate such that outer side surfaces of the first solid layers form an obtuse angle with the substrate; providing a second solid layer above the substrate such that the second solid layer abuts the outer side surfaces of the first solid layers, the second solid layer being processed into at least one portion of a mold for the passages; exposing portions of the outer side surfaces of the first solid layers through the second solid layer; removing the exposed portions from the first solid layers; and providing a cover layer over the second solid layer, the cover layer being processed into the member.
According to the method, the liquid ejection head can be manufactured such that the passages and the discharge ports are densely arranged, the passages are prevented from being communicatively connected to each other, and the length of the passages is secured.
According to the method, the passages are greater in cross-sectional area than those formed by a conventional method when the passages are arranged at the same density as the density of those formed by the conventional method. This allows an increase in refilling rate.
When the passages are equal in cross-sectional area to those formed by the conventional method, the contact area between the substrate and each wall of the passages can be increased as compared to the conventional method; hence, the passage walls can be formed so as to be excellent in adhesion.
Further features of the present invention will become apparent from the following description of exemplary embodiments with reference to the attached drawings.
Embodiments of the present invention will now be described with reference to the attached drawings.
Liquid ejection heads below can be installed in apparatuses such as printers, copiers, facsimile machines including communication systems, and word processors including printer sections; industrial recording apparatuses combined with various processors; and the like. The liquid ejection heads are useful in recording data on various recording media made of paper, yarn, fiber, fabric, leather, metal, plastic, glass, wood, or ceramic. The term “recording” as used herein shall mean not only providing a meaningful image such as a letter, a character, or a figure on a recording medium but also providing a meaningless image such as a pattern on a recording medium.
The term “ink” or “liquid” as used herein should be construed broadly and shall mean a liquid that is provided on a recording medium such that an image, a figure, or a pattern is formed on the recording medium or the recording medium or ink is treated. The treatment of the recording medium or ink provided on the recording medium is as follows: a colorant contained in the ink is solidified or insolublized such that the fixation of the ink, the coloration of the ink, the quality of a recorded image, the durability of the recorded image, and/or the like is improved.
The liquid ejection head includes a substrate 1, made of silicon, including energy-generating elements 2 generating energy used to discharge a liquid. The energy-generating elements 2 are arranged in two rows at predetermined intervals. The substrate 1 has a supply port 8, formed by anisotropically etching the substrate 1, extending between the two rows of the energy-generating elements 2. The substrate 1 is overlaid with a passage-forming member 5 which has discharge ports 6 located at positions opposed to the energy-generating elements 2 and which has separate passages communicatively connected to the supply port 8 and the discharge ports 6. The positions of the discharge ports 6 are not limited to the positions opposed to the energy-generating elements 2.
In the case of using the liquid ejection head as an ink jet recording head, the liquid ejection head is placed such that a surface of the liquid ejection head that has the discharge ports 6 faces a recording surface of a recording medium. In the liquid ejection head, the energy generated by the energy-generating elements 2 is applied to ink supplied to the passages through the supply port 8 such that droplets of the ink are discharged from the discharge ports 6, whereby the ink droplets are applied to the recording medium. Examples of the energy-generating elements 2 include, but are not limited to, electrothermal transducers (so-called heaters) for generating thermal energy and piezoelectric transducers for generating mechanical energy.
A method for manufacturing a liquid ejection head according to a second embodiment of the present invention will now be described. In descriptions below, components having the same functions are denoted by the same reference numerals in the attached drawings and will not be described in detail.
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The angle θ between the principal surface 1a of the substrate 1 and each side surface 12 of the first solid layers 3a is obtuse, that is, the angle θ therebetween is greater than 90 degrees as shown in
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In this embodiment, the side surfaces 12 of the first solid layers 3a are arranged in the Z-direction, one of each two adjacent passages 13 is formed using the second solid layer 4a, which have the transfer portions X transferred from the slope portions of the side surfaces 12 of the first solid layers 3a, as a mold and the other is formed using the first pattern 3, which is obtained from the first solid layers 3a, as a mold. This allows the area and cross-sectional area of each passage 13 to be secured. The angle θ between the principal surface 1a of the substrate 1 and outer surface, parallel to the Y-direction in
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Necessary electrical connections are then provided, whereby the liquid ejection head is completed.
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A method for manufacturing a liquid ejection head according to a third embodiment of the present invention includes the same steps as those described in the first embodiment with reference to
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A passage-forming member and discharge ports can be formed through the same steps as those described in the first embodiment with reference to
A method for manufacturing a liquid ejection head according to a fourth embodiment of the present invention includes the same steps as those described in the first embodiment with reference to
A second solid layer 4a is polished toward a substrate until first solid layers 3a are uncovered, whereby a second pattern 4 is formed. This allows the upper surfaces of the first solid layers 3a and the upper surface of the second pattern 4 to be planarized as shown in
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The liquid ejection head can be obtained through the same steps as those subsequent to the step described in the first embodiment with reference to
In this embodiment, the upper surfaces of the first and second patterns 3 and 4 are planarized by polishing and therefore have high flatness.
In this embodiment, the first solid layers 3a are patterned by exposure but the second solid layer 4a is not patterned; hence, a material insensitive to light can be used to form the second solid layer 4a.
A fifth embodiment of the present invention will now be described with reference to
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In this step, the first solid layers 3a may be globally exposed as required and then removed with a solvent or the like.
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A pattern formed by a method for forming a pattern for forming the passages 13 described above can be used as a microstructure in an MEMS field and so on. That is, a method for forming a first passage pattern 3 and a second passage pattern 4 on a substrate as described above can be used as a method for forming a microstructure for forming a microstructure and another microstructure on such a substrate as described above in various industrial fields.
The present invention will be further described in detail with reference to examples.
An example of the present invention is described below with reference to
A liquid ejection head was prepared and then evaluated as described below.
A plurality of heaters 2 acting as energy-generating elements were provided on a Si substrate 1 as shown in
An adhesive layer (not shown) made of polyether amide was formed on the Si substrate 1.
A film was formed on the adhesive layer by spin coating using a solution prepared by dissolving poly(methyl isopropenyl ketone) in an appropriate solvent and then baked at 150° C. for six minutes, whereby first solid layers 3a with a thickness of 11 μm were formed as shown in
The first solid layers 3a were exposed at a wavelength of 260 nm or more using an exposure system, UX3000™, available from Ushio Inc., whereby a first passage pattern 3 was formed as shown in
A film was formed over the first solid layers 3a by spin coating using a resin principally containing methyl methacrylate and then baked at 90° C for 20 minutes, whereby a second solid layer 4a as shown in
The second solid layer 4a was exposed at a wavelength of 250 nm or less using an exposure system, UX3000™, available from Ushio Inc., whereby a second passage pattern 4 was formed as shown in
The first solid layers 3a were exposed at a wavelength of 260 nm or more again and then developed, whereby the first passage pattern 3 was formed. The distance E between the first and second passage patterns 3 and 4 was 6 μm. The first passage pattern 3 had upper portions with a length B of 16 μm and bottom portions with a length A of 22 μm as shown in
A passage-forming member 5 made of an epoxy resin was formed as shown in
A film was formed by spin coating using a protective layer-forming material and then dried at 80° C. to 120° C., whereby a protective layer (not shown) for protecting the discharge ports 6 during etching was formed. A mask was provided on the back surface of the Si substrate 1. The back surface thereof was anisotropically etched through the mask, whereby a supply port (not shown) was formed.
The protective layer was removed and the first and second passage patterns 3 and 4 were dissolved off, whereby passages 13 were formed. The passage-forming member 5, which was made of the epoxy resin, was cured by heating the passage-forming member 5 at 200° C. for one hour, whereby the liquid ejection head was obtained as shown in
A method for manufacturing a comparative liquid ejection head is described below with reference to
A plurality of heaters 2 acting as energy-generating elements were provided on a Si substrate 1 as shown in
An adhesion enhancement layer (not shown) made of polyether amide was formed on the Si substrate 1.
A film was formed on the adhesion enhancement layer by spin coating using a solution prepared by dissolving poly(methyl isopropenyl ketone) in an appropriate solvent and then baked at 130° C. for six minutes, whereby a first solid layer 11 with a thickness of 11 μm were formed as shown in
A film was formed on the first solid layer 11 by spin coating using a resin principally containing methyl methacrylate and then baked at 120° C. for six minutes, whereby a second solid layer 24a as shown in
The second solid layer 24a was exposed at a wavelength of 250 nm or less using an exposure system, UX3000™, available from Ushio Inc., whereby a second pattern 24 was formed as shown in
The first solid layer 11 was exposed at a wavelength of 260 nm or more, whereby a first pattern 23 was formed. The first pattern 23 had first sections 23a corresponding to energy-generating chambers. The first sections 23a had a tilt angle θ of 75 degrees. The reason why the tilt angle θ of the first sections 23a is less than 90 degrees is as follows: the first solid layer 11 is made of a positive photosensitive resin and therefore absorbs exposure light to react, light traveling through the first solid layer 11 is attenuated and therefore has low intensity at a lower portion thereof, and masked upper portions of the first solid layer 11 are exposed to diffracted light. The first sections 23a, as well as the first passage pattern 3 of the example, had bottom portions with a length F of 22 μm and upper portions with a length G of 16 μm. The second pattern 24 was disposed on the first pattern 23 and had the same shape as that of the second passage pattern 4 of the example.
The first pattern 23 had second sections 23b disposed between the first sections 23a. The second sections 23b had bottom portions with a length H of 9.5 μm and upper portions with a length I of 3.6 μm because the second sections 23b were formed together with the first sections 23a by exposure. This is probably due to the same reason as why the tilt angle θ of the first sections 23a is less than 90 degrees. The distance J, as well as the distance E described in the example, between each second section 23b and a corresponding one of the first sections 23a was 6 μm as shown in
A passage-forming member 5 was provided above the Si substrate 1 as shown in
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In comparison between the example and the comparative example, the energy-generating chambers 33a have the same shape. Walls between the energy-generating chambers and the passages disposed between the energy-generating chambers have the same thickness (E=J=6 μm); hence, the contact area between the substrate 1 and the passage-forming member 5 does not vary and the adhesion between the substrate 1 and the passage-forming member 5 does not vary. The passages 13 (an upper length of 14.5 μm, a bottom length of 9.5 μm, and a height of 11 μm) disposed between the energy-generating chambers 13a of the example has a cross-sectional area greater than that of the passages 33 (an upper length of 3.6 μm, a bottom length of 9.5 μm, and a height of 11 μm) of the comparative example. Therefore, according to the present invention, passages can be increased in cross-sectional area with the adhesion between a substrate and a passage-forming member maintained; hence, refilling rate can be increased. When print duty may be low, the contact area between the passage-forming member 5 and the substrate 1 can be increased in such a manner that the cross-sectional area of the passages 13 of the example is reduced to that of the comparative example. In this case, the adhesion between the passage-forming member 5 and the substrate 1 can be increased with refilling rate maintained.
The liquid ejection head and the comparative liquid ejection head were each installed in an ejection apparatus. Ink was ejected from each of the liquid ejection head and the comparative liquid ejection head toward a sheet of recording paper. In the case of ejecting the ink from the comparative liquid ejection head at high duty, white stripes were formed. This is probably because the ink cannot be ejected through the discharge ports of the comparative liquid ejection head because of insufficient refilling rate. On the other hand, the ink was ejected from the liquid ejection head at high duty without any problems.
While the present invention has been described with reference to exemplary embodiments, it is to be understood that the invention is not limited to the disclosed exemplary embodiments. The scope of the following claims is to be accorded the broadest interpretation so as to encompass all modifications and equivalent structures and functions.
This application claims the benefit of Japanese Patent Application No. 2008-160773 filed Jun. 19, 2008, which is hereby incorporated by reference herein in its entirety.
Number | Date | Country | Kind |
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2008-160773 | Jun 2008 | JP | national |