Claims
- 1. An electrophoretic migration imaging recording method comprising the steps of:
- (a) providing an electrically photosensitive imaging layer comprising an electrically photosensitive particulate material having the following general structure: ##STR32## wherein R.sup.1 is hydrogen, lower alkyl, lower alkoxy, nitro, halogen, cyano, phenyl, lower alkylsulfonamido or lower alkoxycarbonyl and A.sup.1 is a monovalent and A.sup.2 is a divalent residue of an aniline, 1,2,3,4-tetrahydroquinoline, benzomorpholine or indoline compound attached to the .dbd.CH-- group by an aromatic ring carbon atom in the position para to the aromatic amine nitrogen atom,
- (b) applying an electrical field across said layer; and
- (c) exposing said layer to an image pattern of electromagnetic radiation to which said electrically photosensitive material is photosensitive; and
- (d) if necessary, at least partially liquifying said layer before, during or after exposure and application of the electric field to permit some migration of said electrically photosensitive material in said layer,
- thereby forming a record of the image pattern of electromagnetic radiation in said layer.
- 2. A method as in claim 1, further comprising the steps of:
- (a) positioning said layer between two electrodes during the exposure and application of the electric field; and then
- (b) separating the electrodes thereby forming a visual record of the image pattern of electromagnetic radiation on at least one of the electrodes.
- 3. A method as in claim 1, further comprising the steps of:
- (a) placing said layer between two support sheets to form an imaging element;
- (b) positioning the element between two electrodes during the exposure and application of the electric field; and
- (c) separating the two support sheets thereby forming a visual record of the image pattern of electromagnetic record on the support sheets.
- 4. A method as in claims 2 or 3, wherein said layer is liquified in the presence of an electric field some time subsequent to exposure.
- 5. A method as in claim 1, further comprising the step of developing a visual record of the image pattern of electromagnetic radiation by removing the exposed or unexposed portion of said layer.
- 6. A method as in claims 1, 2 or 3 wherein said electrically photosensitive particulate material has the structure ##STR33## wherein R.sup.1 is hydrogen, lower alkyl, lower alkoxy, nitro, halogen, cyano, phenyl, lower alkylsulfonamido or lower alkoxycarbonyl and A.sup.1 has the formula ##STR34## in which R.sup.2 is hydrogen, lower alkyl, lower alkoxy or halogen; n is 0, 1 or 2; R.sup.3 and R.sup.4 are unsubstituted or substituted alkyl containing up to about 12 carbon atoms; cyclohexyl; unsubstituted or substituted aryl; or when R.sup.4 is phenyl R.sup.3 can be hydrogen; R.sup.5, R.sup.6 and R.sup.7 are hydrogen or lower alkyl; R.sup.8 and R.sup.9 are lower alkyl or aryl; R.sup.17 is hydrogen or, when R.sup.5, R.sup.6 and R.sup.7 each is hydrogen, R.sup.17 is halogen derived from halogen or hydroxy.
- 7. A method as in claim 6 wherein said material has the structure ##STR35## wherein R.sup.13 is hydrogen, methyl, methoxy, ethoxy or chlorine;
- R.sup.14 is hydrogen, methyl, methoxy or ethoxy;
- R.sup.3 is lower alkyl, phenethyl; cyclohexylmethyl; benzyl; benzyl substituted with lower alkyl, lower alkoxy, chlorine, bromine or lower alkoxycarbonyl; aryl; or a group having the formula --R.sup.11 --R.sup.15 in which R.sup.11 is ethylene, propylene, trimethylene or tetramethylene and R.sup.15 is lower alkanoyloxy, cyano, lower alkoxycarbonyloxy, arylcarbamoyloxy, lower alkylcarbamoyloxy, aroyloxy, lower alkoxycarbonylbenzoyloxy, lower alkoxy, chlorine, aryloxy, 2-benzothiazolylthio, or a group having the formula ##STR36## in which Y is --CO--, --SO.sub.2 --, or --CH.sub.2 -- and R.sup.16 is ethylene, propylene, trimethylene or o-arylene; and
- R.sup.4 is lower alkyl; cyclohexyl; lower alkylcyclohexyl; benzyl; benzyl substituted with lower alkyl, lower alkoxy, chlorine or bromine; aryl; or a group having the formula --R.sup.11 --R.sup.17 in which R.sup.11 is ethylene, propylene, trimethylene or tetramethylene and R.sup.17 is lower alkanoyloxy, lower alkoxycarbonyloxy, aroyloxy or lower alkoxy,
- in which each aryl moiety is phenyl, tolyl, lower alkoxyphenyl, or chlorophenyl.
- 8. A method as in claim 6 wherein said material has the structure ##STR37## wherein R.sup.13 is hydrogen, methyl, methoxy, ethoxy or chlorine;
- R.sup.3 is lower alkyl, phenethyl; cyclohexylmethyl; benzyl; benzyl substituted with lower alkyl, lower alkoxy, chlorine, bromine or lower alkoxycarbonyl; aryl; or a group having the formula --R.sup.11 --R.sup.15 in which R.sup.11 is ethylene, propylene, trimethylene or tetramethylene and R.sup.15 is lower alkanoyloxy, cyano, lower alkoxycarbonyloxy, arylcarbamoyloxy, lower alkylcarbamoyloxy, aroyloxy, lower alkoxycarbonylbenzoyloxy, lower alkoxy, chlorine, aryloxy, 2-benzothiazolylthio, or a group having the formula ##STR38## in which Y is --CO--, --SO.sub.2 --, or --CH.sub.2 -- and R.sup.16 is ethylene, propylene, trimethylene or o-arylene;
- R.sup.8, R.sup.9 and R.sup.10 each is hydrogen or methyl; and
- R.sup.17 is hydrogen or, when R.sup.8, R.sup.9 and R.sup.10 each is hydrogen, R.sup.17 is one of the substituents which R.sup.15 can represent;
- in which each aryl moiety is phenyl, tolyl, lower alkoxyphenyl, or chlorophenyl.
- 9. A method as in claim 6 wherein said material has the structure ##STR39## wherein R.sup.13 is hydrogen, methyl, methoxy, ethoxy or chlorine;
- R.sup.3 is lower alkyl, phenethyl; cyclohexylmethyl; benzyl; benzyl substituted with lower alkyl, lower alkoxy, chlorine, bromine or lower alkoxycarbonyl; aryl; or a group having the formula --R.sup.11 --R.sup.15 in which R.sup.11 is ethylene, propylene, trimethylene or tetramethylene and R.sup.15 is lower alkanoyloxy, cyano, lower alkoxycarbonyloxy, arylcarbamoyloxy, lower alkylcarbamoyloxy, aroyloxy, lower alkoxycarbonylbenzoyloxy, lower alkoxy, chlorine, aryloxy, 2-benzothiazolylthio, or a group having the formula ##STR40## in which Y is --CO--, --SO.sub.2 --, or --CH.sub.2 -- and R.sup.16 is ethylene, propylene, trimethylene or o-arylene;
- R.sup.9 is hydrogen or methyl;
- in which each aryl moiety is phenyl, tolyl, lower alkoxyphenyl, or chlorophenyl.
- 10. A method as in claim 6 wherein said material has the structure ##STR41## wherein R.sup.13 is hydrogen, methyl, methoxy, ethoxy or chlorine;
- R.sup.3 is lower alkyl, phenethyl; cyclohexylmethyl; benzyl; benzyl substituted with lower alkyl, lower alkoxy, chlorine, bromine or lower alkoxycarbonyl; aryl; or a group having the formula --R.sup.11 --R.sup.15 in which R.sup.11 is ethylene, propylene, trimethylene or tetramethylene and R.sup.15 is lower alkanoyloxy, cyano, lower alkoxycarbonyloxy, arylcarbamoyloxy, lower alkylcarbamoyloxy, aroyloxy, lower alkoxycarbonylbenzoyloxy, lower alkoxy, chlorine, aryloxy, 2-benzothiazolylthio, or a group having the formula ##STR42## in which Y is --CO--, --SO.sub.2 --, or --CH.sub.2 -- and R.sup.16 is ethylene, propylene, trimethylene or o-arylene;
- R.sup.4 is lower alkyl; cyclohexyl; lower alkylcyclohexyl; benzyl; benzyl substituted with lower alkyl, lower alkoxy, chlorine or bromine; aryl; or a group having the formula --R.sup.11 --R.sup.17 in which R.sup.11 is ethylene, propylene, trimethylene or tetramethylene and R.sup.17 is lower alkanoyloxy, lower alkoxycarbonyloxy, aroyloxy or lower alkoxy;
- in which each aryl moiety is phenyl, tolyl, lower alkoxyphenyl, or chlorophenyl.
- 11. A method as in claim 6 wherein said material is selected from the group consisting of ##STR43##
- 12. An electrophoretic migration imaging layer comprising an electrically photosensitive particulate material having the structure ##STR44## wherein R.sup.1 is hydrogen, lower alkyl, lower alkoxy, nitro, halogen, cyano, phenyl, lower alkylsulfonamido or lower alkoxycarbonyl and A.sup.1 is a monovalent and A.sup.2 is a divalent residue of an aniline, 1,2,3,4-tetrahydroquinoline, benzomorpholine or indoline compound attached to the .dbd.CH-- group by an aromatic ring carbon atom in the position para to the aromatic amine nitrogen atom.
- 13. A layer as in claim 12 wherein said material has the structure ##STR45## wherein R.sup.1 is hydrogen, lower alkyl, lower alkoxy, nitro, halogen, cyano, phenyl, lower alkylsulfonamido or lower alkoxycarbonyl and A.sup.1 has the formula ##STR46## in which R.sup.2 is hydrogen, lower alkyl, lower alkoxy or halogen; n is 0, 1 or 2; R.sup.3 and R.sup.4 are unsubstituted or substituted alkyl containing up to about 12 carbon atoms; cyclohexyl; unsubstituted or substituted aryl; or when R.sup.4 is phenyl R.sup.3 can be hydrogen; R.sup.5, R.sup.6 and R.sup.7 are hydrogen or lower alkyl; R.sup.8 and R.sup.9 are lower alkyl or aryl; R.sup.17 is hydrogen or, when R.sup.5, R.sup.6 and R.sup.7 each is hydrogen, R.sup.17 is halogen derived from halogen or hydroxy.
- 14. A layer as in claim 13 wherein said material has the structure ##STR47## wherein R.sup.13 is hydrogen, methyl, methoxy, ethoxy, or chlorine;
- R.sup.14 is hydrogen, methyl, methoxy or ethoxy;
- R.sup.3 is lower alkyl, phenethyl; cyclohexylmethyl; benzyl; benzyl substituted with lower alkyl, lower alkoxy, chlorine, bromine or lower alkoxycarbonyl; aryl; or a group having the formula --R.sup.11 --R.sup.15 in which R.sup.11 is ethylene, propylene, trimethylene or tetramethylene and R.sup.15 is lower alkanoyloxy, cyano, lower alkoxycarbonyloxy, arylcarbamoyloxy, lower alkylcarbamoyloxy, aroyloxy, lower alkoxycarbonylbenzoyloxy, lower alkoxy, chlorine, aryloxy, 2-benzothiazolylthio, or a group having the formula ##STR48## in which Y is --CO--, --SO.sub.2 --, or --CH.sub.2 -- and R.sup.16 is ethylene, propylene, trimethylene or o-arylene; and
- R.sup.4 is lower alkyl; cyclohexyl; lower alkylcyclohexyl; benzyl; benzyl substituted with lower alkyl, lower alkoxy, chlorine or bromine; aryl; or a group having the formula --R.sup.11 --R.sup.17 in which R.sup.11 is ethylene, propylene, trimethylene or tetramethylene and R.sup.17 is lower alkanoyloxy, lower alkoxycarbonyloxy, aroyloxy or lower alkoxy,
- in which each aryl moiety is phenyl, tolyl, lower alkoxyphenyl, or chlorophenyl.
- 15. A layer as in claim 13 wherein said material has the structure ##STR49## wherein R.sup.13 is hydrogen, methyl, methoxy, ethoxy or chlorine;
- R.sup.3 is lower alkyl, phenethyl; cyclohexylmethyl; benzyl; benzyl substituted with lower alkyl, lower alkoxy, chlorine, bromine or lower alkoxycarbonyl; aryl; or a group having the formula --R.sup.11 --R.sup.15 in which R.sup.11 is ethylene, propylene, trimethylene or tetramethylene and R.sup.15 is lower alkanoyloxy, cyano, lower alkoxycarbonyloxy, arylcarbamoyloxy, lower alkylcarbamoyloxy, aroyloxy, lower alkoxycarbonylbenzoyloxy, lower alkoxy, chlorine, aryloxy, 2-benzothiazolylthio, or a group having the formula ##STR50## in which Y is --CO--, --SO.sub.2 --, or --CH.sub.2 -- and R.sup.16 is ethylene, propylene, trimethylene or o-arylene;
- R.sup.8, R.sup.9 and R.sup.10 each is hydrogen or methyl; and
- R.sup.17 hydrogen or, when R.sup.8, R.sup.9 and R.sup.10 each is hydrogen, R.sup.17 is one of the substituents which R.sup.15 can represent;
- in which each aryl moiety is phenyl, tolyl, lower alkoxyphenyl, or chlorophenyl.
- 16. A layer as in claim 13 wherein said material has the structure ##STR51## wherein R.sup.13 is hydrogen, methyl, methoxy, ethoxy or chlorine;
- R.sup.3 is lower alkyl, phenethyl; cyclohexylmethyl; benzyl; benzyl substituted with lower alkyl, lower alkoxy, chlorine, bromine or lower alkoxycarbonyl; aryl; or a group having the formula --R.sup.11 --R.sup.15 in which R.sup.11 is ethylene, propylene, trimethylene or tetramethylene and R.sup.15 is lower alkanoyloxy, cyano, lower alkoxycarbonyloxy, arylcarbamoyloxy, lower alkylcarbamoyloxy, aroyloxy, lower alkoxycarbonylbenzoyloxy, lower alkoxy, chlorine, aryloxy, 2-benzothiazolylthio, or a group having the formula ##STR52## in which Y is --CO--, --SO.sub.2 --, or --CH.sub.2 -- and R.sup.16 is ethylene, propylene, trimethylene or o-arylene;
- R.sup.9 is hydrogen or methyl;
- in which each aryl moiety is phenyl, tolyl, lower alkoxyphenyl, or chlorophenyl.
- 17. A layer as in claim 13 wherein said material has the structure ##STR53## wherein R.sup.13 is hydrogen, methyl, methoxy, ethoxy or chlorine;
- R.sup.3 is lower alkyl, phenethyl; cyclohexylmethyl; benzyl; benzyl substituted with lower alkyl, lower alkoxy, chlorine, bromine or lower alkoxycarbonyl; aryl; or a group having the formula --R.sup.11 --R.sup.15 in which R.sup.11 is ethylene, propylene, trimethylene or tetramethylene and R.sup.15 is lower alkanoyloxy, cyano, lower alkoxycarbonyloxy, arylcarbamoyloxy, lower alkylcarbamoyloxy, aroyloxy, lower alkoxycarbonylbenzoyloxy, lower alkoxy, chlorine, aryloxy, 2-benzothiazolylthio, or a group having the formula ##STR54## in which Y is --CO--, --SO.sub.2 --, or --CH.sub.2 -- and R.sup.16 is ethylene, propylene, trimethylene or o-arylene;
- R.sup.4 is lower alkyl; cyclohexyl; lower alkylcyclohexyl; benzyl; benzyl substituted with lower alkyl, lower alkoxy, chlorine or bromine; aryl; or a group having the formula --R.sup.11 --R.sup.17 in which R.sup.11 is ethylene, propylene, trimethylene or tetramethylene and R.sup.17 is lower alkanoyloxy, lower alkoxycarbonyloxy, aroyloxy or lower alkoxy;
- in which each aryl moiety is phenyl, tolyl, lower alkoxyphenyl, or chlorophenyl.
- 18. A layer as in claim 13 wherein said material is selected from the group consisting of ##STR55##
- 19. An electrophoretic migration image comprising an electrically photosensitive particulate material having the structure ##STR56## wherein R.sup.1 is hydrogen, lower alkyl, lower alkoxy, nitro, halogen, cyano, phenyl, lower alkylsulfonamido or lower alkoxycarbonyl and A.sup.1 is a monovalent and A.sup.2 is a divalent residue of an aniline, 1,2,3,4-tetrahydroquinoline, benzomorpholine or indoline compound attached to the .dbd.CH-- group by an aromatic ring carbon atom in the position para to the aromatic amine nitrogen atom.
Parent Case Info
This is a division of application Ser. No. 161,705 filed June 23, 1980, now U.S. Pat. No. 4,304,908, Dec. 8, 1981.
US Referenced Citations (1)
Number |
Name |
Date |
Kind |
4256819 |
Webster et al. |
Mar 1981 |
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Divisions (1)
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Number |
Date |
Country |
Parent |
161705 |
Jun 1980 |
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