Claims
- 1. A process for forming a pattern which comprises the steps of:
- (a) preparing a photoresist layer consisting essentially of at least one water-soluble polymer selected from the group consisting of poly-N-vinylpyrrolidone, copolymers of N-vinylpyrrolidone and acrylamide-diacetoneacrylamide copolymer and a water-soluble aromatic bisazide compound on a surface of a substrate for the desired pattern, said water-soluble aromatic bisazide compound being at least one compound represented by the following general formula: ##STR14## wherein n is 1 or 0, R.sub.1 represents a hydrogen atom or an alkyl group, R.sub.2 represents a hydrogen atom or an alkyl group, R.sub.1 and R.sub.2 may be linked with each other at their terminals to form a cyclic ketone structure in the molecule, M represents an atom or atomic group capable of being converted to a cation in an aqueous solution, and M' represents an atom or atomic group capable of being converted to a cation in an aqueous solution, said photoresist layer consisting of 70 to 98% by weight of said water-soluble polymer and 2 to 30% by weight of said water-soluble aromatic bisazide compound based on the total amount of photoresist,
- (b) applying light to said photoresist layer by passing the light through a mask having said pattern, in the presence of an oxygen containing gas and with the Schwarzschild's constant p being in the range of greater than 0 and smaller than 0.76, to harden the photoresist layer at a surface area substantially equal to or smaller than that of apertures of said mask through which beams pass, and
- (c) developing the light-applied photoresist layer to form the pattern having a surface area substantially equal to or smaller than that of apertures of said mask through which beams pass.
- 2. A process as set forth in claim 1, wherein the photoresist layer consists essentially of the water-soluble polymer and the water-soluble aromatic bisazide compound.
- 3. A process as set forth in claim 1, wherein the water-soluble aromatic bisazide compound is one in which n is zero in the general formula.
- 4. A process as set forth in claim 1, wherein the water-soluble aromatic bisazide compound in which n is 1 in the general formula.
- 5. A process as set forth in claim 1, wherein the water-soluble aromatic bisazide compound is one in which R.sub.1 and R.sub.2 in the general formula are linked to each other at their terminals to form a 5-membered cyclic ketone structure in the molecule.
- 6. A process as set forth in claim 1, wherein the water-soluble aromatic bisazide compound is one in which R.sub.1 and R.sub.2 in the general formula are linked to each other at their terminals to form a 6-membered cyclic ketone structure in the molecule.
- 7. A process as set forth in claim 1, wherein the water-soluble aromatic bisazide compound is disodium 4,4'-diazidodibenzalacetone-2,2'-disulfonate.
- 8. A process as set forth in claim 1, wherein the water-soluble aromatic bisazide compound is 2, 5-bis(4'-azido-2'-sulfobenzylidene) cyclopentanone disodium salt.
- 9. A process as set forth in claim 1, wherein the water-soluble aromatic bisazide compound is 2, 6-bis(4'-azido-2'sulfocinnamylidene)-4-methylcyclohexanone disodium salt.
- 10. A process as set forth in claim 1, wherein the water-soluble aromatic bisazide compound is one in which M in the general formula represents an atom or atomic group selected from hydrogen, sodium, potassium, ammonium, magnesium, calcium, barium and aluminum, and M' in the general formula represents an atom or atomic group selected from hydrogen, sodium, potassium, ammonium, magnesium, calcium, barium and aluminum.
- 11. A process as set forth in claim 1, wherein at least one second water-soluble polymer selected from the group consisting of carboxymethylcellulose, hydroxymethylcellulose, sodium salt of poly-L-gultamicacid, gelatin, polyacrylamide, polyvinyl methylether, polyvinyl alcohol, polyvinyl acetal, polyethylene oxide, acrylamide-vinyl alcohol copolymer and maleic acid-vinyl methylether copolymer is added in addition to the first water-soluble polymer in the photoresist layer, said second water-soluble polymer being present in an amount of at least 1% by weight based on the total photoresist composition and less than the amount of the first water-soluble polymer, and the total amount of said first and second water-soluble polymer being 70 to 98% by weight based on the total photoresist composition.
Priority Claims (2)
Number |
Date |
Country |
Kind |
49/46476 |
Apr 1974 |
JPX |
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49/73328 |
Jun 1974 |
JPX |
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Parent Case Info
This is a continuation in part of our copending application Ser. No. 571,483, filed on Apr. 24, 1975 now abandoned.
US Referenced Citations (8)
Foreign Referenced Citations (2)
Number |
Date |
Country |
752852 |
Dec 1953 |
DEX |
49-102404 |
Sep 1974 |
JPX |
Non-Patent Literature Citations (2)
Entry |
Akagi et al., Polymer Engineering and Science, vol. 17, No. 6, 6/77, pp. 353-355. |
Technical Papers, Regional Technical Conference "Polymers: Principles, Processes and Materials", Oct. 24-26, 1973, Society of Plastic Engineers, Inc. |
Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
571483 |
Apr 1975 |
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