Photosensitive member comprising charge generating layer and charge transporting layer

Abstract

A photosensitive member of the present invention comprises an electrically conductive substrate, a hydrogenated and/or halogenated amorphous silicon:germanium charge generating layer and a hydrogen-containing amorphous carbon charge transporting layer which contains oxygen and/or nitrogen. The charge generating layer may further contain various elements such as boron or phosphorus, oxygen, nitrogen and carbon as a chemical modifier.

Description

BACKGROUND OF THE INVENTION

1. Field of the Invention:

The present invention relates to a photosensitive member of the function-separated type comprising an amorphous silicon:germanium layer as a charge generating layer and a hydrogen-containing amorphous carbon layer as a charge transporting layer.

2. Description of the Prior Art:

Remarkable progress has been made in the application of electrophotographic techniques since the invention of the Carlson process. Various materials have also been developed for use in electrophotographic photosensitive members.

Conventional photoconductive materials chielfly include inorganic compounds such as amorphous selenium, selenium-arsenic, selenium-tellurium, zinc oxide, amorphous silicon and the like, and organic compounds such as polyvinylcarbazole, metal phthalocyanine, dis-azo pigments, tris-azo pigments, perillene pigments, triphenymethanes, triphenylamines, hydrazones, styryl compounds, pyrazolines, oxazoles, oxadiazoles and the like. The structures of photosensitive members include, for example, those of the single-layer type wherein such a material is used singly, the binder type wherein the material is dispersed in a binder, and the function-separated type comprising a charge generating layer and a charge transporting layer.

However, conventional photoconductive materials have various drawbacks. For example, the above-mentioned inorganic materials, except for amorphous silicon (a-Si), are harmful to the human body.

The electrophotographic photosensitive member, when employed in a copying apparatus, must always have stabilized characteristics even it is is subjected to the severe environmental conditions of charging, exposure, developing, image transfer, removal of reasidual charges and cleaning. However, the above described organic compounds have poor durability and many unstable properties.

In order to eliminate these drawbacks, progress has been made in recent years in the application of a-Si formed by the glow discharge process to an electrophotographic photosensitive members as a material with reducing harmfulness, higher sensitivity, higher hardness (such as more than 7H level of the JIS standards for pencil lead hardness) and higher durability. Nevertheless, a-Si is hazardous to manufacture since it requires highly ignitable silane gas as its starting material. Moreover, a-Si requires a large quantity of silane gas which is expensive, rendering the resulting photosensitive member exceedingly more costly than conventional photosensitive members. The manufacture of photosensitive members of a-Si involves many disadvantages. For example, a-Si is low in film-forming speed and releases a large amount of explosive undecomposed silane products in the form of particles when forming a film. Such particles, when incorporated into the photosensitive member being produced, adversely influences the quality of images obtained. Further, a-Si has a low chargeability due to its original high relative dielectric constant. This necessitates the use of a charger of higher output for charging the a-Si photosensitive member to a predetermined surface potential in the copying apparatus.

On the other hand, it has been proposed in recent years to use amorphous carbon films as plasma-polymerized organic films for photosensitive members.

Plasma-polymerized organic films per se have been well-known for a long time. In Journal of Applied Polymer Science, Vol. 17, pp. 885-892, 1973, for example, M. Shen and A. T. Bell state that a plasma-polymerized organic film can be produced from the gas of any organic compound. The same authors discuss film formation by plasma polymerization in "Plasma Polymerization," published by the American Chemical Society in 1979.

However, the plasma-polymerized organic films prepared by the conventional process have been used only as insulating films. They are thought to be insulating films having a specific resistivity of about 10.sup.16 ohm-cm like usual polyethylene films, or are used, as recognized, at least as such. The use of the film in electrophotographic photosensitive members is based on the same concept; the film has found limited use only as an undercoat or overcoat serving solely as a protective layer, adhesion layer, blocking layer or insulating layer.

For example, Unexamined Japanese Patent Publication SHO 59-28161 discloses a photosensitive member which comprises a plasma-polymerized high polymer layer of reticular structure formed on a substrate and serving as a blocking-adhesion layer, and an a-Si layer formed on the polymer layer. Unexamined Japanese Patent Publication SHO 59-38753 discloses a photosensitive member which comprises a plasma-polymerized film having a thickness of 10 to 100 angstroms and formed over a substrate as a blocking-adhesion layer, and an a-Si layer formed on the film, the plasma-polymerized film being prepared from a gas mixture of oxygen, nitrogen and a hydrocarbon and having a high resistivity of 10.sup.13 to 10.sup.15 ohm-cm. Unexamined Japanese Patent Publication SHO 59-136742 discloses a photosensitive member wherein an aluminum substrate is directly coated with a carbon film having a thickness of about 1 to about 5 microns and serving as a protective layer for preventing aluminum atoms from diffusing through an a-Si layer formed over the substrate when the member is exposed to light. Unexamined Japanese Patent Publication SHO 60-63541 discloses a photosensitive member wherein a diamond-like carbon film, 200 angstroms to 2 microns in thickness, is interposed between an aluminum substrate and an overlying a-Si layer to serve as an adhesion layer to improve the adhesion between the substrate and the a-Si layer. The publication says that the film thickness is preferably up to 2 microns in view of the residual charge.

These disclosed inventions are all directed to a so-called undercoat provided between the substrate and the a-Si layer. In fact, these publications mention nothing whatever about charge transporting properties, nor do they offer any solution to the foregoing substantial problems of a-Si.

Furthermore, U.S. Pat. No. 3,956,525, for example, discloses a photosensitive member of the polyvinylcarbazoleselenium type coated with a polymer film having a thickness of 0.1 to 1 microns and formed by glow discharge polymerization as a protective layer. Unexamined Japanese Patent Publication SHO 59-214859 discloses a technique for protecting the surface of an a-Si photosensitive member with an approximately 5-micron-thick film formed by plasma-polymerizing an organic hydrocarbon monomer such as styrene or acetylene. Unexamined Japanese Patent Publication SHO 60-61761 discloses a photosensitive member having a diamond-like carbon thin film 500 angstroms to 2 microns thick and serving as a surface protective layer, it being preferred that the film thickness be up to 2 microns in view of trasmittancy. Unexamined Japanese Patent Publication SHO 60-249115 discloses a technique for forming a film of amorphous carbon or hard carbon with a thickness of about 0.05 to about 5 microns for use as a surface protective layer. The publications states that the film adversely affects the activity of the protected photosensitive member it exceeds 5 microns in thickness.

These disclosed inventions are all directed to a socalled overcoat formed over the surface of the photosensitive member. The publications disclose nothing whatever about charge transporting properties, nor do they solve the aforementioned substantial problems of a-Si in any way.

Unexamined Japanese Patent Publication SHO 51-46130 discloses an electrophotographic photosensitive member of the polyvinylcarbazole type which has a polymer film 0.001 to 3 microns thick, which is formed on its surface by being subjected to glow discharge polymerization. Nevertheless, the publication is totally mute about charge transporting properties, further failing to solve the foregoing substantial problems of a-Si.

With respect to a-Si, W. E. Spear and P. G. LeComber state in Philosophical Magazine, Vol. 33, pp. 935-949, 1976, that a-Si can control polarities. Since then, progress has been made in the application of a-Si to various photosensitive devices.

For example, Unexamined Japanese Patent Publication No. SHO 56-62254 discloses a photosensitive member of a-Si containing carbon. This reference aims at adjusting the photoconductivity of a-Si by incorporating carbon therein. The a-Si layer needed has a large thickness.

Thus, the conventional plasma-polymerized organic films for use in electrophotographic photosensitive members are used as undercoats or overcoats because of their insulating properties and need not have a carrier transporting function. Accordingly, the films used have limited the thicknesses to a very small value up to about 5 microns at the largest. Carriers pass through the film owing to a tunnel effect, while if the tunnel effect is not expectable, the film used has such a small thickness that will not pose problems due to the occurrence of a residual potential. Further, the conventional a-Si layer, for use in electrophotographic photosensitive members, are used with a large thickness, causing disadvantages in view of cost or productivity.

SUMMARY OF THE INVENTION

The main object of the present invention is to provide a photosensitive member having excellent electrophotographic characteristics and capable of giving satisfactory images.

Another object of the invention is to provide a photosensitive member comprising a charge transporting layer which has excellent charge transportability and charging characteristics and a charge generating layer which exhibits distinct photoconductive properties.

Still another object of the invention is to provide a photosensitive member which is highly resistant to moisture and weather and has excellent transparency.

These and other objects of the invention can be accomplished by providing a photosensitive member comprising an electrically conductive substrate, a charge generating layer comprising hydrogenated amorphous silicon containing germanium or fluorinated amorphous silicon containing germanium, and a charge transporting layer comprising amorphous carbon containing hydrogen and oxygen and/or nitrogen.

BRIEF DESCRIPTION OF THE DRAWINGS

FIGS. 1 to 6 are diagrams showing photosensitive members embodying the invention; and

FIGS. 7 and 8 are diagrams showing apparatus for preparing photosensitive members of the invention.

DETAILED DESCRIPTION OF THE INVENTION

The photosensitive member embodying the present invention is characterized in that the member comprises a hydrogenated or fluorinated amorphous silicon:germanium layer as a charge generating layer (hereinafter referredto as a-Si layer) and an amorphous carbon layer containing hydrogen and oxygen and/or nitrogen and prepared by applying a glow discharge with plasma polymerization as a charge transporting layer (hereinafteer referred to as "a-C layer").

We have conducted research on the application of hydrogen-containing amorphous carbon layers to photosensitive members of the function-separated type and found that a hydrogenated amorphous carbon layer containing oxygen and/or nitrogen, which was originally thought to be an insulating layer, exhibits the ability to transport charges, readilyshowing satisfactory electrophotographic characteristics, when laminated toa hydrogenated or fluorinated amorphous silicon:germanium layer. Although much still remains to be clarified on the detailed theoretical interpretation of this finding, the result will presumably be attributableto the following reason. The band structure formed by electrons in a relatively unstable state, such as .pi.-electrons, unpaired electrons, remaining free radicals and the like, which are captured in the hydrogenated amorphous carbon layer containing oxygen and/or nitrogen has,at the conduction band or charge electron band, an energy level close to that of the band formed by the hydrogenated or fluorinated amorphous silicon:germanium. Therefore the carriers produced in the hydrogenated or fluorinated amorphous silicon:germanium layer can be readily injected intothe hydrogenated amorphous carbon layer containing oxygen and/or nitrogen, and permits satisfactory travel of the carriers therethrough by the actionof the above-mentioned electrons of relatively unstable energy states.

The carbon and hydrogen contents of the a-C layer of the invention can be determined by a usual method of elementary analysis, for example, by organic elementary (CHN) analysis.

The charge generating layer exhibits distinct photoconductive properties when exposed to visible light in the wavelength vicinity of semiconductor laser beams and can have an exceedingly smaller thickness than conventional amorphous silicon photosensitive members when serving its function. The charge transporting layer does not exhibit distinct photoconductive properties when exposed to visible light or light in the wavelength vicinity of semiconductor laser beams, but has the ability to transport charges and has excellent characteristics for use in electrophotographic photosensitive members, e.g. in chargeability, durability, resistance to moisture, weather and environmental pollution, and transmittance. The layer also affords a high degree of freedom in providing laminate structures for use as photosensitive members of the function-separated type.

According to the present invention, hydrocarbons are used as organic gases for forming the a-C layer. These hydrocarbons need not always be in a gaseous phase at room temperature and atmospheric pressure but can be in aliquid or solid phase insofar as they can be vaporized on melting, evaporation or sublimation, for example, by heating or with a vacuum. Examples of useful hydrocarbons are saturated hydrocarbons, unsaturated hydrocarbons, alicyclic hydrocarbons, aromatic hydrocarbons and the like. Such hydrocarbons are usable in combination.

A wide variety of hydrocarbons are usable. Examples of useful saturated hydrocarbons are normal paraffins such as methane, ethane, propane, butane, pentane, hexane, heptane, octane, nonane, decane, undecane, dodecane, tridecane, tetradecane, pentadecane, hexadecane, heptadecane, octadecane, nonadecane, eicosane, heneicosane, docosane, tricosane, tetracosane, pentacosane, hexacosane, heptacosane, octacosane, nonacosane,triacontane, dotriacontane, pentatriacontane, etc.; isoparaffins such as isobutane, isopentane, neopentane, isohexane, neohexane, 2,3-dimethylbutane, 2-methylhexane, 3-ethylpentane, 2,2-dimethylpentane, 2,4-dimethylpentane, 3,3-dimethylpentane, tributane, 2-methylheptane, 3-methylheptane, 2,2-dimethylhexane, 2,2,5-dimethylhexane, 2,2,3-trimethylpentane, 2,2,4-trimethylpentane, 2,3,3-trimethylpentane, 2,3,4-trimethylpentane, isononane, etc.; and the like.

Examples of useful unsaturated hydrocarbons are olefins such as ethylene, propylene, isobutylene, 1-butene, 2-butene, 1-pentene, 2-pentene, 2-methyl-1-butene, 3-methyl-1-butene, 2-methyl-2-butene, 1-hexene, tetramethylethylene, 1-heptene, 1-octene, 1-nonene, 1-decene and the like;diolefins such as allene, methyl-allene, butadiene, pentadiene, hexadiene, cyclopentadiene and the like; triolefins such as ocimene, alloocimene, myrcene, hexatriene and the like; acetylene, butadiyne, 1-pentadiyne, 2,4-hexadiyne, methylacetylene, 1-butyne, 2-butyne, 1-pentyne, 1-hexyne, 1-heptyne, 1-octyne, 1-nonyne, 1-decyne and the like.

Examples of useful alicyclic hydrocarbons are cycloparaffins such as cyclopropane, cyclobutane, cyclopentane, cyclohexane, cycloheptane, cyclooctane, cyclononane, cyclodecane, cycloundecane, cyclododecane, cyclotridecane, cyclotetradecane, cyclopentadecane, cyclohexadecane and the like; cycloolefins such as cyclopropene, cyclobutene, cyclopentene, cyclohexene, cycloheptene, cyclooctene, cyclononene, cyclodecene and the like; terpenes such as limonene, terpinolene, phellandrene, sylvestrene, thujene, carene, pinene, bornylene, camphene, fenchene, cyclofenchene, tricyclene, bisabolene, zingiberene, curcumene, humulene, cadinenesesquibenihene, selinene, caryophyllene, santalene, cedrene, camphorene, phyllocladene, podocarprene, mirene and the like; steroids; etc.

Examples of useful aromatic hydrocarbons are benzene, toluene, xylene, hemimellitene, pseudocumene, mesitylene, prehnitene, isodurene, durene, pentamethylbenzene, hexamethylbenzene, ethylbenzene, propybenzene, cumene,styrene, biphenyl, terphenyl, diphenylmethane, triphenylmethane, dibenzyl, stilbene, indene, naphthalene, tetralin, anthracene, phenanthrene and the like. In addition to hydrocarbons, also usable are compounds, such as alcohols, ketones, ethers and esters, which can be converted to carbon.

While the amount of hydrogen atoms to be contained in the a-C layer of the present invention is invariably dependent on the process by which the layer is prepared, i.e. the glow discharge process, the hydrogen content is generally 30 to 60 atomic % based on the combined amount of carbon and hydrogen atoms present. The carbon and hydrogen contents of the a-C layer can be determined by a usual method of organic elementary analysis, for example, by ONH analysis.

The hydrogen content of the a-C layer of the invention is variable in accordance with the film forming apparatus and film forming conditions. The hydrogen content can be decreased, for example, by elevating the substrate temperature, lowering the pressure, reducing the degree of dilution of the starting materials, applying a greater power, decreasing the frequency of the alternating electric field to be set up, increasing the intensity of a d.c. electric field superposed on the alternating electric field or a desired combination of these procedures.

It is suitable that the a-C layer serving as the charge trannsporting layerof the invention be 5 to 50 microns, preferable 7 to 20 microns, thick for use in the usual electrophotographic process. Thicknesses smaller than 5 microns result in a lower charge potential, failing to give a sufficient copy image density, whereas thicknesses larger than 50 microns are not desirable in view of productivity. The a-C layer is high in transmittancy,dark resistivity and charge transportabiity, traps no carriers even when not smaller than 5 microns thick as mentioned above, and contributes to light decay.

According to the present invention, the starting material gases are made into an a-C layer, most preferably via a plasma which is produced by d.c. low- or high-frequency, microwave or a like plasma process. Alternatively,the layer may be formed via ions produced by ionization deposition, ion-beam deposition or a like process, or via neutral particles produced by the vacuum evaporation process, sputtering process or the like. These processes may be used in combination.

According to the present invention, oxygen compounds are used in addition to hydrocarbons in order to incorporate oxygen atoms into the a-C layer. By incorporating oxygen into the a-C layer, the member exhibits high electric resistivity, reduced dark decay, and further stabilized electrostatic characteristics over a prolonged period of time, free of time lapse deterioration. The oxygen compound need not always be in a gas phase at room temperature and atmospheric pressure. A liquid or solid compound can be used provided the compound can be vaporized on melting, evaporation or sublimation, for example, when heated or subjected to a vacuum. While oxygen and ozone are usable for this purpose, examples of useful oxygen compounds are inorganic compounds such as water (water vapor), hydrogen peroxide, carbon monoxide, carbon dioxide, carbon suboxide; organic compounds having a functional group or linkage such as hydroxyl group (--OH), aldehyde group (--COH), acyl group (RCO--or --CRO),ketone group (CO), ether linkage (--O--), ester linkage (--COO--), oxygen-containing heterocyclic ring or the like. Examples of useful organic compounds having a hydroxyl group include alcohols such as methanol, ethanol, propanol, butanol, allyl alcohol, fluoroethanol, fluorobutanol, phenol, cyclohexanol, benzyl alcohol and furfuryl alcohol. Examples of useful organic compounds having an aldehyde group are formaldehyde, acetaldehyde, propionaldehyde, butyraldehyde, glyoxal, acrolein, benzaldehyde, furfural and the like. Examples of useful organic compounds having an acyl group are formic acid, acetic acid, propionic acid, butyric acid, valeric acid, palmitic acid, stearic acid, oleic acid,oxalic acid, malonic acid, succinic acid, benzoic acid, toluic acid, salicylic acid, cinnamic acid, naphthoic acid, phthalic acid, furoic acid and the like. Examples of suitable organic compounds having a ketone groupare acetone, ethyl methyl ketone, methyl propyl ketone, butyl methyl ketone, pinacolone, diethyl ketone, methyl vinyl ketone, mesityl oxide, methylheptenone, cyclobutanone, cyclopentanone, cyclohexanone, acetophenone, propiophenone, butyrophenone, valerophenone, dibenzyl ketone, acetonaphthone, acetothienone, acetofuron and the like. Examples of useful organic compounds having an ether linkage are methyl ether, ethyl ether, propyl ether, butyl ether, amyl ether, ethyl methyl ether, methyl propyl ether, methyl butyl ether, methyl amyl ether, ethyl propyl ether, ethyl butyl ether, ethyl amyl ether, vinyl ether, allyl ether, methyl vinyl ether, methyl allyl ether, ethyl vinyl ether, ethyl allyl ether, anisole, phenetole, phenyl ether, benzyl ether, phenyl benzyl ether, naphthyl ether, ethylene oxide, propylene oxide, trimethylene oxide, tetrahydrofuran, tetrahydropyran, dioxane and the like. Examples ofuseful organic compounds having an ester linkage are methyl formate, ethyl formate, propyl formate, butyl formate, amyl formate, methyl acetate, ethyl acetate, propyl acetate, butyl acetate, amy acetate, methyl propionate, ethyl propionate, propyl propionate, butyl propionate, amyl propionate, methyl butyrate, ethyl butyrate, propyl butyrate, butyl butyrate, amyl butyrate, methyl valerate, ethyl valerate, propyl valerate,butyl valerate, amyl valerate, mthyl benzoate, ethyl benzoate, methyl cinnamate, ethyl cinnamate, propyl cinnamate, methyl salicylate, ethyl salicylate, propyl salicylate, butyl salicylate, amyl salicylate, methyl anthranilate, ethyl anthranilate, butyl anthranilate, amyl anthranilate, methyl phthalate, ethyl phthalate, butyl phthalate and the like. Examples of useful heterocyclic compounds are furan, oxazole, furazane, pyran, oxazine, morpholine, benzofuran, benzoxazole, chromene, chroman, dibenzofuran, xanthene, phenoxazine, oxirane, dioxirane, oxathiorane, oxadiazine, benzoisooxazole and the like.

Oxygen atoms, serving as a chemical modifying substance, are preferably incorporated in the a-C layer in an amount of 0.01 to 7.0 atomic %, more preferably 0.1 to 4.7 atomic %, based on all the constituent atoms of the layer. The amount of oxygen in the a-C layer can be measured by general methods for element analysis, i.e., auger electron spectroscopy. If the oxygen atom content exceeds 7.0 atomic %, the oxygen, which assures suitable charge transportability when present in a suitable amount conversely, impairs chargeability, further acting to lower the resistivityof the layer.

Moreover, in the case of employing some oxygen source gases, such as oxygengas, ozone gas, carbon monoxide and the like, an etching effect is remarkably observed. If the flow rate of these gases is increased in orderto increase the quantity of oxygen atoms in the a-C layer, film-forming speed lowers. This is undesirable in the formation of the charge transporting layer wherein a certain thickness is required. Therefore, therange of the oxygen atoms to be contained in the a-C layer is important.

The quantity of oxygen atoms to be contained in the layer and serving as a chemical modifying substance is controllable primarily by varying the amount of the oxygen compounds to be introduced into a reactor for plasma polymerization. Increasing the quantity of a oxygen compound gives a higher oxygen atom content to the a-C layer of the invention, whereas decreasing the quantity of a oxygen compound results in a lower oxygen atom content.

The a-C layer of the present invention may contain nitrogen atoms. Nitrogencompounds are used for incorporating nitrogen atoms in the a-C layer. The incorporation of nitrogen in the a-C layer gives high electric resistivityand reduced dark decay. Further, the member containing nitrogen in the a-C layer exhibits stabilized electrostatic characteristics over a prolonged period of time, free of deterioration, despite the lapse of time. The nitrogen compounds to be used need not always be use of a gaseous phase atroom temperature at atmosphric pressure but can be in a liquid or solid phase insofar as they can be vaporized on melting, evaporaton or sublimation, for example, by heating or in a vacuum. While nitrogen per seis usable, examples of useful nitrogen compounds include inorganic compounds such as ammonia, and organic compounds having a functional groupor linkage such as amino group (NH.sub.2), cyano group (--CN), nitrogen-containing hetero-cyclic ring or the like. Examples of useful organic compounds having an amino group are methylamine, ethylamine, propylamine, butylamine, amylamine, hexylamine, heptylamine, octylamine, nonylamine, decylamine, undecylamine, dodecylamine, tridecylamine, tetradecylamine, pentadecylamine, cetylamine, dimethylamine, diethylamine,dipropylamine, dibutylamine, diamylamine, trimethylamine, triethylamine, tripropylamine, tributylamine, triamylamine, allylamine, diallylamine, triallylamine, cyclopropylamine, cyclobutylamine, cyclopentylamine, cyclohexylamine, aniline, methylaniline, dimethylaniline, ethylaniline, diethylaniline, toluidine, benzylamine, dibenzylamine, tribenzylamine, diphenylamine, triphenylamine, naphthylamine, ethylenediamine, trimethylenediamine, tetramethylenediamine, pentamethylenediamine, hexamethylenediamine, diaminoheptane, diaminooctane, diaminonoane, diaminodecane, phenylenediamine and the like. Examples of useful organic compounds having a cyano group are acetonitrile, propionitrile, butyronitrile, valeronitrile, capronitrile, enanthonitrile, caprylonitrile, pelargonnitrile, caprinitrile, lauronitrile, palmitonitrile, stearonitrile, crotononitrile, malonitrile, succinonitrile, glutaronitrile, adiponitrile, bezonitrile, tolunitrile, cyanobenzylic cinnamonitrile, naphthonitrile, cyanopyridine and the like. Examples of useful heterocyclic compounds are pyrrole, pyrroline, pyrrolidine, oxazole, thiazole, imidazole, imidazoline, imidazolidine, pyrazole, pyrazoline, pyrazolidine, triazole, tetrazole, pyridine, piperidine, oxazine, morpholine, thiazine, pyridazine, pyrimidine, pyrazine, piperazine, triazine, indole, indoline, benzoxazole, indazole, benzimidazole, quinoline, cinnoline, phthalazine, phthalocyanine, quinazoline, quinoxaline, carbazole, acridine, phenanthridine, phenazine, phenoxazine, indolizine, quinolizine, quinuclidine, naphthyridine, purine,pteridine, aziridine, azepine, oxadiazine, dithiazine, benzoquinoline, imidazothiazole and the like.

Nitrogen atoms, serving as another chemical modifying substance, are preferably incorporated in the a-C layer in an amount of 0.01 to 5.0 atomic %, more preferably 0.1 to 3.9 atomic %, based on all the constituent atoms of the layer. The amount of nitrogen in the a-C layer can be measured by general methods for element analysis, i.e., auger electron spectroscopy. If the nitrogen atom content exceeds 5.0 atomic %, the nitrogen, which assures suitable charge transportability when present in a suitable amount, impairs chargeability, further acting to lower the resistivity of the layer. Therefore, the range of nitrogen atoms to be contained in the a-C layer is important.

The quantity of nitrogen atoms to be contained in the layer and serving as a chemical modifying substance is controlled primarily by varying the amount of the nitrogen compound to be introduced into a reactor for plasmapolymerization. The use of an increased quantity of a nitrogen compound gives a higher nitrogen atom content in the a-C layer of the invention, whereas a decreased quantity of nitrogen compound results in a lower nitrogen atom content.

According to the present invention, silane gas, disilane gas or silane fluoride gas is used for forming the a-Si layer. Further, a germane gas isused for incorporating germanium atoms into the layer.

The amount of germanium atoms to be contained in the a-Si layer of the invention is preferably up to 30 atomic % based on the combined amount of silicon atoms and germanium atoms. The germanium and silicon contents of the layer can be determined by a usual method of elementary analysis, e.g., Auger electron spectroscopy. The content of germanium atoms can be increased by supplying the germane gas at an increased flow rate for the formation of the layer. As the germanium content increases, the photosensitive member of the invention has improved long-wavelength sensitivity, making it possible to select a light source ranging from short to long wavelengths. However, if the germanium content exceeds 30 atomic %, reduced chargeability results, so that presence of excess of germanium atoms is undesirable. Accordingly, the amount of germanium atomscontained in the a-Si layer of the invention is critical.

The a-Si layer of the present invention may contain boron atoms or phosphorus atoms. The incorporation of boron atoms or phosphorus atoms in the a-Si layer improves charge transportability and assures polarity adjustment. More specifically, by doping boron in the a-Si layer, charges of positive polarity serve as the majority carrier in the a-Si layer (P-type), and hence become more readily movable. On the other hand, by doping phosphorus in the a-Si layer, charges of negative polarity serve asthe majority carrier in the a-Si layer (N-type), and hence become more readily movable. Consequently, the photosensitive member exhibits improvedchargeability and transportability.

A phosphine gas, diborane gas or the like is used as a material gas for incorporating phosphorus atoms or boron atoms into the layer as a chemically modifying substance.

The amount of phosphorus atoms or boron atoms present in the a-Si layer as a chemical modifying substance according to the invention is up to 20,000 atomic ppm, preferably up to 150 atomic ppm, most preferably up to 100 atomic ppm based on all the constituent atoms of the layer. The phosphorusor boron content of the layer can be determined by a usual method of elementary analysis, e.g. Auger electron spectroscopy or IMA analysis. Whereas phosphorus atoms or boron atoms assure appropriate transportability or polarity control when present in a suitable amount, the phosphorus or boron content, if exceeding 20,000 atomic ppm, conversely reduces resistivity of the layer resulting in impaired chargeability.

The a-Si layer of the present invention may contain oxygen, nitrogen and carbon atoms as a chemical modifying substance. These atoms can be incorporated into the a-Si layer singly or in combinations with more than two atoms. The suitable incorporation of these atoms in the a-Si layer increases the electric resistivity of the a-Si layer so that high chargeability is obtained. Further, the member exhibits small dark decay. The above effects can be obtained even if the a-Si layer contains only oneatoms among oxygen, nitrogen and carbon.

According to the present invention, oxygen gas or an oxygen compound gas, such as nitrous oxide gas, ozone gas or carbon monoxide gas, is used as a material gas for incorporating into the layer oxygen atoms serving as a chemical modifying substance. Examples of useful material gases for incorporating nitrogen atoms into the layer are nitrogen gas and nitrogen compound gases such as ammonia gas, nitrous oxide gas and nitrogen dioxidegas. Examples of material gases useful for incorporating carbon atoms into the layer are methane, ethane, ethylene, acetylene, propane, propylene, butane, butadiene, butadiyne, butene, carbon monoxide, carbon dioxide and like carbon compounds.

The amounts of oxygen, nitrogen and carbon atoms to be present as a chemically modifying substance in the invention are 0.001 to 1 atomic % for oxygen atoms, 0.001 to 3 atomic % for nitrogen atoms and 0.001 to 5 atomic % for carbon atoms respectively based on all constituent atoms of the a-Si layer. The contents of these atoms in the a-Si layer can be determined by a usual method of elementary analysis, e.g. Auger electron spectroscopy or IMA analysis. Although, oxygen, nitrogen and carbon atoms assure suitable chargeability when present in a very small amount, the contents of oxygen, nitrogen and carbon atoms, if exceeding 1 atomic %, 3 atomic % and 5 atomic % respectively, increases the electric resistivity of the a-Si layer to an excess entailing inefficient generation of optically excited carriers and impaired carrier mobility, thereby entailing lower sensitivity.

While the amount of hydrogen of fluorine atoms to be incorporated into the a-Si layer of the invention is invariably dependent on the process by which this layer is prepared, i.e. the glow discharge process, the hydrogen or fluorine content is generally 10 to 35 atomic % based on the combined amount of silicon atoms and hydrogen atoms or silicon atoms and fluorine atoms in the layer. The hydrogen or fluorine content of the layercan be determined by a usual method of elementary analysis, e.g. OHN analysis in metal or Auger electron spectroscopy.

It is sitable that the a-Si layer serving as the charge generating layer ofthe invention be 0.1 to 5 microns thick for use in the usual electrophotographic process. A layer less than 0.1 micron thick fails to fully absorb light and to generate a sufficient amount of charges, resulting in lower sensitivity, whereas thicknesses larger than 5 microns are undesirable in view of productivity. The a-Si layer has high ability to generate charges, and when forming a laminate structure along with the a-C layer as the most distinct feature of the invention, the a-Si layer assures efficient injection of the resulting carriers into the a-C layer, contributing to satisfactory light decay.

According to the present invention, the a-Si layer is prepared from the desired gaseous materials by the same process as the a-C layer.

The quantities of oxygen atoms, nitrogen atoms, carbon atoms, and phosphorus or boron atoms to be incorporated into the a-Si layer as chemically modifying substances according to the invention are respectively controllable primarily by varying the amounts of oxygen gas or oxygen compound gas, nitrogen gas or nitrogen compound gas, carbon compound gas, and phosphine gas or diborane gas to be introduced into the reactor for plasma polymerization. The use of increased amounts of oxygen gas or oxygen compound gas, nitrogen gas or nitrogen compound gas, carbon compound gas, and phosphine gas or diborane gas gives the a-Si layer of the invention higher oxygen, nitrogen, carbon, and phosphorus or boron contents, respectively, whereas use of a decreased amount of such a gas gives the layer a lower content of the element concerned.

The photosensitive member of the present invention comprises a charge generating layer and a charge transporting layer of the type described above, which are formed in a superposed structure suitably determined as required.

FIG. 1 shows a photosensitive member of one type comprising an electricallyconductive substrate 1, a charge transporting layer 2 formed on the substrate and a charge generating layer 3 formed on the layer 2. FIG. 2 shows another type comprising an electrically conductive substrate 1, a charge generating layer 3 on the substrate and a charge transporting layer2 on the layer 3. FIG. 3 shows another type comprising an electrically conductive substrate 1, and a charge transporting layer 2, a charge generating layer 3 and another charge transporting layer 2 formed over thesubstrate and arranged one over another.

These photosensitive members are used, for example, by positively charging the surface with a corona charger or the like and exposing the charged surface to an optical image. In the case of FIG. 1, the holes then generated in the charge generating layer 3 travel through the charge transporting layer 2 toward the substrate 1. In FIG. 2, the electrons generated in the charge generating layer 3 travel through the charge transporting layer 2 toward the surface of the photosensitive member. In FIG. 3, the holes generated in the charge generating layer 3 travel through the lower charge transporting layer 2 toward the substrate 1, and at the same time, the electrons generated in the charge generating layer 3travel through the upper transporting layer 2 toward the surface of the member. Consequently, an electrostatic latent image is formed, with satisfactory light decay assured. Conversely, when the surface of the photosensitive member is negatively charged and then exposed, the electronand the hole may replace each other with respect to the carrier travel the above behavior interpretation. With the structures of FIGS. 2 and 3, the image projecting light passes through the charge transporting layer, whichnevertheless has high transmittancy, permitting satisfactory formation of latent image.

FIG. 4 shows another arrangement comprising an electrically conductive substrate 1; a charge transporting layer 2, a charge generating layer 3 and a charge transporting layer 4 are provided over the substrate and arranged one over another. Thus, the illustrated structure corresponds to the structure of FIG. 1 with a surface protective layer. Since the outermost surface of the structure of FIG. 1 is a charge generating of a-Si having poor humidity resistance, in the present invention, it is generally desirable that the surface be covered with a protective layer toassure stability toward humidity. With the structures of FIGS. 2 and 3, thecharge transporting layer embodying the invention and having high durability provides the outermost surface, so that the surface protective layer need not be provided. However, such photosensitive members can be formed with a surface protective layer so as to be compatible with variousother elements within the copying machine, for example, to be free from surface soiling deposition of developer.

FIG. 5 shows another type comprising an electrically conductive substrate 1, and an intermediate layer 5, a charge generating layer 3 and a charge transporting layer 2 which are formed over the substrate and arranged one over another. Thus, this structure corresponds to the structure of FIG. 2 provided with an intermediate layer. Since a charge generating layer of a-Si is joined to the substrate in the structure of FIG. 2, it is generally desirable to interpose an intermediate layer therebetween to assure good adhesion and an injection inhibitory effect. With the structures of FIGS. 1 and 3, the charge transporting layer of the invention, which has excellent adhesion and injection inhibitory effect, is joined to the substrate, so that no intermediate layer is provided. However, the photosensitive member, of either of these types, can be formed with an intermediate layer in order to render the forming transporting layer compatible with the preceding fabrication step, such aspretreatment of the conductive substrate. Another type of photosensitive member is then available.

FIG. 6 shows still another type comprising an electrically conductive substrate 1. An intermediate layer 5, a charge transporting layer 2, a charge generating layer 3 and a surface protective layer 4 are formed overthe substrate and superposed one over another. Thus, this structure corresponds to the structure of FIG. 1 provided with an intermediate layerand a surface protective layer. The intermediate and protective layers are formed for the same stated reasons. Thus, the provision of these two layers in the structure of FIG. 2 or 3 affords another type.

According to the present invention, the intermediate layer and the surface protective layer are not limited specifically to any material or fabrication process. Any material or process can be suitably selected so as to provide that the contemplated objects are achieved. The a-C layer ofthe invention may be used. However, if the material to be used is an insulating material such as one already mentioned, the thickness of the layer needs to be up to 5 microns to preclude occurrence of residual potential.

The charge transporting layer of the photosensitive member embodying the present invention is produced by so-called plasma polymerization wherein molecules in a vapor phase are subjected to discharge decomposition in a vacuum phase. The active neutral seeds or charge seeds contained in plasmaatmosphere are brought the substrate by diffusion or an electric or magnetic force and accumulated into a solid phase on the substrate througha rebinding reaction.

FIG. 7 shows an apparatus for preparing the photosensitive member of the invention. first to sixth tanks 701 to 706 have enclosed therein starting material compounds which are in gas phase at room temperature and a carrier gas and are connected respectively to first to sixth regulator valves 707 to 712 and first to sixth flow controllers 713 to 718. First tothird containers 719 to 721 contain starting material compounds which are liquid or solid at room temperature, can be preheated by first to third heaters 722 to 724 for vaporizing the compounds, and are connected to seventh to ninth regulator valves 725 to 727 and seventh to ninth flow controllers 728 to 730, respectively. The gases to be used as selected from among these gases are mixed together by a mixer 731 and fed to a reactor 733 via a main pipe 732. The interconnecting piping can be heated by a pipe heater 734 which is suitably disposed so that compounds, in a liquid or solid phase at room temperature and vaporized by preheating, will not condense during transport. A grounded electrode 735 and a power application electrode 736 are arranged to oppose each other within the reactor 733. Each of these electrodes can be heated by an electrode heater737. The power application electrode 736 is connected to a high-frequency power source 739 via a high-frequency power matching device 738, to a low-frequency power source 741 via a low-frequency power matching device 740 and to a d.c. power source 743 via a low-pass filter 742. Power of oneof the different frequencies is applicable to the electrode 736 by way of aconnection selecting switch 744. The internal pressure of the reactor 733 is adjustable by a pressure control valve 745. The reactor 733 is evacuated by a diffusion pump 747 and an oil rotary pump 748 via an exhaust system selecting valve 746, or by a cooling-removing device 749, amechanical booster pump 750 and an oil rotary pump 748 via another exhaust system selecting value 746. The exhaust gas is further made harmless by a suitable removal device 753 and then released to the atmosphere. The evacuation piping system can also be heated by a suitably disposed pipe heater 734 so that a material compound which is liquid or solid at room temperature, and vaporized by preheating, will not condense during transport. For the same reason, the reactor 733 can also be heated by a reactor heater 751. An electrically conductive substrate 752 is placed on the electrode 735 in the reactor. Although FIG. 7 shows that the substrate752 is fixed to the grounded electrode 735, the substrate may be attached to the power application electrode 736, or to both the electrodes.

FIG. 8 shows another type of apparatus for preparing the photosensitive member of the invention. This apparatus has the same construction as the apparatus of FIG. 7 with the exception of the interior arrangement of the reactor 833. The numerals shown by 700 order in FIG. 7 are replaced by thenumerals at 800 order in FIG. 8. With reference to FIG. 8, the reactor 833 is internally provided with a hollow cylindrical electrically conductive substrate 852 serving also as the grounded electrode 735 of FIG. 7 and with an electrode heater 837 inside thereof. A power application electrode836, similarly in the form of a hollow cylinder, is provided around the substrate 852 and surrounded by an electrode heater 837. The conductive substrate 852 is rotatable about its own axis by motor from outside.

The reactor for preparing the photosensitive member is first evacuated by the diffusion pump to a vacuum of about 10.sup.-4 to about 10.sup.-6 torr,whereby the adsorbed gas inside the reactor is removed. The reactor is alsochecked for the degree of vacuum. At the same time, the electrodes and the substrate fixedly placed on the electrode are heated to a predetermined temperature. To obtain a photosensitive member of one of above desired structures, an undercoat layer or a charge generating layer may be formed on the substrate before the charge transporting layer is formed when so required. The undercoat or charge generating layer may be formed by the present apparatus or by some other apparatus. Subsequently, material gasesare fed into the reactor from the first to sixth tanks and the first to third containers (i.e. from those concerned), each at a specified flow rate, using the flow controllers concerned, i.e. first to ninth flow controllers and the interior of the reactor is maintained in a predetermined vacuum by the pressure control valve. After the combined flow of gases has become stabilized, the high-frequency power source, for example, is selected by the connection selecting switch to apply a high-frequency power to the power application electrode. This initiates discharge across the two electrodes, forming a solid layer on the substrate with time. The thickness of the layer is controllable by varyingthe reaction time, such that the discharge is discontinued upon the thickness reaching the desired value.

Any a-Si layer or a-C layer can be formed as desired by using suitably selected material gases. The layers, which have different compositions, can be formed as a laminate structure by temporarily discontinuing the discharge after forming one of the layers, changing the composition of material gases, and then restarting the discharge to form the other layer over the first layer. Further, it is possible to form the different layersin the form of a laminate structrue having a gradient composition by gradually changing the flow rates of material gases with continued discharge. The thickness of each layer is controlled by varying the reaction time. Then, the photosensitive member of the present invention isprepared by discontinuing the discharge when the desired laminate structureis obtained with the thickness of each layer thus controlled.

Next the regulator valves concerned are closed, and the reactor is throughly exhausted. When a photosensitive member of the desired structurehas been formed according to the invention, the vacuum within the reactor is vitiated and the member is removed from the reactor. If another charge generating layer or overcoat layer are to be superposed on the above structure, such a layer is formed using the present apparatus, as is. The photosensitive member formed by the above process can be taken out of the reaction chamber after destroying the vacuum, and then transferred to another apparatus to form a layer. Thus, the photosensitive member of the present invention can be obtained having a charge transporting layer and acharge generating layer and, if necessary, an overcoat layer.

The present invention will be described with reference to the following examples.

EXAMPLE 1

Using an apparatus for practicing the present invention, a photosensitive member was prepared, the member comprising an electrically conductive substrate, a charge transporting layer and a charge generating layer provided in this order as shown in FIG. 1.

Charge Transporting Layer Forming Step (CTL):

The glow discharge decomposition apparatus shown in FIG. 7 was used. First,the interior of the reactor 733 was evacuated to a high vacuum of about 10.sup.-6 torr, and the third regulator valve 709 was thereafter opened tointroduce oxygen gas from the third tank 703 into the third flow controller715 at an output pressure of 1.0 kg/cm.sup.2. At the same time, myrcene gas, heated at a temperature of 85.degree. C. by the first heater 722 was introduced from the first container 719 to the seventh flow controller 728. The dials on the flow controllers were adjusted to supply the oxygen gas at a flow rate of 4 sccm and the myrcene gas at 20 sccm to the reactor733 through the main pipe 732 via the intermediate mixer 731. After the flows of the gases were stabilized, the internal pressure of the reactor 733 was adjusted to 1.5 torr by the pressure control valve 745. On the other hand, the substrate 752, which was an aluminum substrate measuring 50 mm in length, 50 mm in width and 3 mm in thickness, was preheated to 150.degree. C. With the gas flow rates and the pressure in a stabilized state, 120-watt power with a frequency of 35 KHz was applied to the power application electrode 736 from the low-frequency power source 741 preconnected thereto by the selecting switch 744. Plasma polymerization was conducted for 2 hours and 40 minutes, forming an a-C layer, 15 micronsin thickness, as a charge transporting layer on the substrate, whereupon the power supply was discontinued, the regulator valves were closed, and the reactor 733 was fully exhausted.

When subjected to CHN quantitative analysis, the a-C layer thus obtained was found to contain 47 atomic % of hydrogen atoms based on the combined amount of carbon atoms and hydrogen atoms. Further, when subjected to auger electron spectroscopy, the a-C layer thus obtained was found to contain 0.7 atomic % of oxygen atoms based on all the constituent atoms contained therein.

Charge Generating Layer Forming Step (CGL):

Next, the tanks were partly exchanged and the first, second and sixth regulator valves 707, 708 and 712 were opened to introduce hydrogen gas from the first tank 701 into the first flow controller 713, germane gas from the second tank 702 into the second flow controller 714 and silane gas from the sixth tank 706 into the sixth flow controller 718, each at anoutput pressure of 1.0 kg/cm.sup.2. The dials on the flow controllers were adjusted to supply the hydrogen gas at a flow rate of 200 sccm, germane gas at a flow rate of 0.6 sccm and the silane gas at 100 sccm to the reactor 733. After the flows of the gases stabilized, the internal pressure of the reactor 733 was adjusted to 0.8 torr by the pressure control valve 745. On the other hand, the substrate 72 formed with the a-Clayer was preheated to 250.degree. C. With the gas flow rates and the pressure stabilized, 35-watt power with a frequency of 13.56 MHz was applied to the power application electrode 736 from the high-frequency power source 739 to effect glow discharge for 5 minutes, whereby a charge generating a-Si:H layer was formed with a thickness of 0.3 microns.

When subjected to ONH quantitative analysis (EMGA-1300 manufactured by Horiba Seisakusho) and Auger electron spectroscopy, the a-Si layer thus obtained was found to contain 20 atomic % of hydrogen atoms and 1 atomic %of germanium atoms based on all the constituent atoms therein.

Characteristics:

When the photosensitive member obtained was used in the usual Carlson process with negative charging and positive charging, the member showed a maximum charge potential (hereinafter referred to as Vmax) of -510 V (+630V). (The obtained values at positive charging were shown in parenthesis hereinafter). Specifically, the chargeability per 1 micron (hereinafter referred to as C.A.) was 33 V/micron (41 V/micron) by calculating from theentire thickness of the member, i.e. 15.3 microns, indicating that the member had satisfactory charging properties.

The period of time required for dark decay from Vmax to the potential corresponding to 90% of Vmax (hereinafter referred to as DDR) was about 12seconds (10 seconds), showing that the member had satisfactory charge retentivity.

The amount of light required for the light decay from Vmax to the potentialcorresponding to 20% of Vmax with white light (hereinafter referred to as E1/2) was about 1.2 lux-sec (1.7 lux-sec), showing that the member was satisfactory in photosensitive characteristics.

The amount of light required for light decay to a potential corresponding to 20% of the Vmax potential after the initial charging by using a semiconductive laser having a wavelength of 780 nm is 7.3 erg/cm.sup.2 (8.6 erg/cm.sup.2). This reveals that the member has high photosensitivitytoward light having long wavelength.

These results indicate that the photosensitive member prepared in the present example according to the invention exhibits outstanding performance. When the member was used in the Carlson process for forming images thereon, followed by image transfer, sharp copy images were obtained.

EXAMPLES 2 TO 22

Photosensitive members were prepared in a manner similar to Example 1, eachmember comprising an electrically conductive substrate (1), a charge transporting layer (2) and a charge generating layer (3) provided in this order as shown in FIG. 1.

Table 1 shows the various condition values for forming a charge transporting layer, Table 2 shows the various condition values for forminga charge generating layer and Table 3 shows the results of the evaluation of each member.

Table 1 and Table 2 show the conditions different from Example 1 used in forming a charge transporting layer and charge generating layer and are classified into 34 items (1) to (34). These items are described at the topcolumn of each Table. Some condition values shown at each item are common to each example, while others vary in each example.

Table 1 shows the items (1) to (16) as follows:

(1) flow rate of hydrogen gas from the first tank (701) (sccm) (2) flow rate of material gas from the second tank (702) (sccm) (3) flow rate of dopant gas from the third tank (703) (sccm) (4) flow rate of dopant gas from the fourth tank (704) (sccm) (5) flow rate of dopant gas from the first container (719) (sccm) (6) temperature of the first heater (722) (.degree.C.) (7) pressure (Torr) (8) temperature of the substrate (.degree.C.) (9) dimension of the substrate (length.times.width.times.thickness) (unit: mm) (10) frequency from the power source (Hz) (11) time for plasma polymerization (hour) (12) thickness of the layer (micron) (13) power (watt) (14) hydrogen content (atomic %) (15) and (16) content of the dopant contained in the charge transporting layer (atomic %)

Table 2 shows the items (17) to (34) as follows:

(17) flow rate of hydrogen gas from the first tank (701) (sccm) (18) flow rate of dopant gas from the second tank (702) (sccm) (19) flow rate of dopant gas from the third tank (703) (sccm) (20) flow rate of dopant gas from the fourth tank (704) (sccm) (21) flow rate of dopant gas from the fifth tank (705) (sccm) (22) flow rate of dopant gas from the sixth tank (706) (sccm) (23) pressure (Torr) (24) temperature of the substrate (.degree.C.) (25) frequency from the power source (Hz) (26) time for plasma ploymerization (minute) (27) thickness of the layer (micron) (28) power (watt) (29) hydrogen content (atomic %) (30) to (34) content of the dopant contained in the charge generating layer(atomic %)

The result of the evaluation shown in Table 3 is classified into 7 items (35) to (41) as follows:

(35) initial charging potential (V) (36) thickness of the entire member (micron) (37) chargeability per 1 micron (V/micron) (38) DDR (sec.) (39) E(1/2) (lux-sec.) (40) light quantity required for light decay to a potential corresponding to 20% of the Vmax potential after the initial charging by using a semiconductive laser having a wavelength of 780 nm (erg/cm.sup.2) (41) clearness of the image

The level of the clearness of the imge is represneted by o (clear) and x (unclear). More specifically, the photosensitive members marked with x arenot satisfactory in performance. When such members were used in the Carlsonprocess for forming images thereon, followd by image transfer, fogged copy images only were obtained.

The charge transporting layers of Examples 1 to 22 comprise amorphous carbon containing hydrogen and oxygen. Table 4 shows the outline of the photosensitive members prepared by Examples 1 to 22.

TABLE 4______________________________________Ex. No. CTL CGL______________________________________1-4 a-C:H:O a-Si:Ge:(H,Hal)5-8 " a-Si:Ge:(H,Hal):(B,P)17, 19 " a-Si:Ge:(H,Hal):(B,P):O:N9, 10 " a-Si:Ge:(H,Hal):(B,P):O11-13, 18 " a-Si:Ge:(H,Hal):(B,P):N14-16, 20 " a-Si:Ge:(H,Hal):(B,P):C21 " a-Si:Ge:(H,Hal)(B,P):N:C22 " a-Si:Ge:(H.Hal):(B,P):O:C______________________________________

From the results shown in Table 3, it is understood that the photosensitivemember according to the present invention has improved chargeability and high sensitivity.

TABLE 1__________________________________________________________________________Charge Transporting Layer Forming StepEx (1) (2) (3) (4) (5) (6) (7) (8) (9) (10) (11) (12) (13) (14) (15) (16)No. (sccm) (sccm) (sccm) (sccm) (sccm) (.degree.C.) (Torr) (.degree.C.) (mm) (Hz) (Hr) (.mu.m) (watt) (at. %) (at. (at.__________________________________________________________________________ %)2 60 C.sub.2 H.sub.4 O.sub.2 -- -- -- 2.2 250 50 .times. 13.56 3 15 150 39 0 3.0 60 10 50 .times. M 33 90 C.sub.2 H.sub.6 O.sub.2 -- -- -- 2.2 120 50 .times. 500K 0.5 15 100 55 0 4.8 70 18 50 .times. 34 88 C.sub.2 H.sub.2 O.sub.2 -- -- -- 2.0 200 50 .times. 4 M 4.6 15 100 30 0 6.1 45 24 50 .times. 35 same as Example 16 same as Example 47 same as Example 28 same as Example 39 same as Example 210 same as Example 411 same as Example 212 same as Example 313 same as Example 414 same as Example 215 same as Example 316 same as Example 417 same as Example 118 same as Example 119 same as Example 320 same as Example 121 200 C.sub.4 H.sub.6 O.sub.2 -- -- -- 1.8 120 50 .times. 200K 0.7 15 120 40 0 5.1 60 20 50 .times. 322 same as Example 21__________________________________________________________________________ TABLE 2 Charge Generating Layer Forming Step Ex (17) (18) (19) (20)*.sup.3 (21) ( 22) (23) (24) (25) (26) (27) (28) (29) (30) (31)*.sup.1 (32) (33) (34) No (sccm) (sccm) (sccm) (sccm) (sccm) (sccm) Torr (.degree.C.) (Hz) min. .mu.m watt (at. %) (at. %) (at. %) (at. %) (at. %) (at. %) 1 200 GeH.sub.4 -- -- -- SiH.sub.4 0.8 250 13.56 5 0.3 35 20 Ge 0.6 100 M 1.0 2 200 GeH.sub.4 -- -- -- SiH.sub.4 0.8 250 13.56 5 0.3 35 20 Ge 3 2 100 M 3 200 GeH.sub.4 -- -- -- SiH.sub.4 1.0 250 13.56 5 0.3 45 20 Ge 30 20 100 M 4 200 SiF.sub.4 GeH.sub.4 -- -- SiH.sub.4 0.9 230 13.56 5 0.3 35 18 Ge 11 F 5 50 6 50 M 5 200 GeH.sub.4 -- B.sub.2 H.sub.6 -- SiH.sub.4 1.0 240 13.56 5 0.3 40 18 Ge B 10P 6 10 100 M 9.7 6 same as Example 5 7 same as Example 4 8 200 SiF.sub.4 GeH.sub.4 PH.sub.3 -- SiH.sub.4 0.8 240 13.56 5 0.3 40 26 Ge P 13P F 5.6 50 6 10 50 M 9.8 9 200 GeH.sub.4 -- B.sub.2 H.sub.6 O.sub.2 SiH.sub.4 0.8 250 13.56 5 0.3 40 24 Ge 11 B 24P O 1.0 6 50 5 100 M 10 200 GeH.sub.4 -- PH.sub.3 O.sub.2 SiH.sub.4 0.9 250 13.56 5 0.3 35 18 Ge P 11P O 0.3 3 10 1.3 200 M 4.2 11 200 GeH.sub.4 -- B.sub.2 H.sub.6 N.sub.2 SiH.sub.4 0.8 250 13.56 5 0.3 35 23 Ge 11 B 10P N 0.001 6 10 0.01 100 M 12 180 GeH.sub.4 -- B.sub.2 H.sub.6 NH.sub.3 SiH.sub.4 0.9 240 13.56 5 0.3 45 21 Ge B 11P N 0.3 8 10 2 100 M 13.2 13 200 GeH.sub.4 -- PH.sub.3 N.sub.2 SiH.sub.4 0.9 250 13.56 5 0.3 35 18 Ge 10 P 12P N 0.3 6 10 3 200 M 14 200 GeH.sub.4 -- B.sub.2 H.sub.6 CH.sub.4 SiH.sub.4 0.8 250 13.56 5 0.3 35 20 Ge B 9P C 0.001 6 10 0.01 100 M 9.8 15 200 GeH.sub. 4 -- B.sub.4 H.sub.6 C.sub.2 H.sub.6 SiH.sub.4 0.9 240 13.56 5 0.3 45 21 Ge B 11P C 0.3 10 10 3 100 M 15.7 16 200 GeH.sub.4 -- B.sub.2 H.sub.6 CH.sub.4 SiH.sub.4 0.8 250 13.56 5 0.3 40 24 Ge B 95P C 1.0 6 100 10 100 M 20.5 17 200 GeH.sub.4 -- B.sub.2 H.sub.6 N.sub.2 O SiH.sub.4 0.9 230 13.56 5 0.3 45 22 Ge B 10P O 0.001 N 0.002 6 10 0.01 100 M 10.1 18 200 GeH.sub.4 SiF.sub.4 B.sub.2 H.sub.6 N.sub.2 SiH.sub.4 0.9 250 13.56 5 0.3 35 22 Ge B 95P N 0.1 F 5 6 50 100 1 50 M 10.3 19 200 GeH.sub.4 SiF.sub.4 B.sub.2 H.sub.6 N.sub.2 O SiH.sub.4 0.9 250 13.56 5 0.3 35 22 Ge 17 B 10P O 0.1 N 0.18 F 5 10 50 10 1 50 M 20 200 GeH.sub.4 SiF.sub.4 B.sub.2 H.sub.6 CF.sub.4 SiH.sub.4 0.9 250 13.56 5 0.3 35 22 Ge B 11P C 0.1 F 4.8 3 50 10 0.1 50 M 6.4 21 200 GeH.sub.4 SiF.sub.4 B.sub.2 H.sub.6 N.sub.2 *.sup.2 0.9 245 13.56 5.4 0.3 38 20.1 Ge 10 B 9P N 0.2 C 0.3 F 4.9 8 50 10 2 C.sub.2 Si M H.sub.4 H.sub.4 3 50 22 200 GeH.sub.4 SiF.sub.4 PH.sub.3 O.sub.2 *.sup.2 0.9 250 13.56 5.3 0.3 40 20.6 Ge P 9P O 0.3 C 0.2 F 4.7 7 50 10 3 C.sub.2 Si M 9.9 H.sub.4 H.sub.4 2 50*.sup.1 The unit P means atomic ppm.*.sup.2 The seventh tank was added to the apparatus to introduce the seventh gas.*.sup.3 B.sub.2 H.sub.6 and PH.sub.3 at this column are diluted to the concentration of 100 ppm with hydrogen gas. TABLE 3__________________________________________________________________________Result of Evaluation(35) (37) (38) (39) (40)(V) (36) (V/.mu.m) (sec.) (E 1/2) (erg/cm.sup.2)Ex. No. - + (.mu.m) - + - + - + - + (41)__________________________________________________________________________1 510 630 15.3 33 41 12 16 1.2 1.7 7.2 8.9 .circle.2 679 840 15.3 44 54 28 38 2.9 3.8 -- -- .circle.3 540 630 15.3 35 41 34 43 5.4 6.3 -- -- .circle.4 820 960 15.3 53 63 44 48 6.8 9.0 -- -- .circle.5 490 480 15.3 32 31 12 13 1.3 1.2 7.3 7.1 .circle.6 660 960 15.3 43 63 35 42 5.2 11.5 -- -- .circle.7 760 770 15.3 49 51 35 43 3.4 3.6 -- -- .circle.8 680 990 15.3 44 64 47 50 3.6 8.1 -- -- .circle.9 920 840 15.3 60 54 35 36 7.2 4.3 -- -- .circle.10 720 930 15.3 47 61 41 50 5.6 15.8 -- -- .circle.11 720 670 15.3 47 44 31 38 3.1 2.9 -- -- .circle.12 810 790 15.3 53 52 38 40 7.2 36 -- -- .circle.13 800 920 15.3 52 60 25 35 5.3 17.3 -- -- .circle.14 670 710 15.3 44 47 38 41 3.2 3.0 -- -- .circle.15 850 840 15.3 55 55 32 35 4.5 3.8 -- -- .circle.16 960 900 15.3 63 59 45 43 14.2 9.0 -- -- .circle.17 505 520 15.3 33 34 13 12 1.3 1.2 8.5 8.3 .circle.18 600 660 15.3 39 43 12 11 1.5 1.4 8.8 7.8 .circle.19 740 770 15.3 48 51 43 45 4.8 4.5 -- -- .circle.20 600 570 15.3 39 37 12 13 1.5 1.4 8.7 8.0 .circle.21 560 580 15.3 36.6 37.9 12 14 1.8 2.2 -- -- .circle.22 570 560 15.3 37.3 36.6 14 13 2.8 2.7 -- -- .circle.__________________________________________________________________________

EXAMPLES 23 TO 29

Photosensitive members were prepared, the members comprising an electrically conductive substrate (1), a charge transporting layer (2) anda charge generating layer (3) provided in this order as shown in FIG. 1.

The respective condition values for forming a charge transporting layer anda charge generating layer are shown in Table 5 and Table 6. Table 7 indicates the results of the evaluation of each member.

The items shown in Tables 5, 6 and 7 are respectively the same as those in Tables 1, 2 and 3.

The charge transporting layers of Examples 23 l to 29 comprise amorphous carbon containing hydrogen, oxygen and nitrogen. Table 8 shows the outlineof the photosensitive members prepared by Examples 23 to 29.

TABLE 8______________________________________Ex. No. CTL CGL______________________________________23 a-C:H:O:N a-Si:Ge:(H,Hal)24 " a-Si:Ge:(H,Hal):(B,P)25 " a-Si:Ge:(H,Hal):(B,P):O:N26 " a-Si:Ge:(H,Hal):(B,P):N27 " a-Si:Ge:(H,Hal):(B,P):C28 " a-Si:Ge:(H,Hal):(B,P):C:N29 " a-Si:Ge:(H,Hal):(B,P):C:O______________________________________

From the results shown in Table 7, it is understood that the photosensitivemember according to the present invention has improved chargeability and high sensitivity.

TABLE 5__________________________________________________________________________Charge Transporting Layer Forming Step (1) (2) (3) (4) (5) (6) (7) (8) (9) (10) (11) (12) (13) (14) (15) (16)Ex No. (sccm) (sccm) (sccm) (sccm) (sccm) (.degree.C.) (Torr) (.degree.C.) (mm) (Hz) (Hr) (.mu.m) (watt) (at. (at. (at.__________________________________________________________________________ %)23 -- -- N.sub.2 O -- C.sub.8 H.sub.8 30 1.8 150 50 .times. 40K 1.25 15 130 42 O 1.9 N 3.7 15 45 50 .times. 324 same as Example 2325 same as Example 2326 same as Example 2327 same as Example 2328 200 C.sub.4 H.sub.6 O.sub.2 N.sub.2 -- -- 2.0 120 50 .times. 400K 0.8 15 140 39 O 2.2 N 2.9 60 10 14 50 .times. 329 same as Example 28__________________________________________________________________________ TABLE 6 Charge Generating Layer Forming Step (17) (18) (19)*.sup.3 (20) (21) ( 22) (23) (24) (25) (26) (27) (28) (29) (30) (31)*.sup.1 (32) (33) (34) Ex No (sccm) (sccm) (sccm) (sccm) (sccm) (sccm) Torr (.degree.C.) (Hz) min. .mu.m watt (at. %) (at. %) (at. %) (at. %) (at. %) (at. %) 23 200 GeH.sub.4 -- -- -- SiH.sub.4 0.9 250 13.56 5 0.3 40 20 Ge 10 6 100 M 24 200 GeH.sub.4 PH.sub.3 -- -- SiH.sub.4 0.8 250 13.56 5 0.3 40 20 Ge 10 P 11P 6 10 100 M 25 200 GeH.sub.4 B.sub.2 H.sub.6 N.sub.2 O -- SiH.sub. 4 1.0 240 13.56 5 0.3 45 21 Ge B 11P O 0.31 N 0.59 6 10 3 100 M 9 .7 26 200 GeH.sub.4 B.sub.2 H.sub.6 N.sub.2 -- SiH.sub.4 0.8 250 13.56 5 0.3 40 24 Ge B 45P N 1.0 10 50 10 100 M 15 .8 27 200 GeH.sub.4 PH.sub.3 CH.sub.4 -- SiH.sub.4 1.0 230 13.56 5 0.3 65 18 Ge P 12P C 0.3 6 10 3 200 M 10 .4 28 same as Example 21 29 same as Example*.sup.1 same as Table 2*.sup.3 same as Table 2 TABLE 7__________________________________________________________________________Result of Evaluation(35) (37) (38) (39) (40)(V) (36) (V/.mu.m) (sec.) (E 1/2) (erg/cm.sup.2)Ex. No. - + (.mu.m) - + - + - + - + (41)__________________________________________________________________________23 500 650 15.3 33 42 19 25 1.4 2.1 8.1 11.2 .circle.24 470 720 15.3 31 47 18 28 1.4 2.9 8.0 13.2 .circle.25 720 740 15.3 47 48 27 28 2.5 2.0 -- -- .circle.26 720 720 15.3 47 47 27 24 2.3 1.5 -- -- .circle.27 580 860 15.3 38 56 23 34 1.4 4.4 -- -- .circle.28 520 550 15.3 34 36 14 16 1.7 2.4 -- -- .circle.29 590 575 15.3 38.6 37.6 11 9.7 3.1 3.0 -- -- .circle.__________________________________________________________________________

EXAMPLES 30 TO 56

Photosensitive members were prepared as similarly as with Example 1, each member comprising an electrically conductive substrate (1), a charge transporting layer (2) and a charge generating layer (3) provided in this order as shown in FIG. 1.

Table 9 shows the various condition values for forming a charge transporting layer, Table 10 shows the various condition values for forming a charge generating layer and Talbe 11 shows the results of the evaluation of each member.

The items shown in Tables 9, 10 and 11 are respectively the same as those in Tables 1, 2 and 3.

The charge transporting layers of Examples 30 to 56 comprise amorphous carbon containing hydrogen and nitrogen. Table 12 shows the outine of the photosensitive members prepared by Examples 30 to 56.

TABLE 12______________________________________Ex. No. CTL CGL______________________________________30-34 a-C:H:N a-Si:Ge:(H,Hal)35-39 " a-Si:Ge:(H,Hal):(B,P)40, 41, 43, " a-Si:Ge:(H,Hal):(B,P):O:N42,44 " a-Si:Ge:(H,Hal):(B,P):O45-49 " a-Si:Ge:(H,Hal):(B,P):N50-54 " a-Si:Ge:(H,Hal):(B,P):C55 " a-Si:Ge:(H,Hal):(B,P):N:C56 " a-Si:Ge:(H,Hal):(B,P):O:C______________________________________

From the results shown in Table 11, it is understood that the photosensitive member according to the present invention has improved chargeability and high sensitivity.

TABLE 9__________________________________________________________________________Charge Transporting Layer Forming Step (1) (2) (3) (4) (5) (6) (7) (8) (9) (10) (11) (12) (13) (14) (15) (16)Ex. No. (sccm) (sccm) (sccm) (sccm) (sccm) (.degree.C.) (Torr) (.degree.C.) (mm) (Hz) (Hr) (.mu.m) (watt) (at. (at. (at.__________________________________________________________________________ %)30 50 C.sub.2 H.sub.4 60 N.sub.2 7 -- -- -- 1.3 250 50 .times. 13.56 8.6 15 200 39 N 0.3 50 .times. M 331 80 C.sub.2 H.sub.2 40 N.sub.2 -- -- -- 1.5 200 50 .times. 13.56 4.5 15 200 30 N 1.4 18 50 .times. M 332 -- -- N.sub.2 O C.sub.10 H.sub. 16 80 0.9 200 50 .times. 30K 2.6 15 150 47 N 2.1 38 18 50 .times. 333 70 40 N.sub.2 -- -- -- 1.2 170 50 .times. 500K 0.43 15 140 55 N 3.7 20 50 .times. 334 40 C.sub.4 H.sub.6 60 NH.sub.3 -- -- -- 1.5 200 50 .times. 400K 0.5 15 120 55 N 4.8 20 50 .times. 335 same as Example 3036 same as Example 3137 same as Example 3238 same as Example 3439 same as Example 3340 same as Example 3041 same as Example 3142 same as Example 3243 same as Example 3344 same as Example 3445 same as Example 3346 same as Example 3447 same as Example 3048 same as Example 3149 same as Example 3250 same as Example 3051 same as Example 3152 same as Example 3253 same as Example 3354 same as Example 3455 200 C.sub.4 H.sub.6 60 N.sub.2 -- -- -- 1.7 120 50 .times. 0.6 15 130 41 N 4.9 20 50 .times. 356 same as Example 55__________________________________________________________________________ TABLE 10__________________________________________________________________________Charge Generating Layer Forming Step (17) (18) (19) (20) (21) (22) (29) (30)Ex. (sc (sc (sc (sc (sc (sc (23) (24) (25) (26) (27) (28) (at. (at. (31) (32) (33) (34)No. cm) cm) cm) cm) cm) cm) Torr (.degree.C.) (Hz) min. .mu.m watt %) %) (at. %) (at. (at. (at.__________________________________________________________________________ %)30 same as Example 131 same as Example 432 same as Example 333 same as Example 234 same as Example 2335 same as Example 536 same as Example 2437 same as Example 738 same as Example 839 same as Example 540 same as Example 1741 same as Example 2542 same as Example 943 same as Example 1944 same as Example 1045 same as Example 1346 same as Example 1147 same as Example 1248 same as Example 1849 same as Example 2650 same as Example 1651 same as Example 2052 same as Example 2753 same as Example 1454 same as Example 1555 same as Example 2156 same as Example 22__________________________________________________________________________ TABLE 11__________________________________________________________________________Result of Evaluation(35) (37) (38) (39) (40)(V) (36) (V/.mu.m) (sec.) (E 1/2) (erg/cm.sup.2)Ex. No. + - (.mu.m) - + - + - + - + (41)__________________________________________________________________________30 510 630 15.3 33 41 12 16 1.2 1.7 7.2 8.9 .circle.31 520 650 15.3 34 43 22 31 1.6 2.1 8.8 11.3 .circle.32 470 550 15.3 31 36 20 26 4.5 5.2 -- -- .circle.33 670 840 15.3 44 55 38 42 3.8 5.0 -- -- .circle.34 670 860 15.3 44 56 42 46 5.2 7.1 -- -- .circle.35 490 480 15.3 32 31 12 13 1.3 1.2 8.8 7.4 .circle.36 430 650 15.3 28 43 20 31 1.3 2.7 9.5 13.3 .circle.37 700 720 15.3 46 47 35 43 3.8 3.6 -- -- .circle.38 720 940 15.3 47 61 35 48 5.6 12.7 -- -- .circle.39 690 670 15.3 45 44 39 47 4.1 3.8 -- -- .circle.40 500 520 15.3 33 34 13 13 1.3 1.2 7.8 8.7 .circle.41 650 670 15.3 43 44 32 31 2.3 1.8 -- -- .circle.42 860 780 15.3 56 51 43 40 7.5 4.5 -- -- .circle.43 690 720 15.3 45 47 38 42 4.8 4.6 -- -- .circle.44 770 910 15.3 50 59 25 46 5.2 14.8 -- -- .circle.45 670 950 15.3 44 62 38 47 3.4 11.0 -- -- .circle.46 820 770 15.3 53 50 41 39 6.0 5.7 -- -- .circle.47 540 540 15.3 35 35 14 13 2.4 1.2 14.2 7.0 .circle.48 650 720 15.3 43 47 25 20 1.8 1.7 10.4 9.1 .circle.49 780 780 15.3 51 51 35 37 4.5 3.0 -- -- .circle.50 660 630 15.3 43 41 17 15 2.9 1.8 -- -- .circle.51 650 650 15.3 43 43 25 22 1.8 1.6 10.6 8.7 .circle.52 620 940 15.3 41 61 38 47 2.6 8.6 -- -- .circle.53 670 710 15.3 44 47 41 46 4.5 4.1 -- -- .circle.54 910 890 15.3 60 58 47 49 7.0 6.0 -- -- .circle.55 550 570 15.3 35.9 37.3 13 14.5 1.9 2.3 -- -- .circle.56 590 575 15.3 38.6 37.6 12 11.5 2.9 2.8 -- -- .circle.__________________________________________________________________________

COMPARATIVE EXAMPLES 9 TO 13

Photosensitive members were prepared, the members comprising an electrically conductive substrate (1), a charge transporting layer (2) anda charge generating layer (3) provided in this order as shown in FIG. 1.

The respective condition values for forming a charge transporting layer anda charge generating layer are shown in Table 13 and Table 14. Table 15 indicates the results of the evaluation of each member.

The items shown in Tables 13, 14 and 15 are respectively the same as those in Tables 1, 2 and 3.

As apparent from Table 15, the comparative photosensitive members are not satisfactory in electrophotographic performance.

TABLE 13__________________________________________________________________________Charge Transporting Layer Forming StepCom. (1) (2) (3) (4) (5) (6) (7) (8) (9) (10) (11) (12) (13) (14) (15) (16)Ex. No. (sccm) (sccm) (sccm) (sccm) (sccm) (.degree.C.) (Torr) (.degree.C.) (mm) (Hz) (Hr) (.mu.m) (watt) (at. (at. (at.__________________________________________________________________________ %)1 200 -- O.sub.2 -- C.sub.10 H.sub.16 55 1.2 120 50 .times. 700K 3 15 100 36.5 O 7.2 35 20 50 .times. 32 200 C.sub.2 H.sub.4 N.sub.2 -- -- -- 1.5 200 50 .times. 13.56 10 15 160 33.0 N 5.2 60 90 50 .times. M 33 same as Example 14 same as Example 15 same as Example 176 same as Example 417 same as Example 208 same as Example 89 same as Example 36__________________________________________________________________________ TABLE 14 Charge Generating Layer Forming Step Com. (17) (18) (19)*.sup.3 (20) (21) (22) (23) (24) (25) (26) (27) (28) (29) (30 (31)*.sup.1 (32) (33) (34) Ex No (sccm) (sccm) (sccm) (sccm) (sccm) (sccm) torr (.degree.C.) (Hz) min. .mu.m watt (at. %) (at. %) (at. %) (at. %) (at. %) (at. %) 1 same as Example 1 2 same as Example 30 3 200 GeH.sub.4 -- -- -- SiH.sub.4 0.9 240 13.56 5.5 0.3 35 9.7 Ge 35 50 M 30.5 4 200 -- -- -- -- SiH.sub.4 0.9 245 13.56 5.4 0.3 35 24.5 100 M 5 200 GeH.sub.4 B.sub.2 H.sub.6 N.sub.2 O -- SiH.sub.4 0.8 250 13.56 5.5 0.3 35 19.5 Ge B 9P O 1.4 6 10 11 100 M 10.0 6 200 GeH.sub.4 PH.sub.3 N.sub.2 -- SiH.sub.4 0.85 245 13.56 5.6 0.3 35 19.5 Ge P 11P N 3.2 6 10 35 100 M 9.9 7 200 GeH.sub.4 B.sub.2 H.sub.6 CF.sub.4 -- SiH.sub.4 0.95 240 13.56 5.4 0.3 35 20.0 Ge B 10P C 5.4 5 10 7.5 100 M 6.2 8 200 GeH.sub.4 *.sup.4 SiH.sub.4 0.9 250 13.56 5.2 0.3 37 17.7 Ge B 2.4 8 10% -- -- 100 M 10.1 B.sub.2 H.sub.6 25 9 200 GeH.sub.4 *.sup.5 SiH.sub.4 0.9 250 13.56 5.1 0.3 37 16.4 Ge P 2.8 8 10% -- -- 100 M 10.2 PH.sub.3 30*.sup.1 Same as Table 2*.sup.3 Same as Table 2*.sup.4 10% B.sub.2 H.sub.6 means the diborane gas diluted to the concentration of 10% with hydrogen gas.*.sup.5 10% PH.sub.3 means the phosphine gas diluted to the concentration of 10% with hydrogen gas. TABLE 15__________________________________________________________________________Result of EvaluationCom. (35) (36) (37) (38) (39) (40)Ex. (V) (36) (V/.mu.m) (sec.) (E 1/2) (erg/cm.sup.2)No. - + (.mu.m) - + - + - + - + (41)__________________________________________________________________________1 1170 1200 15.3 76.5 78.4 75 92 25.5 26.1 -- -- .times.2 1150 1190 15.3 75.2 77.8 74 96 25.2 26.4 -- -- .times.3 170 245 15.3 11.1 16.0 0.6 1.1 15.3 17.2 -- -- .times.4 515 525 15.3 33.7 34.3 6.0 6.2 2.3 2.5 -- -- .times.5 1000 1020 15.3 65.4 66.7 67 89 23.5 24.1 -- -- .times.6 1010 1015 15.3 66.0 66.3 71 92 24.0 24.8 -- -- .times.7 1070 1100 15.3 70 71.9 73 95 24.3 25.6 -- -- .times.8 140 230 15.3 9.2 15.0 0.3 0.4 18.7 20.4 -- -- .times.9 195 155 15.3 12.7 10.1 0.5 0.3 25.1 24.8 -- -- .times.__________________________________________________________________________

Claims

1. A photosensitive member comprising:

an electrically conductive substrate;

a charge generating layer comprising amorphous silicon as a mtrix containing germanium atoms in an amount of up to about 30 atomic % based on the combined amount of silicon atoms and germanium atoms and at least one of hydrogen and halogen atoms in an amount of about 10 to about 35 atomic % based on the combined amount of silicon atoms and hydrogen atoms or of silicon atoms and halogen atoms, said charge generating layer having a thickness of about 0.1 to about 5 microns; and

a charge transporting layer comprising amorphous carbon containing hydrogen in an amount of about 30 to about 60 atomic % based on the combined amount of hydrogen atoms and carbon atoms, said charge transporting layer having a thickness of about 5 to about 50 microns and containing at least one of oxygen atoms in an amount of about 0.01 to about 7.0 atomic % and nitrogn atoms in an amount of about 0.01 to about 5.0 atomic % based on all the constituent atoms therein.

2. A photosensitive member as claimed in claim 1 wherein said charge generating layer further comprises boron atoms or phosphorus atoms in an effective amount of less than about 20,000 atomic ppm based on all the constituent atoms therein.

3. A photosensitive member as claimed in claim 2 wherein the effective amount of the boron or phosphorus atoms is preferably up to about 150 atomic ppm based on all the constituent atoms therein.

4. A photosensitive member as claimed in claim 1 wherein the charge generating layer further contains oxygen in an amount of about 0.001 to about 1 atomic % based on all the constituent atoms therein.

5. A photosensitive member as claimed in claim 1 wherein the charge generating layer further contains nitrogen in an amount of about 0.001 to about 3 atomic % based on all the constituent atoms therein.

6. A photosensitive member as claimed in claim 1 wherein the charge generating layer further contains carbon in an amount of about 0.001 to about 5 atomic % based on all the constituent atoms therein.

7. A photosensitive member as claimed in claim 1 wherein the amount of oxygen atoms contained in the charge transporting layer is preferably about 0.1 to about 4.7 atomic % based on all the constituent atoms therein.

8. A photosensitive member as claimed in claim 1 wherein the amount of nitrogen atoms contained in the charge transporting layer is preferably about 0.1 to about 3.9 atomic % based on all the constituent atoms therein.

9. A photosensitive member as claimed in claim 6, wherein said charge generating layer further comprises oxygen atoms in an amount of about 0.001 to about 1 atomic % based on all the constituent atoms therein.

10. A photosensitive member as claimed in claim 9, wherein said charge generating layer further comprises nitrogen atoms in an amount of about 0.001 to about 3 atomic % based on all the constituent atoms therein.

11. A photosensitive member as claimed in claim 6, wherein said charge generating layer further comprises nitrogen atoms in an amount of about 0.001 to about 3 atomic % based on all the constituent atoms therein.