Probe station thermal chuck with shielding for capacitive current

Abstract
To reduce the time to make measurements and the noise in measurements obtained by probing a device supported on surface of a thermal chuck in a probe station, a conductive member is arranged to intercept current coupling the thermal unit of the chuck to the surface supporting the device. The conductive member is capacitively coupled to the thermal unit but free of direct electrical connection thereto.
Description
BACKGROUND OF THE INVENTION

The present invention is directed to probe stations suitable for making low current and low voltage measurements and, more particularly, to a system for reducing noise due to capacitive currents resulting from the operation of a thermal chuck for a probe station.


Integrated circuit devices are typically manufactured in and on a wafer of semiconductor material using well-known techniques. Prior to cutting the individual integrated circuit devices from a wafer, tests are run on individual devices to determine if the devices operate properly. The wafer is supported on a chuck inside an environmental enclosure in a probe station. Probes are brought into contact with test points or pads on the integrated circuit devices and a series of measurements are performed. Schwindt et al., U.S. Pat. No. 5,663,653, disclose an example of a probe station in which the present invention might be used and the patent is incorporated herein by reference.


Many integrated circuit devices are designed to operate at temperatures other than room temperature. To accommodate device testing at temperatures other than the ambient temperature, a thermal chuck may be employed. One design of a thermal chuck comprises a multilayered chuck for securing a wafer having a thermal driver to modify the temperature of the chuck. A thermal chuck of this design is disclosed by Schwindt in U.S. Pat. No. 5,610,529 which is incorporated herein by reference.


The thermal driver may provide for either heating, cooling, or heating and cooling of the chuck. To modify the temperature of the chuck, the thermal driver may comprise one or more thermal units including a thermal device and a plurality of power conductors connecting the thermal device to a power source. Thermal devices, typically electric resistance heaters or thermoelectric heat pumps, are provided to heat the chuck to temperatures above the ambient temperature. The thermoelectric heat pump, also known as a Peltier device, is reversible and can be used for cooling as well as heating the chuck. The thermoelectric heat pump comprises a number of thermocouples sandwiched between two electrically insulating, thermally conductive plates. When DC power is supplied to the thermocouples, the Peltier effect causes heat to be transferred from one plate to the other. The direction of heat flow is reversible by reversing the direction of current flow in the thermocouples. Exposing the chuck to the warmer plate or the cooler plate of the thermoelectric heat pump will, respectively, either heat or cool the chuck. For testing at temperatures below ambient, the thermal chuck may also include passages for circulating coolant to cool the chuck directly or remove excess heat from the thermoelectric heat pump.


When making the low voltage and low current measurements common to testing integrated circuit devices, even very low levels of electrical noise are unsatisfactory. Thermal chucks include several sources of noise and unacceptably high levels of noise are a common problem when using a thermal chuck. One known source of noise is the result of expansion or contraction of the components of the thermal chuck due to changing temperature. Expansion or contraction changes the spacing between conductive components resulting in the generation of capacitive currents which can reach the conductive surface of the chuck. Expansion or contraction due to temperature change can also cause relative transverse movement between the multiple material layers of the chuck. Relative movement between contacting layers of insulating and conductive materials can generate triboelectric current. In a probe station chuck, the triboelectric current can appear as noise in the test measurements. Triboelectric currents can be reduced by a chuck design which prevents movement between contacting layers of insulating and conducting materials.


The operation of the thermal units by the thermal driver controller is another potential source of noise when using a thermal chuck. To change or maintain the temperature of the thermal chuck, the thermal driver controller fluctuates the electrical power to the thermal units in response to a temperature control system. As a result of the voltage drop within the conductors of the thermal units, physically adjacent portions of the electrical conductors leading to and from, and internal to the thermal devices, will be at different potentials. As the power fluctuates, the difference in voltage between the power conductors changes with time. This results in a displacement of charges in the dielectric material surrounding the conductors which manifests itself as a displacement or capacitive current coupled to the conductive top surface of the chuck. This capacitive current appears as noise in the test measurements.


The currently accepted technique to reduce the effects of capacitive currents involves shielding the chuck from external electromagnetic sources. However, the shielding layers of conductive material in the chuck have proven unsuccessful in eliminating the noise from the thermal driver. To reduce noise due to capacitive currents originating in the thermal chuck, users of probe stations often shut off the thermal units and wait for the current to dissipate. However, the RC time constant involved can be greater than five seconds. Waiting a period of five time constants (e.g. 25 seconds) for the observed noise to dissipate to an acceptable level before making a measurement substantially effects the productivity of the probe station. What is desired, therefore, is a system for reducing the electrical noise generated by the operation of the thermal unit of a probe station's thermal chuck. Reducing noise generated by the thermal chuck reduces the time for the noise to dissipate to acceptable levels improving the productivity of the probe station.





BRIEF DESCRIPTION OF THE DRAWINGS


FIG. 1 is a cross-section of a probe station incorporating a thermal chuck.



FIG. 2 is a cross section of an exemplary thermal chuck constructed in accordance with the present invention.



FIG. 3 is an exemplary schematic diagram of a thermal unit and shielding in accordance with a first aspect of a preferred embodiment of the present invention.



FIG. 4 is an exemplary schematic diagram of a thermal unit and shielding in accordance with a second aspect of a preferred embodiment of the present invention.



FIG. 5 is an exemplary schematic diagram of a thermal unit and shielding in accordance with a third aspect of a preferred embodiment of the present invention.





DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT

As illustrated in FIG. 1, a probe station generally includes an environmental enclosure 2 in which is located a chuck 4 and one or more probes 6. The environmental enclosure 2 is typically constructed of a conductive material and grounded 7 so that the chamber, interior to the enclosure 2, is shielded from electromagnetic fields emanating from outside of the enclosure 2. The chuck 4 typically comprises multiple layers of conductive and dielectric materials that are connected to the various conductors of a coaxial or triaxial cable 8. The chuck 4 includes a securement technique for securing a device under test 10, generally a wafer of semiconductor material, to the upper surface 12 of the chuck 4. The upper surface 12 of the chuck 4 is typically conductive. One technique for securing a device under test 10 relies on a vacuum source (not shown) located outside of the environmental enclosure. The vacuum source communicates through appropriate control valves and piping with apertures (not shown) in the upper surface 12 of the chuck 4. When the device under test 10 is placed on the chuck 4 the device blocks apertures leading to the vacuum source. Air pressure holds the device under test 10 against the chuck's upper surface 12. One or more probes 6 can be positioned over the device under test 10 and brought into contact with test pads on the circuit to be tested. Instrumentation connected to the probes 6 measures selected operating parameters of the circuit at the test pads.


A thermal chuck 14, bracketed, may be used to test the operation of devices at temperatures other than the ambient temperature of the environmental enclosure 2. Referring to FIG. 2, the thermal chuck 14, indicated with a bracket, may include a thermal driver 16 having facilities for modifying the temperature of a chuck 4, indicated with a bracket, supported on the top of the thermal driver 16. The thermal driver 16 may be arranged to provide for either heating, cooling, or heating and cooling of the chuck 4. The thermal driver 16 comprises one or more electrically powered thermal units 20 each of which includes one or more thermal devices 22 and a plurality of insulated power conductors 24 connecting the thermal devices 22 to a thermal driver controller 18. Typically, the thermal devices 22 are resistance heaters or thermoelectric heat pumps. Resistance heaters and thermoelectric heat pumps can increase the temperature of the chuck 4. The thermoelectric heat pump can also be used to cool the chuck 4. The thermoelectric heat pump, also known as a Peltier device, comprises a plurality of electrically connected thermocouples of p-type and n-type semiconductor materials sandwiched between two plates of an electrically insulating, thermally conducting material. When DC power is supplied to the thermocouples, heat is transferred from one plate to the other as a result of the Peltier effect. The direction of heat flow is reversible by reversing the direction of current flow in the semiconductors. Exposing the chuck 4 to the warmer plate or the cooler plate of the thermoelectric heat pump will, respectively, heat or cool the chuck 4.


The thermal driver 16 may also include passages 26 for circulating coolant supplied by a coolant source (not shown) typically located outside of the environmental enclosure 2. For testing at temperatures below the ambient temperature, the chuck 4 may be cooled directly by the coolant. If a thermoelectric heat pump is used to cool the chuck, circulating coolant may be necessary to remove heat transferred to the thermal driver 16 by the heat pump.


Electric power for the thermal units 20 is supplied by the thermal driver controller 18 located outside of the environmental enclosure 2. Insulated power conductors 24 transfer the electrical power to the thermal devices 22 in the thermal chuck 14. In response to a temperature sensing system, the thermal driver controller 18 fluctuates the electrical power to the thermal unit 20 to vary its thermal output to either reduce or increase the rate of addition or removal of thermal energy to or from the chuck 4. As a result of the voltage drop in the thermal unit 20, adjacent portions of the insulated power conductors 24 and the conductors inside the thermal devices 22 are at differing potentials. This causes a displacement of charge in the dielectric material surrounding the conductors. As the thermal driver controller 18 fluctuates the power to the thermal unit 20 the difference in voltage between adjacent conductors also varies with time. The present inventors came to the realization that this displacement of charge varying with time causes a displacement or capacitive current which is coupled to the conductive upper surface 12 of the chuck 4. The present inventors further realized that this capacitive current manifests itself as noise in the test measurements.


The present inventors came to the realization that the aforementioned capacitive currents are a significant source of noise when making measurements in the femtoamp range with state of the art probe stations. The present inventors further realized that conductive shielding of the thermal unit 20 that is capacitively coupled to the conductors of the thermal unit 20 can intercept a substantial amount, and preferably substantially all, of the capacitive currents resulting from the operation of the thermal unit 20 and provide a conductive path to return any current induced in the conductive shielding to the thermal driver controller 18 and to ground. This is in contrast to the presently accepted techniques of adding more shielding to the chuck itself. Referring also to FIG. 3, a conductive thermal device shell 28 substantially encloses the thermal devices 22 and the power conductors 24 at their connection to the thermal devices 22. Variation in charge displacement resulting from the operation of the electric circuit of the thermal device 22 results in a displacement current in the conductive thermal device shell 28. In other words, the thermal device shell 28 is capacitively coupled through “virtual” coupling capacitors 30 to the electric circuit of the thermal device 22 and intercepts capacitive currents that would otherwise find their way to the upper surface 12 of the chuck 4. Although apertures may be required in the thermal device shell 28 they should be minimized in relation to the total surface area of the thermal device shell 28. The more completely the thermal device shell 28 spatially encloses the thermal device 22 the more completely it will intercept capacitive currents emanating from the thermal device 22. The thermal device shell 28 is conductively connected to the thermal driver controller 18 through the conductive shield of the cable 32. The conductive connection of the thermal device shell 28 to the thermal driver controller 18 provides a path for any current in the thermal device shell 28 to exit the environmental enclosure 2 to the thermal driver controller 18. The driver controller 18 is connected to ground 7 extending the conductive return path for capacitive currents to ground 7.


The present inventors also came to the stark realization that by enclosing the thermal devices 22 with a conductive shell 28 the RC time constant of the thermal chuck is dramatically reduced. The thermal devices 22 do not need to be turned off in order for the noise to be sufficiently reduced. The present inventors determined that this reduction in RC time constant is due to a reduction in the stored capacitive charge in the dielectric material within the chuck, referred to as absorption capacitance. The absorption capacitance of a material includes a series resistance so, in effect, it has a memory of previous charges and is slow to dissipate. This absorption capacitance was not previously considered in the design of thermal chucks. There was little, if any, motivation to enclose the thermal devices 22 in a conductive enclosure, as it was believed that noise from the thermal devices 22 could be removed by layers of shielding in the chuck 4. The layers of the chuck 4 include, however, dielectric material which the inventor realized is, in fact, a source of the long RC time constant.


The cable 32 includes the power conductors 24 connecting the thermal driver controller 18 to the thermal devices 22. The shield of the cable 32 ideally extends through the wall of the environmental enclosure 2 and encompasses the power conductors 24 at their entrance into the thermal device shell 28. The shield of the cable 32 is capacitively coupled to the power conductors 24 and will intercept and return to the thermal driver controller 18 currents emanating from the capacitive effects of power fluctuation in the power conductors 24. The thermal driver controller 18 is grounded at ground connection 21. The more complete the enclosure of all conductors in the thermal unit 20 by the conductive shielding, the more complete will be the protection of the test measurement from noise generated by the operation of the thermal unit 20.


The walls of the environmental enclosure 2 are typically conductive material. The conductive material shields the chamber inside the environmental enclosure 2 from electromagnetic (EM) fields originating outside of the enclosure 2 which would otherwise result in noise within the probe 6. The environmental enclosure 2 is grounded to return to ground the currents generated in the conductive wall by the EM fields. In a preferred embodiment of the present invention, the conductive wall of the environmental enclosure is extended to substantially surround parts of the thermal units. The extension of the wall of the enclosure provides a conductive shield capacitively coupled to the thermal units which can return capacitive currents to the enclosure ground.


Referring to FIG. 3, in a first aspect of this preferred embodiment the wall of the environmental enclosure 2 is extended coaxially with yet another shield layer 34 of the cable 32 to a point of close physical proximity to the thermal device shell 28 yet being free from direct electrical connection to the shield of the cable 32, the thermal driver controller 18, and the thermal device shell 28. The wall of the environmental enclosure 2 is extended proximate to the thermal device shell 28 by connecting the outer shield layer 34 of the cable 32 to the wall of the environmental enclosure 2. The cable 32 includes the power conductors 24 connecting the thermal driver controller 18 to the thermal devices 22. Capacitive currents emanating from the power conductors 24 are intercepted by the shield of cable 32 and returned to the thermal driver controller 18 and the thermal driver controller ground 21. The extension of the wall of the environmental enclosure 2 through the outer shield 34 of the power cable 32 is capacitively coupled to the shield of the cable 32 by a “virtual” capacitor 36 and intercepts capacitive currents leaking from within the cable 32 which might otherwise couple to the chuck 4. Any current in the extension of the environmental enclosure 2 is returned to ground 7 outside of the environmental enclosure 2 if switch 23 is closed. If the switch 23 is open, capacitive currents are returned to the ground 25 of an instrument 27 which is connected by leads 29 to probes inside the chamber.


Referring to FIG. 4, in a second aspect of this preferred embodiment the wall 40 of the environmental enclosure 2 is extended to substantially surround the thermal devices 42, the thermal device shell 44 and the power cable 46, comprising electrical conductors 43, connecting the thermal devices 42 to the thermal driver controller 50. Heat is transferred to and from the device supporting surface 56 of the chuck 70 through the thermal device shell 44 and the wall of the environmental enclosure 40, which includes an outer surface 40B and inner surface 40A enclosing the chuck and having a portion 40C that separates the device supporting surface of the chuck from the thermal devices 42. The thermal devices 42 are capacitively coupled to the thermal shell 44 by virtual capacitors 48. The thermal device shell 44 and the shield of the power cable 46 are, in turn, capacitively coupled to the wall of the environmental enclosure 40 by virtual coupling capacitors 52. Capacitive currents in the thermal device shell 44 or the shield of the cable 46 are returned to the thermal driver controller 50 through the conductive shield layer of the cable 46. The thermal driver controller 50 is connected to the thermal devices 42 by power conductors 43 and to ground at ground 51. Capacitive currents leaking from the thermal device shell 44 or the power cable 46 will be intercepted by the wall of the enclosure and returned to the enclosure ground 54 when the switch 53 is closed. When the switch 53 is open, capacitive currents in the wall 40 of the environmental enclosure are returned to the ground 55 of the instrument 57. The instrument 57 is connected to the probes 6 inside the environmental enclosure by instrument leads 47.


Referring to FIG. 5, in a third aspect of this preferred embodiment the wall 60 of the environmental enclosure 2, comprising an inner surface 60A defining the interior of the enclosure and an outer surface 60B, is extended to substantially surround the thermal devices 64 and the power conductors 62 connecting the thermal devices 64 to the thermal driver controller 63. The outer surface 60B of the wall 60 substantially encircles the thermal devices 64 so that portion of the wall including a portion 60C of the inner surface 60A separates the thermal devices from the device supporting surface 56 of the chuck 70. The thermal driver controller is grounded at ground 74. In this aspect of the invention, the thermal devices 64 and the power conductors 62 are capacitively coupled to the wall 60 of the environmental enclosure through the virtual coupling capacitors 66. Capacitive currents generated in the thermal devices 64 or power cables 62 are intercepted by the shield formed by the conductive wall of the enclosure 60 and returned to the enclosure ground 68 when the switch 69 is closed. If the switch 69 is open the walls of the enclosure are grounded through the instrument 73 to the instrument ground 71. Heat is transferred to and from the chuck 70 through the wall 60 of the environmental enclosure.


The terms and expressions that have been employed in the foregoing specification are used as terms of description and not of limitation, and there is no intention, in the use of such terms and expressions, of excluding equivalents of the features shown and described or portions thereof, it being recognized that the scope of the invention is defined and limited only by the claims that follow.

Claims
  • 1. A thermal chuck including a surface for supporting a device under test, said thermal chuck comprising: (a) an electrically powered thermal unit for modifying a temperature of said surface; and(b) a first conductive member substantially enclosing said thermal unit and including a portion separating said thermal unit from said surface.
  • 2. The thermal chuck of claim 1 further comprising a conductive connection of said first conductive member to a ground potential.
  • 3. The thermal chuck of claim 1 further comprising conductive connection of a ground potential to said first conductive member and to a controller supplying power to said thermal unit.
  • 4. The thermal chuck of claim 1 further comprising a second conductive member substantially encircling a power cable conducting electric power to said thermal unit, said second conductive member conductively connected to a ground potential.
  • 5. The thermal chuck of claim 1 further comprising: (a) a controller supplying electric power to said thermal unit; and(b) a second conductive member substantially encircling a portion of a power cable conducting electric power from said controller to said thermal unit, said controller, said first conductor and said second conductor conductively connected to a ground potential.
  • 6. The thermal chuck of claim 5 further comprising a third conductive member substantially encircling a portion of said second conductive member and conductively connected to another ground potential.
  • 7. The thermal chuck of claim 6 wherein said another ground potential comprises a ground potential connected to an enclosure comprising portions defining a chamber in which said thermal chuck is located.
  • 8. The thermal chuck of claim 6 wherein said another ground potential comprises a ground potential for an instrument for measuring a characteristic of said device under test supported on said surface.
  • 9. A method of reducing a time for making a probing measurement of a device under test supported on a surface of a chuck, said chuck comprising a dielectric and a thermal unit for modifying a temperature of said surface, said method comprising: (a) substantially enclosing said thermal unit with a conductive member, said conductive member including a surface interposed between said thermal unit and said surface of said chuck; and(b) conductively connecting said conductive member to a controller supplying electric power to said thermal unit.
  • 10. The method of reducing a time for making a probing measurement of claim 9 further comprising the step of grounding said conductive member and said controller at a common ground potential.
  • 11. The method of reducing a time for making a probing measurement of claim 9 further comprising the step of substantially encircling a power conductor conductively connecting said thermal unit and said controller with a second conductive member conductively connected to said controller.
  • 12. The method of reducing a time for making a probing measurement of claim 11 further comprising the step of grounding said controller, said first conductive member and said second conductive member at a common ground potential.
  • 13. The method of reducing a time for making a probing measurement of claim 11 further comprising the step of substantially encircling said second conductive member with a third conductive member conductively connected to an enclosure comprising a portion defining a chamber in which said chuck is located.
  • 14. The method of reducing a time for making a probing measurement of claim 13 further comprising the step of connecting a probe measurement instrument and said enclosure to a common ground potential.
  • 15. A probe station comprising: (a) a thermal chuck including a surface for supporting a device under test and an electrically powered thermal unit for modifying a temperature of said surface; and(b) a conductive member substantially enclosing at least one of said surface and said thermal unit and including a portion separating said surface and said thermal unit.
  • 16. The probe station of claim 15 further comprising a conductive connection between said conductive member and a ground potential.
  • 17. The probe station of claim 16 wherein a controller supply electric power is also connected to said ground potential.
  • 18. The probe station of claim 16 wherein an instrument for measuring a characteristic of said device under test is also connected to said ground potential.
  • 19. The probe station of claim 15 wherein said conductive member substantially encircles a portion of an electric power conductor connected to said thermal unit.
CROSS REFERENCE TO RELATED APPLICATIONS

This is a continuation of application Ser. No. 11/546,827, filed Oct. 11, 2006, now U.S. Pat. No. 7,292,057; which is a continuation of application Ser. No. 10/626,903, filed Jul. 25, 2003, now U.S. Pat. No. 7,138,813, issued Nov. 21, 2006; which is a continuation of application Ser. No. 10/308,847, filed Dec. 2, 2002, now U.S. Pat. No. 6,642,732 B2, issued Nov. 4, 2003; which is a continuation of application Ser. No. 10/179,771, filed Jun. 24, 2002, now U.S. Pat. No. 6,512,391 B2, issued Jan. 28, 2003; which is a continuation of application Ser. No. 09/345,571, filed Jun. 30, 1999, now U.S. Pat. No. 6,445,202, issued Sep. 3, 2002.

US Referenced Citations (876)
Number Name Date Kind
1191486 Tyler Jul 1916 A
1337866 Whitacker Apr 1920 A
2106003 Hewitt Jan 1938 A
2142625 Zoethout Jan 1939 A
2197081 Piron Apr 1940 A
2264685 Wells Dec 1941 A
2376101 Tyzzer May 1945 A
2389668 Johnson Nov 1945 A
2471897 Rappi May 1949 A
2812502 Doherty Nov 1957 A
3176091 Hanson et al. Mar 1965 A
3185927 Margulis et al. May 1965 A
3192844 Szasz et al. Jul 1965 A
3193712 Harris Jul 1965 A
3201721 Voelcker Aug 1965 A
3230299 Radziekowski Jan 1966 A
3256484 Terry Jun 1966 A
3265969 Catu Aug 1966 A
3289046 Carr Nov 1966 A
3333274 Forcier Jul 1967 A
3359014 Clements Dec 1967 A
3405361 Kattner et al. Oct 1968 A
3408565 Frick et al. Oct 1968 A
3435185 Gerard Mar 1969 A
3484679 Hodgson et al. Dec 1969 A
3596228 Reed, Jr. et al. Jul 1971 A
3602845 Agrios et al. Aug 1971 A
3609539 Gunthert Sep 1971 A
3642415 Johnson Feb 1972 A
3648169 Wiesler Mar 1972 A
3654573 Graham Apr 1972 A
3662318 Decuyper May 1972 A
3666296 Fischettl May 1972 A
3700998 Lee et al. Oct 1972 A
3710251 Hagge et al. Jan 1973 A
3714572 Ham et al. Jan 1973 A
3740900 Youmans et al. Jun 1973 A
3775644 Cotner et al. Nov 1973 A
3777260 Davies et al. Dec 1973 A
3810017 Wiesler et al. May 1974 A
3814838 Shafer Jun 1974 A
3814888 Bowers et al. Jun 1974 A
3829076 Sofy Aug 1974 A
3836751 Anderson Sep 1974 A
3858212 Tompkins et al. Dec 1974 A
3863181 Glance et al. Jan 1975 A
3866093 Kusters et al. Feb 1975 A
3930809 Evans Jan 1976 A
3936743 Roch Feb 1976 A
3952156 Lahr Apr 1976 A
3970934 Aksu Jul 1976 A
3976959 Gaspari Aug 1976 A
3992073 Buchoff et al. Nov 1976 A
3996517 Fergason et al. Dec 1976 A
4001685 Roch Jan 1977 A
4008900 Khoshaba Feb 1977 A
4009456 Hopfer Feb 1977 A
4027253 Chiron et al. May 1977 A
4035723 Kvaternik Jul 1977 A
4038894 Knibbe et al. Aug 1977 A
4042119 Hassan et al. Aug 1977 A
4049252 Bell Sep 1977 A
4066943 Roch Jan 1978 A
4072576 Arwin et al. Feb 1978 A
4093988 Scott Jun 1978 A
4099120 Aksu Jul 1978 A
4115735 Stanford Sep 1978 A
4115736 Tracy Sep 1978 A
4116523 Coberly et al. Sep 1978 A
4135131 Larsen et al. Jan 1979 A
4151465 Lenz Apr 1979 A
4161692 Tarzwell Jul 1979 A
4172993 Leach Oct 1979 A
4186338 Fichtenbaum Jan 1980 A
4275446 Blaess Jun 1981 A
4277741 Faxvog et al. Jul 1981 A
4280112 Eisenhart Jul 1981 A
4284033 del Rio Aug 1981 A
4284682 Tshirch et al. Aug 1981 A
4287473 Sawyer Sep 1981 A
4327180 Chen Apr 1982 A
4330783 Toia May 1982 A
4342958 Russell Aug 1982 A
4346355 Tsukii Aug 1982 A
4352061 Matrone Sep 1982 A
4357575 Uren et al. Nov 1982 A
4365109 O'Loughlin Dec 1982 A
4365195 Stegens Dec 1982 A
4371742 Manly Feb 1983 A
4376920 Smith Mar 1983 A
4383178 Shibata et al. May 1983 A
4383217 Shiell May 1983 A
4401945 Juengel Aug 1983 A
4414638 Talambiras Nov 1983 A
4419626 Cedrone et al. Dec 1983 A
4425395 Negishi et al. Jan 1984 A
4426619 Demand Jan 1984 A
4431967 Nishioka Feb 1984 A
4453142 Murphy Jun 1984 A
4468629 Choma, Jr. Aug 1984 A
4473798 Cedrone et al. Sep 1984 A
4479690 Inouye et al. Oct 1984 A
4480223 Aigo Oct 1984 A
4487996 Rabinowitz et al. Dec 1984 A
4491173 Demand Jan 1985 A
4503335 Takahashi Mar 1985 A
4507602 Aguirre Mar 1985 A
4515133 Roman May 1985 A
4515439 Esswein May 1985 A
4528504 Thornton, Jr. et al. Jul 1985 A
4531474 Inuta Jul 1985 A
4532423 Tojo et al. Jul 1985 A
4552033 Marzhauser Nov 1985 A
4557599 Zimring Dec 1985 A
4566184 Higgins et al. Jan 1986 A
4567321 Harayama Jan 1986 A
4567908 Bolsterli Feb 1986 A
4575676 Palkuti Mar 1986 A
4588950 Henley May 1986 A
4588970 Donecker et al. May 1986 A
4621169 Petinelli et al. Nov 1986 A
4626618 Takaoka et al. Dec 1986 A
4641659 Sepponen Feb 1987 A
4642417 Ruthrof et al. Feb 1987 A
4646005 Ryan Feb 1987 A
4651115 Wu Mar 1987 A
4665360 Phillips May 1987 A
4673839 Veenendaal Jun 1987 A
4675600 Gergin Jun 1987 A
4680538 Dalman et al. Jul 1987 A
4684783 Gore Aug 1987 A
4684883 Ackerman et al. Aug 1987 A
4691163 Blass et al. Sep 1987 A
4691831 Suzuki et al. Sep 1987 A
4694245 Frommes Sep 1987 A
4695794 Bargett et al. Sep 1987 A
4697143 Lockwood et al. Sep 1987 A
4703433 Sharrit Oct 1987 A
4705447 Smith Nov 1987 A
4709141 Olsen et al. Nov 1987 A
4711563 Lass Dec 1987 A
4712370 MacGee Dec 1987 A
4713347 Mitchell et al. Dec 1987 A
4725793 Igarashi Feb 1988 A
4727637 Buckwitz et al. Mar 1988 A
4730158 Kasai et al. Mar 1988 A
4731577 Logan Mar 1988 A
4734872 Eager et al. Mar 1988 A
4739259 Hadwin et al. Apr 1988 A
4742571 Letron May 1988 A
4744041 Strunk et al. May 1988 A
4746857 Sakai et al. May 1988 A
4754239 Sedivec Jun 1988 A
4755746 Mallory et al. Jul 1988 A
4755747 Sato Jul 1988 A
4755874 Esrig et al. Jul 1988 A
4757255 Margozzi Jul 1988 A
4758785 Rath Jul 1988 A
4759712 Demand Jul 1988 A
4766384 Kleinberg et al. Aug 1988 A
4771234 Cook et al. Sep 1988 A
4772846 Reeds Sep 1988 A
4777434 Miller et al. Oct 1988 A
4780670 Cherry Oct 1988 A
4783625 Harry et al. Nov 1988 A
4784213 Eager et al. Nov 1988 A
4786867 Yamatsu Nov 1988 A
4787752 Fraser et al. Nov 1988 A
4791363 Logan Dec 1988 A
4795962 Yanagawa et al. Jan 1989 A
4805627 Klingenbeck et al. Feb 1989 A
4810981 Herstein Mar 1989 A
4812754 Tracy et al. Mar 1989 A
4816767 Cannon et al. Mar 1989 A
4818169 Schram et al. Apr 1989 A
4827211 Strid et al. May 1989 A
4831494 Arnold et al. May 1989 A
4838802 Soar Jun 1989 A
4839587 Flatley et al. Jun 1989 A
4845426 Nolan et al. Jul 1989 A
4849689 Gleason et al. Jul 1989 A
4853613 Sequeira et al. Aug 1989 A
4853624 Rabjohn Aug 1989 A
4853627 Gleason et al. Aug 1989 A
4856426 Wirz Aug 1989 A
4856904 Akagawa Aug 1989 A
4858160 Strid et al. Aug 1989 A
4859989 McPherson Aug 1989 A
4864227 Sato Sep 1989 A
4871883 Guiol Oct 1989 A
4871965 Elbert et al. Oct 1989 A
4884026 Hayakawa et al. Nov 1989 A
4884206 Mate Nov 1989 A
4888550 Reid Dec 1989 A
4891584 Kamieniecki et al. Jan 1990 A
4893914 Hancock et al. Jan 1990 A
4894612 Drake et al. Jan 1990 A
4896109 Rauscher Jan 1990 A
4899998 Teramachi Feb 1990 A
4904933 Snyder et al. Feb 1990 A
4904935 Calma et al. Feb 1990 A
4906920 Huff et al. Mar 1990 A
4916398 Rath Apr 1990 A
4918279 Babel et al. Apr 1990 A
4918374 Stewart et al. Apr 1990 A
4918383 Huff et al. Apr 1990 A
4922128 Dhong et al. May 1990 A
4922186 Tsuchiya et al. May 1990 A
4923407 Rice et al. May 1990 A
4926118 O'Connor et al. May 1990 A
4929893 Sato et al. May 1990 A
4933634 Cuzin et al. Jun 1990 A
4968931 Littlebury et al. Nov 1990 A
4978907 Smith Dec 1990 A
4978914 Akimoto et al. Dec 1990 A
4982153 Collins et al. Jan 1991 A
4994737 Carlton et al. Feb 1991 A
5001423 Abrami et al. Mar 1991 A
5006796 Burton et al. Apr 1991 A
5010296 Okada et al. Apr 1991 A
5019692 Nbedi et al. May 1991 A
5030907 Yih et al. Jul 1991 A
5034688 Moulene et al. Jul 1991 A
5041782 Marzan Aug 1991 A
5045781 Gleason et al. Sep 1991 A
5061823 Carroll Oct 1991 A
5065089 Rich Nov 1991 A
5065092 Sigler Nov 1991 A
5066357 Smyth, Jr. et al. Nov 1991 A
5070297 Kwon et al. Dec 1991 A
5077523 Blanz Dec 1991 A
5082627 Stanbro Jan 1992 A
5084671 Miyata et al. Jan 1992 A
5089774 Nakano Feb 1992 A
5091691 Kamieniecki et al. Feb 1992 A
5091692 Ohno et al. Feb 1992 A
5091732 Mileski et al. Feb 1992 A
5094536 MacDonald et al. Mar 1992 A
5095891 Reitter Mar 1992 A
5097207 Blanz Mar 1992 A
5101149 Adams et al. Mar 1992 A
5101453 Rumbaugh Mar 1992 A
5103169 Heaton et al. Apr 1992 A
5105148 Lee Apr 1992 A
5105181 Ross Apr 1992 A
5107076 Bullock et al. Apr 1992 A
5136237 Smith et al. Aug 1992 A
5142224 Smith et al. Aug 1992 A
5144228 Sorna et al. Sep 1992 A
5159264 Anderson Oct 1992 A
5159267 Anderson Oct 1992 A
5159752 Mahant-Shetti et al. Nov 1992 A
5160883 Blanz Nov 1992 A
5164319 Hafeman et al. Nov 1992 A
5164661 Jones Nov 1992 A
5166606 Blanz Nov 1992 A
5172049 Kiyokawa et al. Dec 1992 A
5172051 Zamborelli Dec 1992 A
5187443 Bereskin Feb 1993 A
5198752 Miyata et al. Mar 1993 A
5198753 Hamburgen Mar 1993 A
5198756 Jenkins et al. Mar 1993 A
5198758 Iknaian et al. Mar 1993 A
5202558 Barker Apr 1993 A
5209088 Vaks May 1993 A
5210377 Kennedy et al. May 1993 A
5210485 Kreiger et al. May 1993 A
5214243 Johnson May 1993 A
5214374 St. Onge May 1993 A
5218185 Gross Jun 1993 A
5220277 Reitinger Jun 1993 A
5221905 Bhangu et al. Jun 1993 A
5225037 Elder et al. Jul 1993 A
5225796 Williams et al. Jul 1993 A
5227730 King et al. Jul 1993 A
5232789 Platz et al. Aug 1993 A
5233197 Bowman et al. Aug 1993 A
5233291 Kouno et al. Aug 1993 A
5233306 Misra Aug 1993 A
5237267 Harwood et al. Aug 1993 A
5245292 Milesky et al. Sep 1993 A
5266889 Harwood et al. Nov 1993 A
5267088 Nomura Nov 1993 A
5270664 McMurtry et al. Dec 1993 A
5274336 Crook et al. Dec 1993 A
5278494 Obigane Jan 1994 A
5280156 Niori et al. Jan 1994 A
5298972 Heffner Mar 1994 A
5303938 Miller et al. Apr 1994 A
5304924 Yamano et al. Apr 1994 A
5315237 Iwakura et al. May 1994 A
5321352 Takebuchi Jun 1994 A
5321453 Mori et al. Jun 1994 A
5325052 Yamashita Jun 1994 A
5334931 Clarke et al. Aug 1994 A
5336989 Hofer Aug 1994 A
5345170 Schwindt et al. Sep 1994 A
5357211 Bryson et al. Oct 1994 A
5363050 Guo et al. Nov 1994 A
5369368 Kassen et al. Nov 1994 A
5369370 Stratmann et al. Nov 1994 A
5371457 Lipp Dec 1994 A
5373231 Boll et al. Dec 1994 A
5374938 Hatazawa et al. Dec 1994 A
5376790 Linker et al. Dec 1994 A
5382898 Subramanian Jan 1995 A
5397855 Ferlier Mar 1995 A
5404111 Mori et al. Apr 1995 A
5408188 Katoh Apr 1995 A
5408189 Swart et al. Apr 1995 A
5410259 Fujihara et al. Apr 1995 A
5412330 Ravel et al. May 1995 A
5412866 Woith et al. May 1995 A
5414565 Sullivan et al. May 1995 A
5422574 Kister Jun 1995 A
5434512 Schwindt et al. Jul 1995 A
5448172 Dechene et al. Sep 1995 A
5451884 Sauerland Sep 1995 A
5457398 Schwindt et al. Oct 1995 A
5461328 Devereaux et al. Oct 1995 A
5467024 Swapp Nov 1995 A
5469324 Henderson et al. Nov 1995 A
5475316 Hurley et al. Dec 1995 A
5477011 Singles et al. Dec 1995 A
5478748 Akins, Jr. et al. Dec 1995 A
5479108 Cheng Dec 1995 A
5479109 Lau et al. Dec 1995 A
5481196 Nosov Jan 1996 A
5481936 Yanagisawa Jan 1996 A
5486975 Shamouilian et al. Jan 1996 A
5488954 Sleva et al. Feb 1996 A
5491426 Small Feb 1996 A
5493070 Habu Feb 1996 A
5493236 Ishii et al. Feb 1996 A
5500606 Holmes Mar 1996 A
5505150 James et al. Apr 1996 A
5506498 Anderson et al. Apr 1996 A
5506515 Godshalk et al. Apr 1996 A
5508631 Manku et al. Apr 1996 A
5510792 Ono et al. Apr 1996 A
5511010 Burns Apr 1996 A
5512835 Rivera et al. Apr 1996 A
5515167 Ledger et al. May 1996 A
5517111 Shelor May 1996 A
5521522 Abe et al. May 1996 A
5523694 Cole, Jr. Jun 1996 A
5528158 Sinsheimer et al. Jun 1996 A
5530371 Perry et al. Jun 1996 A
5530372 Lee et al. Jun 1996 A
5532609 Harwood et al. Jul 1996 A
5539323 Davis, Jr. Jul 1996 A
5539676 Yamaguchi Jul 1996 A
5546012 Perry et al. Aug 1996 A
5550480 Nelson et al. Aug 1996 A
5550482 Sano Aug 1996 A
5552716 Takahashi et al. Sep 1996 A
5554236 Singles et al. Sep 1996 A
5561377 Strid et al. Oct 1996 A
5561585 Barnes et al. Oct 1996 A
5565788 Burr et al. Oct 1996 A
5565881 Phillips et al. Oct 1996 A
5569591 Kell et al. Oct 1996 A
5571324 Sago et al. Nov 1996 A
5572398 Federlin et al. Nov 1996 A
5578932 Adamian Nov 1996 A
5583445 Mullen Dec 1996 A
5584608 Gillespie Dec 1996 A
5594358 Ishikawa et al. Jan 1997 A
5600256 Woith et al. Feb 1997 A
5604444 Harwood et al. Feb 1997 A
5610529 Schwindt Mar 1997 A
5611946 Leong et al. Mar 1997 A
5617035 Swapp Apr 1997 A
5628057 Phillips et al. May 1997 A
5629631 Perry et al. May 1997 A
5631571 Spaziani et al. May 1997 A
5633780 Cronin May 1997 A
5640101 Kuji et al. Jun 1997 A
5642298 Mallory et al. Jun 1997 A
5644248 Fujimoto Jul 1997 A
5646538 Lide et al. Jul 1997 A
5653939 Hollis et al. Aug 1997 A
5656942 Watts et al. Aug 1997 A
5657394 Schwartz et al. Aug 1997 A
5659255 Strid et al. Aug 1997 A
5659421 Rahmel et al. Aug 1997 A
5663653 Schwindt et al. Sep 1997 A
5666063 Abercrombie et al. Sep 1997 A
5668470 Shelor Sep 1997 A
5669316 Faz et al. Sep 1997 A
5670322 Eggers et al. Sep 1997 A
5670888 Cheng Sep 1997 A
5672816 Park et al. Sep 1997 A
5675499 Lee et al. Oct 1997 A
5675932 Mauney Oct 1997 A
5676360 Boucher et al. Oct 1997 A
5680039 Mochizuki et al. Oct 1997 A
5682337 El-Fishawy et al. Oct 1997 A
5685232 Inoue Nov 1997 A
5704355 Bridges Jan 1998 A
5712571 O'Donoghue Jan 1998 A
5715819 Svenson et al. Feb 1998 A
5729150 Schwindt Mar 1998 A
5731708 Sobhani Mar 1998 A
5731920 Katsuragawa Mar 1998 A
5744971 Chan et al. Apr 1998 A
5748506 Bockelman May 1998 A
5751252 Phillips May 1998 A
5767690 Fujimoto Jun 1998 A
5773951 Markowski et al. Jun 1998 A
5777485 Tanaka et al. Jul 1998 A
5792668 Fuller et al. Aug 1998 A
5793213 Bockelman et al. Aug 1998 A
5794133 Kashima Aug 1998 A
5798652 Taraci Aug 1998 A
5802856 Schaper et al. Sep 1998 A
5804982 Lo et al. Sep 1998 A
5804983 Nakajima et al. Sep 1998 A
5807107 Bright et al. Sep 1998 A
5811751 Leong et al. Sep 1998 A
5824494 Feldberg Oct 1998 A
5828225 Obikane et al. Oct 1998 A
5829437 Bridges Nov 1998 A
5831442 Heigl Nov 1998 A
5833601 Swartz et al. Nov 1998 A
5835997 Yassine et al. Nov 1998 A
5838161 Akram et al. Nov 1998 A
5841288 Meaney et al. Nov 1998 A
5846708 Hollis et al. Dec 1998 A
5847569 Ho et al. Dec 1998 A
5848500 Kirk Dec 1998 A
5852232 Samsavar et al. Dec 1998 A
5854608 Leisten Dec 1998 A
5857667 Lee Jan 1999 A
5861743 Pye et al. Jan 1999 A
5867073 Weinreb et al. Feb 1999 A
5869326 Hofmann Feb 1999 A
5869975 Strid et al. Feb 1999 A
5874361 Collins et al. Feb 1999 A
5879289 Yarush et al. Mar 1999 A
5883522 O'Boyle Mar 1999 A
5883523 Ferland et al. Mar 1999 A
5888075 Hasegawa et al. Mar 1999 A
5892539 Colvin Apr 1999 A
5900737 Graham et al. May 1999 A
5903143 Mochizuki et al. May 1999 A
5905421 Oldfield May 1999 A
5910727 Fujihara et al. Jun 1999 A
5916689 Collins et al. Jun 1999 A
5923177 Wardwell Jul 1999 A
5926028 Mochizuki Jul 1999 A
5942907 Chiang Aug 1999 A
5944093 Viswanath Aug 1999 A
5945836 Sayre et al. Aug 1999 A
5949383 Hayes et al. Sep 1999 A
5949579 Baker Sep 1999 A
5952842 Fujimoto Sep 1999 A
5959461 Brown et al. Sep 1999 A
5960411 Hartman et al. Sep 1999 A
5963027 Peters Oct 1999 A
5963364 Leong et al. Oct 1999 A
5970429 Martin Oct 1999 A
5973505 Strid et al. Oct 1999 A
5974662 Eldridge et al. Nov 1999 A
5981268 Kovacs et al. Nov 1999 A
5982166 Mautz Nov 1999 A
5993611 Moroney, III et al. Nov 1999 A
5995914 Cabot Nov 1999 A
5996102 Haulin Nov 1999 A
5998768 Hunter et al. Dec 1999 A
5999268 Yonezawa et al. Dec 1999 A
6001760 Katsuda et al. Dec 1999 A
6002236 Trant et al. Dec 1999 A
6002263 Peters et al. Dec 1999 A
6002426 Back et al. Dec 1999 A
6013586 McGhee et al. Jan 2000 A
6019612 Hasegawa et al. Feb 2000 A
6023209 Faulkner et al. Feb 2000 A
6028435 Nikawa Feb 2000 A
6029141 Bezos et al. Feb 2000 A
6031383 Streib et al. Feb 2000 A
6032714 Fenton Mar 2000 A
6034533 Tervo et al. Mar 2000 A
6037785 Higgins Mar 2000 A
6037793 Miyazawa et al. Mar 2000 A
6043667 Cadwallader et al. Mar 2000 A
6043668 Carney Mar 2000 A
6049216 Yang et al. Apr 2000 A
6051422 Kovacs et al. Apr 2000 A
6052653 Mazur et al. Apr 2000 A
6054869 Hutton et al. Apr 2000 A
6060888 Blackham et al. May 2000 A
6060891 Hembree et al. May 2000 A
6060892 Yamagata May 2000 A
6061589 Bridges et al. May 2000 A
6064213 Khandros et al. May 2000 A
6064217 Smith May 2000 A
6064218 Godfrey et al. May 2000 A
6066911 Lindemann et al. May 2000 A
6078183 Cole, Jr. Jun 2000 A
6091236 Piety et al. Jul 2000 A
6091255 Godfrey Jul 2000 A
6096567 Kaplan et al. Aug 2000 A
6100815 Pailthorp Aug 2000 A
6104203 Costello et al. Aug 2000 A
6104206 Verkuil Aug 2000 A
6111419 Lefever et al. Aug 2000 A
6114865 Lagowski et al. Sep 2000 A
6118287 Boll et al. Sep 2000 A
6118894 Schwartz et al. Sep 2000 A
6121783 Horner et al. Sep 2000 A
6124723 Costello Sep 2000 A
6124725 Sato Sep 2000 A
6127831 Khoury et al. Oct 2000 A
6130544 Strid et al. Oct 2000 A
6137302 Schwindt Oct 2000 A
6137303 Deckert et al. Oct 2000 A
6144212 Mizuta Nov 2000 A
6147502 Fryer et al. Nov 2000 A
6147851 Anderson Nov 2000 A
6160407 Nikawa Dec 2000 A
6161294 Bland et al. Dec 2000 A
6166553 Sinsheimer Dec 2000 A
6169410 Grace et al. Jan 2001 B1
6172337 Johnsgard et al. Jan 2001 B1
6175228 Zamborelli et al. Jan 2001 B1
6181144 Hembree et al. Jan 2001 B1
6181149 Godfrey et al. Jan 2001 B1
6181297 Leisten Jan 2001 B1
6181416 Falk Jan 2001 B1
6184845 Leisten et al. Feb 2001 B1
6191596 Abiko Feb 2001 B1
6194720 Li et al. Feb 2001 B1
6194907 Kanao et al. Feb 2001 B1
6198299 Hollman Mar 2001 B1
6211663 Moulthrop et al. Apr 2001 B1
6211837 Crouch et al. Apr 2001 B1
6215295 Smith, III Apr 2001 B1
6222031 Wakabayashi et al. Apr 2001 B1
6222970 Wach et al. Apr 2001 B1
6229322 Hembree May 2001 B1
6229327 Boll et al. May 2001 B1
6232787 Lo et al. May 2001 B1
6232788 Schwindt et al. May 2001 B1
6232789 Schwindt May 2001 B1
6232790 Bryan et al. May 2001 B1
6233613 Walker et al. May 2001 B1
6236223 Brady et al. May 2001 B1
6236975 Boe et al. May 2001 B1
6236977 Verba et al. May 2001 B1
6242929 Mizuta Jun 2001 B1
6245692 Pearce et al. Jun 2001 B1
6251595 Gordon et al. Jun 2001 B1
6252392 Peters Jun 2001 B1
6257319 Kainuma et al. Jul 2001 B1
6257564 Avneri et al. Jul 2001 B1
6259261 Engelking et al. Jul 2001 B1
6265950 Schmidt et al. Jul 2001 B1
6271673 Furuta et al. Aug 2001 B1
6275738 Kasevich et al. Aug 2001 B1
6278051 Peabody Aug 2001 B1
6278411 Ohlsson et al. Aug 2001 B1
6281691 Matsunaga et al. Aug 2001 B1
6284971 Atalar et al. Sep 2001 B1
6288557 Peters et al. Sep 2001 B1
6292760 Burns Sep 2001 B1
6300775 Peach et al. Oct 2001 B1
6307672 DeNure Oct 2001 B1
6310483 Taura et al. Oct 2001 B1
6310755 Kholodenko et al. Oct 2001 B1
6313567 Maltabes et al. Nov 2001 B1
6313649 Harwood et al. Nov 2001 B2
6320372 Keller Nov 2001 B1
6320396 Nikawa Nov 2001 B1
6327034 Hoover et al. Dec 2001 B1
6335625 Bryant et al. Jan 2002 B1
6335628 Schwindt et al. Jan 2002 B2
6340568 Hefti Jan 2002 B2
6340895 Uher et al. Jan 2002 B1
6359456 Hembree et al. Mar 2002 B1
6362636 Peters et al. Mar 2002 B1
6362792 Sawamura et al. Mar 2002 B1
6366247 Sawamura et al. Apr 2002 B1
6369776 Leisten et al. Apr 2002 B1
6376258 Hefti Apr 2002 B2
6380751 Harwood et al. Apr 2002 B2
6384614 Hager et al. May 2002 B1
6395480 Hefti May 2002 B1
6396296 Tarter et al. May 2002 B1
6396298 Young et al. May 2002 B1
6400168 Matsunaga et al. Jun 2002 B2
6404213 Noda Jun 2002 B2
6407560 Walraven et al. Jun 2002 B1
6407562 Whiteman Jun 2002 B1
6409724 Penny et al. Jun 2002 B1
6414478 Suzuki Jul 2002 B1
6415858 Getchel et al. Jul 2002 B1
6418009 Brunette Jul 2002 B1
6420722 Moore et al. Jul 2002 B2
6424141 Hollman et al. Jul 2002 B1
6424316 Leisten Jul 2002 B1
6445202 Cowan et al. Sep 2002 B1
6447339 Reed et al. Sep 2002 B1
6448788 Meaney et al. Sep 2002 B1
6459739 Vitenberg Oct 2002 B1
6466046 Maruyama et al. Oct 2002 B1
6468816 Hunter Oct 2002 B2
6476442 Williams et al. Nov 2002 B1
6480013 Nayler et al. Nov 2002 B1
6481939 Gillespie et al. Nov 2002 B1
6483327 Bruce et al. Nov 2002 B1
6483336 Harris et al. Nov 2002 B1
6486687 Harwood et al. Nov 2002 B2
6488405 Eppes et al. Dec 2002 B1
6489789 Peters et al. Dec 2002 B2
6490471 Svenson et al. Dec 2002 B2
6492822 Schwindt et al. Dec 2002 B2
6501289 Takekoshi Dec 2002 B1
6512391 Cowan et al. Jan 2003 B2
6512482 Nelson et al. Jan 2003 B1
6515494 Low Feb 2003 B1
6528993 Shin et al. Mar 2003 B1
6529844 Kapetanic et al. Mar 2003 B1
6548311 Knoll Apr 2003 B1
6549022 Cole, Jr. et al. Apr 2003 B1
6549026 Dibattista et al. Apr 2003 B1
6549106 Martin Apr 2003 B2
6566079 Hefti May 2003 B2
6573702 Marcuse et al. Jun 2003 B2
6578264 Gleason et al. Jun 2003 B1
6580283 Carbone et al. Jun 2003 B1
6582979 Coccioli et al. Jun 2003 B2
6587327 Devoe et al. Jul 2003 B1
6603322 Boll et al. Aug 2003 B1
6605951 Cowan Aug 2003 B1
6605955 Costello et al. Aug 2003 B1
6608494 Bruce et al. Aug 2003 B1
6608496 Strid et al. Aug 2003 B1
6611417 Chen Aug 2003 B2
6617862 Bruce Sep 2003 B1
6621082 Morita et al. Sep 2003 B2
6624891 Marcus et al. Sep 2003 B2
6627461 Chapman et al. Sep 2003 B2
6628503 Sogard Sep 2003 B2
6628980 Atalar et al. Sep 2003 B2
6633174 Satya et al. Oct 2003 B1
6636059 Harwood et al. Oct 2003 B2
6636182 Mehltretter Oct 2003 B2
6639415 Peters et al. Oct 2003 B2
6639461 Tam et al. Oct 2003 B1
6642732 Cowan et al. Nov 2003 B2
6643597 Dunsmore Nov 2003 B1
6650135 Mautz et al. Nov 2003 B1
6653903 Leich et al. Nov 2003 B2
6657214 Foegelle et al. Dec 2003 B1
6657601 McLean Dec 2003 B2
6686753 Kitahata Feb 2004 B1
6701265 Hill et al. Mar 2004 B2
6707548 Kreimer et al. Mar 2004 B2
6710798 Hershel et al. Mar 2004 B1
6717426 Iwasaki Apr 2004 B2
6720782 Schwindt et al. Apr 2004 B2
6724205 Hayden et al. Apr 2004 B1
6724928 Davis Apr 2004 B1
6727716 Sharif Apr 2004 B1
6731804 Carrieri et al. May 2004 B1
6734687 Ishitani et al. May 2004 B1
6737920 Jen et al. May 2004 B2
6739208 Hyakudomi May 2004 B2
6744268 Hollman Jun 2004 B2
6753679 Kwong et al. Jun 2004 B1
6753699 Stockstad Jun 2004 B2
6756751 Hunter Jun 2004 B2
6768328 Self et al. Jul 2004 B2
6770955 Coccioli et al. Aug 2004 B1
6771090 Harris et al. Aug 2004 B2
6771806 Satya et al. Aug 2004 B1
6774651 Hembree Aug 2004 B1
6777964 Navratil et al. Aug 2004 B2
6778140 Yeh Aug 2004 B1
6784679 Sweet et al. Aug 2004 B2
6788093 Aitren et al. Sep 2004 B2
6791344 Cook et al. Sep 2004 B2
6794888 Kawaguchi et al. Sep 2004 B2
6794950 Du Toit et al. Sep 2004 B2
6798226 Altmann et al. Sep 2004 B2
6801047 Harwood et al. Oct 2004 B2
6806724 Hayden et al. Oct 2004 B2
6806836 Ogawa et al. Oct 2004 B2
6809533 Anlage et al. Oct 2004 B1
6812718 Chong et al. Nov 2004 B1
6822463 Jacobs Nov 2004 B1
6836135 Harris et al. Dec 2004 B2
6838885 Kamitani Jan 2005 B2
6842024 Peters et al. Jan 2005 B2
6843024 Nozaki et al. Jan 2005 B2
6847219 Lesher et al. Jan 2005 B1
6856129 Thomas et al. Feb 2005 B2
6861856 Dunklee et al. Mar 2005 B2
6864694 McTigue Mar 2005 B2
6873167 Goto et al. Mar 2005 B2
6885197 Harris et al. Apr 2005 B2
6900646 Kasukabe et al. May 2005 B2
6900647 Yoshida et al. May 2005 B2
6900652 Mazur May 2005 B2
6900653 Yu et al. May 2005 B2
6902941 Sun Jun 2005 B2
6903563 Yoshida et al. Jun 2005 B2
6914244 Alani Jul 2005 B2
6914580 Leisten Jul 2005 B2
6924656 Matsumoto Aug 2005 B2
6927079 Fyfield Aug 2005 B1
6937341 Woollam et al. Aug 2005 B1
6965226 Dunklee Nov 2005 B2
6970001 Chheda et al. Nov 2005 B2
6987483 Tran Jan 2006 B2
7001785 Chen Feb 2006 B1
7002133 Beausoleil et al. Feb 2006 B2
7002363 Mathieu Feb 2006 B2
7002364 Kang et al. Feb 2006 B2
7003184 Ronnekleiv et al. Feb 2006 B2
7005842 Fink et al. Feb 2006 B2
7005868 McTigue Feb 2006 B2
7005879 Robertazzi Feb 2006 B1
7006046 Aisenbrey Feb 2006 B2
7007380 Das et al. Mar 2006 B2
7009188 Wang Mar 2006 B2
7009383 Harwood et al. Mar 2006 B2
7009415 Kobayashi et al. Mar 2006 B2
7011531 Egitto et al. Mar 2006 B2
7012425 Shoji Mar 2006 B2
7012441 Chou et al. Mar 2006 B2
7013221 Friend et al. Mar 2006 B1
7014499 Yoon Mar 2006 B2
7015455 Mitsuoka et al. Mar 2006 B2
7015689 Kasajima et al. Mar 2006 B2
7015690 Wang et al. Mar 2006 B2
7015703 Hopkins et al. Mar 2006 B2
7015707 Cherian Mar 2006 B2
7015708 Beckous et al. Mar 2006 B2
7015709 Capps et al. Mar 2006 B2
7015710 Yoshida et al. Mar 2006 B2
7015711 Rothaug et al. Mar 2006 B2
7019541 Kittrell Mar 2006 B2
7019544 Jacobs et al. Mar 2006 B1
7019701 Ohno et al. Mar 2006 B2
7020360 Satomura et al. Mar 2006 B2
7020363 Johannessen Mar 2006 B2
7022976 Santana, Jr. et al. Apr 2006 B1
7022985 Knebel et al. Apr 2006 B2
7023225 Blackwood Apr 2006 B2
7023226 Okumura et al. Apr 2006 B2
7023229 Maesaki et al. Apr 2006 B2
7023231 Howland, Jr. et al. Apr 2006 B2
7025628 LaMeres et al. Apr 2006 B2
7026832 Chaya et al. Apr 2006 B2
7026833 Rincon et al. Apr 2006 B2
7026834 Hwang Apr 2006 B2
7026835 Farnworth et al. Apr 2006 B2
7030599 Douglas Apr 2006 B2
7030827 Mahler et al. Apr 2006 B2
7032307 Matsunaga et al. Apr 2006 B2
7034553 Gilboe Apr 2006 B2
7035738 Matsumoto et al. Apr 2006 B2
7088981 Chang Aug 2006 B2
7096133 Martin et al. Aug 2006 B1
7101797 Yuasa Sep 2006 B2
7138813 Cowan et al. Nov 2006 B2
7187188 Andrews et al. Mar 2007 B2
7188037 Hidehira Mar 2007 B2
7221172 Dunklee May 2007 B2
7250779 Dunklee et al. Jul 2007 B2
7362115 Andrews et al. Apr 2008 B2
7501810 Dunklee Mar 2009 B2
20010002794 Draving et al. Jun 2001 A1
20010009377 Schwindt et al. Jul 2001 A1
20010010468 Gleason et al. Aug 2001 A1
20010020283 Sakaguchi Sep 2001 A1
20010024116 Draving Sep 2001 A1
20010030549 Gleason et al. Oct 2001 A1
20010043073 Montoya Nov 2001 A1
20010044152 Burnett Nov 2001 A1
20010045511 Moore et al. Nov 2001 A1
20010054906 Fujimura Dec 2001 A1
20020005728 Babson et al. Jan 2002 A1
20020008533 Ito et al. Jan 2002 A1
20020009377 Shafer Jan 2002 A1
20020009378 Obara Jan 2002 A1
20020011859 Smith et al. Jan 2002 A1
20020011863 Takahashi et al. Jan 2002 A1
20020050828 Seward, IV et al. May 2002 A1
20020066551 Stone et al. Jun 2002 A1
20020070743 Felici et al. Jun 2002 A1
20020070745 Johnson et al. Jun 2002 A1
20020075027 Hollman et al. Jun 2002 A1
20020079911 Schwindt Jun 2002 A1
20020118009 Hollman et al. Aug 2002 A1
20020118034 Laureanti Aug 2002 A1
20020149377 Hefti et al. Oct 2002 A1
20020153909 Petersen et al. Oct 2002 A1
20020163769 Brown Nov 2002 A1
20020168659 Hefti et al. Nov 2002 A1
20020180466 Hiramatsu et al. Dec 2002 A1
20020197709 Van der Weide et al. Dec 2002 A1
20030010877 Landreville et al. Jan 2003 A1
20030030822 Finarov Feb 2003 A1
20030032000 Liu et al. Feb 2003 A1
20030040004 Hefti et al. Feb 2003 A1
20030057513 Leedy Mar 2003 A1
20030062915 Arnold et al. Apr 2003 A1
20030071631 Alexander Apr 2003 A1
20030072549 Facer et al. Apr 2003 A1
20030077649 Cho et al. Apr 2003 A1
20030088180 Van Veen et al. May 2003 A1
20030119057 Gascoyne et al. Jun 2003 A1
20030139662 Seidman Jul 2003 A1
20030139790 Ingle et al. Jul 2003 A1
20030141861 Navratil et al. Jul 2003 A1
20030155939 Lutz et al. Aug 2003 A1
20030156270 Hunter Aug 2003 A1
20030170898 Gundersen et al. Sep 2003 A1
20030184332 Tomimatsu et al. Oct 2003 A1
20040015060 Samsoondar et al. Jan 2004 A1
20040021475 Ito et al. Feb 2004 A1
20040061514 Schwindt et al. Apr 2004 A1
20040066181 Thies Apr 2004 A1
20040069776 Fagrell et al. Apr 2004 A1
20040090223 Yonezawa May 2004 A1
20040095145 Boudiaf et al. May 2004 A1
20040095641 Russum et al. May 2004 A1
20040100276 Fanton May 2004 A1
20040100297 Tanioka et al. May 2004 A1
20040108847 Stoll et al. Jun 2004 A1
20040113639 Dunklee et al. Jun 2004 A1
20040113640 Cooper et al. Jun 2004 A1
20040130787 Thome-Forster et al. Jul 2004 A1
20040132222 Hembree et al. Jul 2004 A1
20040134899 Hiramatsu et al. Jul 2004 A1
20040147034 Gore et al. Jul 2004 A1
20040162689 Jamneala et al. Aug 2004 A1
20040175294 Ellison et al. Sep 2004 A1
20040186382 Modell et al. Sep 2004 A1
20040193382 Adamian et al. Sep 2004 A1
20040197771 Powers et al. Oct 2004 A1
20040199350 Blackham et al. Oct 2004 A1
20040207072 Hiramatsu et al. Oct 2004 A1
20040207424 Hollman Oct 2004 A1
20040239338 Jonsson et al. Dec 2004 A1
20040246004 Heuermann Dec 2004 A1
20040251922 Martens et al. Dec 2004 A1
20040267691 Vasudeva Dec 2004 A1
20050024069 Hayden et al. Feb 2005 A1
20050026276 Chou Feb 2005 A1
20050030047 Adamian Feb 2005 A1
20050054029 Tomimatsu et al. Mar 2005 A1
20050062533 Vice Mar 2005 A1
20050083130 Grilo Apr 2005 A1
20050099192 Dunklee et al. May 2005 A1
20050101846 Fine et al. May 2005 A1
20050156675 Rohde et al. Jul 2005 A1
20050164160 Gunter et al. Jul 2005 A1
20050165316 Lowery et al. Jul 2005 A1
20050168722 Forstner et al. Aug 2005 A1
20050174191 Brunker et al. Aug 2005 A1
20050178980 Skidmore et al. Aug 2005 A1
20050195124 Puente Baliarda et al. Sep 2005 A1
20050227503 Reitinger Oct 2005 A1
20050236587 Kodama et al. Oct 2005 A1
20050237102 Tanaka Oct 2005 A1
20060052075 Galivanche et al. Mar 2006 A1
20060114012 Reitinger Jun 2006 A1
20060155270 Hancock et al. Jul 2006 A1
20060158207 Reitinger Jul 2006 A1
20060226864 Kramer Oct 2006 A1
20070024506 Hardacker Feb 2007 A1
20070030021 Cowan et al. Feb 2007 A1
Foreign Referenced Citations (105)
Number Date Country
1083975 Mar 1994 CN
29 12 826 Oct 1980 DE
31 14 466 Mar 1982 DE
31 25 552 Nov 1982 DE
36 37 549 May 1988 DE
41 09 908 Oct 1992 DE
43 16 111 Nov 1994 DE
94 06 227 Oct 1995 DE
195 41 334 Sep 1996 DE
196 16 212 Oct 1996 DE
195 22 774 Jan 1997 DE
196 18 717 Jan 1998 DE
288 234 Mar 1999 DE
693 22 206 Apr 1999 DE
100 00 324 Jul 2001 DE
0 087 497 Sep 1983 EP
0 201 205 Dec 1986 EP
0 314 481 May 1989 EP
0 333 521 Sep 1989 EP
0 460 911 Dec 1991 EP
0 574 149 May 1993 EP
0 706 210 Apr 1996 EP
0 505 981 Jun 1998 EP
0 573 183 Jan 1999 EP
0 945 736 Sep 1999 EP
2 197 081 May 1988 GB
53-037077 Apr 1978 JP
53-052354 May 1978 JP
55-115383 Sep 1980 JP
56-007439 Jan 1981 JP
56-88333 Jul 1981 JP
57-075480 May 1982 JP
57-163035 Oct 1982 JP
62-11243 Jan 1987 JP
62-011243 Jan 1987 JP
62-51235 Mar 1987 JP
62-098634 May 1987 JP
62-107937 May 1987 JP
62-239050 Oct 1987 JP
63-108736 May 1988 JP
63-129640 Jun 1988 JP
63-143814 Jun 1988 JP
63-160355 Jul 1988 JP
63-318745 Dec 1988 JP
1-165968 Jun 1989 JP
1-178872 Jul 1989 JP
1-209380 Aug 1989 JP
1-214038 Aug 1989 JP
1-219575 Sep 1989 JP
1-296167 Nov 1989 JP
2-22836 Jan 1990 JP
2-22837 Jan 1990 JP
2-22873 Jan 1990 JP
2-124469 May 1990 JP
2-191352 Jul 1990 JP
2-220453 Sep 1990 JP
3-67187 Mar 1991 JP
3-175367 Jul 1991 JP
3-196206 Aug 1991 JP
3-228348 Oct 1991 JP
4-732 Jan 1992 JP
4-130639 May 1992 JP
4-159043 Jun 1992 JP
4-206930 Jul 1992 JP
4-340248 Nov 1992 JP
5-082631 Apr 1993 JP
5-157790 Jun 1993 JP
51-57790 Jun 1993 JP
5-166893 Jul 1993 JP
51-66893 Jul 1993 JP
6-85044 Mar 1994 JP
60-71425 Mar 1994 JP
6-102313 Apr 1994 JP
6-132709 May 1994 JP
7-005078 Jan 1995 JP
7-5197 Jan 1995 JP
7-12871 Jan 1995 JP
7-84003 Mar 1995 JP
7-273509 Oct 1995 JP
8-35987 Feb 1996 JP
8-261898 Oct 1996 JP
8-330401 Dec 1996 JP
10-116866 May 1998 JP
10-339743 Dec 1998 JP
11-023975 Jan 1999 JP
11-031724 Feb 1999 JP
2000-329664 Nov 2000 JP
2001-124676 May 2001 JP
2001-189285 Jul 2001 JP
2001-189378 Jul 2001 JP
2001-358184 Dec 2001 JP
2002-033374 Jan 2002 JP
2002164396 Jun 2002 JP
2002-203879 Jul 2002 JP
2002-243502 Aug 2002 JP
843040 Jun 1981 SU
1392603 Apr 1988 SU
WO 8000101 Jan 1980 WO
WO 8607493 Dec 1986 WO
WO 8904001 May 1989 WO
WO 0169656 Sep 2001 WO
WO 2004049395 Jun 2004 WO
WO 2004065944 Aug 2004 WO
WO 2004079299 Sep 2004 WO
WO 2005062025 Jul 2005 WO
Related Publications (1)
Number Date Country
20080042680 A1 Feb 2008 US
Continuations (5)
Number Date Country
Parent 11546827 Oct 2006 US
Child 11975221 US
Parent 10626903 Jul 2003 US
Child 11546827 US
Parent 10308847 Dec 2002 US
Child 10626903 US
Parent 10179771 Jun 2002 US
Child 10308847 US
Parent 09345571 Jun 1999 US
Child 10179771 US