Claims
- 1. A process for manufacturing a device comprising:
- obtaining a substrate with an imaging layer of resist material applied thereon that is substantially free of added acid or base, the resist material comprising a polymer with a backbone chain having pendant substituents with acid labile functional groups attached, the functional groups selected from the group consisting of alkyloxy carbonyl and alkyl, wherein at least 5% of the functional groups have been removed and replaced by hydrogen; exposing a discrete portion of the imaging layer to a dose of radiation, thereby forming an exposed region and an unexposed region wherein an acid is generated in substantially greater amounts in the exposed region than in the unexposed region; developing an image defined by the exposed and unexposed regions of the resist material in the imaging layer; and using said image for manufacturing a device.
- 2. The process of claim 1 wherein the acid labile functional groups are t-butoxycarbonyl groups.
- 3. The process of claim 1 wherein the functional groups are t-butyl groups.
- 4. The process of claim 2 wherein the polymer comprises t-butoxycarbonyloxystyrene and hydroxystyrene.
- 5. The process of claim 2 wherein the polymer comprises t-butoxycarbonylmaleimide and maleimide.
- 6. The process of claim 3 wherein the polymer comprises t-butylmethacrylate and methacrylate.
- 7. The process of claim 3 wherein the polymer comprises t-butylvinylbenzoate and vinylbenzoate.
- 8. The process of claim 1 wherein a photoacid-generator is added to the imaging layer.
Parent Case Info
This application is a continuation of application Ser. No. 08/008,029, filed on Jan. 25, 1993, abandoned.
US Referenced Citations (8)
Foreign Referenced Citations (3)
Number |
Date |
Country |
2001384 |
Apr 1990 |
CAX |
0366590 |
May 1990 |
EPX |
53-81116 |
Jul 1978 |
JPX |
Continuations (1)
|
Number |
Date |
Country |
Parent |
8029 |
Jan 1993 |
|