Claims
- 1. A production method of a photosensitive member having an organic photosensitive layer and a surface protective layer in this order on an electrically conductive substrate comprising;
- a first step of forming the organic photosensitive layer by coating a solution which includes a solvent, a binder resin and an organic photosensitive material on the electrically conductive substrate,
- a second step of mechanically wearing the organic photosensitive layer to a degree of 30 .ANG.-2 .mu.m in thickness so as to eliminate an oxidized outermost surface portion of the organic photosensitive layer, and
- a third step of forming the surface protective layer under vacuum conditions on the organic photosensitive layer.
- 2. The production method of a photosensitive member of claim 1, in which a charge generating layer is formed on the electrically conductive substrate and then a charge transporting layer is formed on the charge generating layer in the first step.
- 3. The production method of a photosensitive member of claim 1, in which a charge transporting layer is formed on the electrically conductive substrate and then a charge generating layer is formed on the charge transporting layer in the first step.
- 4. The production method of a photosensitive member of claim 1, in which:
- a charge generating material and a charge transporting material are dispersed in a resin for the formation of the photosensitive layer in the first step.
- 5. The production method of a photosensitive member of claim 1, in which the surface protective layer comprising amorphous carbon is formed on the organic photosensitive layer by a glow-discharge decomposition method in the third step.
- 6. The production method of a photosensitive member of claim 1, in which the surface protective layer comprising amorphous silicon is formed on the organic photosensitive layer by a glow-discharge decomposition method in the third step.
- 7. The production method of a photosensitive member of claim 6, in which the surface protective layer is formed with amorphous silicon carbides.
- 8. The production method of a photosensitive member of claim 1, in which inorganic oxides are deposited on the photosensitive layer under vacuum conditions for the formation of the surface protective layer.
- 9. A production method of a photosensitive member having an organic photosensitive layer and a surface protective layer in this order on an electrically conductive substrate comprising:
- a first step of forming the organic photosensitive layer by coating a solution which includes a solvent, a binder resin and an organic photosensitive material on the electrically conductive substrate,
- a second step of dissolving the organic photosensitive layer with a non-chlorinated solvent, in which 30 .ANG.-2 .mu.m in thickness of the surface of the photosensitive layer is removed, so as to eliminate an oxidized outermost surface portion of the organic photosensitive layer; and
- a third step of forming the surface protective layer under vacuum conditions on the organic photosensitive layer.
- 10. The production method of a photosensitive member of claim 9, in which the photosensitive layer is dipped in the solvent in the second step.
- 11. A production method of a photosensitive member having an organic photosensitive layer and a surface protective layer in this order on an electrically conductive substrate comprising:
- a first step of forming the organic photosensitive layer by coating a solution which includes a solvent, a binder resin and an organic photosensitive material on the electrically conductive substrate,
- a second step of leaving the organic photosensitive layer to stand in a vapor phase of a solvent for the time (t) specified by the following formula;
- Kmin.times.H(Tb-Ts).gtoreq.t.ltoreq.Kmax.times.H(Tb-Ts)
- in which
- t(sec) is the time standing in the vapor phase,
- H[J.multidot.K.sup.-1 .multidot.cm.sup.-2 ] is the heat capacity per unit area of the surface of the electronically conductive substrate,
- Tb[K] is the boiling point of the solvent,
- Ts[K] is the temperature of the electrically conductive substrate measured before the photosensitive layer is exposed to the vapor phase,
- Kmin is a proportionality factor, being 1 [J.sup.-1 .multidot.sec], and
- Kmax is a proportionality factor, being 8 [J.sup.-1 .multidot.cm.sup.2 .multidot.sec], so as to eliminate an oxidized outermost surface portion of the organic photosensitive layer; and
- a third step of forming the surface protective layer under vacuum conditions on the organic photosensitive layer.
- 12. A production method of a photosensitive member having an organic photosensitive layer and a surface protective layer in this order on an electrically conductive substrate comprising:
- a first step of forming the organic photosensitive layer by coating a solution which includes a solvent, a binder resin and an organic photosensitive material on the electrically conductive substrate,
- a second step of bombarding the organic photosensitive layer with ions, in which 30 .ANG.-2 .mu.m in thickness of the surface of the photosensitive layer is removed, so as to eliminate an oxidized outermost surface portion of the organic photosensitive layer; and
- a third step of forming the surface protective layer under vacuum conditions on the organic photosensitive layer.
- 13. The production method of a photosensitive member of claim 12, in which the bombardment is carried out in gaseous atmosphere of oxygen-containing molecules.
Priority Claims (5)
Number |
Date |
Country |
Kind |
1-291859 |
Nov 1989 |
JPX |
|
1-291860 |
Nov 1989 |
JPX |
|
1-291861 |
Nov 1989 |
JPX |
|
1-291862 |
Nov 1989 |
JPX |
|
1-312960 |
Nov 1989 |
JPX |
|
Parent Case Info
This application is a continuation of application Ser. No. 07/611,710, filed Nov. 9, 1990, now abandoned.
US Referenced Citations (8)
Continuations (1)
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Number |
Date |
Country |
Parent |
611710 |
Nov 1990 |
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