Astrileux Corporation

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La Jolla, CA, US

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Patents Grantslast 30 patents

Patents Applicationslast 30 patents

Information Patent Application
EUV PHOTOMASK ARCHITECTURES FOR PATTERNING OF INTEGRATED CIRCUITS
- Publication number 20230101021
- Publication date Mar 30, 2023
- Astrileux Corporation
- Supriya JAISWAL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK HAVING REFLECTIVE LAYER WITH NON-REFLECTIVE REGIONS
- Publication number 20200124957
- Publication date Apr 23, 2020
- Astrileux Corporation
- Supriya JAISWAL
- B82 - NANO-TECHNOLOGY

Trademarklast 30 trademarks