Astrileux Corporation

Follow

Organization

La Jolla, CA, US

Organizations

Please log in for detailed analytics

Patents Applicationslast 30 patents

Information Patent Application
EUV PHOTOMASK ARCHITECTURES FOR PATTERNING OF INTEGRATED CIRCUITS
- Publication number 20230101021
- Publication date Mar 30, 2023
- Astrileux Corporation
- Supriya JAISWAL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK HAVING REFLECTIVE LAYER WITH NON-REFLECTIVE REGIONS
- Publication number 20200124957
- Publication date Apr 23, 2020
- Astrileux Corporation
- Supriya JAISWAL
- B82 - NANO-TECHNOLOGY

NSF Awardslast 12 months

processing...

Count: 3

NSF Awards

Information NSF Award
SBIR Phase II: Next Generation High Performance EUV Photomasks.
- Award Id 1927546
- Effective date Oct 1, 2019
Information NSF Award
SBIR Phase II: Novel Technologies to Enable High Volume, Extreme Ul...
- Award Id 1457418
- Effective date Mar 1, 2015
Information NSF Award
SBIR Phase I: Novel Technologies to Enable High Volume EUV Manufact...
- Award Id 1343877
- Effective date Jan 1, 2014