Membership
Tour
Register
Log in
MES AFTY Corporation
Follow
Organization
Tokyo, JP
Organizations
Overview
Industries
People
People
Information
Transactions
Events
Impact
Please log in for detailed analytics
Patents Grants
last 30 patents
Information
Patent Grant
ECR plasma source and ECR plasma device
Patent number
7,485,204
Issue date
Feb 3, 2009
MES AFTY Corporation
Seitaro Matsuo
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR