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Akira Tokoh
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Tokyo, JP
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last 30 patents
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Patent Grant
Positive photo-sensitive resin composition comprising a photosensit...
Patent number
5,449,584
Issue date
Sep 12, 1995
Sumitomo Bakelite Company, Ltd.
Toshio Banba
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photosensitive resin composition and semiconductor apparatus using it
Patent number
5,385,808
Issue date
Jan 31, 1995
Sumitomo Bakelite Company Limited
Akira Tokoh
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Photosensitive resin composition with polyamic acid polymer
Patent number
5,238,784
Issue date
Aug 24, 1993
Sumitomo Bakelite Company Limited
Akira Tokoh
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Solvent-soluble polyimidesiloxane oligomer and process for producin...
Patent number
5,206,337
Issue date
Apr 27, 1993
Sumitomo Bakelite Company Limited
Toshiro Takeda
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...