Alessandro Cesare Callegari

Person

Yorktown Heights, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Selective nanotube growth inside vias using an ion beam
- Patent number 9,099,537
- Issue date Aug 4, 2015
- International Business Machines Corporation
- Katherina E. Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to improve nucleation of materials on graphene and carbon na...
- Patent number 8,895,352
- Issue date Nov 25, 2014
- International Business Machines Corporation
- Katherina Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to improve nucleation of materials on graphene and carbon na...
- Patent number 8,816,333
- Issue date Aug 26, 2014
- International Business Machines Corporation
- Katherina Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectric equivalent thickness and capacitance scaling for semicon...
- Patent number 8,772,116
- Issue date Jul 8, 2014
- International Business Machines Corporation
- Alessandro Callegari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Filling narrow openings using ion beam etch
- Patent number 8,497,212
- Issue date Jul 30, 2013
- GLOBALFOUNDRIES Inc.
- Katherina E. Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Field-effect transistor device having a metal gate stack with an ox...
- Patent number 8,415,677
- Issue date Apr 9, 2013
- International Business Machines Corporation
- Praneet Adusumilli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High performance CMOS circuits, and methods for fabricating same
- Patent number 8,383,483
- Issue date Feb 26, 2013
- International Business Machines Corporation
- John C. Arnold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
TiC as a thermally stable p-metal carbide on high k SiO2 gate stacks
- Patent number 8,288,237
- Issue date Oct 16, 2012
- International Business Machines Corporation
- Alessandro C. Callegari
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming metal/high-κ gate stacks with high mobility
- Patent number 8,153,514
- Issue date Apr 10, 2012
- International Business Machines Corporation
- Wanda Andreoni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual metal gate self-aligned integration
- Patent number 7,872,317
- Issue date Jan 18, 2011
- International Business Machines Corporation
- Alessandro C. Callegari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High temperature processing compatible metal gate electrode for pFE...
- Patent number 7,863,083
- Issue date Jan 4, 2011
- International Business Machines Corporation
- Ricky Amos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating a semiconductor structure including one devic...
- Patent number 7,833,849
- Issue date Nov 16, 2010
- International Business Machines Corporation
- Alessandro C. Callegari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal oxynitride as a pFET material
- Patent number 7,776,701
- Issue date Aug 17, 2010
- International Business Machines Corporation
- Alessandro C. Callegari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for composition control of a metal compound film
- Patent number 7,772,016
- Issue date Aug 10, 2010
- International Business Machines Corporation
- Russell D. Allen
- G01 - MEASURING TESTING
Information Patent Grant
DUV laser annealing and stabilization of SiCOH films
- Patent number 7,755,159
- Issue date Jul 13, 2010
- International Business Machines Corporation
- Alessandro C. Callegari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
TiC as a thermally stable p-metal carbide on high k SiO2 gate stacks
- Patent number 7,667,277
- Issue date Feb 23, 2010
- International Business Machines Corporation
- Alessandro C. Callegari
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Metal gates with low charge trapping and enhanced dielectric reliab...
- Patent number 7,611,979
- Issue date Nov 3, 2009
- International Business Machines Corporation
- Alessandro C. Callegari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual metal gate self-aligned integration
- Patent number 7,569,466
- Issue date Aug 4, 2009
- International Business Machines Corporation
- Alessandro C. Callegari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of hafnium oxide and/or zirconium oxide and fabrication...
- Patent number 7,566,938
- Issue date Jul 28, 2009
- International Business Machines Corporation
- Cyril Cabral, Jr.
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
DUV laser annealing and stabilization of SiCOH films
- Patent number 7,560,794
- Issue date Jul 14, 2009
- International Business Machines Corporation
- Alessandro C. Callegari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming HfSiN metal for n-FET applications
- Patent number 7,521,346
- Issue date Apr 21, 2009
- International Business Machines Corporation
- Alessandro C. Callegari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal oxynitride as a pFET material
- Patent number 7,436,034
- Issue date Oct 14, 2008
- International Business Machines Corporation
- Alessandro C. Callegari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of ultra-thin oxide layers by self-limiting interfacial o...
- Patent number 7,235,440
- Issue date Jun 26, 2007
- Tokyo Electron Limited
- David L O'Meara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
DUV laser annealing and stabilization of SiCOH films
- Patent number 7,223,670
- Issue date May 29, 2007
- International Business Machines Corporation
- Alessandro C. Callegari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming uniform ultra-thin oxynitride layers
- Patent number 7,202,186
- Issue date Apr 10, 2007
- Tokyo Electron Limited
- David L O'Meara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming metal/high-k gate stacks with high mobility
- Patent number 7,115,959
- Issue date Oct 3, 2006
- International Business Machines Corporation
- Wanda Andreoni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stability of ion beam generated alignment layers by surface modific...
- Patent number 7,097,884
- Issue date Aug 29, 2006
- International Business Machines Corporation
- Alessandro C. Callegari
- G02 - OPTICS
Information Patent Grant
Method of film deposition, and fabrication of structures
- Patent number 7,015,152
- Issue date Mar 21, 2006
- International Business Machines Corporation
- Alessandro C. Callegari
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition of hafnium oxide and/or zirconium oxide and fabrication...
- Patent number 6,982,230
- Issue date Jan 3, 2006
- International Business Machines Corporation
- Cyril Cabral, Jr.
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Interfacial oxidation process for high-k gate dielectric process in...
- Patent number 6,974,779
- Issue date Dec 13, 2005
- Tokyo Electron Limited
- David L O'Meara
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
DIELECTRIC EQUIVALENT THICKNESS AND CAPACITANCE SCALING FOR SEMICON...
- Publication number 20140138781
- Publication date May 22, 2014
- International Business Machines Corporation
- Alessandro CALLEGARI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method to Improve Nucleation of Materials on Graphene and Carbon Na...
- Publication number 20120235119
- Publication date Sep 20, 2012
- International Business Machines Corporation
- Katherina Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Filling Narrow Openings Using Ion Beam Etch
- Publication number 20120217590
- Publication date Aug 30, 2012
- GLOBALFOUNDRIES INC.
- Katherina E. Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FIELD-EFFECT TRANSISTOR DEVICE HAVING A METAL GATE STACK WITH AN OX...
- Publication number 20110175147
- Publication date Jul 21, 2011
- International Business Machines Corporation
- Praneet Adusumilli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE NANOTUBE GROWTH INSIDE VIAS USING AN ION BEAM
- Publication number 20110048930
- Publication date Mar 3, 2011
- International Business Machines Corporation
- Katherina E. Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method to Improve Nucleation of Materials on Graphene and Carbon Na...
- Publication number 20100301336
- Publication date Dec 2, 2010
- International Business Machines Corporation
- Katherina Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL GATES WITH LOW CHARGE TRAPPING AND ENHANCED DIELECTRIC RELIAB...
- Publication number 20100044805
- Publication date Feb 25, 2010
- International Business Machines Corporation
- Alessandro C. Callegari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH PERFORMANCE CMOS CIRCUITS, AND METHODS FOR FABRICATING SAME
- Publication number 20100041221
- Publication date Feb 18, 2010
- International Business Machines Coporation
- John C. Arnold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TiC AS A THERMALLY STABLE p-METAL CARBIDE ON HIGH k SiO2 GATE STACKS
- Publication number 20100015790
- Publication date Jan 21, 2010
- International Business Machines Corporation
- Alessandro C. Callegari
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI-DOMAIN AND IPS LIQUID-CRYSTAL DISPLAY USING DRY ALIGNMENT
- Publication number 20090316096
- Publication date Dec 24, 2009
- Alessandro Cesare Callegari
- G02 - OPTICS
Information Patent Application
DUAL METAL GATE SELF-ALIGNED INTEGRATION
- Publication number 20090283830
- Publication date Nov 19, 2009
- International Business Machines Corporation
- Alessandro C. Callegari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High Temperature Processing Compatible Metal Gate Electrode For pFE...
- Publication number 20080311745
- Publication date Dec 18, 2008
- International Business Machines Corporation
- Ricky Amos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL OXYNITRIDE AS A pFET MATERIAL
- Publication number 20080299730
- Publication date Dec 4, 2008
- International Business Machines Corporation
- Alessandro C. Callegari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING METAL/HIGH-k GATE STACKS WITH HIGH MOBILITY
- Publication number 20080293259
- Publication date Nov 27, 2008
- International Business Machines Corporation
- Wanda Andreoni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR COMPOSITION CONTROL OF A METAL COMPOUND FILM
- Publication number 20080249650
- Publication date Oct 9, 2008
- International Business Machines Corporation
- Russell D. Allen
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF FORMING HfSiN METAL FOR n-FET APPLICATIONS
- Publication number 20080245658
- Publication date Oct 9, 2008
- International Business Machines Corporation
- Alessandro C. Callegari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUV LASER ANNEALING AND STABILIZATION OF SiCOH FILMS
- Publication number 20080230875
- Publication date Sep 25, 2008
- International Business Machines Corporation
- Alessandro C. Callegari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL GATES WITH LOW CHARGE TRAPPING AND ENHANCED DIELECTRIC RELIAB...
- Publication number 20080191292
- Publication date Aug 14, 2008
- International Business Machines Corporation
- Alessandro C. Callegari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING HfSiN METAL FOR n-FET APPLICATIONS
- Publication number 20080038905
- Publication date Feb 14, 2008
- International Business Machines Corporation
- Alessandro C. Callegari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUV LASER ANNEALING AND STABILIZATION OF SiCOH FILMS
- Publication number 20070284698
- Publication date Dec 13, 2007
- International Business Machines Corporation
- Alessandro C. Callegari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High pretilt homogeneous alignment and tilted vertical alignment by...
- Publication number 20070224365
- Publication date Sep 27, 2007
- Alessandro C. Callegari
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
High performance CMOS circuits, and methods for fabricating the same
- Publication number 20070152276
- Publication date Jul 5, 2007
- International Business Machines Corporation
- John C. Arnold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High performance circuit with metal and polygate electrodes
- Publication number 20070152273
- Publication date Jul 5, 2007
- INTERNATIONAL BUNISESS MACHINES CORPORATION
- Alessandro C. Callegari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual metal gate self-aligned integration
- Publication number 20070138563
- Publication date Jun 21, 2007
- International Business Machines Corporation
- Alessandro C. Callegari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metal oxynitride as a pFET material
- Publication number 20070138578
- Publication date Jun 21, 2007
- International Business Machines Corporation
- Alessandro C. Callegari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming metal/high-k gate stacks with high mobility
- Publication number 20060289903
- Publication date Dec 28, 2006
- Wanda Andreoni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TiC as a thermally stable p-metal carbide on high k SiO2 gate stacks
- Publication number 20060163630
- Publication date Jul 27, 2006
- International Business Machines Corporation
- Alessandro C. Callegari
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of forming HfSiN metal for n-FET applications
- Publication number 20060151846
- Publication date Jul 13, 2006
- International Business Machines Corporation
- Alessandro C. Callegari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion gun deposition and alignment for liquid-crystal applications
- Publication number 20060150912
- Publication date Jul 13, 2006
- INTERNATIONAL BUSINESS MACHINES CORP.
- Alessandro Cesare Callegari
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Deposition of hafnium oxide and/or zirconium oxide and fabrication...
- Publication number 20060138603
- Publication date Jun 29, 2006
- International Business Machines Corporation
- Cyril Cabral
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Alessandro Cesare Callegari

Person

Patents Grantslast 30 patents

Selective nanotube growth inside vias using an ion beam

Method to improve nucleation of materials on graphene and carbon na...

Method to improve nucleation of materials on graphene and carbon na...

Dielectric equivalent thickness and capacitance scaling for semicon...

Filling narrow openings using ion beam etch

Field-effect transistor device having a metal gate stack with an ox...

High performance CMOS circuits, and methods for fabricating same

TiC as a thermally stable p-metal carbide on high k SiO2 gate stacks

Method of forming metal/high-κ gate stacks with high mobility

Dual metal gate self-aligned integration

High temperature processing compatible metal gate electrode for pFE...

Method of fabricating a semiconductor structure including one devic...

Metal oxynitride as a pFET material

Method for composition control of a metal compound film

DUV laser annealing and stabilization of SiCOH films

TiC as a thermally stable p-metal carbide on high k SiO2 gate stacks

Metal gates with low charge trapping and enhanced dielectric reliab...

Dual metal gate self-aligned integration

Deposition of hafnium oxide and/or zirconium oxide and fabrication...

DUV laser annealing and stabilization of SiCOH films

Method of forming HfSiN metal for n-FET applications

Metal oxynitride as a pFET material

Formation of ultra-thin oxide layers by self-limiting interfacial o...

DUV laser annealing and stabilization of SiCOH films

Method of forming uniform ultra-thin oxynitride layers

Method of forming metal/high-k gate stacks with high mobility

Stability of ion beam generated alignment layers by surface modific...

Method of film deposition, and fabrication of structures

Deposition of hafnium oxide and/or zirconium oxide and fabrication...

Interfacial oxidation process for high-k gate dielectric process in...

Patents Applicationslast 30 patents

DIELECTRIC EQUIVALENT THICKNESS AND CAPACITANCE SCALING FOR SEMICON...

Method to Improve Nucleation of Materials on Graphene and Carbon Na...

Filling Narrow Openings Using Ion Beam Etch

FIELD-EFFECT TRANSISTOR DEVICE HAVING A METAL GATE STACK WITH AN OX...

SELECTIVE NANOTUBE GROWTH INSIDE VIAS USING AN ION BEAM

Method to Improve Nucleation of Materials on Graphene and Carbon Na...

METAL GATES WITH LOW CHARGE TRAPPING AND ENHANCED DIELECTRIC RELIAB...

HIGH PERFORMANCE CMOS CIRCUITS, AND METHODS FOR FABRICATING SAME

TiC AS A THERMALLY STABLE p-METAL CARBIDE ON HIGH k SiO2 GATE STACKS

MULTI-DOMAIN AND IPS LIQUID-CRYSTAL DISPLAY USING DRY ALIGNMENT

DUAL METAL GATE SELF-ALIGNED INTEGRATION

High Temperature Processing Compatible Metal Gate Electrode For pFE...

METAL OXYNITRIDE AS A pFET MATERIAL

METHOD OF FORMING METAL/HIGH-k GATE STACKS WITH HIGH MOBILITY

METHOD FOR COMPOSITION CONTROL OF A METAL COMPOUND FILM

METHOD OF FORMING HfSiN METAL FOR n-FET APPLICATIONS

DUV LASER ANNEALING AND STABILIZATION OF SiCOH FILMS

METAL GATES WITH LOW CHARGE TRAPPING AND ENHANCED DIELECTRIC RELIAB...

METHOD OF FORMING HfSiN METAL FOR n-FET APPLICATIONS

DUV LASER ANNEALING AND STABILIZATION OF SiCOH FILMS

High pretilt homogeneous alignment and tilted vertical alignment by...

High performance CMOS circuits, and methods for fabricating the same

High performance circuit with metal and polygate electrodes

Dual metal gate self-aligned integration

Metal oxynitride as a pFET material

Method of forming metal/high-k gate stacks with high mobility

TiC as a thermally stable p-metal carbide on high k SiO2 gate stacks

Method of forming HfSiN metal for n-FET applications

Ion gun deposition and alignment for liquid-crystal applications

Deposition of hafnium oxide and/or zirconium oxide and fabrication...