Emir Gurer

Person

Scotvalley, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Yield and line width performance for liquid polymers and other mate...
- Patent number 7,625,692
- Issue date Dec 1, 2009
- ASML Holding N.V.
- Emir Gurer
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Yield and line width performance for liquid polymers and other mate...
- Patent number 7,255,975
- Issue date Aug 14, 2007
- ASML Holding N.V.
- Emir Gurer
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Techniques for analyzing data generated by instruments
- Patent number 7,231,324
- Issue date Jun 12, 2007
- ReVera Incorporated
- James Orrock
- G01 - MEASURING TESTING
Information Patent Grant
Yield and line width performance for liquid polymers and other mate...
- Patent number 7,208,262
- Issue date Apr 24, 2007
- ASML Holdings N.V.
- Emir Gurer
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method of uniformly coating a substrate
- Patent number 7,030,039
- Issue date Apr 18, 2006
- ASML Holding N.V.
- Emir Gurer
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method of uniformly coating a substrate
- Patent number 7,018,943
- Issue date Mar 28, 2006
- ASML Holding N.V.
- Gurer Emir
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method of uniformly coating a substrate
- Patent number 6,977,098
- Issue date Dec 20, 2005
- ASML Holding N.V.
- Emir Gurer
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Plasma deposition of spin chucks to reduce contamination of Silicon...
- Patent number 6,955,720
- Issue date Oct 18, 2005
- ASML Holding N.V.
- Emir Gurer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Environment exchange control for material on a wafer surface
- Patent number 6,911,091
- Issue date Jun 28, 2005
- ASML Netherlands B.V.
- Emir Gurer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Environment exchange control for material on a wafer surface
- Patent number 6,844,027
- Issue date Jan 18, 2005
- ASML Holding N.V.
- Emir Gurer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Environment exchange control for material on a wafer surface
- Patent number 6,780,461
- Issue date Aug 24, 2004
- ASML Holding N.V.
- Emir Gurer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Yield and line width performance for liquid polymers and other mate...
- Patent number 6,669,779
- Issue date Dec 30, 2003
- ASML Holding N.V.
- Emir Gurer
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method for two dimensional adaptive process control of critical dim...
- Patent number 6,662,466
- Issue date Dec 16, 2003
- ASML Holdings, N.V.
- Emir Gurer
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Environment exchange control for material on a wafer surface
- Patent number 6,468,586
- Issue date Oct 22, 2002
- Silicon Valley Group, Inc.
- Emir Gurer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for two dimensional adaptive process control of critical dim...
- Patent number 6,327,793
- Issue date Dec 11, 2001
- Silicon Valley Group
- Emir Gurer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Environment exchange control for material on a wafer surface
- Patent number 6,254,936
- Issue date Jul 3, 2001
- Silicon Valley Group, Inc.
- Emir Gurer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Yield and line width performance for liquid polymers and other mate...
- Patent number 6,248,171
- Issue date Jun 19, 2001
- Silicon Valley Group, Inc.
- Emir Gurer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plasma deposition of spin chucks to reduce contamination of silicon...
- Patent number 6,242,364
- Issue date Jun 5, 2001
- Silicon Valley Group, Inc.
- Emir Gurer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of uniformly coating a substrate
- Patent number 6,238,735
- Issue date May 29, 2001
- Silicon Valley Group, Inc.
- Robert P. Mandal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for adaptive process control of critical dimen...
- Patent number 6,177,133
- Issue date Jan 23, 2001
- Silicon Valley Group, Inc.
- Emir Gurer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist coating process control with solvent vapor sensor
- Patent number 6,027,760
- Issue date Feb 22, 2000
- Emir Gurer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of uniformly coating a substrate
- Patent number 5,670,210
- Issue date Sep 23, 1997
- Silicon Valley Group, Inc.
- Robert P. Mandal
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Yield and line width performance for liquid polymers and other mate...
- Publication number 20070089671
- Publication date Apr 26, 2007
- Emir Gurer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Yield and line width performance for liquid polymers and other mate...
- Publication number 20070059651
- Publication date Mar 15, 2007
- Emir Gurer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Techniques for analyzing data generated by instruments
- Publication number 20060247899
- Publication date Nov 2, 2006
- James Orrock
- G01 - MEASURING TESTING
Information Patent Application
Yield and line width performance for liquid polymers and other mate...
- Publication number 20050095368
- Publication date May 5, 2005
- Emir Gurer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Yield and line width performance for liquid polymers and other mate...
- Publication number 20040062876
- Publication date Apr 1, 2004
- Emir Gurer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Environment exchange control for material on a wafer surface
- Publication number 20030190427
- Publication date Oct 9, 2003
- Emir Gurer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Environment exchange control for material on a wafer surface
- Publication number 20030010289
- Publication date Jan 16, 2003
- Emir Gurer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Yield and line width performance for liquid polymers and other mate...
- Publication number 20020187442
- Publication date Dec 12, 2002
- Emir Gurer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of uniformly coating a substrate
- Publication number 20020127334
- Publication date Sep 12, 2002
- Emir Gurer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for two dimensional adaptive process control of critical dim...
- Publication number 20020112370
- Publication date Aug 22, 2002
- Emir Gurer
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
Method of uniformly coating a substrate
- Publication number 20020098283
- Publication date Jul 25, 2002
- Emir Gurer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of uniformly coating a substrate
- Publication number 20020004100
- Publication date Jan 10, 2002
- Emir Gurer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma deposition of spin chucks to reduce contamination of silicon...
- Publication number 20010044217
- Publication date Nov 22, 2001
- Emir Gurer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Person

Patents Grantslast 30 patents

Yield and line width performance for liquid polymers and other mate...

Yield and line width performance for liquid polymers and other mate...

Techniques for analyzing data generated by instruments

Yield and line width performance for liquid polymers and other mate...

Method of uniformly coating a substrate

Method of uniformly coating a substrate

Method of uniformly coating a substrate

Plasma deposition of spin chucks to reduce contamination of Silicon...

Environment exchange control for material on a wafer surface

Environment exchange control for material on a wafer surface

Environment exchange control for material on a wafer surface

Yield and line width performance for liquid polymers and other mate...

Method for two dimensional adaptive process control of critical dim...

Environment exchange control for material on a wafer surface

Method for two dimensional adaptive process control of critical dim...

Environment exchange control for material on a wafer surface

Yield and line width performance for liquid polymers and other mate...

Plasma deposition of spin chucks to reduce contamination of silicon...

Method of uniformly coating a substrate

Method and apparatus for adaptive process control of critical dimen...

Photoresist coating process control with solvent vapor sensor

Method of uniformly coating a substrate

Patents Applicationslast 30 patents

Yield and line width performance for liquid polymers and other mate...

Yield and line width performance for liquid polymers and other mate...

Techniques for analyzing data generated by instruments

Yield and line width performance for liquid polymers and other mate...

Yield and line width performance for liquid polymers and other mate...

Environment exchange control for material on a wafer surface

Environment exchange control for material on a wafer surface

Yield and line width performance for liquid polymers and other mate...

Method of uniformly coating a substrate

Method for two dimensional adaptive process control of critical dim...

Method of uniformly coating a substrate

Method of uniformly coating a substrate

Plasma deposition of spin chucks to reduce contamination of silicon...