Fumikatsu Uesawa

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Kanagawa, JP

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Patents Grantslast 30 patents

Information Patent Grant
Method of manufacturing a semiconductor apparatus with a tapered ap...
- Patent number 7,517,638
- Issue date Apr 14, 2009
- Sony Corporation
- Fumikatsu Uesawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor apparatus with a tapered ap...
- Patent number 6,953,746
- Issue date Oct 11, 2005
- Sony Corporation
- Fumikatsu Uesawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor apparatus with a tapered ap...
- Patent number 6,716,747
- Issue date Apr 6, 2004
- Sony Corporation
- Fumikatsu Uesawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming resist pattern
- Patent number 6,177,233
- Issue date Jan 23, 2001
- Sony Corporation
- Fumikatsu Uesawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask and method of manufacturing the same
- Patent number 5,397,663
- Issue date Mar 14, 1995
- Sony Corporation
- Fumikatsu Uesawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Method of manufacturing a semiconductor apparatus with a tapered ap...
- Publication number 20050176257
- Publication date Aug 11, 2005
- Sony Corporation
- Fumikatsu Uesawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing a semiconductor apparatus with a tapered ap...
- Publication number 20040063323
- Publication date Apr 1, 2004
- Sony Corporation
- Fumikatsu Uesawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Manufacturing method for semiconductor apparatus
- Publication number 20030003725
- Publication date Jan 2, 2003
- Fumikatsu Uesawa
- H01 - BASIC ELECTRIC ELEMENTS