Haruhiko Komoriya

Person

Saitama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Composition for forming films, film produced from said composition,...
- Patent number 9,966,575
- Issue date May 8, 2018
- Central Glass Company, Limited
- Haruhiko Komoriya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Film-forming composition, film formed thereby, and method for manuf...
- Patent number 9,842,993
- Issue date Dec 12, 2017
- Central Glass Company, Limited
- Yoshiharu Terui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymerizable fluoromonomer, fluoropolymer, resist material, and me...
- Patent number 9,678,425
- Issue date Jun 13, 2017
- Central Glass Company, Limited
- Haruhiko Komoriya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymerizable fluoromonomer, fluoropolymer, resist material, and me...
- Patent number 9,678,426
- Issue date Jun 13, 2017
- Central Glass Company, Limited
- Haruhiko Komoriya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluorine-containing compounds and their polymers useful for anti-re...
- Patent number 9,650,451
- Issue date May 16, 2017
- Central Glass Company, Limited
- Shinichi Sumida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for producing compound containing BIS (perfluoroalkylsulfony...
- Patent number 9,512,070
- Issue date Dec 6, 2016
- Central Glass Company, Limited
- Arata Takahashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Proton conducting polymer membrane, membrane-electrode assembly usi...
- Patent number 9,318,764
- Issue date Apr 19, 2016
- Central Glass Company, Limited
- Toru Tanaka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive-type resist composition
- Patent number 9,310,682
- Issue date Apr 12, 2016
- Central Glass Company, Limited
- Yoshiharu Terui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Antibacterial agent, substrate surface treatment method using the s...
- Patent number 9,204,652
- Issue date Dec 8, 2015
- Central Glass Company, Limited
- Haruhiko Komoriya
- A01 - AGRICULTURE FORESTRY ANIMAL HUSBANDRY HUNTING TRAPPING FISHING
Information Patent Grant
Solid electrolyte film, and method for producing same
- Patent number 9,171,655
- Issue date Oct 27, 2015
- Central Glass Company, Limited
- Katsutoshi Suzuki
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Fluorine-containing polymer and anti-static agent wherein same is used
- Patent number 8,822,588
- Issue date Sep 2, 2014
- Central Glass Company, Limited
- Yoshiharu Terui
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polymerizable fluoromonomer, fluoropolymer, resist material, and me...
- Patent number 8,716,385
- Issue date May 6, 2014
- Central Glass Company, Limited
- Haruhiko Komoriya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Fluorine-containing compounds and their polymers useful for anti-re...
- Patent number 8,691,491
- Issue date Apr 8, 2014
- Central Glass Company, Limited
- Shinichi Sumida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Top coating composition
- Patent number 8,663,903
- Issue date Mar 4, 2014
- Central Glass Company, Limited
- Kazuhiko Maeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Top coat composition
- Patent number 8,592,508
- Issue date Nov 26, 2013
- Central Glass Company, Limited
- Haruhiko Komoriya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Solid electrolyte membrane for fuel cell and process for producing...
- Patent number 8,445,551
- Issue date May 21, 2013
- Central Glass Company, Ltd.
- Yoshihiko Obara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-containing polymer coating composition, method for forming...
- Patent number 8,211,612
- Issue date Jul 3, 2012
- Central Glass Company, Limited
- Kazuhiko Maeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluorine-containing cyclic compound, fluorine-containing polymer co...
- Patent number 8,115,036
- Issue date Feb 14, 2012
- Central Glass Company, Limited
- Haruhiko Komoriya
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-containing compounds and their polymers useful for anti-re...
- Patent number 7,947,422
- Issue date May 24, 2011
- Central Glass Company, Limited
- Shinichi Sumida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropol...
- Patent number 7,781,602
- Issue date Aug 24, 2010
- Central Glass Company, Limited
- Haruhiko Komoriya
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-containing cyclic compound, fluorine-containing polymer co...
- Patent number 7,736,835
- Issue date Jun 15, 2010
- Central Glass Company, Limited
- Haruhiko Komoriya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Ester compound, polymer, resist composition, and patterning process
- Patent number 7,666,967
- Issue date Feb 23, 2010
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist protective coating material and patterning process
- Patent number 7,569,323
- Issue date Aug 4, 2009
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymer, resist composition and patterning process
- Patent number 7,488,567
- Issue date Feb 10, 2009
- Panasonic Corporation
- Yuji Harada
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Transparent fluorine-containing copolymer
- Patent number 7,417,100
- Issue date Aug 26, 2008
- Central Glass Company, Limited
- Haruhiko Komoriya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Top coat composition
- Patent number 7,402,626
- Issue date Jul 22, 2008
- Central Glass Company, Limited
- Kazuhiko Maeda
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Fluorine-containing allyl ether compounds, their copolymers, and re...
- Patent number 7,399,815
- Issue date Jul 15, 2008
- Central Glass Company, Limited
- Satoru Kobayashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymer, resist composition and patterning process
- Patent number 7,378,218
- Issue date May 27, 2008
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymer, resist protective coating material, and patterning process
- Patent number 7,354,693
- Issue date Apr 8, 2008
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymerizable ester compounds
- Patent number 7,276,623
- Issue date Oct 2, 2007
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Film-Forming Composition, Film Formed Thereby, and Method for Manuf...
- Publication number 20160181531
- Publication date Jun 23, 2016
- Central Glass Company, Limited
- Yoshiharu TERUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Composition for Forming Films, Film Produced from Said Composition,...
- Publication number 20160164047
- Publication date Jun 9, 2016
- Central Glass Company, Limited
- Haruhiko KOMORIYA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Method for Producing Compound Containing BIS (Perfluoroalkylsulfony...
- Publication number 20150266816
- Publication date Sep 24, 2015
- Central Glass Company, Limited
- Arata Takahashi
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Polymerizable Fluoromonomer, Fluoropolymer, Resist Material, and Me...
- Publication number 20140220490
- Publication date Aug 7, 2014
- Central Glass Company, Limited
- Haruhiko KOMORIYA
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Polymerizable Fluoromonomer, Fluoropolymer, Resist Material, and Me...
- Publication number 20140221589
- Publication date Aug 7, 2014
- Central Glass Company, Limited
- Haruhiko KOMORIYA
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Fluorine-Containing Compounds and Their Polymers Useful for Anti-Re...
- Publication number 20140171584
- Publication date Jun 19, 2014
- Central Glass Company, Limited
- Shinichi Sumida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Positive-Type Resist Composition
- Publication number 20140134542
- Publication date May 15, 2014
- Central Glass Company, Limited
- Yoshiharu Terui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Proton Conducting Polymer Membrane, Membrane-Electrode Assembly Usi...
- Publication number 20140023953
- Publication date Jan 23, 2014
- Central Glass Company, Limited
- Toru Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Water Repellent Additive for Immersion Resist
- Publication number 20130216960
- Publication date Aug 22, 2013
- Central Glass Company, Limited
- Kazuhiko Maeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Antibacterial Agent, Substrate Surface Treatment Method Using The S...
- Publication number 20130189220
- Publication date Jul 25, 2013
- Central Glass Company, Limited
- Haruhiko Komoriya
- A01 - AGRICULTURE FORESTRY ANIMAL HUSBANDRY HUNTING TRAPPING FISHING
Information Patent Application
Solid Electrolyte Film, and Method for Producing Same
- Publication number 20120301811
- Publication date Nov 29, 2012
- Central Glass Company, Limited
- Katsutoshi Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Solid Electrolyte Membrane for Fuel Cell and Process for Producing...
- Publication number 20120142791
- Publication date Jun 7, 2012
- Central Glass Company, Limited
- Yoshihiko Obara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Water Repellent Additive for Immersion Resist
- Publication number 20120064459
- Publication date Mar 15, 2012
- Central Glass Company, Limited
- Kazuhiko Maeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Top Coating Composition
- Publication number 20120040294
- Publication date Feb 16, 2012
- Central Glass Company, Limited
- Kazuhiko Maeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Top Coat Composition
- Publication number 20110245395
- Publication date Oct 6, 2011
- Central Glass Company, Limited
- Haruhiko Komoriya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polymerizable Fluoromonomer, Fluoropolymer, Resist Material, and Me...
- Publication number 20110244188
- Publication date Oct 6, 2011
- Central Glass Company , Limited
- Haruhiko Komoriya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Fluorine-Containing Compounds and their Polymers Useful for Anti-Re...
- Publication number 20110196121
- Publication date Aug 11, 2011
- Central Glass Company, Limited
- Shinichi Sumida
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Fluorine-Containing Polymer and Anti-Static Agent Wherein Same is Used
- Publication number 20110065857
- Publication date Mar 17, 2011
- Central Glass Company, Limited
- Yoshiharu Terui
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Fluorine-Containing Cyclic Compound, Fluorine-Containing Polymer Co...
- Publication number 20100204422
- Publication date Aug 12, 2010
- Central Glass Company, Limited
- Haruhiko Komoriya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Fluorinated Cyclic Compound, Polymerizable Fluoromonomer, Fluoropol...
- Publication number 20080194764
- Publication date Aug 14, 2008
- Central Glass Company Limited
- Haruhiko KOMORIYA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Fluorine-Containing Cyclic Compound, Fluorine-Containing Polymer Co...
- Publication number 20080003517
- Publication date Jan 3, 2008
- Central Glass Company, Limited
- Haruhiko Komoriya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Novel ester compound, polymer, resist composition, and patterning p...
- Publication number 20070128555
- Publication date Jun 7, 2007
- Central Glass Co., Ltd.
- Yuji Harada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Fluorine-containing polymer coating composition, method for forming...
- Publication number 20070105044
- Publication date May 10, 2007
- Central Glass Company, Limited
- Kazuhiko Maeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process for producing top coat film used in lithography
- Publication number 20070087125
- Publication date Apr 19, 2007
- Central Glass Company, Limited
- Kazuhiko Maeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist protective coating material and patterning process
- Publication number 20070026341
- Publication date Feb 1, 2007
- SHIN-ETSU CHEMICAL CO., LTD.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Cyclic fluorine compounds, polymerizable fluoromonomers, fluoropoly...
- Publication number 20060270864
- Publication date Nov 30, 2006
- Shinichi Sumida
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Novel polymerizable ester compounds
- Publication number 20060269870
- Publication date Nov 30, 2006
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polymer, resist composition and patterning process
- Publication number 20060269871
- Publication date Nov 30, 2006
- MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- Yuji Harada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Fluorine-containing allyl ether compounds, their copolymers, and re...
- Publication number 20060264592
- Publication date Nov 23, 2006
- Central Glass Company, Limited
- Satoru Kobayashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Fluorine-containing polymerizable monomers, fluorine-containing pol...
- Publication number 20060194143
- Publication date Aug 31, 2006
- Shinichi Sumida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Haruhiko Komoriya

Person

Patents Grantslast 30 patents

Composition for forming films, film produced from said composition,...

Film-forming composition, film formed thereby, and method for manuf...

Polymerizable fluoromonomer, fluoropolymer, resist material, and me...

Polymerizable fluoromonomer, fluoropolymer, resist material, and me...

Fluorine-containing compounds and their polymers useful for anti-re...

Method for producing compound containing BIS (perfluoroalkylsulfony...

Proton conducting polymer membrane, membrane-electrode assembly usi...

Positive-type resist composition

Antibacterial agent, substrate surface treatment method using the s...

Solid electrolyte film, and method for producing same

Fluorine-containing polymer and anti-static agent wherein same is used

Polymerizable fluoromonomer, fluoropolymer, resist material, and me...

Fluorine-containing compounds and their polymers useful for anti-re...

Top coating composition

Top coat composition

Solid electrolyte membrane for fuel cell and process for producing...

Fluorine-containing polymer coating composition, method for forming...

Fluorine-containing cyclic compound, fluorine-containing polymer co...

Fluorine-containing compounds and their polymers useful for anti-re...

Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropol...

Fluorine-containing cyclic compound, fluorine-containing polymer co...

Ester compound, polymer, resist composition, and patterning process

Resist protective coating material and patterning process

Polymer, resist composition and patterning process

Transparent fluorine-containing copolymer

Top coat composition

Fluorine-containing allyl ether compounds, their copolymers, and re...

Polymer, resist composition and patterning process

Polymer, resist protective coating material, and patterning process

Polymerizable ester compounds

Patents Applicationslast 30 patents

Film-Forming Composition, Film Formed Thereby, and Method for Manuf...

Composition for Forming Films, Film Produced from Said Composition,...

Method for Producing Compound Containing BIS (Perfluoroalkylsulfony...

Polymerizable Fluoromonomer, Fluoropolymer, Resist Material, and Me...

Polymerizable Fluoromonomer, Fluoropolymer, Resist Material, and Me...

Fluorine-Containing Compounds and Their Polymers Useful for Anti-Re...

Positive-Type Resist Composition

Proton Conducting Polymer Membrane, Membrane-Electrode Assembly Usi...

Water Repellent Additive for Immersion Resist

Antibacterial Agent, Substrate Surface Treatment Method Using The S...

Solid Electrolyte Film, and Method for Producing Same

Solid Electrolyte Membrane for Fuel Cell and Process for Producing...

Water Repellent Additive for Immersion Resist

Top Coating Composition

Top Coat Composition

Polymerizable Fluoromonomer, Fluoropolymer, Resist Material, and Me...

Fluorine-Containing Compounds and their Polymers Useful for Anti-Re...

Fluorine-Containing Polymer and Anti-Static Agent Wherein Same is Used

Fluorine-Containing Cyclic Compound, Fluorine-Containing Polymer Co...

Fluorinated Cyclic Compound, Polymerizable Fluoromonomer, Fluoropol...

Fluorine-Containing Cyclic Compound, Fluorine-Containing Polymer Co...

Novel ester compound, polymer, resist composition, and patterning p...

Fluorine-containing polymer coating composition, method for forming...

Process for producing top coat film used in lithography

Resist protective coating material and patterning process

Cyclic fluorine compounds, polymerizable fluoromonomers, fluoropoly...

Novel polymerizable ester compounds

Polymer, resist composition and patterning process

Fluorine-containing allyl ether compounds, their copolymers, and re...

Fluorine-containing polymerizable monomers, fluorine-containing pol...