Jeffrey B. Miller

Person

West Chester, PA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method of making polishing layer for chemical mechanical polishing pad
- Patent number 10,144,115
- Issue date Dec 4, 2018
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- David Michael Veneziale
- B24 - GRINDING POLISHING
Information Patent Grant
Method of making polishing layer for chemical mechanical polishing pad
- Patent number 10,105,825
- Issue date Oct 23, 2018
- Rohm and Haas Electronics Materials CMP Holdings, Inc.
- David Michael Veneziale
- B24 - GRINDING POLISHING
Information Patent Grant
Method of making composite polishing layer for chemical mechanical...
- Patent number 10,092,998
- Issue date Oct 9, 2018
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Method of making composite polishing layer for chemical mechanical...
- Patent number 10,011,002
- Issue date Jul 3, 2018
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Controlled-porosity method for forming polishing pad
- Patent number 10,005,172
- Issue date Jun 26, 2018
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Yuhua Tong
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Chemical mechanical polishing pad and method of making same
- Patent number 9,776,300
- Issue date Oct 3, 2017
- Rohm and Haas Electronic Materials CMP Holdings Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing pad composite polishing layer formula...
- Patent number 9,630,293
- Issue date Apr 25, 2017
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Chemical mechanical polishing pad and method of making same
- Patent number 9,586,305
- Issue date Mar 7, 2017
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Method of manufacturing grooved chemical mechanical polishing layers
- Patent number 9,034,063
- Issue date May 19, 2015
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Jeffrey James Hendron
- B24 - GRINDING POLISHING
Information Patent Grant
Method of manufacturing chemical mechanical polishing layers having...
- Patent number 8,986,585
- Issue date Mar 24, 2015
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Brian T. Cantrell
- B24 - GRINDING POLISHING
Information Patent Grant
Method of manufacturing chemical mechanical polishing layers
- Patent number 8,709,114
- Issue date Apr 29, 2014
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Brian T. Cantrell
- B24 - GRINDING POLISHING
Information Patent Grant
Method of manufacturing chemical mechanical polishing layers
- Patent number 8,444,727
- Issue date May 21, 2013
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Kathleen McHugh
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
METHODS FOR MAKING CHEMICAL MECHANICAL PLANARIZATION (CMP) POLISHIN...
- Publication number 20180169827
- Publication date Jun 21, 2018
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Adam P. Smith
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING PAD AND METHOD OF MAKING SAME
- Publication number 20160379840
- Publication date Dec 29, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING PAD AND METHOD OF MAKING SAME
- Publication number 20160375543
- Publication date Dec 29, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- G02 - OPTICS
Information Patent Application
CONTROLLED-POROSITY METHOD FOR FORMING POLISHING PAD
- Publication number 20160375550
- Publication date Dec 29, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Yuhua Tong
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
METHOD OF MAKING POLISHING LAYER FOR CHEMICAL MECHANICAL POLISHING PAD
- Publication number 20160375553
- Publication date Dec 29, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- David Michael Veneziale
- B24 - GRINDING POLISHING
Information Patent Application
METHOD OF MAKING COMPOSITE POLISHING LAYER FOR CHEMICAL MECHANICAL...
- Publication number 20160375552
- Publication date Dec 29, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING PAD COMPOSITE POLISHING LAYER FORMULA...
- Publication number 20160375545
- Publication date Dec 29, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MAKING COMPOSITE POLISHING LAYER FOR CHEMICAL MECHANICAL...
- Publication number 20160375554
- Publication date Dec 29, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Application
METHOD OF MAKING POLISHING LAYER FOR CHEMICAL MECHANICAL POLISHING PAD
- Publication number 20160375555
- Publication date Dec 29, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- David Michael Veneziale
- B24 - GRINDING POLISHING
Information Patent Application
Method of manufacturing grooved chemical mechanical polishing layers
- Publication number 20140083018
- Publication date Mar 27, 2014
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Jeffrey James Hendron
- B24 - GRINDING POLISHING
Information Patent Application
Method Of Manufacturing Chemical Mechanical Polishing Layers Having...
- Publication number 20130247477
- Publication date Sep 26, 2013
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Brian T. Cantrell
- B24 - GRINDING POLISHING
Information Patent Application
Method Of Manufacturing Chemical Mechanical Polishing Layers
- Publication number 20130247476
- Publication date Sep 26, 2013
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Brian T. Cantrell
- B24 - GRINDING POLISHING

Jeffrey B. Miller

Person

Patents Grantslast 30 patents

Method of making polishing layer for chemical mechanical polishing pad

Method of making polishing layer for chemical mechanical polishing pad

Method of making composite polishing layer for chemical mechanical...

Method of making composite polishing layer for chemical mechanical...

Controlled-porosity method for forming polishing pad

Chemical mechanical polishing pad and method of making same

Chemical mechanical polishing pad composite polishing layer formula...

Chemical mechanical polishing pad and method of making same

Method of manufacturing grooved chemical mechanical polishing layers

Method of manufacturing chemical mechanical polishing layers having...

Method of manufacturing chemical mechanical polishing layers

Method of manufacturing chemical mechanical polishing layers

Patents Applicationslast 30 patents

METHODS FOR MAKING CHEMICAL MECHANICAL PLANARIZATION (CMP) POLISHIN...

CHEMICAL MECHANICAL POLISHING PAD AND METHOD OF MAKING SAME

CHEMICAL MECHANICAL POLISHING PAD AND METHOD OF MAKING SAME

CONTROLLED-POROSITY METHOD FOR FORMING POLISHING PAD

METHOD OF MAKING POLISHING LAYER FOR CHEMICAL MECHANICAL POLISHING PAD

METHOD OF MAKING COMPOSITE POLISHING LAYER FOR CHEMICAL MECHANICAL...

CHEMICAL MECHANICAL POLISHING PAD COMPOSITE POLISHING LAYER FORMULA...

METHOD OF MAKING COMPOSITE POLISHING LAYER FOR CHEMICAL MECHANICAL...

METHOD OF MAKING POLISHING LAYER FOR CHEMICAL MECHANICAL POLISHING PAD

Method of manufacturing grooved chemical mechanical polishing layers

Method Of Manufacturing Chemical Mechanical Polishing Layers Having...

Method Of Manufacturing Chemical Mechanical Polishing Layers