Joseph Mattia

Person

Framingham, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Cholate photoacid generators and photoresists comprising same
- Patent number 10,809,616
- Issue date Oct 20, 2020
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Cholate photoacid generators and photoresists comprising same
- Patent number 9,671,689
- Issue date Jun 6, 2017
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition
- Patent number 9,507,259
- Issue date Nov 29, 2016
- Rohm and Haas Electronic Materials LLC
- Mingqi Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoacid generators and photoresists comprising same
- Patent number 9,255,079
- Issue date Feb 9, 2016
- Rohm and Haas Electronic Materials, LLC
- Mingqi Li
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Monomers, polymers, methods of synthesis thereof and photoresist co...
- Patent number 7,022,454
- Issue date Apr 4, 2006
- Shipley Company, L.L.C.
- George G. Barclay
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Copolymers and photoresist compositions comprising same
- Patent number 6,849,381
- Issue date Feb 1, 2005
- Shipley Company, L.L.C.
- George G. Barclay
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Copolymers and photoresist compositions comprising same
- Patent number 6,777,157
- Issue date Aug 17, 2004
- Shipley Company, L.L.C.
- George G. Barclay
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
CHOLATE PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME
- Publication number 20170285470
- Publication date Oct 5, 2017
- Rohm and Haas Electronic Materials L.L.C.
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME
- Publication number 20160124304
- Publication date May 5, 2016
- Rohm and Haas Electronic Materials, L.L.C.
- Mingqi Li
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTORESIST COMPOSITION
- Publication number 20130137038
- Publication date May 30, 2013
- DOW GLOBAL TECHNOLOGIES LLC
- Mingqi Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME
- Publication number 20110250538
- Publication date Oct 13, 2011
- Rohm and Haas Electronic Materials LLC
- Mingqi LI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
CHOLATE PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME
- Publication number 20110250537
- Publication date Oct 13, 2011
- Rohm and Haas Electronic Materials L.L.C.
- Emad AQAD
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Novel copolymers and photoresist compositions comprising same
- Publication number 20030215742
- Publication date Nov 20, 2003
- George G. Barclay
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Novel monomers, polymers, methods of synthesis thereof and photores...
- Publication number 20020013448
- Publication date Jan 31, 2002
- Shipley Company, L.L.C.
- George G. Barclay
- C07 - ORGANIC CHEMISTRY

Joseph Mattia

Person

Patents Grantslast 30 patents

Cholate photoacid generators and photoresists comprising same

Cholate photoacid generators and photoresists comprising same

Photoresist composition

Photoacid generators and photoresists comprising same

Monomers, polymers, methods of synthesis thereof and photoresist co...

Copolymers and photoresist compositions comprising same

Copolymers and photoresist compositions comprising same

Patents Applicationslast 30 patents

CHOLATE PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME

PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME

PHOTORESIST COMPOSITION

PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME

CHOLATE PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME

Novel copolymers and photoresist compositions comprising same

Novel monomers, polymers, methods of synthesis thereof and photores...