Ju-Seon Goo

Person

Suwon, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Methods of manufacturing flash memory devices by selective removal...
- Patent number 8,492,223
- Issue date Jul 23, 2013
- Samsung Electronics Co., Ltd.
- Jong-wan Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of fabricating flash memory devices comprising forming a si...
- Patent number 8,043,914
- Issue date Oct 25, 2011
- Samsung Electronics Co., Ltd.
- Jong-wan Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flash memory device and method of fabricating the same
- Patent number 7,842,569
- Issue date Nov 30, 2010
- Samsung Electronics Co., Ltd.
- Hong-Gun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having trench isolation region and methods of...
- Patent number 7,781,304
- Issue date Aug 24, 2010
- Samsung Electronics Co., Ltd.
- Kyung-Mun Byun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device isolation structures and methods of fabricatin...
- Patent number 7,674,685
- Issue date Mar 9, 2010
- Samsung Electronics Co, Ltd.
- Jong-Wan Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a silicon oxide layer using spin-on glass
- Patent number 7,517,817
- Issue date Apr 14, 2009
- Samsung Electronics Co., Ltd.
- Ju-Seon Goo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of filling gaps by deposition on materials having different...
- Patent number 7,358,190
- Issue date Apr 15, 2008
- Samsung Electronics Co., Ltd.
- Hong-gun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming trench isolation layers using high density plasm...
- Patent number 7,332,409
- Issue date Feb 19, 2008
- Samsung Electronics Co., Ltd.
- Yong-Won Cha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a silicon oxide layer using spin-on glass
- Patent number 7,192,891
- Issue date Mar 20, 2007
- Samsung Electronics, Co., Ltd.
- Ju-Seon Goo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a silicon oxide layer of a semiconductor device a...
- Patent number 6,645,879
- Issue date Nov 11, 2003
- Samsung Electronics Co., Ltd.
- Eun-Kee Hong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a spin-on-glass insulation layer
- Patent number 6,635,586
- Issue date Oct 21, 2003
- Samsung Electronics Co., Ltd.
- Ju-Seon Goo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming an insulating layer in a trench isolation type se...
- Patent number 6,566,229
- Issue date May 20, 2003
- Samsung Electronics Co., Ltd.
- Soo-Jin Hong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a spin-on-glass insulation layer
- Patent number 6,489,252
- Issue date Dec 3, 2002
- Samsung Electronics Co., Ltd.
- Ju-Seon Goo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of planarization using selecting curing of SOG layer
- Patent number 6,368,906
- Issue date Apr 9, 2002
- Samsung Electronics Co., Ltd.
- Hong-jae Shin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple etch methods for forming contact holes in microelectronic...
- Patent number 6,117,785
- Issue date Sep 12, 2000
- Samsung Electronics Co., Ltd.
- Hae-jeong Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming interlevel dielectric layer in semiconductor dev...
- Patent number 6,057,251
- Issue date May 2, 2000
- Samsung Electronics, Co., Ltd.
- Ju-seon Goo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating and curing spin-on-glass layers by electron b...
- Patent number 5,989,983
- Issue date Nov 23, 1999
- Samsung Electronics Co., Ltd.
- Ju-seon Goo
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20150255302
- Publication date Sep 10, 2015
- Samsung Electronics Co., Ltd.
- BYOUNG-MOON YOON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES
- Publication number 20120007165
- Publication date Jan 12, 2012
- SAMSUNG ELECTRONICS CO., LTD.
- Myoung-Bum LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Manufacturing Flash Memory Devices by Selective Removal...
- Publication number 20110256708
- Publication date Oct 20, 2011
- Jong-wan Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES INCLUDING LOWER AND UPPER DEVICE ISOLATION PA...
- Publication number 20110037109
- Publication date Feb 17, 2011
- SAMSUNG ELECTRONICS CO., LTD.
- Hong-Gun KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of fabricating semiconductor device
- Publication number 20100240194
- Publication date Sep 23, 2010
- DeokYoung Jung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING SEMICONDUCTOR DEVICE
- Publication number 20100203700
- Publication date Aug 12, 2010
- Kyungmun Byun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Fabricating Flash Memory Device
- Publication number 20100167490
- Publication date Jul 1, 2010
- Jong-wan Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming an isolation layer, method of manufacturing a sem...
- Publication number 20100072569
- Publication date Mar 25, 2010
- Samsung Electronics, Co., Ltd.
- Tae-Jong Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device having trench isolation region and methods of...
- Publication number 20090020847
- Publication date Jan 22, 2009
- SAMSUNG ELECTRONICS CO., LTD.
- Kyung-Mun Byun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITIONS INCLUDING PERHYDRO-POLYSILAZANE USED IN A SEMICONDUCTO...
- Publication number 20090012221
- Publication date Jan 8, 2009
- SAMSUNG ELECTRONICS CO., LTD.
- Eunkee Hong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method of manufacturing having the same
- Publication number 20080121977
- Publication date May 29, 2008
- Yong-Soon Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLASH MEMORY DEVICE AND METHOD OF FABRICATING THE SAME
- Publication number 20080035984
- Publication date Feb 14, 2008
- Samsung Electronics Co., Ltd.
- Hong-Gun KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device isolation structures and methods of fabricatin...
- Publication number 20080014711
- Publication date Jan 17, 2008
- SAMSUNG ELECTRONICS CO., LTD.
- Jong-Wan Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for forming a silicon oxide layer using spin-on glass
- Publication number 20070117412
- Publication date May 24, 2007
- Ju-Seon Goo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming an isolation layer and method of manufacturing a...
- Publication number 20070020879
- Publication date Jan 25, 2007
- SAMSUNG ELECTRONICS CO., LTD.
- Eun-Kyung Baek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing a non-volatile semiconductor device
- Publication number 20070004139
- Publication date Jan 4, 2007
- Hong-Gun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of manufacturing silicon oxide isolation layers and semicon...
- Publication number 20060089008
- Publication date Apr 27, 2006
- Eunkee Hong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of forming trench isolation layers using high density plasm...
- Publication number 20050277265
- Publication date Dec 15, 2005
- Yong-Won Cha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for forming a silicon oxide layer using spin-on glass
- Publication number 20050026443
- Publication date Feb 3, 2005
- Ju-Seon Goo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for forming a thin film on an integrated circuit including...
- Publication number 20040169005
- Publication date Sep 2, 2004
- Hong-Gun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of filling gaps by deposition on materials having different...
- Publication number 20040144749
- Publication date Jul 29, 2004
- Hong-Gun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming a silicon oxide layer of a semiconductor device a...
- Publication number 20030036291
- Publication date Feb 20, 2003
- Samsung Electrics Co., Ltd.
- Eun-Kee Hong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming an insulating layer in a trench isolation type se...
- Publication number 20020123206
- Publication date Sep 5, 2002
- Soo-Jin Hong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming a spin-on-glass insulation layer
- Publication number 20020119675
- Publication date Aug 29, 2002
- SAMSUNG ELECTRONICS CO., LTD.
- Ju-Seon Goo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming a spin-on-glass insulation layer
- Publication number 20020072246
- Publication date Jun 13, 2002
- SAMSUNG ELECTRONICS CO., LTD.
- Ju-Seon Goo
- H01 - BASIC ELECTRIC ELEMENTS

Ju-Seon Goo

Person

Patents Grantslast 30 patents

Methods of manufacturing flash memory devices by selective removal...

Methods of fabricating flash memory devices comprising forming a si...

Flash memory device and method of fabricating the same

Semiconductor device having trench isolation region and methods of...

Semiconductor device isolation structures and methods of fabricatin...

Method for forming a silicon oxide layer using spin-on glass

Methods of filling gaps by deposition on materials having different...

Methods of forming trench isolation layers using high density plasm...

Method for forming a silicon oxide layer using spin-on glass

Method of forming a silicon oxide layer of a semiconductor device a...

Method of forming a spin-on-glass insulation layer

Method of forming an insulating layer in a trench isolation type se...

Method of forming a spin-on-glass insulation layer

Method of planarization using selecting curing of SOG layer

Multiple etch methods for forming contact holes in microelectronic...

Method for forming interlevel dielectric layer in semiconductor dev...

Method of fabricating and curing spin-on-glass layers by electron b...

Patents Applicationslast 30 patents

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICES

Methods of Manufacturing Flash Memory Devices by Selective Removal...

SEMICONDUCTOR DEVICES INCLUDING LOWER AND UPPER DEVICE ISOLATION PA...

Method of fabricating semiconductor device

METHOD OF FORMING SEMICONDUCTOR DEVICE

Method of Fabricating Flash Memory Device

Method of forming an isolation layer, method of manufacturing a sem...

Semiconductor device having trench isolation region and methods of...

COMPOSITIONS INCLUDING PERHYDRO-POLYSILAZANE USED IN A SEMICONDUCTO...

Semiconductor device and method of manufacturing having the same

FLASH MEMORY DEVICE AND METHOD OF FABRICATING THE SAME

Semiconductor device isolation structures and methods of fabricatin...

Method for forming a silicon oxide layer using spin-on glass

Method of forming an isolation layer and method of manufacturing a...

Method of manufacturing a non-volatile semiconductor device

Methods of manufacturing silicon oxide isolation layers and semicon...

Methods of forming trench isolation layers using high density plasm...

Method for forming a silicon oxide layer using spin-on glass

Methods for forming a thin film on an integrated circuit including...

Methods of filling gaps by deposition on materials having different...

Method of forming a silicon oxide layer of a semiconductor device a...

Method of forming an insulating layer in a trench isolation type se...

Method of forming a spin-on-glass insulation layer

Method of forming a spin-on-glass insulation layer