Kaustuve Bhattacharyya

Person

Veldhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Method for overlay metrology and apparatus thereof
- Patent number 12,130,246
- Issue date Oct 29, 2024
- ASML Netherlands B.V.
- Simon Gijsbert Josephus Mathijssen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and system for determining information about a target structure
- Patent number 12,061,421
- Issue date Aug 13, 2024
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for monitoring lithographic apparatus
- Patent number 12,032,297
- Issue date Jul 9, 2024
- ASML Netherlands B.V.
- Emil Peter Schmitt-Weaver
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and associated metrology and lithographic apparatuses
- Patent number 12,032,299
- Issue date Jul 9, 2024
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method
- Patent number 12,013,647
- Issue date Jun 18, 2024
- ASML Netherlands B.V.
- Simon Gijsbert Josephus Mathijssen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for inferring a local uniformity metric
- Patent number 11,886,125
- Issue date Jan 30, 2024
- ASML Netherlands B.V.
- Simon Gijsbert Josephus Mathijssen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Recipe selection based on inter-recipe consistency
- Patent number 11,703,772
- Issue date Jul 18, 2023
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G01 - MEASURING TESTING
Information Patent Grant
Metrology method, computer product and system
- Patent number 11,640,116
- Issue date May 2, 2023
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for inspection and metrology
- Patent number 11,580,274
- Issue date Feb 14, 2023
- ASML Netherlands B.V.
- Lotte Marloes Willems
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology method and apparatus, lithographic system, device manufac...
- Patent number 11,466,980
- Issue date Oct 11, 2022
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metrology method, target and substrate
- Patent number 11,428,521
- Issue date Aug 30, 2022
- ASML Netherlands B.V.
- Kaustuve Bhattacharyya
- G01 - MEASURING TESTING
Information Patent Grant
Methods and apparatus for monitoring a lithographic manufacturing p...
- Patent number 11,422,476
- Issue date Aug 23, 2022
- ASML Netherlands B.V.
- Emil Peter Schmitt-Weaver
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method, patterning device, apparatus and computer program
- Patent number 11,385,553
- Issue date Jul 12, 2022
- ASML Netherlands B.V.
- Zili Zhou
- G01 - MEASURING TESTING
Information Patent Grant
Method of measuring a structure, inspection apparatus, lithographic...
- Patent number 11,385,552
- Issue date Jul 12, 2022
- ASML Netherlands B.V.
- Martin Jacobus Johan Jak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to determine a patterning process parameter
- Patent number 11,300,883
- Issue date Apr 12, 2022
- ASML Netherlands B.V.
- Martin Jacobus Johan Jak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for measurement of alignment
- Patent number 11,249,404
- Issue date Feb 15, 2022
- ASML Netherlands B.V.
- Emil Peter Schmitt-Weaver
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method, target and substrate
- Patent number 11,204,239
- Issue date Dec 21, 2021
- ASML Netherlands B.V.
- Kaustuve Bhattacharyya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology recipe selection
- Patent number 11,106,142
- Issue date Aug 31, 2021
- ASML Netherlands B.V.
- Kaustuve Bhattacharyya
- G01 - MEASURING TESTING
Information Patent Grant
Mark position determination method
- Patent number 11,022,896
- Issue date Jun 1, 2021
- ASML Netherlands B.V.
- Emil Peter Schmitt-Weaver
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method, patterning device, apparatus and computer program
- Patent number 10,996,570
- Issue date May 4, 2021
- ASML Netherlands B.V.
- Zili Zhou
- G01 - MEASURING TESTING
Information Patent Grant
Metrology method and apparatus and computer program
- Patent number 10,908,513
- Issue date Feb 2, 2021
- ASML Netherlands B.V.
- Marc Johannes Noot
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Recipe selection based on inter-recipe consistency
- Patent number 10,901,330
- Issue date Jan 26, 2021
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for predicting performance of a metrology system
- Patent number 10,884,342
- Issue date Jan 5, 2021
- ASML Netherlands B.V.
- Martinus Gerardus Maria Johannes Maassen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods and apparatus for monitoring a lithographic manufacturing p...
- Patent number 10,866,527
- Issue date Dec 15, 2020
- ASML Netherlands B.V.
- Emil Peter Schmitt-Weaver
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Determination of stack difference and correction using stack differ...
- Patent number 10,845,707
- Issue date Nov 24, 2020
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G01 - MEASURING TESTING
Information Patent Grant
Method of measuring a structure, inspection apparatus, lithographic...
- Patent number 10,831,109
- Issue date Nov 10, 2020
- ASML Netherlands B.V.
- Martin Jacobus Johan Jak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and lithographic method, lithographic cell and com...
- Patent number 10,831,111
- Issue date Nov 10, 2020
- ASML Netherlands B.V.
- Kaustuve Bhattacharyya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of designing metrology targets, substrates having metrology...
- Patent number 10,809,628
- Issue date Oct 20, 2020
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metrology method, target and substrate
- Patent number 10,718,604
- Issue date Jul 21, 2020
- ASML Netherlands B.V.
- Kaustuve Bhattacharyya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method, computer product and system
- Patent number 10,698,322
- Issue date Jun 30, 2020
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR INFERRING A LOCAL UNIFORMITY METRIC
- Publication number 20240168388
- Publication date May 23, 2024
- ASML NETHERLANDS B.V.
- Simon Gijsbert Josephus MATHIJSSEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF METROLOGY AND ASSOCIATED APPARATUSES
- Publication number 20240036484
- Publication date Feb 1, 2024
- ASML NETHERLANDS B.V.
- Timothy Dugan DAVIS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND APPARATUS AND COMPUTER PROGRAM
- Publication number 20240027918
- Publication date Jan 25, 2024
- ASML NETHERLANDS B.V.
- Simon Gijsbert Josephus MATHIJSSEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSES
- Publication number 20240012342
- Publication date Jan 11, 2024
- ASML NETHERLANDS B.V.
- Sebastianus Adrianus GOORDEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR INSPECTION AND METROLOGY
- Publication number 20230185990
- Publication date Jun 15, 2023
- ASML NETHERLANDS B.V.
- Lotte Marloes Willems
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
A SUBSTRATE COMPRISING A TARGET ARRANGEMENT, AND ASSOCIATED AT LEAS...
- Publication number 20230176491
- Publication date Jun 8, 2023
- ASML NETHERLANDS B.V.
- Olger Victor ZWIER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR INFERRING A LOCAL UNIFORMITY METRIC
- Publication number 20230062558
- Publication date Mar 2, 2023
- ASML NETHERLANDS B.V.
- Simon Gijsbert Josephus MATHIJSSEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSES
- Publication number 20230017491
- Publication date Jan 19, 2023
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20230016664
- Publication date Jan 19, 2023
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G01 - MEASURING TESTING
Information Patent Application
MODELING METHOD FOR COMPUTATIONAL FINGERPRINTS
- Publication number 20220291590
- Publication date Sep 15, 2022
- ASML NETHERLANDS B.V.
- Jing SU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION AND DETECTION APPARATUS FOR A METROLOGY APPARATUS
- Publication number 20220276180
- Publication date Sep 1, 2022
- ASML NETHERLANDS B.V.
- Nitesh PANDEY
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING INFORMATION ABOUT A TARGET STRUCTURE
- Publication number 20220276569
- Publication date Sep 1, 2022
- ASML NETHERLANDS B.V.
- Arie Jeffrey DEN BOEF
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR OVERLAY METROLOGY AND APPARATUS THEREOF
- Publication number 20220074875
- Publication date Mar 10, 2022
- ASML NETHERLANDS B.V.
- Simon Gijsbert Josephus MATHIJSSEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY METHOD
- Publication number 20220075276
- Publication date Mar 10, 2022
- ASML NETHERLANDS B.V.
- Simon Gijsbert Josephus MATHIJSSEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20220057192
- Publication date Feb 24, 2022
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR MONITORING LITHOGRAPHIC APPARATUS
- Publication number 20220026809
- Publication date Jan 27, 2022
- ASML NETHERLANDS B.V.
- Emil Peter SCHMITT-WEAVER
- G05 - CONTROLLING REGULATING
Information Patent Application
METROLOGY METHOD AND APPARATUS THEREFOR
- Publication number 20210356873
- Publication date Nov 18, 2021
- ASML NETHERLANDS B.V.
- Arie Jeffrey DEN BOEF
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD, PATTERNING DEVICE, APPARATUS AND COMPUTER PROGRAM
- Publication number 20210255553
- Publication date Aug 19, 2021
- ASML NETHERLANDS B.V.
- Zili ZHOU
- G01 - MEASURING TESTING
Information Patent Application
RECIPE SELECTION BASED ON INTER-RECIPE CONSISTENCY
- Publication number 20210103227
- Publication date Apr 8, 2021
- ASML NETHERLANDS B.V.
- Arie Jeffrey DEN BOEF
- G01 - MEASURING TESTING
Information Patent Application
Method of Measuring a Structure, Inspection Apparatus, Lithographic...
- Publication number 20210026256
- Publication date Jan 28, 2021
- ASML NETHERLANDS B.V.
- Martin Jacobus Johan JAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS & APPARATUS FOR MONITORING A LITHOGRAPHIC MANUFACTURING PRO...
- Publication number 20210018847
- Publication date Jan 21, 2021
- ASML NETHERLANDS B.V.
- Emil Peter SCHMITT-WEAVER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20200348125
- Publication date Nov 5, 2020
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY METHOD, COMPUTER PRODUCT AND SYSTEM
- Publication number 20200301290
- Publication date Sep 24, 2020
- ASML NETHERLANDS B.V.
- Arie Jeffrey DEN BOEF
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY RECIPE SELECTION
- Publication number 20200218166
- Publication date Jul 9, 2020
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G01 - MEASURING TESTING
Information Patent Application
System and Method for Measurement of Alignment
- Publication number 20200133144
- Publication date Apr 30, 2020
- ASML NETHERLANDS B.V.
- Emil Peter SCHMITT-WEAVER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology Method, Patterning Device, Apparatus and Computer Program
- Publication number 20200110342
- Publication date Apr 9, 2020
- ASML NETHERLANDS B.V.
- Zili ZHOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD, COMPUTER PRODUCT AND SYSTEM
- Publication number 20200103762
- Publication date Apr 2, 2020
- ASML NETHERLANDS B.V.
- Arie Jeffrey DEN BOEF
- G01 - MEASURING TESTING
Information Patent Application
DETERMINATION OF STACK DIFFERENCE AND CORRECTION USING STACK DIFFER...
- Publication number 20200012198
- Publication date Jan 9, 2020
- ASML NETHERLANDS B.V.
- Arie Jeffrey DEN BOEF
- G01 - MEASURING TESTING
Information Patent Application
METHODS & APPARATUS FOR MONITORING A LITHOGRAPHIC MANUFACTURING PRO...
- Publication number 20200004164
- Publication date Jan 2, 2020
- ASML NETHERLANDS B.V.
- Emil Peter SCHMITT-WEAVER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20190346256
- Publication date Nov 14, 2019
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Kaustuve Bhattacharyya

Person

Patents Grantslast 30 patents

Method for overlay metrology and apparatus thereof

Method and system for determining information about a target structure

Method for monitoring lithographic apparatus

Metrology method and associated metrology and lithographic apparatuses

Metrology method

Method for inferring a local uniformity metric

Recipe selection based on inter-recipe consistency

Metrology method, computer product and system

Method and apparatus for inspection and metrology

Metrology method and apparatus, lithographic system, device manufac...

Metrology method, target and substrate

Methods and apparatus for monitoring a lithographic manufacturing p...

Metrology method, patterning device, apparatus and computer program

Method of measuring a structure, inspection apparatus, lithographic...

Method to determine a patterning process parameter

System and method for measurement of alignment

Metrology method, target and substrate

Metrology recipe selection

Mark position determination method

Metrology method, patterning device, apparatus and computer program

Metrology method and apparatus and computer program

Recipe selection based on inter-recipe consistency

Method and apparatus for predicting performance of a metrology system

Methods and apparatus for monitoring a lithographic manufacturing p...

Determination of stack difference and correction using stack differ...

Method of measuring a structure, inspection apparatus, lithographic...

Metrology method and lithographic method, lithographic cell and com...

Method of designing metrology targets, substrates having metrology...

Metrology method, target and substrate

Metrology method, computer product and system

Patents Applicationslast 30 patents

METHOD FOR INFERRING A LOCAL UNIFORMITY METRIC

METHOD OF METROLOGY AND ASSOCIATED APPARATUSES

METROLOGY METHOD AND APPARATUS AND COMPUTER PROGRAM

METROLOGY METHOD AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSES

METHOD AND APPARATUS FOR INSPECTION AND METROLOGY

A SUBSTRATE COMPRISING A TARGET ARRANGEMENT, AND ASSOCIATED AT LEAS...

METHOD FOR INFERRING A LOCAL UNIFORMITY METRIC

METROLOGY METHOD AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSES

METROLOGY METHOD, TARGET AND SUBSTRATE

MODELING METHOD FOR COMPUTATIONAL FINGERPRINTS

ILLUMINATION AND DETECTION APPARATUS FOR A METROLOGY APPARATUS

METHOD AND SYSTEM FOR DETERMINING INFORMATION ABOUT A TARGET STRUCTURE

METHOD FOR OVERLAY METROLOGY AND APPARATUS THEREOF

METROLOGY METHOD

METROLOGY METHOD, TARGET AND SUBSTRATE

METHOD FOR MONITORING LITHOGRAPHIC APPARATUS

METROLOGY METHOD AND APPARATUS THEREFOR

METROLOGY METHOD, PATTERNING DEVICE, APPARATUS AND COMPUTER PROGRAM

RECIPE SELECTION BASED ON INTER-RECIPE CONSISTENCY

Method of Measuring a Structure, Inspection Apparatus, Lithographic...

METHODS & APPARATUS FOR MONITORING A LITHOGRAPHIC MANUFACTURING PRO...

METROLOGY METHOD, TARGET AND SUBSTRATE

METROLOGY METHOD, COMPUTER PRODUCT AND SYSTEM

METROLOGY RECIPE SELECTION

System and Method for Measurement of Alignment

Metrology Method, Patterning Device, Apparatus and Computer Program

METROLOGY METHOD, COMPUTER PRODUCT AND SYSTEM

DETERMINATION OF STACK DIFFERENCE AND CORRECTION USING STACK DIFFER...

METHODS & APPARATUS FOR MONITORING A LITHOGRAPHIC MANUFACTURING PRO...

METROLOGY METHOD, TARGET AND SUBSTRATE