Kazuki Denpoh

Person

Nirasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,804,076
- Issue date Oct 13, 2020
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,997,332
- Issue date Jun 12, 2018
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 9,941,097
- Issue date Apr 10, 2018
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 9,899,191
- Issue date Feb 20, 2018
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hollow cathode device and method for using the device to control th...
- Patent number 9,455,133
- Issue date Sep 27, 2016
- Tokyo Electron Limited
- Kazuki Denpoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,313,872
- Issue date Apr 12, 2016
- Tokyo Electron Limited
- Yohei Yamazawa
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,253,867
- Issue date Feb 2, 2016
- Tokyo Electron Limited
- Yohei Yamazawa
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Shower plate and substrate processing apparatus
- Patent number 9,136,097
- Issue date Sep 15, 2015
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus having hollow electrode on periphery an...
- Patent number 8,829,387
- Issue date Sep 9, 2014
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,741,097
- Issue date Jun 3, 2014
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,608,903
- Issue date Dec 17, 2013
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hollow cathode device and method for using the device to control th...
- Patent number 8,409,459
- Issue date Apr 2, 2013
- Tokyo Electron Limited
- Kazuki Denpoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus, focus ring, and susceptor
- Patent number 8,124,539
- Issue date Feb 28, 2012
- Tokyo Electron Limited
- Shosuke Endoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of plasma particle simulation, storage medium, plasma partic...
- Patent number 7,847,247
- Issue date Dec 7, 2010
- Tokyo Electron Limited
- Kazuki Denpoh
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma processing method
- Patent number 7,713,431
- Issue date May 11, 2010
- Tokyo Electron Limited
- Tomoaki Ukei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electron temperature measurement method, electron temperature measu...
- Patent number 7,691,226
- Issue date Apr 6, 2010
- Tokyo Electron Limited
- Kazuki Denpoh
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Apparatus and method for plasma treatment
- Patent number 6,828,243
- Issue date Dec 7, 2004
- Tokyo Electron Limited
- Kazuki Denpoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for plasma treatment
- Patent number 6,514,347
- Issue date Feb 4, 2003
- Tokyo Electron Limited
- Kazuki Denpoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Resist processing method and apparatus
- Patent number 5,853,803
- Issue date Dec 29, 1998
- Tokyo Electron Limited
- Kiyohisa Tateyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist processing apparatus for a rectangular substrate
- Patent number 5,718,763
- Issue date Feb 17, 1998
- Tokyo Electron Limited
- Kiyohisa Tateyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20200357606
- Publication date Nov 12, 2020
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20200058467
- Publication date Feb 20, 2020
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20180308662
- Publication date Oct 25, 2018
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20170256381
- Publication date Sep 7, 2017
- TOKYO ELECTRON LIMITED
- Kazuki DENPOH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20160203951
- Publication date Jul 14, 2016
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20160172160
- Publication date Jun 16, 2016
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20160118222
- Publication date Apr 28, 2016
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20140216345
- Publication date Aug 7, 2014
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20140216346
- Publication date Aug 7, 2014
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HOLLOW CATHODE DEVICE AND METHOD FOR USING THE DEVICE TO CONTROL TH...
- Publication number 20130228284
- Publication date Sep 5, 2013
- TOKYO ELECTRON LIMITED
- Kazuki DENPOH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA CONTROL METHOD
- Publication number 20120037597
- Publication date Feb 16, 2012
- TOKYO ELECTRON LIMITED
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20110104902
- Publication date May 5, 2011
- TOKYO ELECTRON LIMITED
- Yohei Yamazawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20110094997
- Publication date Apr 28, 2011
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20110094682
- Publication date Apr 28, 2011
- TOKYO ELECTRON LIMITED
- Yohei Yamazawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20110094995
- Publication date Apr 28, 2011
- TOKYO ELECTRON LIMITED
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20110094996
- Publication date Apr 28, 2011
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, FOCUS RING, AND SUSCEPTOR
- Publication number 20110000883
- Publication date Jan 6, 2011
- TOKYO ELECTRON LIMITED
- Shosuke Endoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA MEASURING METHOD, PLASMA MEASURING DEVICE AND STORAGE MEDIUM
- Publication number 20100321029
- Publication date Dec 23, 2010
- TOKYO ELECTRON LIMITED
- Toru Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUS RING, SUBSTRATE MOUNTING TABLE AND PLASMA PROCESSING APPARATU...
- Publication number 20100012274
- Publication date Jan 21, 2010
- TOKYO ELECTRON LIMITED
- Masaaki Miyagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HOLLOW CATHODE DEVICE AND METHOD FOR USING THE DEVICE TO CONTROL TH...
- Publication number 20090218212
- Publication date Sep 3, 2009
- TOKYO ELECTRON LIMITED
- Kazuki Denpoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHOWER PLATE AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20090120582
- Publication date May 14, 2009
- TOKYO ELECTRON LIMITED
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PLASMA PARTICLE SIMULATION, STORAGE MEDIUM, PLASMA PARTIC...
- Publication number 20090057578
- Publication date Mar 5, 2009
- TOKYO ELECTRON LIMITED
- Kazuki Denpoh
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20070187363
- Publication date Aug 16, 2007
- TOKYO ELECTRON LIMITED
- Hiromi OKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron temperature measurement method, electron temperature measu...
- Publication number 20060214593
- Publication date Sep 28, 2006
- TOKYO ELECTRON LIMITED
- Kazuki Denpoh
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Plasma processing apparatus and method
- Publication number 20050274321
- Publication date Dec 15, 2005
- TOKYO ELECTRON LIMITED
- Tomoaki Ukei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus, focus ring, and susceptor
- Publication number 20040261946
- Publication date Dec 30, 2004
- TOKYO ELECTRON LIMITED
- Shosuke Endoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and method for plasma treatment
- Publication number 20030062128
- Publication date Apr 3, 2003
- Kazuki Denpoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus and method for plasma treatment
- Publication number 20010015262
- Publication date Aug 23, 2001
- Kazuki Denpoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Kazuki Denpoh

Person

Patents Grantslast 30 patents

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Plasma processing apparatus

Hollow cathode device and method for using the device to control th...

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Shower plate and substrate processing apparatus

Plasma processing apparatus having hollow electrode on periphery an...

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Hollow cathode device and method for using the device to control th...

Plasma processing apparatus, focus ring, and susceptor

Method of plasma particle simulation, storage medium, plasma partic...

Plasma processing method

Electron temperature measurement method, electron temperature measu...

Apparatus and method for plasma treatment

Apparatus and method for plasma treatment

Resist processing method and apparatus

Resist processing apparatus for a rectangular substrate

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

HOLLOW CATHODE DEVICE AND METHOD FOR USING THE DEVICE TO CONTROL TH...

PLASMA PROCESSING APPARATUS AND PLASMA CONTROL METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS, FOCUS RING, AND SUSCEPTOR

PLASMA MEASURING METHOD, PLASMA MEASURING DEVICE AND STORAGE MEDIUM

FOCUS RING, SUBSTRATE MOUNTING TABLE AND PLASMA PROCESSING APPARATU...

HOLLOW CATHODE DEVICE AND METHOD FOR USING THE DEVICE TO CONTROL TH...

SHOWER PLATE AND SUBSTRATE PROCESSING APPARATUS

METHOD OF PLASMA PARTICLE SIMULATION, STORAGE MEDIUM, PLASMA PARTIC...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

Electron temperature measurement method, electron temperature measu...

Plasma processing apparatus and method

Plasma processing apparatus, focus ring, and susceptor

Apparatus and method for plasma treatment

Apparatus and method for plasma treatment