Kazuyuki Ikenaga

Person

Chiyoda, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and method for venting a processing cha...
- Patent number 12,266,508
- Issue date Apr 1, 2025
- HITACHI HIGH-TECH CORPORATION
- Kazuyuki Ikenaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,191,121
- Issue date Jan 7, 2025
- HITACHI HIGH-TECH CORPORATION
- Kazuyuki Ikenaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,112,925
- Issue date Oct 8, 2024
- HITACHI HIGH-TECH CORPORATION
- Masaki Ishiguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method and inspection method of interior member of pl...
- Patent number 11,987,880
- Issue date May 21, 2024
- HITACHI HIGH-TECH CORPORATION
- Kazuhiro Ueda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for releasing sample and plasma processing apparatus using same
- Patent number 11,664,233
- Issue date May 30, 2023
- HITACHI HIGH-TECH CORPORATION
- Masaki Ishiguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,424,108
- Issue date Aug 23, 2022
- HITACHI HIGH-TECH CORPORATION
- Kazuyuki Ikenaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,315,792
- Issue date Apr 26, 2022
- HITACHI HIGH-TECH CORPORATION
- Masaki Ishiguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,257,661
- Issue date Feb 22, 2022
- HITACHI HIGH-TECH CORPORATION
- Masaki Ishiguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for releasing sample and plasma processing apparatus using same
- Patent number 11,107,694
- Issue date Aug 31, 2021
- HITACHI HIGH-TECH CORPORATION
- Masaki Ishiguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method for venting a processing cha...
- Patent number 10,886,106
- Issue date Jan 5, 2021
- HITACHI HIGH-TECH CORPORATION
- Kazuyuki Ikenaga
- B08 - CLEANING
Information Patent Grant
Method for releasing sample and plasma processing apparatus using same
- Patent number 10,490,412
- Issue date Nov 26, 2019
- Hitachi High-Technologies Corporation
- Masaki Ishiguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,395,935
- Issue date Aug 27, 2019
- Hitachi High-Technologies Corporation
- Masaki Ishiguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,941,133
- Issue date Apr 10, 2018
- Hitachi High-Technologies Corporation
- Masaki Ishiguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 9,607,874
- Issue date Mar 28, 2017
- Hitachi High-Technologies Corporation
- Hiroyuki Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron microscope, and specimen holding method
- Patent number 8,680,466
- Issue date Mar 25, 2014
- Hitachi High-Technologies Coporation
- Seiichiro Kanno
- G01 - MEASURING TESTING
Information Patent Grant
Cleaning method
- Patent number 8,024,831
- Issue date Sep 27, 2011
- Hitachi High-Technologies Corporation
- Kazuyuki Ikenaga
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cleaning apparatus
- Patent number 8,006,340
- Issue date Aug 30, 2011
- Hitachi High-Technologies Corporation
- Kazuyuki Ikenaga
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 7,771,607
- Issue date Aug 10, 2010
- Hitachi, Ltd.
- Tsutomu Tetsuka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 7,601,241
- Issue date Oct 13, 2009
- Hitachi, Ltd.
- Tsutomu Tetsuka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and apparatus using dynamic sensing of a p...
- Patent number 6,911,157
- Issue date Jun 28, 2005
- Hitachi, Ltd.
- Manabu Edamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 6,850,012
- Issue date Feb 1, 2005
- Hitachi High-Technologies Corporation
- Manabu Edamura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma-assisted processing apparatus
- Patent number 6,793,768
- Issue date Sep 21, 2004
- Hitachi, Ltd.
- Hideyuki Kazumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing apparatus and method of processing semi...
- Patent number 6,716,301
- Issue date Apr 6, 2004
- Hitachi, Ltd.
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250218846
- Publication date Jul 3, 2025
- HITACHI HIGH-TECH CORPORATION
- Tomoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING METHOD OF FILM LAYER IN THE PLASMA PROCESSING APPARATUS
- Publication number 20240203708
- Publication date Jun 20, 2024
- Hitachi High-Tech Corporation
- Kazuhiro UEDA
- B08 - CLEANING
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240047258
- Publication date Feb 8, 2024
- Hitachi High-Tech Corporation
- Tomoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND MEMBER OF PLASMA PROCESSING CHAMBER
- Publication number 20230207279
- Publication date Jun 29, 2023
- HITACHI HIGH-TECH CORPORATION
- Kazuhiro UEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MANUFACTURING METHOD AND INSPECTION METHOD OF INTERIOR MEMBER OF PL...
- Publication number 20230101039
- Publication date Mar 30, 2023
- Hitachi High-Tech Corporation
- Kazuhiro Ueda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20220359172
- Publication date Nov 10, 2022
- HITACHI HIGH-TECH CORPORATION
- Kazuyuki Ikenaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20220139678
- Publication date May 5, 2022
- HITACHI HIGH-TECH CORPORATION
- Masaki ISHIGURO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR RELEASING SAMPLE AND PLASMA PROCESSING APPARATUS USING SAME
- Publication number 20210358758
- Publication date Nov 18, 2021
- HITACHI HIGH-TECH CORPORATION
- Masaki ISHIGURO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND INNER COMPONENT OF PLASMA PROCESSIN...
- Publication number 20210241998
- Publication date Aug 5, 2021
- Hitachi High-Technologies Corporation
- Tomoyuki TAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD FOR VENTING A PROCESSING CHA...
- Publication number 20210074515
- Publication date Mar 11, 2021
- HITACHI HIGH-TECH CORPORATION
- Kazuyuki Ikenaga
- B08 - CLEANING
Information Patent Application
METHOD FOR RELEASING SAMPLE AND PLASMA PROCESSING APPARATUS USING SAME
- Publication number 20200058511
- Publication date Feb 20, 2020
- Hitachi High-Technologies Corporation
- Masaki ISHIGURO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20190333772
- Publication date Oct 31, 2019
- Hitachi High-Technologies Corporation
- Masaki ISHIGURO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND MEMBER OF PLASMA PROCESSING CHAMBER
- Publication number 20190326101
- Publication date Oct 24, 2019
- Hitachi High-Technologies Corporation
- Kazuhiro UEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD FOR VENTING A PROCESSING CHA...
- Publication number 20190080888
- Publication date Mar 14, 2019
- Hitachi High-Technologies Corporation
- Kazuyuki IKENAGA
- G05 - CONTROLLING REGULATING
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20180190502
- Publication date Jul 5, 2018
- Hitachi High-Technologies Corporation
- Masaki ISHIGURO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR RELEASING SAMPLE AND PLASMA PROCESSING APPARATUS USING SAME
- Publication number 20170194157
- Publication date Jul 6, 2017
- Hitachi High-Technologies Corporation
- Masaki ISHIGURO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20160336185
- Publication date Nov 17, 2016
- Hitachi High-Technologies Corporation
- Masaki ISHIGURO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20160172161
- Publication date Jun 16, 2016
- Hitachi High-Technologies Corporation
- Kazuyuki IKENAGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20160079043
- Publication date Mar 17, 2016
- Hitachi High-Technologies Corporation
- Hiroyuki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20160027615
- Publication date Jan 28, 2016
- Hitachi High-Technologies Corporation
- Masaki ISHIGURO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20150371825
- Publication date Dec 24, 2015
- Hitachi High-Technologies Corporation
- Hiroyuki Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTRON MICROSCOPE, AND SPECIMEN HOLDING METHOD
- Publication number 20110303844
- Publication date Dec 15, 2011
- Hitachi High-Technologies Corporation
- Seiichiro Kanno
- G01 - MEASURING TESTING
Information Patent Application
Cleaning Method
- Publication number 20100294315
- Publication date Nov 25, 2010
- Kazuyuki Ikenaga
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Cleaning apparatus and cleaning method
- Publication number 20100050349
- Publication date Mar 4, 2010
- Hitachi High-Technologies Corporation
- Kazuyuki Ikenaga
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Processing Apparatus And Plasma Processing Method
- Publication number 20070175586
- Publication date Aug 2, 2007
- Tsutomu Tetsuka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus and plasma processing method
- Publication number 20050133162
- Publication date Jun 23, 2005
- Tsutomu Tetsuka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor manufacturing apparatus and method of processing semi...
- Publication number 20040149384
- Publication date Aug 5, 2004
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method and apparatus using dynamic sensing of a p...
- Publication number 20030132195
- Publication date Jul 17, 2003
- Manabu Edamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20030057845
- Publication date Mar 27, 2003
- Manabu Edamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma-assisted processing apparatus
- Publication number 20020104482
- Publication date Aug 8, 2002
- Hideyuki Kazumi
- H01 - BASIC ELECTRIC ELEMENTS

Kazuyuki Ikenaga

Person

Patents Grantslast 30 patents

Plasma processing apparatus and method for venting a processing cha...

Plasma processing apparatus

Plasma processing apparatus

Manufacturing method and inspection method of interior member of pl...

Method for releasing sample and plasma processing apparatus using same

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Method for releasing sample and plasma processing apparatus using same

Plasma processing apparatus and method for venting a processing cha...

Method for releasing sample and plasma processing apparatus using same

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Electron microscope, and specimen holding method

Cleaning method

Cleaning apparatus

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Plasma processing method and apparatus using dynamic sensing of a p...

Plasma processing apparatus

Plasma-assisted processing apparatus

Semiconductor manufacturing apparatus and method of processing semi...

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS

CLEANING METHOD OF FILM LAYER IN THE PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND MEMBER OF PLASMA PROCESSING CHAMBER

MANUFACTURING METHOD AND INSPECTION METHOD OF INTERIOR MEMBER OF PL...

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

METHOD FOR RELEASING SAMPLE AND PLASMA PROCESSING APPARATUS USING SAME

PLASMA PROCESSING APPARATUS AND INNER COMPONENT OF PLASMA PROCESSIN...

PLASMA PROCESSING APPARATUS AND METHOD FOR VENTING A PROCESSING CHA...

METHOD FOR RELEASING SAMPLE AND PLASMA PROCESSING APPARATUS USING SAME

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND MEMBER OF PLASMA PROCESSING CHAMBER

PLASMA PROCESSING APPARATUS AND METHOD FOR VENTING A PROCESSING CHA...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

METHOD FOR RELEASING SAMPLE AND PLASMA PROCESSING APPARATUS USING SAME

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

ELECTRON MICROSCOPE, AND SPECIMEN HOLDING METHOD

Cleaning Method

Cleaning apparatus and cleaning method

Plasma Processing Apparatus And Plasma Processing Method

Plasma processing apparatus and plasma processing method

Semiconductor manufacturing apparatus and method of processing semi...

Plasma processing method and apparatus using dynamic sensing of a p...

Plasma processing apparatus

Plasma-assisted processing apparatus