Kenro Kitamura

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Fujisawa, JP

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Patents Grantslast 30 patents

Information Patent Grant
Positive resist polymer composition and method of forming resist pa...
- Patent number 4,345,020
- Issue date Aug 17, 1982
- Fujitsu Limited
- Yasuhiro Yoneda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist terpolymer composition and method of forming resist...
- Patent number 4,276,365
- Issue date Jun 30, 1981
- Fujitsu Limited
- Yasuhiro Yoneda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist terpolymer composition and method of forming resist...
- Patent number 4,273,856
- Issue date Jun 16, 1981
- Fujitsu Limited
- Yasuhiro Yoneda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative type deep ultraviolet resist
- Patent number 4,267,258
- Issue date May 12, 1981
- Fujitsu Limited
- Yasuhiro Yoneda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY