Ko Nakamura

Person

Kawasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device and fabrication method
- Patent number 10,847,522
- Issue date Nov 24, 2020
- FUJITSU SEMICONDUCTOR MEMORY SOLUTION LIMITED
- Kouichi Nagai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of a semiconductor device
- Patent number 8,652,854
- Issue date Feb 18, 2014
- Fujitsu Semiconductor Limited
- Tomohiro Takamatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with ferro-electric capacitor
- Patent number 8,497,537
- Issue date Jul 30, 2013
- Fujitsu Semiconductor Limited
- Wensheng Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing the same having i...
- Patent number 8,338,249
- Issue date Dec 25, 2012
- Fujitsu Semiconductor Limited
- Makoto Takahashi
- G11 - INFORMATION STORAGE
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 8,263,419
- Issue date Sep 11, 2012
- Fujitsu Semiconductor Limited
- Ko Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of a semiconductor device
- Patent number 8,153,448
- Issue date Apr 10, 2012
- Fujitsu Semiconductor Limited
- Tomohiro Takamatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabrication process of semiconductor device
- Patent number 7,816,150
- Issue date Oct 19, 2010
- Fujitsu Semiconductor Limited
- Ko Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method of a semiconductor de...
- Patent number 7,547,933
- Issue date Jun 16, 2009
- Fujitsu Microelectronics Limited
- Tomohiro Takamatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of semiconducter device
- Patent number 7,078,242
- Issue date Jul 18, 2006
- Fujitsu Limited
- Katsuyoshi Matsuura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor capacitor with diffusion prevention layer
- Patent number 6,933,156
- Issue date Aug 23, 2005
- Fujitsu Limited
- Wensheng Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for producing high quality PZT films for ferroelectric memo...
- Patent number 6,887,716
- Issue date May 3, 2005
- Fujitsu Limited
- Glen Fox
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having a ferroelectric capacitor and fabricati...
- Patent number 6,740,533
- Issue date May 25, 2004
- Fujitsu Limited
- Tomohiro Takamatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor capacitor with diffusion prevention layer
- Patent number 6,713,808
- Issue date Mar 30, 2004
- Fujitsu Limited
- Wensheng Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having a ferroelectric capacitor and fabricati...
- Patent number 6,624,458
- Issue date Sep 23, 2003
- Fujitsu Limited
- Tomohiro Takamatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Slurry containing manganese oxide and a fabrication process of a se...
- Patent number 6,159,858
- Issue date Dec 12, 2000
- Fujitsu Limited
- Sadahiro Kishii
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Polishing cloth for use in a CMP process and a surface treatment th...
- Patent number 6,114,247
- Issue date Sep 5, 2000
- Fujitsu Limited
- Ko Nakamura
- B24 - GRINDING POLISHING
Information Patent Grant
Memory device with two ferroelectric capacitors per one cell
- Patent number 6,046,929
- Issue date Apr 4, 2000
- Fujitsu Limited
- Masaki Aoki
- G11 - INFORMATION STORAGE
Information Patent Grant
Polishing apparatus and polishing method
- Patent number 5,904,609
- Issue date May 18, 1999
- Fujitsu Limited
- Atsushi Fukuroda
- G05 - CONTROLLING REGULATING
Information Patent Grant
Slurry containing manganese oxide
- Patent number 5,877,089
- Issue date Mar 2, 1999
- Fujitsu Limited
- Sadahiro Kishii
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Fabrication process of a semiconductor device using a slurry contai...
- Patent number 5,763,325
- Issue date Jun 9, 1998
- Fujitsu Limited
- Sadahiro Kishii
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE AND FABRICATION METHOD
- Publication number 20190237471
- Publication date Aug 1, 2019
- FUJITSU SEMICONDUCTOR LIMITED
- Kouichi Nagai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE WITH FERRO-ELECTRIC CAPACITOR
- Publication number 20130149796
- Publication date Jun 13, 2013
- FUJITSU SEMICONDUCTOR LIMITED
- Wensheng Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20130140614
- Publication date Jun 6, 2013
- FUJITSU SEMICONDUCTOR LIMITED
- Makoto TAKAHASHI
- G11 - INFORMATION STORAGE
Information Patent Application
MANUFACTURING METHOD OF A SEMICONDUCTOR DEVICE
- Publication number 20120171785
- Publication date Jul 5, 2012
- FUJITSU SEMICONDUCTOR LIMITED
- Tomohiro Takamatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20100207178
- Publication date Aug 19, 2010
- Fujitsu Limited
- Makoto TAKAHASHI
- G11 - INFORMATION STORAGE
Information Patent Application
Manufacturing method of a semiconductor device
- Publication number 20090280577
- Publication date Nov 12, 2009
- Fujitsu Microelectronics Limited
- Tomohiro TAKAMATSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE WITH FERRO-ELECTRIC CAPACITOR
- Publication number 20080224195
- Publication date Sep 18, 2008
- Fujitsu Limited
- Wensheng WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SEMICONDUCTOR...
- Publication number 20080191252
- Publication date Aug 14, 2008
- Fujitsu Limited
- Ko NAKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF PRODUCING THE SAME
- Publication number 20080179645
- Publication date Jul 31, 2008
- Fujitsu Limited
- Ko Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method of fabricating the same
- Publication number 20080160645
- Publication date Jul 3, 2008
- FUJITSU LIMITED
- Ko Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20080149977
- Publication date Jun 26, 2008
- Fujitsu Limited
- Ko Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FABRICATION PROCESS OF SEMICONDUCTOR DEVICE
- Publication number 20080113453
- Publication date May 15, 2008
- Fujitsu Limited
- Ko Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING FERROELECTRIC CAPACITOR AND METHOD FOR FABRICATI...
- Publication number 20080057598
- Publication date Mar 6, 2008
- Fujitsu Limited
- Kenkichi Suezawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Forming method of ferroelectric capacitor and manufacturing method...
- Publication number 20070122917
- Publication date May 31, 2007
- FUJITSU LIMITED
- Mitsushi Fujiki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and manufacturing method of the same
- Publication number 20060220082
- Publication date Oct 5, 2006
- FUJITSU LIMITED
- Ko Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method of fabricating the same
- Publication number 20050161717
- Publication date Jul 28, 2005
- FUJITSU LIMITED
- Ko Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Manufacturing method of semiconductor device
- Publication number 20050136556
- Publication date Jun 23, 2005
- FUJITSU LIMITED
- Katsuyoshi Matsuura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor capacitor with diffusion prevention layer
- Publication number 20040184218
- Publication date Sep 23, 2004
- FUJITSU LIMITED
- Wensheng Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and manufacturing method of a semiconductor de...
- Publication number 20040113189
- Publication date Jun 17, 2004
- Tomohiro Takamatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device having a ferroelectric capacitor and fabricati...
- Publication number 20030213986
- Publication date Nov 20, 2003
- FUJITSU LIMITED
- Tomohiro Takamatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Capacitor and method of manufacturing the same
- Publication number 20030022454
- Publication date Jan 30, 2003
- FUJITSU LIMITED
- Wensheng Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device having a ferroelectric capacitor and fabricati...
- Publication number 20020185668
- Publication date Dec 12, 2002
- FUJITSU LIMITED
- Tomohiro Takamatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process for producing high quality PZT films for ferroelectric memo...
- Publication number 20020074601
- Publication date Jun 20, 2002
- Glen Fox
- H01 - BASIC ELECTRIC ELEMENTS

Ko Nakamura

Person

Patents Grantslast 30 patents

Semiconductor device and fabrication method

Manufacturing method of a semiconductor device

Semiconductor device with ferro-electric capacitor

Semiconductor device and method for manufacturing the same having i...

Semiconductor device and method for manufacturing the same

Manufacturing method of a semiconductor device

Fabrication process of semiconductor device

Semiconductor device and manufacturing method of a semiconductor de...

Manufacturing method of semiconducter device

Semiconductor capacitor with diffusion prevention layer

Process for producing high quality PZT films for ferroelectric memo...

Semiconductor device having a ferroelectric capacitor and fabricati...

Semiconductor capacitor with diffusion prevention layer

Semiconductor device having a ferroelectric capacitor and fabricati...

Slurry containing manganese oxide and a fabrication process of a se...

Polishing cloth for use in a CMP process and a surface treatment th...

Memory device with two ferroelectric capacitors per one cell

Polishing apparatus and polishing method

Slurry containing manganese oxide

Fabrication process of a semiconductor device using a slurry contai...

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE AND FABRICATION METHOD

SEMICONDUCTOR DEVICE WITH FERRO-ELECTRIC CAPACITOR

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

MANUFACTURING METHOD OF A SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

Manufacturing method of a semiconductor device

SEMICONDUCTOR DEVICE WITH FERRO-ELECTRIC CAPACITOR

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SEMICONDUCTOR...

SEMICONDUCTOR DEVICE AND METHOD OF PRODUCING THE SAME

Semiconductor device and method of fabricating the same

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

FABRICATION PROCESS OF SEMICONDUCTOR DEVICE

METHOD FOR FORMING FERROELECTRIC CAPACITOR AND METHOD FOR FABRICATI...

Forming method of ferroelectric capacitor and manufacturing method...

Semiconductor device and manufacturing method of the same

Semiconductor device and method of fabricating the same

Manufacturing method of semiconductor device

Semiconductor capacitor with diffusion prevention layer

Semiconductor device and manufacturing method of a semiconductor de...

Semiconductor device having a ferroelectric capacitor and fabricati...

Capacitor and method of manufacturing the same

Semiconductor device having a ferroelectric capacitor and fabricati...

Process for producing high quality PZT films for ferroelectric memo...