Lakshmi Nittala

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Sunnyvale, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Atomic layer removal process with higher etch amount
- Patent number 8,058,179
- Issue date Nov 15, 2011
- Novellus Systems, Inc.
- Nerissa Draeger
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ATOMIC LAYER REMOVAL PROCESS WITH HIGHER ETCH AMOUNT
- Publication number 20150118848
- Publication date Apr 30, 2015
- Novellus System, Inc.
- Nerissa Draeger
- H01 - BASIC ELECTRIC ELEMENTS