Magdy S. Abdelrahman

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Santa Clara, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Soluble hard mask for interlayer dielectric patterning
- Patent number 7,659,196
- Issue date Feb 9, 2010
- Intel Corporation
- Magdy S. Abdelrahman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hard mask for low-k interlayer dielectric patterning
- Patent number 7,649,264
- Issue date Jan 19, 2010
- Intel Corporation
- Tony V. Mule
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Soluble hard mask for interlayer dielectric patterning
- Publication number 20080153283
- Publication date Jun 26, 2008
- Magdy S. Abdelrahman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Hard mask for low-k interlayer dielectric patterning
- Publication number 20080079155
- Publication date Apr 3, 2008
- Tony V. Mule
- H01 - BASIC ELECTRIC ELEMENTS