Michael L. Hill

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New York, NY, US

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Patents Grantslast 30 patents

Information Patent Grant
Magnetron reactive bias sputtering method and apparatus
- Patent number 4,525,262
- Issue date Jun 25, 1985
- Materials Research Corporation
- Walter H. Class
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focusing magnetron sputtering apparatus
- Patent number 4,472,259
- Issue date Sep 18, 1984
- Materials Research Corporation
- Walter H. Class
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetically enhanced plasma process and apparatus
- Patent number 4,422,896
- Issue date Dec 27, 1983
- Materials Research Corporation
- Walter H. Class
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...