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Nena MILENKOVIC
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Reute, DE
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last 30 patents
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Patent Grant
Process and apparatus for removal of impurities from chlorosilanes
Patent number
11,560,316
Issue date
Jan 24, 2023
NexWafe GmbH
Kai Schillinger
C01 - INORGANIC CHEMISTRY
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Patent Grant
Apparatus and method for etching one side of a semiconductor layer...
Patent number
11,519,094
Issue date
Dec 6, 2022
NexWafe GmbH
Stefan Reber
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Patents Applications
last 30 patents
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Patent Application
APPARATUS AND METHOD FOR ETCHING ONE SIDE OF A SEMICONDUCTOR LAYER...
Publication number
20210246546
Publication date
Aug 12, 2021
NexWafe GmbH
Stefan REBER
H01 - BASIC ELECTRIC ELEMENTS
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Patent Application
PROCESS AND APPARATUS FOR REMOVAL OF IMPURITIES FROM CHLOROSILANES
Publication number
20200283298
Publication date
Sep 10, 2020
NexWafe GmbH
Kai SCHILLINGER
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...