Osamu Katada

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Kawasaki, JP

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Patents Grantslast 30 patents

Information Patent Grant
Post exposure modification of critical dimensions in mask fabrication
- Patent number 6,801,295
- Issue date Oct 5, 2004
- Intel Corporation
- Hiroyuki Inomata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Heat-treating apparatus capable of high temperature uniformity
- Patent number 6,399,926
- Issue date Jun 4, 2002
- Sigmameltec Ltd.
- Michiro Takano
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Post exposure modification of critical dimensions in mask fabrication
- Publication number 20030059688
- Publication date Mar 27, 2003
- Hiroyuki Inomata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus for Heat-treating substrate
- Publication number 20010025795
- Publication date Oct 4, 2001
- Michiro Takano
- H01 - BASIC ELECTRIC ELEMENTS