Ruizhe REN

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Shaanxi, CN

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Patents Grantslast 30 patents

Information Patent Grant
Methods for etching a material layer for semiconductor applications
- Patent number 12,165,877
- Issue date Dec 10, 2024
- Applied Materials, Inc.
- Zhigang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Source RF power split inner coil to improve BCD and etch depth perf...
- Patent number 10,211,030
- Issue date Feb 19, 2019
- Applied Materials, Inc.
- Rongping Wang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHODS FOR ETCHING A MATERIAL LAYER FOR SEMICONDUCTOR APPLICATIONS
- Publication number 20220399205
- Publication date Dec 15, 2022
- Applied Materials, Inc.
- Zhigang WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SOURCE RF POWER SPLIT INNER COIL TO IMPROVE BCD AND ETCH DEPTH PERF...
- Publication number 20170200585
- Publication date Jul 13, 2017
- Applied Materials, Inc.
- Rongping WANG
- H01 - BASIC ELECTRIC ELEMENTS