Ryoji WATANABE

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Hard-mask forming composition and method for manufacturing electron...
- Patent number 11,248,086
- Issue date Feb 15, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Keiichi Ibata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for forming resist pattern
- Patent number 10,503,068
- Issue date Dec 10, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Takayoshi Mori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coating agent for reducing roughness of resist pattern, and method...
- Patent number 10,429,735
- Issue date Oct 1, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Ryoji Watanabe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Coating agent for reducing roughness of resist pattern, and method...
- Patent number 10,254,651
- Issue date Apr 9, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Ryoji Watanabe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist pattern forming method and developer for lithography
- Patent number 9,964,851
- Issue date May 8, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Kazufumi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming resist pattern, resist pattern splitting agent,...
- Patent number 9,618,845
- Issue date Apr 11, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Yoichi Hori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of trimming resist pattern
- Patent number 9,581,909
- Issue date Feb 28, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Rikita Tsunoda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern-forming method, metal oxide film-forming material and metho...
- Patent number 8,349,543
- Issue date Jan 8, 2013
- Tokyo Ohka Kogyo Co. Ltd.
- Shogo Matsumaru
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,247,159
- Issue date Aug 21, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming resist pattern
- Patent number 8,236,483
- Issue date Aug 7, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Ando
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 8,007,981
- Issue date Aug 30, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Ryoji Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 7,776,511
- Issue date Aug 17, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 7,645,559
- Issue date Jan 12, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Ryoji Watanabe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
HARD-MASK FORMING COMPOSITION AND METHOD FOR MANUFACTURING ELECTRON...
- Publication number 20190341253
- Publication date Nov 7, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Keiichi IBATA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COATING AGENT FOR REDUCING ROUGHNESS OF RESIST PATTERN, AND METHOD...
- Publication number 20180101098
- Publication date Apr 12, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Ryoji WATANABE
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COATING AGENT FOR REDUCING ROUGHNESS OF RESIST PATTERN, AND METHOD...
- Publication number 20180102246
- Publication date Apr 12, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Ryoji WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING RESIST PATTERN
- Publication number 20170168396
- Publication date Jun 15, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Takayoshi MORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN FORMING METHOD AND DEVELOPER FOR LITHOGRAPHY
- Publication number 20170059994
- Publication date Mar 2, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Kazufumi SATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF TRIMMING RESIST PATTERN
- Publication number 20160097979
- Publication date Apr 7, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Rikita TSUNODA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING RESIST PATTERN, RESIST PATTERN SPLITTING AGENT,...
- Publication number 20160091790
- Publication date Mar 31, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Yoichi Hori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20100104972
- Publication date Apr 29, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Ryoji Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING RESIST PATTERN
- Publication number 20100035192
- Publication date Feb 11, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Ando
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN-FORMING METHOD, METAL OXIDE FILM-FORMING MATERIAL AND METHO...
- Publication number 20100003622
- Publication date Jan 7, 2010
- Tokyo Ohka Kogy Co., Ltd
- Shogo Matsumaru
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20090246683
- Publication date Oct 1, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Ryoji Watanabe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20090075204
- Publication date Mar 19, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20090068592
- Publication date Mar 12, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Ryoji WATANABE

Person

Patents Grantslast 30 patents

Hard-mask forming composition and method for manufacturing electron...

Method for forming resist pattern

Coating agent for reducing roughness of resist pattern, and method...

Coating agent for reducing roughness of resist pattern, and method...

Resist pattern forming method and developer for lithography

Method for forming resist pattern, resist pattern splitting agent,...

Method of trimming resist pattern

Pattern-forming method, metal oxide film-forming material and metho...

Positive resist composition and method of forming resist pattern

Method of forming resist pattern

Resist composition and method of forming resist pattern

Positive resist composition and method of forming resist pattern

Positive resist composition and method of forming resist pattern

Patents Applicationslast 30 patents

HARD-MASK FORMING COMPOSITION AND METHOD FOR MANUFACTURING ELECTRON...

COATING AGENT FOR REDUCING ROUGHNESS OF RESIST PATTERN, AND METHOD...

COATING AGENT FOR REDUCING ROUGHNESS OF RESIST PATTERN, AND METHOD...

METHOD FOR FORMING RESIST PATTERN

RESIST PATTERN FORMING METHOD AND DEVELOPER FOR LITHOGRAPHY

METHOD OF TRIMMING RESIST PATTERN

METHOD FOR FORMING RESIST PATTERN, RESIST PATTERN SPLITTING AGENT,...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

METHOD OF FORMING RESIST PATTERN

PATTERN-FORMING METHOD, METAL OXIDE FILM-FORMING MATERIAL AND METHO...

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN