Shohei KATAOKA

Person

Shizuoka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Electrolytic solution for non-aqueous secondary battery, non-aqueou...
- Patent number 11,201,352
- Issue date Dec 14, 2021
- FUJIFILM Corporation
- Shohei Kataoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrolytic solution for non-aqueous secondary battery and non-aqu...
- Patent number 10,923,769
- Issue date Feb 16, 2021
- FUJIFILM Corporation
- Shohei Kataoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
M-phenylenediamine compound and method for producing polymer compou...
- Patent number 10,717,706
- Issue date Jul 21, 2020
- FUJIFILM Corporation
- Koji Hironaka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Active light sensitive or radiation sensitive resin composition, ac...
- Patent number 10,649,329
- Issue date May 12, 2020
- FUJIFILM Corporation
- Shohei Kataoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, actinic ray-sensitive or radiation-sensitiv...
- Patent number 10,248,019
- Issue date Apr 2, 2019
- FUJIFILM Corporation
- Shohei Kataoka
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern forming method and resist composition
- Patent number 10,126,653
- Issue date Nov 13, 2018
- FUJIFILM Corporation
- Kaoru Iwato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic-ray- or radiation-sensitive resin composition and method of...
- Patent number 9,709,892
- Issue date Jul 18, 2017
- FUJIFILM Corporation
- Shohei Kataoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method and resist composition
- Patent number 9,551,935
- Issue date Jan 24, 2017
- FUJIFILM Corporation
- Keita Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, actinic ray-sensitive or radiation-sensitiv...
- Patent number 9,523,912
- Issue date Dec 20, 2016
- FUJIFILM Corporation
- Shohei Kataoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, actinic ray-sensitive or radiation-sensitiv...
- Patent number 9,482,947
- Issue date Nov 1, 2016
- FUJIFILM Corporation
- Shuhei Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray- or radiation-sensitive resin composition, actinic ray-...
- Patent number 9,454,079
- Issue date Sep 27, 2016
- FUJIFILM Corporation
- Akinori Shibuya
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern forming method, method for manufacturing electronic device,...
- Patent number 9,405,197
- Issue date Aug 2, 2016
- FUJIFILM Corporation
- Akinori Shibuya
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern forming method, actinic-ray-sensitive or radiation-sensitiv...
- Patent number 9,316,910
- Issue date Apr 19, 2016
- FUJIFILM Corporation
- Shohei Kataoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method and actinic ray-sensitive or radiation-sensi...
- Patent number 9,250,519
- Issue date Feb 2, 2016
- FUJIFILM Corporation
- Shohei Kataoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 9,223,204
- Issue date Dec 29, 2015
- FUJITSU Corporation
- Takayuki Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic-ray- or radiation-sensitive resin composition and method of...
- Patent number 9,152,049
- Issue date Oct 6, 2015
- FUJIFILM Corporation
- Shohei Kataoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, actinic ray-sensitive or radiation-sensitiv...
- Patent number 9,120,288
- Issue date Sep 1, 2015
- FUJIFILM Corporation
- Hidenori Takahashi
- B32 - LAYERED PRODUCTS
Information Patent Grant
Pattern forming method, chemical amplification resist composition a...
- Patent number 8,999,622
- Issue date Apr 7, 2015
- FUJIFILM Corporation
- Kaoru Iwato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition and...
- Patent number 8,895,222
- Issue date Nov 25, 2014
- FUJIFILM Corporation
- Tomotaka Tsuchimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, and...
- Patent number 8,846,293
- Issue date Sep 30, 2014
- FUJIFILM Corporation
- Yusuke Iizuka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition and...
- Patent number 8,846,290
- Issue date Sep 30, 2014
- FUJIFILM Corporation
- Naohiro Tango
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Actinic-ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 8,841,060
- Issue date Sep 23, 2014
- FUJIFILM Corporation
- Shohei Kataoka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of forming pattern
- Patent number 8,663,907
- Issue date Mar 4, 2014
- FUJIFILM Corporation
- Keita Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic-ray- or radiation-sensitive resin composition, compound and...
- Patent number 8,557,499
- Issue date Oct 15, 2013
- FUJIFILM Corporation
- Shuhei Yamaguchi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 8,329,379
- Issue date Dec 11, 2012
- FUJIFILM Corporation
- Takayuki Ito
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Composition, article and their production method, and film and its...
- Patent number 7,829,609
- Issue date Nov 9, 2010
- FUJIFILM Corporation
- Tetsufumi Takamoto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
TEXTILE PRINTING INK SET AND TEXTILE PRINTING METHOD
- Publication number 20220177721
- Publication date Jun 9, 2022
- FUJIFILM CORPORATION
- Masao IKOSHI
- D06 - TREATMENT OF TEXTILES OR THE LIKE LAUNDERING FLEXIBLE MATERIALS NOT OTH...
Information Patent Application
ELECTROLYTIC SOLUTION FOR NON-AQUEOUS SECONDARY BATTERY, NON-AQUEOU...
- Publication number 20190280335
- Publication date Sep 12, 2019
- FUJIFILM CORPORATION
- Shohei KATAOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NOVEL M-PHENYLENEDIAMINE COMPOUND AND METHOD FOR PRODUCING POLYMER...
- Publication number 20190177270
- Publication date Jun 13, 2019
- FUJIFILM CORPORATION
- Koji HIRONAKA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ELECTROLYTIC SOLUTION FOR NON-AQUEOUS SECONDARY BATTERY AND NON-AQU...
- Publication number 20190157720
- Publication date May 23, 2019
- FUJIFILM CORPORATION
- Shohei KATAOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING PATTERN
- Publication number 20170102618
- Publication date Apr 13, 2017
- FUJIFILM CORPORATION
- Keita KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, AC...
- Publication number 20170097565
- Publication date Apr 6, 2017
- FUJIFILM CORPORATION
- Shohei KATAOKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITI...
- Publication number 20160070174
- Publication date Mar 10, 2016
- FUJIFILM CORPORATION
- Shuhei YAMAGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...
- Publication number 20160070167
- Publication date Mar 10, 2016
- FUJIFILM CORPORATION
- Shohei KATAOKA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20150277225
- Publication date Oct 1, 2015
- FUJIFILM CORPORATION
- MASAFUMI KOJIMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20150168830
- Publication date Jun 18, 2015
- FUJIFILM CORPORATION
- Akiyoshi GOTO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE,...
- Publication number 20150160559
- Publication date Jun 11, 2015
- FUJIFILM CORPORATION
- Akinori SHIBUYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING PATTERN AND ACTINIC-RAY- OR RADIATION-SENSITIVE R...
- Publication number 20150111157
- Publication date Apr 23, 2015
- FUJIFILM CORPORATION
- Keita KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSI...
- Publication number 20150111135
- Publication date Apr 23, 2015
- FUJIFILM CORPORATION
- Shohei KATAOKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-...
- Publication number 20140248562
- Publication date Sep 4, 2014
- FUJIFILM CORPORATION
- Akinori SHIBUYA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...
- Publication number 20140234762
- Publication date Aug 21, 2014
- FUJIFILM CORPORATION
- Shuhei YAMAGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-...
- Publication number 20140234759
- Publication date Aug 21, 2014
- FUJIFILM CORPORATION
- Shohei KATAOKA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-...
- Publication number 20140212814
- Publication date Jul 31, 2014
- FUJIFILM CORPORATION
- Junichi ITO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20140127627
- Publication date May 8, 2014
- Takayuki Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING PATTERN
- Publication number 20140127629
- Publication date May 8, 2014
- FUJIFILM CORPORATION
- Keita KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...
- Publication number 20140045117
- Publication date Feb 13, 2014
- FUJIFILM CORPORATION
- Shuhei YAMAGUCHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...
- Publication number 20140011134
- Publication date Jan 9, 2014
- FUJIFILM CORPORATION
- Hidenori TAKAHASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...
- Publication number 20130122427
- Publication date May 16, 2013
- FUJIFILM CORPORATION
- Shohei KATAOKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION A...
- Publication number 20130115556
- Publication date May 9, 2013
- FUJIFILM CORPORATION
- Kaoru IWATO
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...
- Publication number 20130078432
- Publication date Mar 28, 2013
- FUJIFILM CORPORATION
- Hidenori TAKAHASHI
- B32 - LAYERED PRODUCTS
Information Patent Application
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF...
- Publication number 20130017377
- Publication date Jan 17, 2013
- FUJIFILM Corporation
- Shohei Kataoka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PATTERN FORMING METHOD AND RESIST COMPOSITION
- Publication number 20130011785
- Publication date Jan 10, 2013
- FUJIFILM Corporation
- Keita Kato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20130004740
- Publication date Jan 3, 2013
- FUJIFILM CORPORATION
- Shohei KATAOKA
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PATTERN FORMING METHOD AND RESIST COMPOSITION
- Publication number 20120321855
- Publication date Dec 20, 2012
- FUJIFILM Corporation
- Kaoru Iwato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND...
- Publication number 20120251948
- Publication date Oct 4, 2012
- FUJIFILM CORPORATION
- Yusuke IIZUKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIV...
- Publication number 20120219913
- Publication date Aug 30, 2012
- FUJIFILM CORPORATION
- Shohei KATAOKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Shohei KATAOKA

Person

Patents Grantslast 30 patents

Electrolytic solution for non-aqueous secondary battery, non-aqueou...

Electrolytic solution for non-aqueous secondary battery and non-aqu...

M-phenylenediamine compound and method for producing polymer compou...

Active light sensitive or radiation sensitive resin composition, ac...

Pattern forming method, actinic ray-sensitive or radiation-sensitiv...

Pattern forming method and resist composition

Actinic-ray- or radiation-sensitive resin composition and method of...

Pattern forming method and resist composition

Pattern forming method, actinic ray-sensitive or radiation-sensitiv...

Pattern forming method, actinic ray-sensitive or radiation-sensitiv...

Actinic ray- or radiation-sensitive resin composition, actinic ray-...

Pattern forming method, method for manufacturing electronic device,...

Pattern forming method, actinic-ray-sensitive or radiation-sensitiv...

Pattern forming method and actinic ray-sensitive or radiation-sensi...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Actinic-ray- or radiation-sensitive resin composition and method of...

Pattern forming method, actinic ray-sensitive or radiation-sensitiv...

Pattern forming method, chemical amplification resist composition a...

Actinic ray-sensitive or radiation-sensitive resin composition and...

Actinic ray-sensitive or radiation-sensitive resin composition, and...

Actinic ray-sensitive or radiation-sensitive resin composition and...

Actinic-ray-sensitive or radiation-sensitive resin composition, res...

Method of forming pattern

Actinic-ray- or radiation-sensitive resin composition, compound and...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Composition, article and their production method, and film and its...

Patents Applicationslast 30 patents

TEXTILE PRINTING INK SET AND TEXTILE PRINTING METHOD

ELECTROLYTIC SOLUTION FOR NON-AQUEOUS SECONDARY BATTERY, NON-AQUEOU...

NOVEL M-PHENYLENEDIAMINE COMPOUND AND METHOD FOR PRODUCING POLYMER...

ELECTROLYTIC SOLUTION FOR NON-AQUEOUS SECONDARY BATTERY AND NON-AQU...

METHOD OF FORMING PATTERN

ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, AC...

PATTERN FORMING METHOD, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITI...

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...

ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE,...

METHOD OF FORMING PATTERN AND ACTINIC-RAY- OR RADIATION-SENSITIVE R...

PATTERN FORMING METHOD AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSI...

ACTINIC RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-...

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...

ACTINIC RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-...

ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

METHOD OF FORMING PATTERN

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...

PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION A...

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...

ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF...

PATTERN FORMING METHOD AND RESIST COMPOSITION

ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

PATTERN FORMING METHOD AND RESIST COMPOSITION

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND...

PATTERN FORMING METHOD, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIV...