Tetsuji Ueno

Person

Hsinchu City, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Epitaxial growth methods and structures thereof
- Patent number 12,369,374
- Issue date Jul 22, 2025
- Taiwan Semicoductor Manufacturing Co., Ltd.
- Tetsuji Ueno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor devices with tunable low-K inner air spacers
- Patent number 12,369,388
- Issue date Jul 22, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chen-Han Wang
Information Patent Grant
Seal material for air gaps in semiconductor devices
- Patent number 12,324,200
- Issue date Jun 3, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shuen-Shin Liang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Air spacer formation with a spin-on dielectric material
- Patent number 12,094,952
- Issue date Sep 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ting-Ting Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bilayer seal material for air gaps in semiconductor devices
- Patent number 11,901,220
- Issue date Feb 13, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shuen-Shin Liang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for manufacturing semiconductor devices with tunable low-k...
- Patent number 11,848,238
- Issue date Dec 19, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chen-Han Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Air spacer formation with a spin-on dielectric material
- Patent number 11,626,482
- Issue date Apr 11, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ting-Ting Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Epitaxial growth methods and structures thereof
- Patent number 11,456,360
- Issue date Sep 27, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tetsuji Ueno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Epitaxial growth methods and structures thereof
- Patent number 10,658,468
- Issue date May 19, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tetsuji Ueno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Epitaxial growth methods and structures thereof
- Patent number 10,453,925
- Issue date Oct 22, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tetsuji Ueno
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
AIR SPACER FORMATION WITH A SPIN-ON DIELECTRIC MATERIAL
- Publication number 20240363722
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ting-Ting CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BILAYER SEAL MATERIAL FOR AIR GAPS IN SEMICONDUCTOR DEVICES
- Publication number 20240162083
- Publication date May 16, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shuen-Shin LIANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEAL MATERIAL FOR AIR GAPS IN SEMICONDUCTOR DEVICES
- Publication number 20230268387
- Publication date Aug 24, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shuen-Shin LIANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AIR SPACER FORMATION WITH A SPIN-ON DIELECTRIC MATERIAL
- Publication number 20230242115
- Publication date Aug 3, 2023
- Taiwan Semiconductor For Manufactuing Co., Ltd.
- Ting-Ting CHEN
- B60 - VEHICLES IN GENERAL
Information Patent Application
TUNABLE LOW-K INNER AIR SPACERS OF SEMICONDUCTOR DEVICES
- Publication number 20220367278
- Publication date Nov 17, 2022
- Taiwan Semiconductor Manufafacturing Co, Ltd.
- Chen-Han WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AIR SPACER FORMATION WITH A SPIN-ON DIELECTRIC MATERIAL
- Publication number 20220285492
- Publication date Sep 8, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ting-Ting CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNABLE LOW-K INNER AIR SPACERS OF SEMICONDUCTOR DEVICES
- Publication number 20210407856
- Publication date Dec 30, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chen-Han WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BILAYER SEAL MATERIAL FOR AIR GAPS IN SEMICONDUCTOR DEVICES
- Publication number 20210193506
- Publication date Jun 24, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shuen-Shin LIANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EPITAXIAL GROWTH METHODS AND STRUCTURES THEREOF
- Publication number 20200279920
- Publication date Sep 3, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tetsuji Ueno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EPITAXIAL GROWTH METHODS AND STRUCTURES THEREOF
- Publication number 20190109194
- Publication date Apr 11, 2019
- Taiwan Semiconductor Manufacturing Co., LTD
- Tetsuji Ueno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EPITAXIAL GROWTH METHODS AND STRUCTURES THEREOF
- Publication number 20170221709
- Publication date Aug 3, 2017
- Taiwan Semiconductor Manufacturing Co., LTD
- Tetsuji Ueno
- H01 - BASIC ELECTRIC ELEMENTS

Tetsuji Ueno

Person

Patents Grantslast 30 patents

Epitaxial growth methods and structures thereof

Semiconductor devices with tunable low-K inner air spacers

Seal material for air gaps in semiconductor devices

Air spacer formation with a spin-on dielectric material

Bilayer seal material for air gaps in semiconductor devices

Methods for manufacturing semiconductor devices with tunable low-k...

Air spacer formation with a spin-on dielectric material

Epitaxial growth methods and structures thereof

Epitaxial growth methods and structures thereof

Epitaxial growth methods and structures thereof

Patents Applicationslast 30 patents

AIR SPACER FORMATION WITH A SPIN-ON DIELECTRIC MATERIAL

BILAYER SEAL MATERIAL FOR AIR GAPS IN SEMICONDUCTOR DEVICES

SEAL MATERIAL FOR AIR GAPS IN SEMICONDUCTOR DEVICES

AIR SPACER FORMATION WITH A SPIN-ON DIELECTRIC MATERIAL

TUNABLE LOW-K INNER AIR SPACERS OF SEMICONDUCTOR DEVICES

AIR SPACER FORMATION WITH A SPIN-ON DIELECTRIC MATERIAL

TUNABLE LOW-K INNER AIR SPACERS OF SEMICONDUCTOR DEVICES

BILAYER SEAL MATERIAL FOR AIR GAPS IN SEMICONDUCTOR DEVICES

EPITAXIAL GROWTH METHODS AND STRUCTURES THEREOF

EPITAXIAL GROWTH METHODS AND STRUCTURES THEREOF

EPITAXIAL GROWTH METHODS AND STRUCTURES THEREOF