Tokuhisa Ohiwa

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing method and manufacturing method of semiconductor...
- Patent number 9,177,781
- Issue date Nov 3, 2015
- Tokyo Electron Limited
- Shigeru Tahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposit removal method
- Patent number 9,126,229
- Issue date Sep 8, 2015
- Tokyo Electron Limited
- Shigeru Tahara
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Semiconductor device producing method
- Patent number 8,513,134
- Issue date Aug 20, 2013
- Kabushiki Kaisha Toshiba
- Mitsuhiro Omura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing same
- Patent number 8,487,365
- Issue date Jul 16, 2013
- Kabushiki Kaisha Toshiba
- Toshiyuki Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device including a patterned...
- Patent number 8,211,783
- Issue date Jul 3, 2012
- Kabushiki Kaisha Toshiba
- Noriko Sakurai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitive coupling plasma processing apparatus
- Patent number 7,767,055
- Issue date Aug 3, 2010
- Tokyo Electron Limited
- Shinji Himori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 7,767,582
- Issue date Aug 3, 2010
- Kabushiki Kaisha Toshiba
- Nobuyasu Nishiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing method for conservation of processing gases
- Patent number 7,628,931
- Issue date Dec 8, 2009
- Tokyo Electron Limited
- Masashi Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process monitoring system, process monitoring method, and method fo...
- Patent number 7,595,885
- Issue date Sep 29, 2009
- Kabushiki Kaisha Toshiba
- Takayuki Sakai
- G01 - MEASURING TESTING
Information Patent Grant
Process monitoring system, process monitoring method, and method fo...
- Patent number 7,349,088
- Issue date Mar 25, 2008
- Kabushiki Kaisha Toshiba
- Takayuki Sakai
- G01 - MEASURING TESTING
Information Patent Grant
Process monitoring system, process monitoring method, and method fo...
- Patent number 7,327,455
- Issue date Feb 5, 2008
- Kabushiki Kaisha Toshiba
- Takayuki Sakai
- G01 - MEASURING TESTING
Information Patent Grant
Etching method
- Patent number 7,285,498
- Issue date Oct 23, 2007
- Tokyo Electron Limited
- Kazuto Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 7,182,879
- Issue date Feb 27, 2007
- Kabushiki Kaisha Toshiba
- Itsuko Sakai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for fabricating a pattern and method for manufacturing a sem...
- Patent number 7,045,462
- Issue date May 16, 2006
- Kabushiki Kaisha Toshiba
- Takayuki Sakai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High speed silicon etching method
- Patent number 7,022,616
- Issue date Apr 4, 2006
- Tokyo Electron Limited
- Takanori Mimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of sequentially processing a plurality of lots each includin...
- Patent number 6,911,398
- Issue date Jun 28, 2005
- Kabushiki Kaisha Toshiba
- Masaki Narita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device and semiconductor device
- Patent number 6,887,802
- Issue date May 3, 2005
- Kabushiki Kaisha Toshiba
- Masaki Narita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High precision pattern forming method of manufacturing a semiconduc...
- Patent number 6,846,750
- Issue date Jan 25, 2005
- Kabushiki Kaisha Toshiba
- Tokuhisa Ohiwa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas recirculation flow control method and apparatus for use in vacu...
- Patent number 6,782,907
- Issue date Aug 31, 2004
- Ebara Corporation
- Hiroyuki Kawasaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus with reduced parasitic capacity and los...
- Patent number 6,780,278
- Issue date Aug 24, 2004
- Kabushiki Kaisha Toshiba
- Hisataka Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing a semiconductor device using recirculation...
- Patent number 6,689,699
- Issue date Feb 10, 2004
- Kabushiki Kaisha Toshiba
- Itsuko Sakai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Manufacturing method of semiconductor device using mask pattern hav...
- Patent number 6,576,562
- Issue date Jun 10, 2003
- Kabushiki Kaisha Toshiba
- Junko Ohuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 6,433,297
- Issue date Aug 13, 2002
- Kabushiki Kaisha Toshiba
- Akihiro Kojima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a pattern
- Patent number 6,420,271
- Issue date Jul 16, 2002
- Kabushiki Kaisha Toshiba
- Yasuhiko Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device with a thin gate stack having a plurality of i...
- Patent number 6,369,423
- Issue date Apr 9, 2002
- Kabushiki Kaisha Toshiba
- Tokuhisa Ohiwa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing a semiconductor device
- Patent number 6,274,512
- Issue date Aug 14, 2001
- Kabushiki Kaisha Toshiba
- Hisataka Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polycide etching with HCL and chlorine
- Patent number 5,874,363
- Issue date Feb 23, 1999
- Kabushiki Kaisha Toshiba
- Peter D. Hoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin film forming method and apparatus
- Patent number 5,658,389
- Issue date Aug 19, 1997
- Kabushiki Kaisha Toshiba
- Tetsuo Matsuda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dry etching method
- Patent number 5,310,454
- Issue date May 10, 1994
- Kabushiki Kaisha Toshiba
- Tokuhisa Ohiwa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of activating at least one gas to produce different charged...
- Patent number 5,094,879
- Issue date Mar 10, 1992
- Kabushiki Kaisha Toshiba
- Tetsuo Matsuda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS
- Publication number 20140284308
- Publication date Sep 25, 2014
- KABUSHIKI KAISHA TOSHIBA
- Shoichiro MATSUYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSIT REMOVAL METHOD
- Publication number 20140083979
- Publication date Mar 27, 2014
- TOKYO ELECTRON LIMITED
- Shigeru Tahara
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SEMICONDUCTOR DEVICE PRODUCING METHOD
- Publication number 20120021605
- Publication date Jan 26, 2012
- Mitsuhiro OMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND MANUFACTURING METHOD OF SEMICONDUCTOR...
- Publication number 20120009786
- Publication date Jan 12, 2012
- Kabushiki Kaisha Toshiba
- Shigeru TAHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME
- Publication number 20110291178
- Publication date Dec 1, 2011
- Kabushiki Kaisha Toshiba
- Toshiyuki SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20110183497
- Publication date Jul 28, 2011
- Kabushiki Kaisha Toshiba
- Noriko SAKURAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE CLEANING METHOD AND SUBSTRATE CLEANING APPARATUS
- Publication number 20110168205
- Publication date Jul 14, 2011
- TOKYO ELECTRON LIMITED
- Shigeru TAHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process monitoring system, process monitoring method, and method fo...
- Publication number 20080137083
- Publication date Jun 12, 2008
- Kabushiki Kaisha Toshiba
- Takayuki Sakai
- G01 - MEASURING TESTING
Information Patent Application
Process monitoring system, process monitoring method, and method fo...
- Publication number 20070273880
- Publication date Nov 29, 2007
- Kabushiki Kaisha Toshiba
- Takayuki Sakai
- G01 - MEASURING TESTING
Information Patent Application
SUBSTRATE TRANSFERRING APPARATUS, SUBSTRATE PROCESSING APPARATUS, A...
- Publication number 20070227033
- Publication date Oct 4, 2007
- TOKYO ELECTRON LIMITED
- Yoshiyuki Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing semiconductor device
- Publication number 20070082493
- Publication date Apr 12, 2007
- Nobuyasu Nishiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Capacitive coupling plasma processing apparatus
- Publication number 20060118044
- Publication date Jun 8, 2006
- Shinji Himori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processing method for conservation of processing gases
- Publication number 20050279731
- Publication date Dec 22, 2005
- TOKYO ELECTRON LIMITED
- Masashi Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing semiconductor device
- Publication number 20050215062
- Publication date Sep 29, 2005
- Osamu Miyagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process monitoring system, process monitoring method, and method fo...
- Publication number 20050140975
- Publication date Jun 30, 2005
- Takayuki Sakai
- G01 - MEASURING TESTING
Information Patent Application
Etching method
- Publication number 20050085077
- Publication date Apr 21, 2005
- Kazuto Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus with reduced parasitic capacity and los...
- Publication number 20040238126
- Publication date Dec 2, 2004
- KABUSHIKI KAISHA TOSHIBA
- Hisataka Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device including trench capacitor and manufacturing m...
- Publication number 20040188739
- Publication date Sep 30, 2004
- Keiichi Takenaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing semiconductor device
- Publication number 20040192034
- Publication date Sep 30, 2004
- Kabushiki Kaisha Toshiba
- Tokuhisa Ohiwa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method
- Publication number 20040168766
- Publication date Sep 2, 2004
- Kabushiki Kaisha Toshiba
- Itsuko Sakai
- B08 - CLEANING
Information Patent Application
Plasma processing apparatus and plasma processing method
- Publication number 20040144491
- Publication date Jul 29, 2004
- Junko Ohuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High speed silicon etching method
- Publication number 20040097079
- Publication date May 20, 2004
- Takanori Mimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for fabricating a pattern and method for manufacturing a sem...
- Publication number 20040058533
- Publication date Mar 25, 2004
- Takayuki Sakai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing semiconductor device and semiconductor device
- Publication number 20040017011
- Publication date Jan 29, 2004
- Masaki Narita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for manufacturing a semiconductor device
- Publication number 20030181031
- Publication date Sep 25, 2003
- Kabushiki Kaisha Toshiba
- Akihiro Kojima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing
- Publication number 20020192972
- Publication date Dec 19, 2002
- Masaki Narita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Dry etching method and apparatus
- Publication number 20020155724
- Publication date Oct 24, 2002
- Kabushiki Kaisha Toshiba
- Takayuki Sakai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of making semiconductor device
- Publication number 20020155727
- Publication date Oct 24, 2002
- Masaki Narita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gas recirculation flow control method and apparatus for use in vacu...
- Publication number 20020134439
- Publication date Sep 26, 2002
- Hiroyuki Kawasaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Manufacturing method of semiconductor device using mask pattern hav...
- Publication number 20020119612
- Publication date Aug 29, 2002
- Kabushiki Kaisha Toshiba
- Junko Ohuchi
- H01 - BASIC ELECTRIC ELEMENTS

Tokuhisa Ohiwa

Person

Patents Grantslast 30 patents

Plasma processing method and manufacturing method of semiconductor...

Deposit removal method

Semiconductor device producing method

Semiconductor device and method for manufacturing same

Method for manufacturing semiconductor device including a patterned...

Capacitive coupling plasma processing apparatus

Method of manufacturing semiconductor device

Processing method for conservation of processing gases

Process monitoring system, process monitoring method, and method fo...

Process monitoring system, process monitoring method, and method fo...

Process monitoring system, process monitoring method, and method fo...

Etching method

Plasma processing method

Method for fabricating a pattern and method for manufacturing a sem...

High speed silicon etching method

Method of sequentially processing a plurality of lots each includin...

Method of manufacturing semiconductor device and semiconductor device

High precision pattern forming method of manufacturing a semiconduc...

Gas recirculation flow control method and apparatus for use in vacu...

Plasma processing apparatus with reduced parasitic capacity and los...

Method for manufacturing a semiconductor device using recirculation...

Manufacturing method of semiconductor device using mask pattern hav...

Plasma processing method and plasma processing apparatus

Method of forming a pattern

Semiconductor device with a thin gate stack having a plurality of i...

Method for manufacturing a semiconductor device

Polycide etching with HCL and chlorine

Thin film forming method and apparatus

Dry etching method

Method of activating at least one gas to produce different charged...

Patents Applicationslast 30 patents

PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS

DEPOSIT REMOVAL METHOD

SEMICONDUCTOR DEVICE PRODUCING METHOD

PLASMA PROCESSING METHOD AND MANUFACTURING METHOD OF SEMICONDUCTOR...

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

SUBSTRATE CLEANING METHOD AND SUBSTRATE CLEANING APPARATUS

Process monitoring system, process monitoring method, and method fo...

Process monitoring system, process monitoring method, and method fo...

SUBSTRATE TRANSFERRING APPARATUS, SUBSTRATE PROCESSING APPARATUS, A...

Method of manufacturing semiconductor device

Capacitive coupling plasma processing apparatus

Processing method for conservation of processing gases

Method of manufacturing semiconductor device

Process monitoring system, process monitoring method, and method fo...

Etching method

Plasma processing apparatus with reduced parasitic capacity and los...

Semiconductor device including trench capacitor and manufacturing m...

Method of manufacturing semiconductor device

Plasma processing method

Plasma processing apparatus and plasma processing method

High speed silicon etching method

Method for fabricating a pattern and method for manufacturing a sem...

Method of manufacturing semiconductor device and semiconductor device

Method for manufacturing a semiconductor device

Plasma processing

Dry etching method and apparatus

Method of making semiconductor device

Gas recirculation flow control method and apparatus for use in vacu...

Manufacturing method of semiconductor device using mask pattern hav...