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Hsin-Chu, TW
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Patents Grants
last 30 patents
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Patent Grant
Metal etching with in situ plasma ashing
Patent number
11,699,596
Issue date
Jul 11, 2023
Taiwan Semiconductor Manufacturing Co., Ltd.
Hsing-Hsiang Wang
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
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Patent Application
METAL ETCHING WITH IN SITU PLASMA ASHING
Publication number
20220336228
Publication date
Oct 20, 2022
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Hsing-Hsiang WANG
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METAL ETCHING WITH IN SITU PLASMA ASHING
Publication number
20200176269
Publication date
Jun 4, 2020
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Hsing-Hsiang WANG
H01 - BASIC ELECTRIC ELEMENTS