Tsuyoshi Takahashi

Person

Nirasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 12,009,217
- Issue date Jun 11, 2024
- Tokyo Electron Limited
- Tsuyoshi Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming tungsten film and system therefor
- Patent number 11,840,759
- Issue date Dec 12, 2023
- Tokyo Electron Limited
- Masafumi Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 11,732,357
- Issue date Aug 22, 2023
- Tokyo Electron Limited
- Tsuyoshi Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming method and film forming apparatus
- Patent number 10,864,548
- Issue date Dec 15, 2020
- Tokyo Electron Limited
- Hiroaki Ashizawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming apparatus
- Patent number 10,612,141
- Issue date Apr 7, 2020
- Tokyo Electron Limited
- Tsuyoshi Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming method, film forming system and surface processing method
- Patent number 10,392,698
- Issue date Aug 27, 2019
- Tokyo Electron Limited
- Miyako Kaneko
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Method and device for processing substrate, and apparatus for manuf...
- Patent number 7,125,799
- Issue date Oct 24, 2006
- Tokyo Electron Limited
- Shintaro Aoyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming dielectric film
- Patent number 7,105,362
- Issue date Sep 12, 2006
- Tokyo Electron Limited
- Tsuyoshi Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Interfacial oxidation process for high-k gate dielectric process in...
- Patent number 6,974,779
- Issue date Dec 13, 2005
- Tokyo Electron Limited
- David L O'Meara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radical processing of a sub-nanometer insulation film
- Patent number 6,927,112
- Issue date Aug 9, 2005
- Tokyo Electron Limited
- Masanobu Igeta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming a dielectric film
- Patent number 6,866,890
- Issue date Mar 15, 2005
- Tokyo Electron Limited
- Hideki Kiryu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming a laminated structure to enhance metal silicide a...
- Patent number 6,489,208
- Issue date Dec 3, 2002
- Tokyo Electron Limited
- Masato Koizumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Laminated structure and a method of forming the same
- Patent number 6,404,021
- Issue date Jun 11, 2002
- Tokyo Electron Limited
- Masato Koizumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for forming laminated thin films or layers
- Patent number 6,251,188
- Issue date Jun 26, 2001
- Tokyo Electron Limited
- Tsuyoshi Hashimoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming tungsten silicide film
- Patent number 6,245,673
- Issue date Jun 12, 2001
- Tokyo Electron Limited
- Kazuya Okubo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for forming laminated thin films or layers
- Patent number 6,022,586
- Issue date Feb 8, 2000
- Tokyo Electron Limited
- Tsuyoshi Hashimoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
FILM FORMING METHOD, FILM FORMING DEVICE, AND METHOD FOR MANUFACTUR...
- Publication number 20230037960
- Publication date Feb 9, 2023
- Tokyo Electron Limited
- Seokhyoung HONG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING TITANIUM NITRIDE FILM AND APPARATUS FOR FORMING...
- Publication number 20230030762
- Publication date Feb 2, 2023
- TOKYO ELECTRON LIMITED
- Kensuke HIGUCHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TITANIUM NITRIDE FILM FORMING METHOD AND TITANIUM NITRIDE FILM FORM...
- Publication number 20220356565
- Publication date Nov 10, 2022
- TOKYO ELECTRON LIMITED
- Tsuyoshi TAKAHASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING TUNGSTEN FILM AND SYSTEM THEREFOR
- Publication number 20220290294
- Publication date Sep 15, 2022
- TOKYO ELECTRON LIMITED
- Masafumi TAKAHASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20220238311
- Publication date Jul 28, 2022
- Tokyo Electron Limited
- Atsushi KUBO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20220189779
- Publication date Jun 16, 2022
- Tokyo Electron Limited
- Tsuyoshi TAKAHASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20200392622
- Publication date Dec 17, 2020
- TOKYO ELECTRON LIMITED
- Tsuyoshi TAKAHASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM-FORMING METHOD AND FILM-FORMING APPARATUS
- Publication number 20200063258
- Publication date Feb 27, 2020
- TOKYO ELECTRON LIMITED
- Tsuyoshi TAKAHASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film-Forming Method and Film-Forming Apparatus
- Publication number 20200056287
- Publication date Feb 20, 2020
- TOKYO ELECTRON LIMITED
- Tsuyoshi TAKAHASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20180311700
- Publication date Nov 1, 2018
- TOKYO ELECTRON LIMITED
- Hiroaki Ashizawa
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
FILM FORMING APPARATUS AND FILM FORMING METHOD
- Publication number 20180112312
- Publication date Apr 26, 2018
- TOKYO ELECTRON LIMITED
- Masaya ODAGIRI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD, FILM FORMING SYSTEM AND SURFACE PROCESSING METHOD
- Publication number 20180037989
- Publication date Feb 8, 2018
- TOKYO ELECTRON LIMITED
- Miyako Kaneko
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING APPARATUS
- Publication number 20160177445
- Publication date Jun 23, 2016
- TOKYO ELECTRON LIMITED
- Tsuyoshi TAKAHASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM-FORMING APPARATUS, FILM-FORMING METHOD AND RECORDING MEDIUM
- Publication number 20090269494
- Publication date Oct 29, 2009
- TOKYO ELECTRON LIMITED
- Tsuyoshi Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS TREATMENT APPARATUS
- Publication number 20090250008
- Publication date Oct 8, 2009
- TOKYO ELECTRON LIMITED
- Noriaki Matsushima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD OF HIGH-K DIELECTRIC FILM
- Publication number 20080242113
- Publication date Oct 2, 2008
- TOKYO ELECTRON LIMITED
- Shintaro AOYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Formation of Gate Insulation Film
- Publication number 20080233764
- Publication date Sep 25, 2008
- Tsuyoshi Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Radical Processing of a Sub-Nanometer Insulation Film
- Publication number 20080139000
- Publication date Jun 12, 2008
- TOKYO ELECTRON LIMITED
- Masanobu Igeta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for forming metal silicate film, and method fo...
- Publication number 20070141257
- Publication date Jun 21, 2007
- TOKYO ELECTRON LIMITED
- Tsuyoshi Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of forming dielectric film
- Publication number 20060008969
- Publication date Jan 12, 2006
- TOKYO ELECTRON LIMITED
- Tsuyoshi Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film forming apparatus
- Publication number 20050223987
- Publication date Oct 13, 2005
- Teruo Iwata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Radical processing of a sub-nanometer insulation film
- Publication number 20050170541
- Publication date Aug 4, 2005
- TOKYO ELECTRON LIMITED
- Masanobu Igeta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Interfacial oxidation process for high-k gate dielectric process in...
- Publication number 20050059259
- Publication date Mar 17, 2005
- TOKYO ELECTRON LIMITED
- David L. O'Meara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and device for processing substrate, and apparatus for manuf...
- Publication number 20040241991
- Publication date Dec 2, 2004
- Shintaro Aoyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for film formation of gate insulator, apparatus for film for...
- Publication number 20040053472
- Publication date Mar 18, 2004
- Hideki Kiryu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of forming a dielectric film
- Publication number 20040005408
- Publication date Jan 8, 2004
- Hideki Kiryu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Radical processing of a sub-nanometer insulation film
- Publication number 20030170945
- Publication date Sep 11, 2003
- TOKYO ELECTRON LIMITED
- Masanobu Igeta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Laminated structure and a method of forming the same
- Publication number 20020058384
- Publication date May 16, 2002
- Masato Koizumi
- H01 - BASIC ELECTRIC ELEMENTS

Tsuyoshi Takahashi

Person

Patents Grantslast 30 patents

Substrate processing method and substrate processing apparatus

Method of forming tungsten film and system therefor

Substrate processing method and substrate processing apparatus

Film forming method and film forming apparatus

Film forming apparatus

Film forming method, film forming system and surface processing method

Method and device for processing substrate, and apparatus for manuf...

Method of forming dielectric film

Interfacial oxidation process for high-k gate dielectric process in...

Radical processing of a sub-nanometer insulation film

Method of forming a dielectric film

Method of forming a laminated structure to enhance metal silicide a...

Laminated structure and a method of forming the same

Apparatus for forming laminated thin films or layers

Method of forming tungsten silicide film

Method and apparatus for forming laminated thin films or layers

Patents Applicationslast 30 patents

FILM FORMING METHOD, FILM FORMING DEVICE, AND METHOD FOR MANUFACTUR...

METHOD FOR FORMING TITANIUM NITRIDE FILM AND APPARATUS FOR FORMING...

TITANIUM NITRIDE FILM FORMING METHOD AND TITANIUM NITRIDE FILM FORM...

METHOD OF FORMING TUNGSTEN FILM AND SYSTEM THEREFOR

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

FILM-FORMING METHOD AND FILM-FORMING APPARATUS

Film-Forming Method and Film-Forming Apparatus

FILM FORMING METHOD AND FILM FORMING APPARATUS

FILM FORMING APPARATUS AND FILM FORMING METHOD

FILM FORMING METHOD, FILM FORMING SYSTEM AND SURFACE PROCESSING METHOD

FILM FORMING APPARATUS

FILM-FORMING APPARATUS, FILM-FORMING METHOD AND RECORDING MEDIUM

GAS TREATMENT APPARATUS

FILM FORMING METHOD OF HIGH-K DIELECTRIC FILM

Formation of Gate Insulation Film

Radical Processing of a Sub-Nanometer Insulation Film

Method and apparatus for forming metal silicate film, and method fo...

Method of forming dielectric film

Film forming apparatus

Radical processing of a sub-nanometer insulation film

Interfacial oxidation process for high-k gate dielectric process in...

Method and device for processing substrate, and apparatus for manuf...

Method for film formation of gate insulator, apparatus for film for...

Method of forming a dielectric film

Radical processing of a sub-nanometer insulation film

Laminated structure and a method of forming the same