Abrasive powders, suspensions and pastes for polishing

Industry

CPC
C09K3/1454

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

CCHEMISTRY METALLURGY C09Paints, dyes C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE C09K3/00Materials not provided for elsewhere

Current Industry

C09K3/1454Abrasive powders, suspensions and pastes for polishing

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Polishing liquid and method for manufacturing glass substrate
- Patent number 12,252,633
- Issue date Mar 18, 2025
- Hoya Corporation
- Toshio Takizawa
- B24 - GRINDING POLISHING
Information Patent Grant
Slurry and polishing method
- Patent number 12,247,140
- Issue date Mar 11, 2025
- Resonac Corporation
- Tomohiro Iwano
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Polishing liquid
- Patent number 12,203,007
- Issue date Jan 21, 2025
- Hoya Corporation
- Hiroki Nakagawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Slurry and polishing method
- Patent number 12,173,219
- Issue date Dec 24, 2024
- Resonac Corporation
- Satoyuki Nomura
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Polishing agent for synthetic quartz glass substrate and method for...
- Patent number 12,173,193
- Issue date Dec 24, 2024
- Shin-Etsu Chemical Co., Ltd.
- Mitsuhito Takahashi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition and method for polysilicon CMP
- Patent number 12,157,834
- Issue date Dec 3, 2024
- CMC MATERIALS LLC
- Sarah Brosnan
- B24 - GRINDING POLISHING
Information Patent Grant
Slurry, screening method, and polishing method
- Patent number 12,104,112
- Issue date Oct 1, 2024
- Resonac Corporation
- Satoyuki Nomura
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Ruthenium CMP chemistry based on halogenation
- Patent number 12,037,517
- Issue date Jul 16, 2024
- Tokyo Electron Limited
- Paul Abel
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing slurry composition and method of poli...
- Patent number 12,024,651
- Issue date Jul 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Hung Liao
- B24 - GRINDING POLISHING
Information Patent Grant
Composite binding agent grinding wheel and preparation method thereof
- Patent number 11,858,093
- Issue date Jan 2, 2024
- ZHENGZHOU RESEARCH INSTITUTE FOR ABRASIVES & GRINDING CO., LTD.
- Yanjun Zhao
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Methods for polishing dielectric layer in forming semiconductor device
- Patent number 11,862,472
- Issue date Jan 2, 2024
- Yangtze Memory Technologies Co., Ltd.
- Xiaohong Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ruthenium CMP chemistry based on halogenation
- Patent number 11,820,919
- Issue date Nov 21, 2023
- Tokyo Electron Limited
- Paul Abel
- B24 - GRINDING POLISHING
Information Patent Grant
Calcium carbonate slurry
- Patent number 11,806,836
- Issue date Nov 7, 2023
- Illumina, Inc.
- Robert Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing liquid, polishing liquid set, and polishing method
- Patent number 11,767,448
- Issue date Sep 26, 2023
- Resonac Corporation
- Takaaki Matsumoto
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing compositions and methods of use thereof
- Patent number 11,732,157
- Issue date Aug 22, 2023
- Fujifilm Electronic Materials U.S.A., Inc.
- Yannan Liang
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical planarization composition for polishing oxide m...
- Patent number 11,718,767
- Issue date Aug 8, 2023
- VERSUM MATERIALS US, LLC
- Ming-Shih Tsai
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing agent, polishing method, and liquid additive for polishing
- Patent number 11,713,404
- Issue date Aug 1, 2023
- AGC Inc.
- Toshihiko Otsuki
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing compositions and methods of using same
- Patent number 11,680,186
- Issue date Jun 20, 2023
- Fujifilm Electronic Materials U.S.A., Inc.
- Eric Turner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition including a plurality of abrasive particles and method...
- Patent number 11,674,065
- Issue date Jun 13, 2023
- Saint-Gobain Ceramics & Plastics, Inc.
- Stephen Bottiglieri
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Slurry scraping mechanism and applying and scraping device used in...
- Patent number 11,633,876
- Issue date Apr 25, 2023
- Qingdao University of Technology
- Changhe Li
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Shallow trench isolation (STI) chemical mechanical planarization (C...
- Patent number 11,608,451
- Issue date Mar 21, 2023
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing composition, manufacturing method of polishing compositio...
- Patent number 11,518,911
- Issue date Dec 6, 2022
- FUJIMI INCORPORATED
- Yukinobu Yoshizaki
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing slurry, method for polishing glass, and method for manufa...
- Patent number 11,518,912
- Issue date Dec 6, 2022
- AGC Inc.
- Tomohiro Shibuya
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Slurry, and polishing method
- Patent number 11,518,920
- Issue date Dec 6, 2022
- SHOWA DENKO MATERIALS CO., LTD.
- Tomoyasu Hasegawa
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Barrier ruthenium chemical mechanical polishing slurry
- Patent number 11,505,718
- Issue date Nov 22, 2022
- FUJIFILM ELECTRONIC MATERIALS U.S.A., INC.
- David (Tawei) Lin
- B24 - GRINDING POLISHING
Information Patent Grant
Slurry and polishing method
- Patent number 11,505,731
- Issue date Nov 22, 2022
- SHOWA DENKO MATERIALS CO., LTD.
- Takaaki Matsumoto
- B24 - GRINDING POLISHING
Information Patent Grant
Slurry, polishing solution production method, and polishing method
- Patent number 11,499,078
- Issue date Nov 15, 2022
- SHOWA DENKO MATERIALS CO., LTD.
- Tomomi Kukita
- B24 - GRINDING POLISHING
Information Patent Grant
Slurry, method for producing polishing liquid, and polishing method
- Patent number 11,492,526
- Issue date Nov 8, 2022
- SHOWA DENKO MATERIALS CO., LTD.
- Tomoyasu Hasegawa
- B24 - GRINDING POLISHING
Information Patent Grant
Derivatized polyamino acids
- Patent number 11,492,514
- Issue date Nov 8, 2022
- CMC Materials, Inc.
- Na Zhang
- B24 - GRINDING POLISHING
Information Patent Grant
Methods for polishing dielectric layer in forming semiconductor device
- Patent number 11,462,415
- Issue date Oct 4, 2022
- Yangtze Memory Technologies Co., Ltd.
- Xiaohong Zhou
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
SLURRY, SCREENING METHOD, AND POLISHING METHOD
- Publication number 20250129279
- Publication date Apr 24, 2025
- Resonac Corporation
- Satoyuki NOMURA
- C01 - INORGANIC CHEMISTRY
Information Patent Application
SLURRY AND POLISHING METHOD
- Publication number 20250084294
- Publication date Mar 13, 2025
- Resonac Corporation
- Satoyuki NOMURA
- C01 - INORGANIC CHEMISTRY
Information Patent Application
SLURRY, SCREENING METHOD, AND POLISHING METHOD
- Publication number 20240425737
- Publication date Dec 26, 2024
- Resonac Corporation
- Satoyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD OF POLI...
- Publication number 20240327677
- Publication date Oct 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Hung Liao
- B24 - GRINDING POLISHING
Information Patent Application
Ruthenium CMP Chemistry Based On Halogenation
- Publication number 20240043721
- Publication date Feb 8, 2024
- TOKYO ELECTRON LIMITED
- Paul Abel
- B24 - GRINDING POLISHING
Information Patent Application
Polishing Compositions and Methods of Using Same
- Publication number 20230265313
- Publication date Aug 24, 2023
- Fujifilm Electronic Materials U.S.A., Inc.
- Eric Turner
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITE BINDING AGENT GRINDING WHEEL AND PREPARATION METHOD THEREOF
- Publication number 20230042029
- Publication date Feb 9, 2023
- ZHENGZHOU RESEARCH INSTITUTE FOR ABRASIVES & GRINDING CO., LTD.
- Yanjun Zhao
- B24 - GRINDING POLISHING
Information Patent Application
METHODS FOR POLISHING DIELECTRIC LAYER IN FORMING SEMICONDUCTOR DEVICE
- Publication number 20220406612
- Publication date Dec 22, 2022
- Yangtze Memory Technologies Co., Ltd.
- Xiaohong Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD OF POLI...
- Publication number 20220195246
- Publication date Jun 23, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Hung Liao
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING SLURRY COMPOSITION
- Publication number 20220127495
- Publication date Apr 28, 2022
- KCTECH CO., LTD.
- Jin Sook HWANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CMP SLURRY COMPOSITION FOR POLISHING TUNGSTEN PATTERN WAFER AND MET...
- Publication number 20220112401
- Publication date Apr 14, 2022
- Samsung SDI Co., Ltd.
- Won Jung KIM
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CALCIUM CARBONATE SLURRY
- Publication number 20220089910
- Publication date Mar 24, 2022
- Illumina, Inc.
- Robert Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SLURRY AND POLISHING METHOD
- Publication number 20220033680
- Publication date Feb 3, 2022
- Showa Denko Materials Co., Ltd.
- Tomohiro IWANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BLASTING ABRASIVES AND METHOD OF PRODUCING BLASTING ABRASIVES
- Publication number 20220033681
- Publication date Feb 3, 2022
- Conox, LLC
- Scott D. Trom
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING LIQUID, CARRIER PARTICLE, METHOD FOR REDUCING CERIUM OXID...
- Publication number 20210348030
- Publication date Nov 11, 2021
- Hoya Corporation
- Hiroki NAKAGAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
POLISHING AGENT, POLISHING METHOD, AND LIQUID ADDITIVE FOR POLISHING
- Publication number 20210261824
- Publication date Aug 26, 2021
- AGC Inc.
- Toshihiko Otsuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BARRIER RUTHENIUM CHEMICAL MECHANICAL POLISHING SLURRY
- Publication number 20210261822
- Publication date Aug 26, 2021
- FUJIFILM ELECTRONIC MATERIALS U.S.A., INC.
- David (Tawei) Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SLURRY, METHOD FOR PRODUCING POLISHING LIQUID, AND POLISHING METHOD
- Publication number 20210246346
- Publication date Aug 12, 2021
- Showa Denko Materials Co., Ltd.
- Tomoyasu HASEGAWA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING COMPOSITION, METHOD FOR PRODUCING POLISHING COMPOSITION,...
- Publication number 20210246334
- Publication date Aug 12, 2021
- FUJIMI INCORPORATED
- Tzu-Chun TSENG
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SLURRY SCREEDING MECHANISM AND COATING AND SCREEDING APPARATUS USED...
- Publication number 20210062057
- Publication date Mar 4, 2021
- QINGDAO UNIVERSITY OF TECHNOLOGY
- Changhe LI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING AGENT FOR SYNTHETIC QUARTZ GLASS SUBSTRATE AND METHOD FOR...
- Publication number 20200399504
- Publication date Dec 24, 2020
- Shin-Etsu Chemical Co., Ltd.
- Mitsuhito TAKAHASHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICAL-MECHANICAL POLISHING COMPOSITION COMPRISING BENZOTRIAZOLE...
- Publication number 20200255713
- Publication date Aug 13, 2020
- BASF SE
- Robert REICHARDT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION INCLUDING A PLURALITY OF ABRASIVE PARTICLES AND METHOD...
- Publication number 20200048516
- Publication date Feb 13, 2020
- Saint-Gobain Ceramics & Plastics, Inc.
- Stephen BOTTIGLIERI
- C01 - INORGANIC CHEMISTRY
Information Patent Application
Chemical Mechanical Planarization Of Films Comprising Elemental Sil...
- Publication number 20200032108
- Publication date Jan 30, 2020
- VERSUM MATERIALS US, LLC
- James Matthew Henry
- B24 - GRINDING POLISHING
Information Patent Application
METHOD FOR POLISHING GLASS SUBSTRATE, METHOD FOR MANUFACTURING GLAS...
- Publication number 20200032104
- Publication date Jan 30, 2020
- HOYA CORPORATION
- Hiroki NAKAGAWA
- B24 - GRINDING POLISHING
Information Patent Application
Composite Particles, Method of Refining And Use Thereof
- Publication number 20190359868
- Publication date Nov 28, 2019
- VERSUM MATERIALS US, LLC
- Hongjun Zhou
- B24 - GRINDING POLISHING
Information Patent Application
Organic Film CMP Slurry Composition and Polishing Method Using Same
- Publication number 20180362807
- Publication date Dec 20, 2018
- Samsung SDI Co., Ltd.
- Jung Min CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DOUBLE-FACE POLISHING DEVICE AND METHOD CAPABLE OF CONTROLLING RIGI...
- Publication number 20180243877
- Publication date Aug 30, 2018
- GUANGDONG UNIVERSITY OF TECHNOLOGY
- Jisheng PAN
- B24 - GRINDING POLISHING
Information Patent Application
SILICA-BASED POLISHING PARTICLE AND ABRASIVE
- Publication number 20180127627
- Publication date May 10, 2018
- JGC Catalysts and Chemicals Ltd
- Mitsuaki KUMAZAWA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD FOR POLISHING SILICON WAFER AND SURFACE TREATMENT COMPOSITION
- Publication number 20180030313
- Publication date Feb 1, 2018
- FUJIMI INCORPORATED
- Kohsuke TSUCHIYA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Abrasive powders, suspensions and pastes for polishing

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Polishing liquid and method for manufacturing glass substrate

Slurry and polishing method

Polishing liquid

Slurry and polishing method

Polishing agent for synthetic quartz glass substrate and method for...

Composition and method for polysilicon CMP

Slurry, screening method, and polishing method

Ruthenium CMP chemistry based on halogenation

Chemical mechanical polishing slurry composition and method of poli...

Composite binding agent grinding wheel and preparation method thereof

Methods for polishing dielectric layer in forming semiconductor device

Ruthenium CMP chemistry based on halogenation

Calcium carbonate slurry

Polishing liquid, polishing liquid set, and polishing method

Polishing compositions and methods of use thereof

Chemical mechanical planarization composition for polishing oxide m...

Polishing agent, polishing method, and liquid additive for polishing

Polishing compositions and methods of using same

Composition including a plurality of abrasive particles and method...

Slurry scraping mechanism and applying and scraping device used in...

Shallow trench isolation (STI) chemical mechanical planarization (C...

Polishing composition, manufacturing method of polishing compositio...

Polishing slurry, method for polishing glass, and method for manufa...

Slurry, and polishing method

Barrier ruthenium chemical mechanical polishing slurry

Slurry and polishing method

Slurry, polishing solution production method, and polishing method

Slurry, method for producing polishing liquid, and polishing method

Derivatized polyamino acids

Methods for polishing dielectric layer in forming semiconductor device

Patents Applicationslast 30 patents

SLURRY, SCREENING METHOD, AND POLISHING METHOD

SLURRY AND POLISHING METHOD

SLURRY, SCREENING METHOD, AND POLISHING METHOD

CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD OF POLI...

Ruthenium CMP Chemistry Based On Halogenation

Polishing Compositions and Methods of Using Same

COMPOSITE BINDING AGENT GRINDING WHEEL AND PREPARATION METHOD THEREOF

METHODS FOR POLISHING DIELECTRIC LAYER IN FORMING SEMICONDUCTOR DEVICE

CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD OF POLI...

POLISHING SLURRY COMPOSITION

CMP SLURRY COMPOSITION FOR POLISHING TUNGSTEN PATTERN WAFER AND MET...

CALCIUM CARBONATE SLURRY

SLURRY AND POLISHING METHOD

BLASTING ABRASIVES AND METHOD OF PRODUCING BLASTING ABRASIVES

POLISHING LIQUID, CARRIER PARTICLE, METHOD FOR REDUCING CERIUM OXID...

POLISHING AGENT, POLISHING METHOD, AND LIQUID ADDITIVE FOR POLISHING

BARRIER RUTHENIUM CHEMICAL MECHANICAL POLISHING SLURRY

SLURRY, METHOD FOR PRODUCING POLISHING LIQUID, AND POLISHING METHOD

POLISHING COMPOSITION, METHOD FOR PRODUCING POLISHING COMPOSITION,...

SLURRY SCREEDING MECHANISM AND COATING AND SCREEDING APPARATUS USED...

POLISHING AGENT FOR SYNTHETIC QUARTZ GLASS SUBSTRATE AND METHOD FOR...

CHEMICAL-MECHANICAL POLISHING COMPOSITION COMPRISING BENZOTRIAZOLE...

COMPOSITION INCLUDING A PLURALITY OF ABRASIVE PARTICLES AND METHOD...

Chemical Mechanical Planarization Of Films Comprising Elemental Sil...

METHOD FOR POLISHING GLASS SUBSTRATE, METHOD FOR MANUFACTURING GLAS...

Composite Particles, Method of Refining And Use Thereof

Organic Film CMP Slurry Composition and Polishing Method Using Same

DOUBLE-FACE POLISHING DEVICE AND METHOD CAPABLE OF CONTROLLING RIGI...

SILICA-BASED POLISHING PARTICLE AND ABRASIVE

METHOD FOR POLISHING SILICON WAFER AND SURFACE TREATMENT COMPOSITION