Antiabrasion

Industry

CPC
G03C2001/7621

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Parent Industries

GPHYSICS G03Photography G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHOTOGRAPHIC PROCESSES

Current Industry

G03C2001/7621Antiabrasion

Industries

Patents Grantslast 30 patents

Information Patent Grant
Preparation of polyamides
- Patent number 8,772,438
- Issue date Jul 8, 2014
- INVISTA North America S.ar.l.
- Keith Whiston
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Scratch resistant-water resistant overcoat for photographic systems
- Patent number 6,465,165
- Issue date Oct 15, 2002
- Eastman Kodak Company
- Christine J. Landry-Coltrain
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Protecting layer for image recording materials
- Patent number 6,221,546
- Issue date Apr 24, 2001
- Eastman Kodak Company
- Hwei-Ling Yau
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Protecting layer for gelatin based photographic products containing...
- Patent number 6,165,653
- Issue date Dec 26, 2000
- Eastman Kodak Company
- Hwei-ling Yau
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photographic elements containing matte particles of bimodal size di...
- Patent number 5,595,862
- Issue date Jan 21, 1997
- Eastman Kodak Company
- Alfred B. Fant
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photographic elements containing matte particles of bimodal size di...
- Patent number 5,550,011
- Issue date Aug 27, 1996
- Eastman Kodak Company
- Alfred B. Fant
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photographic light-sensitive elements
- Patent number 5,378,577
- Issue date Jan 3, 1995
- Eastman Kodak Company
- Dennis E. Smith
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PREPARATION OF POLYAMIDES
- Publication number 20120264907
- Publication date Oct 18, 2012
- Invista North America S.A.R.L
- Keith Whiston
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SCRSTCH RESISTANT-WATER RESISTANT OVERCOAT FOR PHOTOGRAPHIC SYSTEMS
- Publication number 20020076627
- Publication date Jun 20, 2002
- CHRISTINE J. LANDRY-COLTRAIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Antiabrasion

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Preparation of polyamides

Scratch resistant-water resistant overcoat for photographic systems

Protecting layer for image recording materials

Protecting layer for gelatin based photographic products containing...

Photographic elements containing matte particles of bimodal size di...

Photographic elements containing matte particles of bimodal size di...

Photographic light-sensitive elements

Patents Applicationslast 30 patents

PREPARATION OF POLYAMIDES

SCRSTCH RESISTANT-WATER RESISTANT OVERCOAT FOR PHOTOGRAPHIC SYSTEMS