Aqueous dispersions

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CPC
C09G1/04

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Parent Industries

CCHEMISTRY METALLURGY C09Paints, dyes C09GPOLISHING COMPOSITIONS OTHER THAN FRENCH POLISH SKI WAXES C09G1/00Polishing compositions

Current Industry

C09G1/04Aqueous dispersions

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Semiconductor element
- Patent number 12,163,058
- Issue date Dec 10, 2024
- Jae-Wan Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition and method for polysilicon CMP
- Patent number 12,157,834
- Issue date Dec 3, 2024
- CMC MATERIALS LLC
- Sarah Brosnan
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing composition
- Patent number 12,146,077
- Issue date Nov 19, 2024
- FUJIMI INCORPORATED
- Yasuaki Ito
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Semiconductor element
- Patent number 12,146,076
- Issue date Nov 19, 2024
- Jae-Wan Park
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Silicon carbide substrate
- Patent number 12,104,278
- Issue date Oct 1, 2024
- Sumitomo Electric Industries, Ltd.
- Tsubasa Honke
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing liquid and chemical mechanical polishing method
- Patent number 12,098,301
- Issue date Sep 24, 2024
- FUJIFILM Corporation
- Tetsuya Kamimura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
CMP slurry composition for polishing tungsten pattern wafer and met...
- Patent number 12,077,681
- Issue date Sep 3, 2024
- Samsung SDI Co., Ltd.
- Ji Ho Lee
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing compositions for reduced defectivity and methods of using...
- Patent number 12,065,587
- Issue date Aug 20, 2024
- Fujifilm Electronic Materials U.S.A., Inc.
- James McDonough
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Hydrophilization treatment liquid for semiconductor wafer surface
- Patent number 12,060,498
- Issue date Aug 13, 2024
- Daicel Corporation
- Yuichi Sakanishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ruthenium CMP chemistry based on halogenation
- Patent number 12,037,517
- Issue date Jul 16, 2024
- Tokyo Electron Limited
- Paul Abel
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing slurry composition and method of poli...
- Patent number 12,024,651
- Issue date Jul 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Hung Liao
- B24 - GRINDING POLISHING
Information Patent Grant
Composition for etching and manufacturing method of semiconductor d...
- Patent number 12,012,525
- Issue date Jun 18, 2024
- Jae-Wan Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for etching and manufacturing method of semiconductor d...
- Patent number 11,912,902
- Issue date Feb 27, 2024
- Jae-Wan Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for polishing dielectric layer in forming semiconductor device
- Patent number 11,862,472
- Issue date Jan 2, 2024
- Yangtze Memory Technologies Co., Ltd.
- Xiaohong Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hard abrasive particle-free polishing of hard materials
- Patent number 11,820,918
- Issue date Nov 21, 2023
- Entegris, Inc.
- Rajiv K. Singh
- B24 - GRINDING POLISHING
Information Patent Grant
Ruthenium CMP chemistry based on halogenation
- Patent number 11,820,919
- Issue date Nov 21, 2023
- Tokyo Electron Limited
- Paul Abel
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing pad and polishing method
- Patent number 11,813,713
- Issue date Nov 14, 2023
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bryan E. Barton
- B24 - GRINDING POLISHING
Information Patent Grant
Calcium carbonate slurry
- Patent number 11,806,836
- Issue date Nov 7, 2023
- Illumina, Inc.
- Robert Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Freeze-thaw stable water-in-oil emulsion cleaner and/or polish comp...
- Patent number 11,773,293
- Issue date Oct 3, 2023
- S. C. Johnson & Son, Inc.
- Bing Li
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing liquid, polishing liquid set, and polishing method
- Patent number 11,767,448
- Issue date Sep 26, 2023
- Resonac Corporation
- Takaaki Matsumoto
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing compositions and methods of use thereof
- Patent number 11,732,157
- Issue date Aug 22, 2023
- Fujifilm Electronic Materials U.S.A., Inc.
- Yannan Liang
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical planarization composition for polishing oxide m...
- Patent number 11,718,767
- Issue date Aug 8, 2023
- VERSUM MATERIALS US, LLC
- Ming-Shih Tsai
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing composition containing composite sili...
- Patent number 11,718,769
- Issue date Aug 8, 2023
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Yi Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing agent, polishing method, and liquid additive for polishing
- Patent number 11,713,404
- Issue date Aug 1, 2023
- AGC Inc.
- Toshihiko Otsuki
- B24 - GRINDING POLISHING
Information Patent Grant
Intermediate raw material, and polishing composition and compositio...
- Patent number 11,692,137
- Issue date Jul 4, 2023
- FUJIMI CORPORATION
- Tsutomu Yoshino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing compositions and methods of using same
- Patent number 11,680,186
- Issue date Jun 20, 2023
- Fujifilm Electronic Materials U.S.A., Inc.
- Eric Turner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structure and formation method of semiconductor device with conduct...
- Patent number 11,532,514
- Issue date Dec 20, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Li-Chieh Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing slurry, method for polishing glass, and method for manufa...
- Patent number 11,518,912
- Issue date Dec 6, 2022
- AGC Inc.
- Tomohiro Shibuya
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Composition for etching and manufacturing method of semiconductor d...
- Patent number 11,512,226
- Issue date Nov 29, 2022
- Jae-Wan Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Barrier ruthenium chemical mechanical polishing slurry
- Patent number 11,505,718
- Issue date Nov 22, 2022
- FUJIFILM ELECTRONIC MATERIALS U.S.A., INC.
- David (Tawei) Lin
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
COMPOSITION FOR ETCHING AND MANUFACTURING METHOD OF SEMICONDUCTOR D...
- Publication number 20250026962
- Publication date Jan 23, 2025
- SOULBRAIN CO., LTD
- Jae-Wan PARK
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICAL MECHANICAL POLISH SLURRY AND METHOD OF MANUFACTURE
- Publication number 20240395562
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Hao Kung
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD OF POLI...
- Publication number 20240327677
- Publication date Oct 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Hung Liao
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING SLURRY AND METHOD OF MANUFACTURING SE...
- Publication number 20240318039
- Publication date Sep 26, 2024
- Samsung Electronics Co., Ltd.
- Yearin BYUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD OF MANU...
- Publication number 20240318040
- Publication date Sep 26, 2024
- Samsung Electronics Co., Ltd.
- Yearin Byun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITIONS AND METHODS OF USE THEREOF
- Publication number 20240141205
- Publication date May 2, 2024
- Fujifilm Electronic Materials U.S.A., Inc.
- Ting-Kai Huang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING LIQUID FOR POLISHING COMPOUND SEMICONDUCTOR SUBSTRATE
- Publication number 20240076522
- Publication date Mar 7, 2024
- Disco Corporation
- Ayumu SAKAI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Ruthenium CMP Chemistry Based On Halogenation
- Publication number 20240043721
- Publication date Feb 8, 2024
- TOKYO ELECTRON LIMITED
- Paul Abel
- B24 - GRINDING POLISHING
Information Patent Application
SURFACE TREATMENT ARTICLES, DEVICES AND METHODS FOR MAKING THE SAME
- Publication number 20240016154
- Publication date Jan 18, 2024
- SoClean, Inc.
- Dean MARCARELLI
- A01 - AGRICULTURE FORESTRY ANIMAL HUSBANDRY HUNTING TRAPPING FISHING
Information Patent Application
POLISHING LIQUID FOR POLISHING COMPOUND SEMICONDUCTOR SUBSTRATE
- Publication number 20230357601
- Publication date Nov 9, 2023
- Disco Corporation
- Ayumu SAKAI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SLURRY COMPOSITION FOR POLISHING METAL AND METHOD OF MANUFACTURING...
- Publication number 20230332015
- Publication date Oct 19, 2023
- Samsung Electronics Co., Ltd.
- Inkwon KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Polishing Compositions and Methods of Using Same
- Publication number 20230265313
- Publication date Aug 24, 2023
- Fujifilm Electronic Materials U.S.A., Inc.
- Eric Turner
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICAL POLISHING BATH FOR ALUMINUM AND ALUMINUM ALLOYS, AND METHO...
- Publication number 20230193476
- Publication date Jun 22, 2023
- INSTITUT DE RECHERCHE TECHNOLOGIQUE MATÉRIAUX, MÉTALLURGIE, PROCÉDÉS
- Jérôme FRAYRET
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHEMICAL PLANARIZATION
- Publication number 20230143013
- Publication date May 11, 2023
- CHEMPOWER CORPORATION
- Sudhanshu Misra
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
TOOLS FOR CHEMICAL PLANARIZATION
- Publication number 20230077988
- Publication date Mar 16, 2023
- CHEMPOWER CORPORATION
- Sudhanshu Misra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITIONS AND METHODS OF USE THEREOF
- Publication number 20230052829
- Publication date Feb 16, 2023
- Fujifilm Electronic Materials U.S.A., Inc.
- Ting-Kai Huang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHODS FOR POLISHING DIELECTRIC LAYER IN FORMING SEMICONDUCTOR DEVICE
- Publication number 20220406612
- Publication date Dec 22, 2022
- Yangtze Memory Technologies Co., Ltd.
- Xiaohong Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
With-In Die Non-Uniformities (WID-NU) In Planarization
- Publication number 20220372332
- Publication date Nov 24, 2022
- VERSUM MATERIALS US, LLC
- LU GAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING COMPOSITIONS FOR REDUCED DEFECTIVITY AND METHODS OF USING...
- Publication number 20220348792
- Publication date Nov 3, 2022
- James McDonough
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SUSPENSION FOR CHEMICAL MECHANICAL PLANARIZATION (CMP) AND METHOD E...
- Publication number 20220315802
- Publication date Oct 6, 2022
- Entegris, Inc.
- Sridevi R. ALETY
- B82 - NANO-TECHNOLOGY
Information Patent Application
CMP SLURRY COMPOSITION FOR POLISHING TUNGSTEN PATTERN WAFER AND MET...
- Publication number 20220298382
- Publication date Sep 22, 2022
- Samsung SDI Co., Ltd.
- Ji Ho LEE
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP SLURRY COMPOSITION FOR POLISHING TUNGSTEN PATTERN WAFER AND MET...
- Publication number 20220298381
- Publication date Sep 22, 2022
- Samsung SDI Co., Ltd.
- Soo Yeon SIM
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SILICON CARBONITRIDE POLISHING COMPOSITION AND METHOD
- Publication number 20220243094
- Publication date Aug 4, 2022
- CMC Materials, Inc.
- Lung-Tai LU
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHITOSAN BASED COATING SYSTEM
- Publication number 20220227894
- Publication date Jul 21, 2022
- BONA AB
- John F Schierlmann
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CHEMICAL MECHANICAL POLISHING PAD AND POLISHING METHOD
- Publication number 20220226957
- Publication date Jul 21, 2022
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bryan E. Barton
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SURFACE TREATMENT ARTICLES, DEVICES AND METHODS FOR MAKING THE SAME
- Publication number 20220211042
- Publication date Jul 7, 2022
- SoClean, Inc.
- Dean MARCARELLI
- A01 - AGRICULTURE FORESTRY ANIMAL HUSBANDRY HUNTING TRAPPING FISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD OF POLI...
- Publication number 20220195246
- Publication date Jun 23, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Hung Liao
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICAL MECHANICAL POLISHING COMPOSITION CONTAINING COMPOSITE SILI...
- Publication number 20220177729
- Publication date Jun 9, 2022
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Yi Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FREEZE-THAW STABLE WATER-IN-OIL EMULSION CLEANER AND/OR POLISH COMP...
- Publication number 20220145133
- Publication date May 12, 2022
- S.C. JOHNSON & SON, INC.
- Bing Li
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
POLISHING AGENT REGENERATING METHOD AND POLISHING AGENT RECYCLE PRO...
- Publication number 20220111489
- Publication date Apr 14, 2022
- Konica Minolta, Inc.
- Keisuke MIZOGUCHI
- B24 - GRINDING POLISHING

Aqueous dispersions

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Semiconductor element

Composition and method for polysilicon CMP

Polishing composition

Semiconductor element

Silicon carbide substrate

Polishing liquid and chemical mechanical polishing method

CMP slurry composition for polishing tungsten pattern wafer and met...

Polishing compositions for reduced defectivity and methods of using...

Hydrophilization treatment liquid for semiconductor wafer surface

Ruthenium CMP chemistry based on halogenation

Chemical mechanical polishing slurry composition and method of poli...

Composition for etching and manufacturing method of semiconductor d...

Composition for etching and manufacturing method of semiconductor d...

Methods for polishing dielectric layer in forming semiconductor device

Hard abrasive particle-free polishing of hard materials

Ruthenium CMP chemistry based on halogenation

Chemical mechanical polishing pad and polishing method

Calcium carbonate slurry

Freeze-thaw stable water-in-oil emulsion cleaner and/or polish comp...

Polishing liquid, polishing liquid set, and polishing method

Polishing compositions and methods of use thereof

Chemical mechanical planarization composition for polishing oxide m...

Chemical mechanical polishing composition containing composite sili...

Polishing agent, polishing method, and liquid additive for polishing

Intermediate raw material, and polishing composition and compositio...

Polishing compositions and methods of using same

Structure and formation method of semiconductor device with conduct...

Polishing slurry, method for polishing glass, and method for manufa...

Composition for etching and manufacturing method of semiconductor d...

Barrier ruthenium chemical mechanical polishing slurry

Patents Applicationslast 30 patents

COMPOSITION FOR ETCHING AND MANUFACTURING METHOD OF SEMICONDUCTOR D...

CHEMICAL MECHANICAL POLISH SLURRY AND METHOD OF MANUFACTURE

CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD OF POLI...

CHEMICAL MECHANICAL POLISHING SLURRY AND METHOD OF MANUFACTURING SE...

CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD OF MANU...

COMPOSITIONS AND METHODS OF USE THEREOF

POLISHING LIQUID FOR POLISHING COMPOUND SEMICONDUCTOR SUBSTRATE

Ruthenium CMP Chemistry Based On Halogenation

SURFACE TREATMENT ARTICLES, DEVICES AND METHODS FOR MAKING THE SAME

POLISHING LIQUID FOR POLISHING COMPOUND SEMICONDUCTOR SUBSTRATE

SLURRY COMPOSITION FOR POLISHING METAL AND METHOD OF MANUFACTURING...

Polishing Compositions and Methods of Using Same

CHEMICAL POLISHING BATH FOR ALUMINUM AND ALUMINUM ALLOYS, AND METHO...

CHEMICAL PLANARIZATION

TOOLS FOR CHEMICAL PLANARIZATION

COMPOSITIONS AND METHODS OF USE THEREOF

METHODS FOR POLISHING DIELECTRIC LAYER IN FORMING SEMICONDUCTOR DEVICE

With-In Die Non-Uniformities (WID-NU) In Planarization

POLISHING COMPOSITIONS FOR REDUCED DEFECTIVITY AND METHODS OF USING...

SUSPENSION FOR CHEMICAL MECHANICAL PLANARIZATION (CMP) AND METHOD E...

CMP SLURRY COMPOSITION FOR POLISHING TUNGSTEN PATTERN WAFER AND MET...

CMP SLURRY COMPOSITION FOR POLISHING TUNGSTEN PATTERN WAFER AND MET...

SILICON CARBONITRIDE POLISHING COMPOSITION AND METHOD

CHITOSAN BASED COATING SYSTEM

CHEMICAL MECHANICAL POLISHING PAD AND POLISHING METHOD

SURFACE TREATMENT ARTICLES, DEVICES AND METHODS FOR MAKING THE SAME

CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD OF POLI...

CHEMICAL MECHANICAL POLISHING COMPOSITION CONTAINING COMPOSITE SILI...

FREEZE-THAW STABLE WATER-IN-OIL EMULSION CLEANER AND/OR POLISH COMP...

POLISHING AGENT REGENERATING METHOD AND POLISHING AGENT RECYCLE PRO...