Aqueous liquid suspensions

Industry

CPC
C09K3/1463

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Parent Industries

CCHEMISTRY METALLURGY C09Paints, dyes C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE C09K3/00Materials not provided for elsewhere

Current Industry

C09K3/1463Aqueous liquid suspensions

Industries

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Patents Grantslast 30 patents

Information Patent Grant
MXene with excellent mechanical strength and fast and high-yield an...
- Patent number 12,173,215
- Issue date Dec 24, 2024
- Korea Institute of Science and Technology
- Chong Min Koo
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Composition and method for polysilicon CMP
- Patent number 12,157,834
- Issue date Dec 3, 2024
- CMC MATERIALS LLC
- Sarah Brosnan
- B24 - GRINDING POLISHING
Information Patent Grant
CMP slurry composition for polishing tungsten pattern wafer and met...
- Patent number 12,077,681
- Issue date Sep 3, 2024
- Samsung SDI Co., Ltd.
- Ji Ho Lee
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing slurry composition and method of poli...
- Patent number 12,024,651
- Issue date Jul 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Hung Liao
- B24 - GRINDING POLISHING
Information Patent Grant
Portable wet sand blaster
- Patent number 11,911,874
- Issue date Feb 27, 2024
- Richard J. Hayes
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Abrasive water-jet cutting machine
- Patent number 11,904,437
- Issue date Feb 20, 2024
- Politecnico di Milano
- Massimiliano Annoni
- B24 - GRINDING POLISHING
Information Patent Grant
Alternative oxidizing agents for cobalt CMP
- Patent number 11,851,584
- Issue date Dec 26, 2023
- CMC Materials, Inc.
- Steven Kraft
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Calcium carbonate slurry
- Patent number 11,806,836
- Issue date Nov 7, 2023
- Illumina, Inc.
- Robert Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing liquid, polishing liquid set, and polishing method
- Patent number 11,767,448
- Issue date Sep 26, 2023
- Resonac Corporation
- Takaaki Matsumoto
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing method, and polishing composition and method for producin...
- Patent number 11,749,531
- Issue date Sep 5, 2023
- FUJIMI INCORPORATED
- Yoshihiro Izawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical processing of additive manufactured workpieces
- Patent number 11,732,366
- Issue date Aug 22, 2023
- REM Technologies, Inc.
- Agustin Diaz
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Polishing compositions and methods of use thereof
- Patent number 11,732,157
- Issue date Aug 22, 2023
- Fujifilm Electronic Materials U.S.A., Inc.
- Yannan Liang
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing of substrates containing copper and r...
- Patent number 11,725,117
- Issue date Aug 15, 2023
- BASF SE
- Haci Osman Guevenc
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Chemical mechanical planarization composition for polishing oxide m...
- Patent number 11,718,767
- Issue date Aug 8, 2023
- VERSUM MATERIALS US, LLC
- Ming-Shih Tsai
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing agent, polishing method, and liquid additive for polishing
- Patent number 11,713,404
- Issue date Aug 1, 2023
- AGC Inc.
- Toshihiko Otsuki
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing compositions and methods of using same
- Patent number 11,680,186
- Issue date Jun 20, 2023
- Fujifilm Electronic Materials U.S.A., Inc.
- Eric Turner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical polishing slurry composition, method for chemic...
- Patent number 11,658,065
- Issue date May 23, 2023
- Taiwan Semiconductor Manufacturing Company Ltd.
- Ji Cui
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Shallow trench isolation (STI) chemical mechanical planarization (C...
- Patent number 11,608,451
- Issue date Mar 21, 2023
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Slurry, polishing-liquid set, polishing liquid, and polishing metho...
- Patent number 11,578,236
- Issue date Feb 14, 2023
- SHOWA DENKO MATERIALS CO., LTD.
- Hisataka Minami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing composition, manufacturing method of polishing compositio...
- Patent number 11,518,911
- Issue date Dec 6, 2022
- FUJIMI INCORPORATED
- Yukinobu Yoshizaki
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing slurry, method for polishing glass, and method for manufa...
- Patent number 11,518,912
- Issue date Dec 6, 2022
- AGC Inc.
- Tomohiro Shibuya
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Barrier ruthenium chemical mechanical polishing slurry
- Patent number 11,505,718
- Issue date Nov 22, 2022
- FUJIFILM ELECTRONIC MATERIALS U.S.A., INC.
- David (Tawei) Lin
- B24 - GRINDING POLISHING
Information Patent Grant
Derivatized polyamino acids
- Patent number 11,492,514
- Issue date Nov 8, 2022
- CMC Materials, Inc.
- Na Zhang
- B24 - GRINDING POLISHING
Information Patent Grant
Fluid synthesis system
- Patent number 11,401,450
- Issue date Aug 2, 2022
- NIKON CORPORATION
- Takashi Nagata
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Polishing slurry, method for polishing glass, and method for manufa...
- Patent number 11,370,939
- Issue date Jun 28, 2022
- AGC Inc.
- Tomohiro Shibuya
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Abrasive grains, evaluation method therefor, and wafer manufacturin...
- Patent number 11,373,858
- Issue date Jun 28, 2022
- Sumco Corporation
- Makoto Funayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor substrate polishing methods
- Patent number 11,367,649
- Issue date Jun 21, 2022
- GlobalWafers Co., Ltd.
- Hui Wang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing liquid, polishing liquid set and polishing method
- Patent number 11,352,523
- Issue date Jun 7, 2022
- SHOWA DENKO MATERIALS CO., LTD.
- Tomohiro Iwano
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing method
- Patent number 11,339,308
- Issue date May 24, 2022
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Wei-Wen Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing composition and polishing method using same
- Patent number 11,332,640
- Issue date May 17, 2022
- FUJIMI INCORPORATED
- Megumi Taniguchi
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD OF POLI...
- Publication number 20240327677
- Publication date Oct 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Hung Liao
- B24 - GRINDING POLISHING
Information Patent Application
ABRASIVE SLURRY REGENERATION METHOD AND ABRASIVE SLURRY REGENERATIO...
- Publication number 20240091905
- Publication date Mar 21, 2024
- Konica Minolta, Inc.
- Shin NAKAYAMA
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING LIQUID, POLISHING LIQUID SET AND POLISHING METHOD
- Publication number 20240052222
- Publication date Feb 15, 2024
- Daisuke IIKURA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICAL MECHANICAL POLISHING OF SUBSTRATES CONTAINING COPPER AND R...
- Publication number 20230416570
- Publication date Dec 28, 2023
- BASF SE
- Haci Osman GUEVENC
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Polishing Compositions and Methods of Using Same
- Publication number 20230265313
- Publication date Aug 24, 2023
- Fujifilm Electronic Materials U.S.A., Inc.
- Eric Turner
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ABRASIVE ARTICLES INCLUDING AN ANTI-LOADING SIZE LAYER WITH ENHANCE...
- Publication number 20230089669
- Publication date Mar 23, 2023
- 3M Innovative Properties Company
- Lan Hong Liu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PORTABLE WET SAND BLASTER
- Publication number 20230035722
- Publication date Feb 2, 2023
- Richard J. Hayes
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING METHOD, AND POLISHING COMPOSITION AND METHOD FOR PRODUCIN...
- Publication number 20220415669
- Publication date Dec 29, 2022
- FUJIMI INCORPORATED
- Yoshihiro IZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHODS OF FINISHING A METALLIC SURFACE
- Publication number 20220389277
- Publication date Dec 8, 2022
- 3M Innovative Properties Company
- Andrew R. Henry
- B24 - GRINDING POLISHING
Information Patent Application
SURFACE MODIFIED SILANIZED COLLOIDAL SILICA PARTICLES
- Publication number 20220348789
- Publication date Nov 3, 2022
- Rohm and Haas Electronics Materials CMP Holdings, Inc.
- Changzai CHI
- B82 - NANO-TECHNOLOGY
Information Patent Application
SPHERICAL INORGANIC PARTICLES HAVING SURFACE BUMPS FORMED THEREON,...
- Publication number 20220235252
- Publication date Jul 28, 2022
- BEAD ORIGIN INC.
- Jae-Do NAM
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD OF POLI...
- Publication number 20220195246
- Publication date Jun 23, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Hung Liao
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING COMPOSITION
- Publication number 20220162477
- Publication date May 26, 2022
- FUJIMI INCORPORATED
- Yoshiko YAMAGUCHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CALCIUM CARBONATE SLURRY
- Publication number 20220089910
- Publication date Mar 24, 2022
- Illumina, Inc.
- Robert Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING OF SUBSTRATES CONTAINING COPPER AND R...
- Publication number 20220056307
- Publication date Feb 24, 2022
- BASF SE
- Haci Osman GUEVENC
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING OF SUBSTRATES CONTAINING COPPER AND R...
- Publication number 20220049125
- Publication date Feb 17, 2022
- BASF SE
- Haci Osman GUEVENC
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD OF MANUFACTURING GALLIUM OXIDE SUBSTRATE AND POLISHING SLURR...
- Publication number 20220002589
- Publication date Jan 6, 2022
- AGC Inc.
- Yusuke Hirabayashi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ABRADABLE COATING hBN FILLER MATERIAL AND METHOD OF MANUFACTURE
- Publication number 20210348077
- Publication date Nov 11, 2021
- Raytheon Technologies Corporation
- Christopher W. Strock
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING AGENT, POLISHING METHOD, AND LIQUID ADDITIVE FOR POLISHING
- Publication number 20210261824
- Publication date Aug 26, 2021
- AGC Inc.
- Toshihiko Otsuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STABILIZED, WATER-JET, SLURRY APPARATUS AND METHOD
- Publication number 20210259804
- Publication date Aug 26, 2021
- H2O Tech, Inc.
- Timothy D. Nelson
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
BARRIER RUTHENIUM CHEMICAL MECHANICAL POLISHING SLURRY
- Publication number 20210261822
- Publication date Aug 26, 2021
- FUJIFILM ELECTRONIC MATERIALS U.S.A., INC.
- David (Tawei) Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING COMPOSITION, METHOD FOR PRODUCING POLISHING COMPOSITION,...
- Publication number 20210246334
- Publication date Aug 12, 2021
- FUJIMI INCORPORATED
- Tzu-Chun TSENG
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING COMPOSITION FOR MAGNETIC DISK SUBSTRATE
- Publication number 20210198524
- Publication date Jul 1, 2021
- YAMAGUCHI SEIKEN KOGYO CO., LTD.
- Junichiro Ando
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...
- Publication number 20210102093
- Publication date Apr 8, 2021
- BASF SE
- Robert REICHARDT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF SELECTIVE CHEMICAL MECHANICAL POLISHING COBALT, ZIRCONIUM...
- Publication number 20210071034
- Publication date Mar 11, 2021
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Murali Ganth Theivanayagam
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SEMICONDUCTOR SUBSTRATE POLISHING METHODS
- Publication number 20210013092
- Publication date Jan 14, 2021
- GLOBALWAFERS CO., LTD.
- Hui Wang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SURFACE TREATMENT COMPOSITION, METHOD FOR PRODUCING SURFACE TREATME...
- Publication number 20210005462
- Publication date Jan 7, 2021
- Fujimi Incorporated
- Tsutomu YOSHINO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING LIQUID AND CHEMICAL MECHANICAL POLISHING METHOD
- Publication number 20200362199
- Publication date Nov 19, 2020
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE COATED ABRASIVE PARTICLES FOR TUNGSTEN BUFF APPLICATIONS
- Publication number 20200332150
- Publication date Oct 22, 2020
- Cabot Microelectronics Corporation
- Chih-Hsien CHIEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING LIQUID AND METHOD FOR PRODUCING POLISHED ARTICLE
- Publication number 20200332163
- Publication date Oct 22, 2020
- Mitsui Mining and Smelting Co., Ltd.
- Ken MATSUO
- H01 - BASIC ELECTRIC ELEMENTS

Aqueous liquid suspensions

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

MXene with excellent mechanical strength and fast and high-yield an...

Composition and method for polysilicon CMP

CMP slurry composition for polishing tungsten pattern wafer and met...

Chemical mechanical polishing slurry composition and method of poli...

Portable wet sand blaster

Abrasive water-jet cutting machine

Alternative oxidizing agents for cobalt CMP

Calcium carbonate slurry

Polishing liquid, polishing liquid set, and polishing method

Polishing method, and polishing composition and method for producin...

Chemical processing of additive manufactured workpieces

Polishing compositions and methods of use thereof

Chemical mechanical polishing of substrates containing copper and r...

Chemical mechanical planarization composition for polishing oxide m...

Polishing agent, polishing method, and liquid additive for polishing

Polishing compositions and methods of using same

Chemical mechanical polishing slurry composition, method for chemic...

Shallow trench isolation (STI) chemical mechanical planarization (C...

Slurry, polishing-liquid set, polishing liquid, and polishing metho...

Polishing composition, manufacturing method of polishing compositio...

Polishing slurry, method for polishing glass, and method for manufa...

Barrier ruthenium chemical mechanical polishing slurry

Derivatized polyamino acids

Fluid synthesis system

Polishing slurry, method for polishing glass, and method for manufa...

Abrasive grains, evaluation method therefor, and wafer manufacturin...

Semiconductor substrate polishing methods

Polishing liquid, polishing liquid set and polishing method

Chemical mechanical polishing method

Polishing composition and polishing method using same

Patents Applicationslast 30 patents

CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD OF POLI...

ABRASIVE SLURRY REGENERATION METHOD AND ABRASIVE SLURRY REGENERATIO...

POLISHING LIQUID, POLISHING LIQUID SET AND POLISHING METHOD

CHEMICAL MECHANICAL POLISHING OF SUBSTRATES CONTAINING COPPER AND R...

Polishing Compositions and Methods of Using Same

ABRASIVE ARTICLES INCLUDING AN ANTI-LOADING SIZE LAYER WITH ENHANCE...

PORTABLE WET SAND BLASTER

POLISHING METHOD, AND POLISHING COMPOSITION AND METHOD FOR PRODUCIN...

SYSTEM AND METHODS OF FINISHING A METALLIC SURFACE

SURFACE MODIFIED SILANIZED COLLOIDAL SILICA PARTICLES

SPHERICAL INORGANIC PARTICLES HAVING SURFACE BUMPS FORMED THEREON,...

CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD OF POLI...

POLISHING COMPOSITION

CALCIUM CARBONATE SLURRY

CHEMICAL MECHANICAL POLISHING OF SUBSTRATES CONTAINING COPPER AND R...

CHEMICAL MECHANICAL POLISHING OF SUBSTRATES CONTAINING COPPER AND R...

METHOD OF MANUFACTURING GALLIUM OXIDE SUBSTRATE AND POLISHING SLURR...

ABRADABLE COATING hBN FILLER MATERIAL AND METHOD OF MANUFACTURE

POLISHING AGENT, POLISHING METHOD, AND LIQUID ADDITIVE FOR POLISHING

STABILIZED, WATER-JET, SLURRY APPARATUS AND METHOD

BARRIER RUTHENIUM CHEMICAL MECHANICAL POLISHING SLURRY

POLISHING COMPOSITION, METHOD FOR PRODUCING POLISHING COMPOSITION,...

POLISHING COMPOSITION FOR MAGNETIC DISK SUBSTRATE

USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...

METHOD OF SELECTIVE CHEMICAL MECHANICAL POLISHING COBALT, ZIRCONIUM...

SEMICONDUCTOR SUBSTRATE POLISHING METHODS

SURFACE TREATMENT COMPOSITION, METHOD FOR PRODUCING SURFACE TREATME...

POLISHING LIQUID AND CHEMICAL MECHANICAL POLISHING METHOD

SURFACE COATED ABRASIVE PARTICLES FOR TUNGSTEN BUFF APPLICATIONS

POLISHING LIQUID AND METHOD FOR PRODUCING POLISHED ARTICLE