Arrangements for controlling cross-section of ray or beam Arrangements for correcting aberration of beam

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H01J3/12

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J3/00Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps

Current Industry

H01J3/12Arrangements for controlling cross-section of ray or beam Arrangements for correcting aberration of beam

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Variable-focus magnetostatic lens
- Patent number 10,998,158
- Issue date May 4, 2021
- Triad National Security, LLC
- John Lewellen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron gun, control method and control program thereof, and three...
- Patent number 10,217,599
- Issue date Feb 26, 2019
- TECHNOLOGY RESEARCH ASSOCIATION FOR FUTURE ADDITIVE MANUFACTURING
- Takashi Sato
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Device and method for optimizing diffusion section of electron beam
- Patent number 9,767,985
- Issue date Sep 19, 2017
- Huazhong University of Science & Technology
- Jiang Huang
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Charged particle-beam device
- Patent number 9,653,256
- Issue date May 16, 2017
- Hitachi High-Technologies Corporation
- Akira Ikegami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle-beam column corrected for both chromatic and spherical abe...
- Patent number 9,275,817
- Issue date Mar 1, 2016
- Frederick Wight Martin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spherical aberration corrector, method of spherical aberration corr...
- Patent number 9,256,068
- Issue date Feb 9, 2016
- Jeol Ltd.
- Hidetaka Sawada
- G01 - MEASURING TESTING
Information Patent Grant
Method for correcting electronic proximity effects using off-center...
- Patent number 9,224,577
- Issue date Dec 29, 2015
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Patrick Schiavone
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle lithography system with a long shape illumination...
- Patent number 9,202,662
- Issue date Dec 1, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jimmy Hsiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aberration correction device and charged particle beam device emplo...
- Patent number 8,791,423
- Issue date Jul 29, 2014
- Hitachi High-Technologies Corporation
- Yoichi Hirayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle optical system, drawing apparatus, and method of m...
- Patent number 8,716,672
- Issue date May 6, 2014
- Canon Kabushiki Kaisha
- Kentaro Sano
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Aberration correction apparatus that corrects spherical aberration...
- Patent number 8,035,086
- Issue date Oct 11, 2011
- Hitachi, Ltd.
- Yoichi Hirayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cathode assembly with integral tabs
- Patent number 7,860,219
- Issue date Dec 28, 2010
- Varian Medical Systems, Inc.
- Scott M. Clark
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Non-axisymmetric charged-particle beam system
- Patent number 7,612,346
- Issue date Nov 3, 2009
- Massachusetts Institute of Technology
- Ronak J. Bhatt
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Non-axisymmetric charged-particle beam system
- Patent number 7,381,967
- Issue date Jun 3, 2008
- Massachusetts Institute of Technology
- Ronak J. Bhatt
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Electrically conductive synthetic diamond apertures for electron an...
- Patent number 6,855,945
- Issue date Feb 15, 2005
- Stephen H. Silder
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
X-ray tube providing variable imaging spot size
- Patent number 6,236,713
- Issue date May 22, 2001
- Litton Systems, Inc.
- Richard B. True
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cathode assembly for a line focus electron beam device
- Patent number 5,637,953
- Issue date Jun 10, 1997
- American International Technologies, Inc.
- George Wakalopulos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aberration free lens system for electron microscope
- Patent number 5,336,891
- Issue date Aug 9, 1994
- Arch Development Corporation
- Albert V. Crewe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle optical systems having therein means for correctin...
- Patent number 4,823,003
- Issue date Apr 18, 1989
- George C. King
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for correcting chromatic aberration in charged...
- Patent number 4,795,912
- Issue date Jan 3, 1989
- TRW Inc.
- Alfred W. Maschke
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method and apparatus for correcting high-order abberations in parti...
- Patent number 4,763,003
- Issue date Aug 9, 1988
- TRW Inc.
- Alfred W. Maschke
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Sextupole system for the correction of spherical aberration
- Patent number 4,303,864
- Issue date Dec 1, 1981
- The United States of America as represented by the United States Department o...
- Albert V. Crewe
- B82 - NANO-TECHNOLOGY
Information Patent Grant
3209147
- Patent number 3,209,147
- Issue date Sep 28, 1965
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHODS, MEDIUMS, AND SYSTEMS FOR IDENTIFYING TUNABLE DOMAINS FOR I...
- Publication number 20230013095
- Publication date Jan 19, 2023
- Applied Materials, Inc.
- Richard Allen Sprenkle
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Charged-Particle-Beam Device
- Publication number 20160300690
- Publication date Oct 13, 2016
- Hitachi High-Technologies Corporation
- Akira IKEGAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ULTRA-MINIATURIZED ELECTRON OPTICAL MICROCOLUMN
- Publication number 20140224997
- Publication date Aug 14, 2014
- Industry-University Cooperation Foundation Sunmoon University
- Tae Sik OH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Lithography System With a Long Shape Illumination...
- Publication number 20140212815
- Publication date Jul 31, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jimmy Hsiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE OPTICAL SYSTEM, DRAWING APPARATUS, AND METHOD OF M...
- Publication number 20130273478
- Publication date Oct 17, 2013
- Canon Kabushiki Kaisha
- Kentaro Sano
- B82 - NANO-TECHNOLOGY
Information Patent Application
PARTICLE-BEAM COLUMN CORRECTED FOR BOTH CHROMATIC AND SPHERICAL ABE...
- Publication number 20130264477
- Publication date Oct 10, 2013
- Frederick Wight Martin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHAPING OFFSET ADJUSTMENT METHOD AND CHARGED PARTICLE BEAM DRAWING...
- Publication number 20130256555
- Publication date Oct 3, 2013
- NuFlare Technology, Inc.
- Takahito NAKAYAMA
- B82 - NANO-TECHNOLOGY
Information Patent Application
Aberration Correction Device and Charged Particle Beam Device Emplo...
- Publication number 20130112873
- Publication date May 9, 2013
- Hitachi High-Technologies Corporation
- Yoichi Hirayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CORRECTING ELECTRONIC PROXIMITY EFFECTS USING OFF-CENTER...
- Publication number 20130043389
- Publication date Feb 21, 2013
- ASELTA NANOGRAPHICS
- Patrick SCHIAVONE
- B82 - NANO-TECHNOLOGY
Information Patent Application
Cathode Assembly With Integral Tabs
- Publication number 20100079053
- Publication date Apr 1, 2010
- Varian Medical Systems, Inc.
- Gregory C. ANDREWS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Aberration correction apparatus that corrects spherical aberration...
- Publication number 20090230317
- Publication date Sep 17, 2009
- Hitachi, Ltd.
- Yoichi Hirayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NON-AXISYMMETRIC CHARGED-PARTICLE BEAM SYSTEM
- Publication number 20080191144
- Publication date Aug 14, 2008
- Ronak J. Bhatt
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Non-axisymmetric charged-particle beam system
- Publication number 20060017002
- Publication date Jan 26, 2006
- Ronak J. Bhatt
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING

Arrangements for controlling cross-section of ray or beam Arrangements for correcting aberration of beam

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Variable-focus magnetostatic lens

Electron gun, control method and control program thereof, and three...

Device and method for optimizing diffusion section of electron beam

Charged particle-beam device

Particle-beam column corrected for both chromatic and spherical abe...

Spherical aberration corrector, method of spherical aberration corr...

Method for correcting electronic proximity effects using off-center...

Charged particle lithography system with a long shape illumination...

Aberration correction device and charged particle beam device emplo...

Charged particle optical system, drawing apparatus, and method of m...

Aberration correction apparatus that corrects spherical aberration...

Cathode assembly with integral tabs

Non-axisymmetric charged-particle beam system

Non-axisymmetric charged-particle beam system

Electrically conductive synthetic diamond apertures for electron an...

X-ray tube providing variable imaging spot size

Cathode assembly for a line focus electron beam device

Aberration free lens system for electron microscope

Charged particle optical systems having therein means for correctin...

Method and apparatus for correcting chromatic aberration in charged...

Method and apparatus for correcting high-order abberations in parti...

Sextupole system for the correction of spherical aberration

3209147

Patents Applicationslast 30 patents

METHODS, MEDIUMS, AND SYSTEMS FOR IDENTIFYING TUNABLE DOMAINS FOR I...

Charged-Particle-Beam Device

ULTRA-MINIATURIZED ELECTRON OPTICAL MICROCOLUMN

Charged Particle Lithography System With a Long Shape Illumination...

CHARGED PARTICLE OPTICAL SYSTEM, DRAWING APPARATUS, AND METHOD OF M...

PARTICLE-BEAM COLUMN CORRECTED FOR BOTH CHROMATIC AND SPHERICAL ABE...

SHAPING OFFSET ADJUSTMENT METHOD AND CHARGED PARTICLE BEAM DRAWING...

Aberration Correction Device and Charged Particle Beam Device Emplo...

METHOD FOR CORRECTING ELECTRONIC PROXIMITY EFFECTS USING OFF-CENTER...

Cathode Assembly With Integral Tabs

Aberration correction apparatus that corrects spherical aberration...

NON-AXISYMMETRIC CHARGED-PARTICLE BEAM SYSTEM

Non-axisymmetric charged-particle beam system