Carbocyclic compounds

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CPC
C08F216/10

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CCHEMISTRY METALLURGY C08Organic compounds C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS C08F216/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical

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C08F216/10Carbocyclic compounds

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Radiopaque polymers
- Patent number 11,744,916
- Issue date Sep 5, 2023
- Biocompatibles UK Limited
- Koorosh Ashrafi
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Surfactant composition
- Patent number 11,578,028
- Issue date Feb 14, 2023
- Dai-Ichi Kogyo Seiyaku Co., Ltd.
- Masatake Joyabu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Cyclopentene monomers and methods of polymerization
- Patent number 11,136,426
- Issue date Oct 5, 2021
- Florida State University Research Foundation, Inc.
- Justin G. Kennemur
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition
- Patent number 10,795,258
- Issue date Oct 6, 2020
- Sumitomo Chemical Company, Limited
- Takayuki Miyagawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymer, resist composition, and pattern forming process
- Patent number 10,457,761
- Issue date Oct 29, 2019
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resin, resist composition and method for producing resist pattern
- Patent number 10,101,657
- Issue date Oct 16, 2018
- Sumitomo Chemical Company, Limited
- Masako Sugihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound for forming organic film, and organic film composition usi...
- Patent number 10,007,183
- Issue date Jun 26, 2018
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro Tachibana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound for forming organic film, and organic film composition usi...
- Patent number 9,977,330
- Issue date May 22, 2018
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro Tachibana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer compound, positive resist composition, laminate, and resist...
- Patent number 9,944,738
- Issue date Apr 17, 2018
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Domon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photocurable polymeric dielectrics and methods of preparation and u...
- Patent number 9,923,158
- Issue date Mar 20, 2018
- BASF SE
- Jordan Quinn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, act...
- Patent number 9,904,168
- Issue date Feb 27, 2018
- Fujifilm Corporation
- Natsumi Yokokawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
CNSL-based hydrocarbon resins, preparation and uses thereof
- Patent number 9,796,802
- Issue date Oct 24, 2017
- Cardolite Corporation
- Mauricio Pinto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymer, monomer, resist composition, and patterning process
- Patent number 9,790,166
- Issue date Oct 17, 2017
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi Sagehashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-type resist composition, method for forming resist pattern...
- Patent number 9,766,541
- Issue date Sep 19, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroto Yamazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymers for hard masks, hard mask compositions including the same,...
- Patent number 9,676,892
- Issue date Jun 13, 2017
- Samsung Electronics Co., Ltd.
- Myeong koo Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, resin, photoresist composition, and method for producing...
- Patent number 9,513,549
- Issue date Dec 6, 2016
- Sumitomo Chemical Company, Limited
- Isao Yoshida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive composition, resist fi...
- Patent number 9,500,951
- Issue date Nov 22, 2016
- FUJIFILM Corporation
- Natsumi Yokokawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive composition, resist fi...
- Patent number 9,459,531
- Issue date Oct 4, 2016
- FUJIFILM Corporation
- Natsumi Yokokawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymerizable spirobisindane monomers and polymers prepared therefrom
- Patent number 9,296,668
- Issue date Mar 29, 2016
- 3M Innovative Properties Company
- Michael S. Wendland
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition and patterning process
- Patent number 9,250,522
- Issue date Feb 2, 2016
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
CNSL-based hydrocarbon resins, preparation and uses thereof
- Patent number 9,228,040
- Issue date Jan 5, 2016
- Cardolite Corporation
- Mauricio Pinto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Immersion upper layer film forming composition and method of formin...
- Patent number 9,182,674
- Issue date Nov 10, 2015
- JSR Corporation
- Toru Kimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist-protective film-forming composition and patterning process
- Patent number 9,029,075
- Issue date May 12, 2015
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Upper layer film forming composition for liquid immersion and metho...
- Patent number 8,247,165
- Issue date Aug 21, 2012
- JSR Corporation
- Toru Kimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Acidic superabsorbent hydrogels
- Patent number 7,915,363
- Issue date Mar 29, 2011
- BASF Aktiengesellschaft
- Rüdiger Funk
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Acidic superabsorbent hydrogels
- Patent number 7,790,823
- Issue date Sep 7, 2010
- BASF Aktiengesellschaft
- Rüdiger Funk
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of producing water-soluble nonturbid copolymers of at least...
- Patent number 7,572,871
- Issue date Aug 11, 2009
- BASF SE
- Rainer Dobrawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of producing water-soluble nonturbid copolymers of at least...
- Patent number 7,449,531
- Issue date Nov 11, 2008
- BASF SE
- Rainer Dobrawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of producing water-soluble nonturbid copolymers of at least...
- Patent number 7,442,751
- Issue date Oct 28, 2008
- BASF SE
- Rainer Dobrawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
RADIOPAQUE POLYMERS
- Publication number 20230355833
- Publication date Nov 9, 2023
- BIOCOMPATIBLES UK LIMITED
- Koorosh Ashrafi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE POLYMER CAPABLE OF MULTI-STEP DEPROTECTION REACTION,...
- Publication number 20230288806
- Publication date Sep 14, 2023
- Samsung Electronics Co., Ltd.
- Jiyup KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIOPAQUE POLYMERS
- Publication number 20210015963
- Publication date Jan 21, 2021
- BIOCOMPATIBLES UK LIMITED
- Koorosh Ashrafi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOUND, POLYMER COMPOUND, RESIST COMPOSITION, AND PATTERNING PROCESS
- Publication number 20170038683
- Publication date Feb 9, 2017
- Shin-Etsu Chemical Co., Ltd.
- Masaki OHASHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POLYMER COMPOUND, POSITIVE RESIST COMPOSITION, LAMINATE, AND RESIST...
- Publication number 20170037167
- Publication date Feb 9, 2017
- Shin-Etsu Chemical Co., Ltd.
- Daisuke DOMON
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE-TYPE RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN...
- Publication number 20160376233
- Publication date Dec 29, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroto YAMAZAKI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POLYMER, MONOMER, RESIST COMPOSITION, AND PATTERNING PROCESS
- Publication number 20160342086
- Publication date Nov 24, 2016
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi Sagehashi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20160320700
- Publication date Nov 3, 2016
- FUJIFILM CORPORATION
- Natsumi YOKOKAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20160291467
- Publication date Oct 6, 2016
- Sumitomo Chemical Company, Limited
- Masako SUGIHARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SILICON-CONTAINING POLYMER, SILICON-CONTAINING COMPOUND, COMPOSITIO...
- Publication number 20160229939
- Publication date Aug 11, 2016
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS
- Publication number 20160229940
- Publication date Aug 11, 2016
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS
- Publication number 20160168296
- Publication date Jun 16, 2016
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CNSL-BASED HYDROCARBON RESINS, PREPARATION AND USES THEREOF
- Publication number 20160075805
- Publication date Mar 17, 2016
- CARDOLITE CORPORATION
- Mauricio Pinto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOUND FOR FORMING ORGANIC FILM, AND ORGANIC FILM COMPOSITION USI...
- Publication number 20160018735
- Publication date Jan 21, 2016
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro TACHIBANA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, RESIST FI...
- Publication number 20150293446
- Publication date Oct 15, 2015
- FUJIFILM CORPORATION
- Natsumi YOKOKAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, RESIST FI...
- Publication number 20150284492
- Publication date Oct 8, 2015
- FUJIFILM CORPORATION
- Natsumi YOKOKAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, MET...
- Publication number 20150253662
- Publication date Sep 10, 2015
- FUJIFILM CORPORATION
- Keita KATO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20150253665
- Publication date Sep 10, 2015
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20150253666
- Publication date Sep 10, 2015
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMERIZABLE SPIROBISINDANE MONOMERS AND POLYMERS PREPARED THEREFROM
- Publication number 20150239806
- Publication date Aug 27, 2015
- 3M INNOVATIVE PROPERTIES COMPANY
- Michael S. Wendland
- C07 - ORGANIC CHEMISTRY
Information Patent Application
NEGATIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20150147698
- Publication date May 28, 2015
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CNSL-BASED HYDROCARBON RESINS, PREPARATION AND USES THEREOF
- Publication number 20150099851
- Publication date Apr 9, 2015
- CARDOLITE CORPORATION
- Mauricio Pinto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20150086912
- Publication date Mar 26, 2015
- FUJIFILM CORPORATION
- Takeshi KAWABATA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST TOP COAT COMPOSITION AND PATTERNING PROCESS
- Publication number 20150030983
- Publication date Jan 29, 2015
- Shin-Etsu Chemical Co., Ltd.
- Jun HATAKEYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOCURABLE POLYMERIC DIELECTRICS AND METHODS OF PREPARATION AND U...
- Publication number 20140363690
- Publication date Dec 11, 2014
- BASF SE
- Jordan QUINN
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
COMPOUND FOR FORMING ORGANIC FILM, AND ORGANIC FILM COMPOSITION USI...
- Publication number 20130337649
- Publication date Dec 19, 2013
- Seiichiro TACHIBANA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST-PROTECTIVE FILM-FORMING COMPOSITION AND PATTERNING PROCESS
- Publication number 20130143163
- Publication date Jun 6, 2013
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
IMMERSION UPPER LAYER FILM FORMING COMPOSITION AND METHOD OF FORMIN...
- Publication number 20120282553
- Publication date Nov 8, 2012
- JSR Corporation
- Toru KIMURA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOCURABLE POLYMERIC DIELECTRICS AND METHODS OF PREPARATION AND U...
- Publication number 20110215334
- Publication date Sep 8, 2011
- BASF SE
- Jordan Quinn
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Acidic Superabsorbent Hydrogels
- Publication number 20080166410
- Publication date Jul 10, 2008
- BASF Aktiengesellschaft
- Rudiger Funk
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Carbocyclic compounds

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Radiopaque polymers

Surfactant composition

Cyclopentene monomers and methods of polymerization

Resist composition

Polymer, resist composition, and pattern forming process

Resin, resist composition and method for producing resist pattern

Compound for forming organic film, and organic film composition usi...

Compound for forming organic film, and organic film composition usi...

Polymer compound, positive resist composition, laminate, and resist...

Photocurable polymeric dielectrics and methods of preparation and u...

Actinic ray-sensitive or radiation-sensitive resin composition, act...

CNSL-based hydrocarbon resins, preparation and uses thereof

Polymer, monomer, resist composition, and patterning process

Positive-type resist composition, method for forming resist pattern...

Polymers for hard masks, hard mask compositions including the same,...

Compound, resin, photoresist composition, and method for producing...

Actinic ray-sensitive or radiation-sensitive composition, resist fi...

Actinic ray-sensitive or radiation-sensitive composition, resist fi...

Polymerizable spirobisindane monomers and polymers prepared therefrom

Positive resist composition and patterning process

CNSL-based hydrocarbon resins, preparation and uses thereof

Immersion upper layer film forming composition and method of formin...

Resist-protective film-forming composition and patterning process

Upper layer film forming composition for liquid immersion and metho...

Acidic superabsorbent hydrogels

Acidic superabsorbent hydrogels

Method of producing water-soluble nonturbid copolymers of at least...

Method of producing water-soluble nonturbid copolymers of at least...

Method of producing water-soluble nonturbid copolymers of at least...

Patents Applicationslast 30 patents

RADIOPAQUE POLYMERS

PHOTOSENSITIVE POLYMER CAPABLE OF MULTI-STEP DEPROTECTION REACTION,...

RADIOPAQUE POLYMERS

COMPOUND, POLYMER COMPOUND, RESIST COMPOSITION, AND PATTERNING PROCESS

POLYMER COMPOUND, POSITIVE RESIST COMPOSITION, LAMINATE, AND RESIST...

POSITIVE-TYPE RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN...

POLYMER, MONOMER, RESIST COMPOSITION, AND PATTERNING PROCESS

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

SILICON-CONTAINING POLYMER, SILICON-CONTAINING COMPOUND, COMPOSITIO...

POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS

POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS

CNSL-BASED HYDROCARBON RESINS, PREPARATION AND USES THEREOF

COMPOUND FOR FORMING ORGANIC FILM, AND ORGANIC FILM COMPOSITION USI...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, RESIST FI...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, RESIST FI...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, MET...

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

POLYMERIZABLE SPIROBISINDANE MONOMERS AND POLYMERS PREPARED THEREFROM

NEGATIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS

CNSL-BASED HYDROCARBON RESINS, PREPARATION AND USES THEREOF

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

RESIST TOP COAT COMPOSITION AND PATTERNING PROCESS

PHOTOCURABLE POLYMERIC DIELECTRICS AND METHODS OF PREPARATION AND U...

COMPOUND FOR FORMING ORGANIC FILM, AND ORGANIC FILM COMPOSITION USI...

RESIST-PROTECTIVE FILM-FORMING COMPOSITION AND PATTERNING PROCESS

IMMERSION UPPER LAYER FILM FORMING COMPOSITION AND METHOD OF FORMIN...

PHOTOCURABLE POLYMERIC DIELECTRICS AND METHODS OF PREPARATION AND U...

Acidic Superabsorbent Hydrogels