Colloid systems and wetting agents subcombinations thereof processes of

YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10USPC classification Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS

Y10S516/00Colloid systems and wetting agents subcombinations thereof processes of

Y10S516/01Wetting, emulsifying, dispersing, or stabilizing agents Y10S516/02Organic and inorganic agents containing, except water Y10S516/03Organic sulfoxy compound containing Y10S516/04Protein or carboxylic compound containing Y10S516/05Organic amine, amide, or n-base containing Y10S516/06Protein or carboxylic compound containing Y10S516/07Organic amine, amide, or n-base containing Y10S516/90Liquid crystal material of, or for, colloid system Y10S516/901Substantially pure carbon Y10S516/902Gelled emulsion Y10S516/903Two or more gellants Y10S516/904Fermentation foam breaking or inhibiting Y10S516/905Agent composition per se for colloid system making or stabilizing Y10S516/906The agent contains organic compound containing silicon Y10S516/907The agent contains organic compound containing phosphorus Y10S516/908The compound contains repeating -OCnH2n- Y10S516/909The agent contains organic compound containing sulfoxy* Y10S516/91The compound contains nitrogen, except if present solely as NH4+ Y10S516/911The compound contains -S[O2]NHH where substitution may be made for the hydrogen Y10S516/912The compound contains -C[=O]NHH where substitution may be made for the hydrogen Y10S516/913The compound contains -C[=O]OH or salt thereof Y10S516/914The agent contains organic compound containing nitrogen, except if present solely as NH4+ Y10S516/915The compound contains -C[=O]NHH where substitution may be made for the hydrogen Y10S516/916The compound contains repeating -OCnH2n- Y10S516/917The agent contains organic compound containing oxygen Y10S516/918The compound contains carboxylic acid ester group Y10S516/919The compound contains -C[=O]OH or salt thereof Y10S516/92The compound contains repeating unsubstituted oxyalkylene Y10S516/921Colloid systems having specified high purity Y10S516/922Colloid systems having specified particle size, range, or distribution Y10S516/923Emulsion Y10S516/924Significant dispersive or manipulative operation or step in making or stabilizing colloid system Y10S516/925Phase inversion Y10S516/926Phase change Y10S516/927in situ formation of a colloid system making or stabilizing agent which chemical reaction Y10S516/928Mixing combined with non-mixing operation or step, successively or simultaneously Y10S516/929Specified combination of agitation steps Y10S516/93Low shear followed by high shear Y10S516/931High shear followed by low shear