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Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
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C07C381/00
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Parent Industries
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CHEMISTRY METALLURGY
C07
Organic chemistry
C07C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
Current Industry
C07C381/00
Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
Sub Industries
C07C381/02
Thiosulfates
C07C381/04
Thiosulfonates
C07C381/06
Compounds containing sulfur atoms only bound to two nitrogen atoms
C07C381/08
having at least one of the nitrogen atoms acylated
C07C381/10
Compounds containing sulfur atoms doubly-bound to nitrogen atoms
C07C381/12
Sulfonium compounds
C07C381/14
Compounds containing a carbon atom having four bonds to hetero atoms with a double bond to one hetero atom and at least one bond to a sulfur atom further doubly-bound to oxygen atoms
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Patents Grants
last 30 patents
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Patent Grant
Positive resist composition and patterning process
Patent number
12,204,245
Issue date
Jan 21, 2025
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Production method for resist composition purified product, resist p...
Patent number
12,186,715
Issue date
Jan 7, 2025
Tokyo Ohka Kogyo Co., Ltd.
Akihiko Nakata
B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information
Patent Grant
Photoacid generators, photoresist compositions, and pattern formati...
Patent number
12,140,866
Issue date
Nov 12, 2024
Rohm and Haas Electronic Materials LLC
Emad Aqad
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Resist composition and patterning process
Patent number
12,117,728
Issue date
Oct 15, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Ketone inhibitors of lysine gingipain
Patent number
12,110,263
Issue date
Oct 8, 2024
Lighthouse Pharmaceuticals, Inc.
Andrei W. Konradi
A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information
Patent Grant
Resist composition and patterning process
Patent number
12,072,627
Issue date
Aug 27, 2024
Shin-Etsu Chemical Co., Ltd.
Teppei Adachi
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Carboxylate, quencher, resist composition and method for producing...
Patent number
12,060,316
Issue date
Aug 13, 2024
Sumitomo Chemical Company, Limited
Katsuhiro Komuro
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Onium salt, chemically amplified negative resist composition, and p...
Patent number
12,060,317
Issue date
Aug 13, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
HDAC inhibitors and therapeutic use thereof
Patent number
12,043,607
Issue date
Jul 23, 2024
Tango Therapeutics, Inc.
John P. Maxwell
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
Patent number
12,032,288
Issue date
Jul 9, 2024
FUJIFILM Corporation
Masafumi Kojima
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Salt, acid generator, resist composition and method for producing r...
Patent number
12,013,636
Issue date
Jun 18, 2024
Sumitomo Chemical Company, Limited
Masahiko Shimada
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Negative resist composition and pattern forming process
Patent number
11,994,799
Issue date
May 28, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Photoacid generator, photoresist composition including the same, an...
Patent number
11,982,940
Issue date
May 14, 2024
Samsung Electronics Co., Ltd.
Eunkyung Lee
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Aryl ethers and uses thereof
Patent number
RE49948
Issue date
Apr 30, 2024
PELOTON THERAPEUTICS, INC.
Darryl David Dixon
Information
Patent Grant
Radiation-sensitive resin composition, method of forming resist pat...
Patent number
11,966,161
Issue date
Apr 23, 2024
JSR Corporation
Takuhiro Taniguchi
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Photoresist composition, coated substrate including the photoresist...
Patent number
11,960,206
Issue date
Apr 16, 2024
Rohm and Hass Electronic Materials LLC
Emad Aqad
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Molecules having pesticidal utility, and intermediates, composition...
Patent number
11,944,099
Issue date
Apr 2, 2024
CORTEVA AGRISCIENCE LLC
Ronald J. Heemstra
A01 - AGRICULTURE FORESTRY ANIMAL HUSBANDRY HUNTING TRAPPING FISHING
Information
Patent Grant
Molecular resist composition and patterning process
Patent number
11,940,728
Issue date
Mar 26, 2024
Shin-Etsu Chemical Co., Ltd.
Masaki Ohashi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Dimethoxyphenylalkylamine activators of serotonin receptors
Patent number
11,926,574
Issue date
Mar 12, 2024
Atai Therapeutics Inc.
Glenn Short
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Sulfonium salt, photoacid generator, curable composition, and resis...
Patent number
11,926,581
Issue date
Mar 12, 2024
SAN-APRO LIMITED
Takuto Nakao
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Salt, acid generator, resist composition and method for producing r...
Patent number
11,899,363
Issue date
Feb 13, 2024
Sumitomo Chemical Company, Limited
Katsuhiro Komuro
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
Patent number
11,886,113
Issue date
Jan 30, 2024
FUJIFILM Corporation
Keita Kato
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Resist composition, method of forming resist pattern, compound, and...
Patent number
11,874,601
Issue date
Jan 16, 2024
Tokyo Ohka Kogyo Co., Ltd.
KhanhTin Nguyen
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Gemini surfactant composition and method for treating subterranean...
Patent number
11,858,878
Issue date
Jan 2, 2024
King Fahd University of Petroleum & Minerals
Syed M. Shakil Hussain
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Photoacid generator
Patent number
11,846,886
Issue date
Dec 19, 2023
International Business Machines Corporation
Gerhard Ingmar Meijer
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
Patent number
11,835,849
Issue date
Dec 5, 2023
FUJIFILM Corporation
Tsutomu Yoshimura
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Compound, photoresist composition comprising same, photoresist patt...
Patent number
11,834,419
Issue date
Dec 5, 2023
LG Chem, Ltd.
Junhyun An
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Hole injection layer and charge generation layer containing a truxe...
Patent number
11,839,147
Issue date
Dec 5, 2023
Beijing Summer Sprout Technology Co., Ltd.
Chuanjun Xia
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Electrolyte for lithium secondary battery and lithium secondary bat...
Patent number
11,830,979
Issue date
Nov 28, 2023
Hyundai Motor Company
Yoon Sung Lee
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Salt, acid generator, resist composition and method for producing r...
Patent number
11,820,735
Issue date
Nov 21, 2023
Sumitomo Chemical Company, Limited
Yukako Anryu
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Patents Applications
last 30 patents
Information
Patent Application
MOLECULES HAVING PESTICIDAL UTILITY, AND INTERMEDIATES, COMPOSITION...
Publication number
20250008960
Publication date
Jan 9, 2025
Corteva Agriscience LLC
RONALD J. HEEMSTRA
A01 - AGRICULTURE FORESTRY ANIMAL HUSBANDRY HUNTING TRAPPING FISHING
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
Publication number
20240402601
Publication date
Dec 5, 2024
FUJIFILM CORPORATION
Minoru UEMURA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
COMPOUNDS AND COMPOSITIONS FOR TREATING CONDITIONS ASSOCIATED WITH...
Publication number
20240391884
Publication date
Nov 28, 2024
Novartis AG
Luigi FRANCHI
A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information
Patent Application
MERCAPTOACETOPHENONE AMINOHYDRAZONES, THEIR SALTS AND USES THEREOF
Publication number
20240383846
Publication date
Nov 21, 2024
LONDON PHARMACEUTICALS AND RESEARCH CORPORATION
ABDEL-RAHMAN LAWENDY
A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information
Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING...
Publication number
20240377733
Publication date
Nov 14, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
C07 - ORGANIC CHEMISTRY
Information
Patent Application
ONIUM SALT, RESIST COMPOSITION, AND PATTERN FORMING PROCESS
Publication number
20240361688
Publication date
Oct 31, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
C07 - ORGANIC CHEMISTRY
Information
Patent Application
Resist Material, Resist Composition, Patterning Process, And Monomer
Publication number
20240361690
Publication date
Oct 31, 2024
Shin-Etsu Chemical Co., Ltd.
Jun HATAKEYAMA
C07 - ORGANIC CHEMISTRY
Information
Patent Application
Monomer, Resist Material, Resist Composition, And Patterning Process
Publication number
20240360069
Publication date
Oct 31, 2024
Shin-Etsu Chemical Co., Ltd.
Yutaro OTOMO
C07 - ORGANIC CHEMISTRY
Information
Patent Application
POLYONIUM SALT PHOTOACID GENERATOR FOR ARF LIGHT SOURCE DRY LITHOGR...
Publication number
20240351979
Publication date
Oct 24, 2024
SHANGHAI SINYANG SEMICONDUCTOR MATERIALS CO., LTD.
Shunong FANG
C07 - ORGANIC CHEMISTRY
Information
Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...
Publication number
20240337927
Publication date
Oct 10, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
Publication number
20240337931
Publication date
Oct 10, 2024
FUJIFILM CORPORATION
Masafumi KOJIMA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PRODRUGS WITH 1-(DISULFANYL)ALKYLOXY-CARBONYL UNITS
Publication number
20240299554
Publication date
Sep 12, 2024
PharmaCytics B.V.
Bouchra HAJJAJ
A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information
Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR P...
Publication number
20240295812
Publication date
Sep 5, 2024
Tokyo Ohka Kogyo Co., Ltd.
Junichi Miyakawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
DIMETHOXYPHENYLALKYLAMINE ACTIVATORS OF SEROTONIN RECEPTORS
Publication number
20240294461
Publication date
Sep 5, 2024
Atai Therapeutics Inc.
Glenn Short
C07 - ORGANIC CHEMISTRY
Information
Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...
Publication number
20240280900
Publication date
Aug 22, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD FOR PRODUCING TETRAFLUOROSULFANYL GROUP-CONTAINING ARYL COMP...
Publication number
20240228435
Publication date
Jul 11, 2024
AGC Inc.
Takashi OKAZOE
C07 - ORGANIC CHEMISTRY
Information
Patent Application
SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING R...
Publication number
20240219830
Publication date
Jul 4, 2024
Sumitomo Chemical Company, Limited
Shohei TERAHIGASHI
C07 - ORGANIC CHEMISTRY
Information
Patent Application
SYNTHESIS OF DIMETHYL-C17-32-ALKYL SULFONIUM SALTS
Publication number
20240208900
Publication date
Jun 27, 2024
HELM AG
Joerg STROOT
C07 - ORGANIC CHEMISTRY
Information
Patent Application
CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METH...
Publication number
20240210824
Publication date
Jun 27, 2024
Sumitomo Chemical Company, Limited
Shohei TERAHIGASHI
C07 - ORGANIC CHEMISTRY
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
Publication number
20240201589
Publication date
Jun 20, 2024
FUJIFILM CORPORATION
Takeshi KAWABATA
C07 - ORGANIC CHEMISTRY
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
Publication number
20240192592
Publication date
Jun 13, 2024
FUJIFILM CORPORATION
Takeshi KAWABATA
C07 - ORGANIC CHEMISTRY
Information
Patent Application
Onium Salt, Resist Composition, And Patterning Process
Publication number
20240184199
Publication date
Jun 6, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
C07 - ORGANIC CHEMISTRY
Information
Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING...
Publication number
20240176236
Publication date
May 30, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
C07 - ORGANIC CHEMISTRY
Information
Patent Application
Positive Resist Material And Patterning Process
Publication number
20240168378
Publication date
May 23, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C07 - ORGANIC CHEMISTRY
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD
Publication number
20240152048
Publication date
May 9, 2024
JSR Corporation
Ken MARUYAMA
C07 - ORGANIC CHEMISTRY
Information
Patent Application
Pattern Forming Method
Publication number
20240103365
Publication date
Mar 28, 2024
Shin-Etsu Chemical Co., Ltd.
Seiichiro TACHIBANA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
PHOTOACID GENERATOR
Publication number
20240069442
Publication date
Feb 29, 2024
International Business Machines Corporation
Gerhard Ingmar Meijer
C07 - ORGANIC CHEMISTRY
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
Publication number
20240061331
Publication date
Feb 22, 2024
FUJIFILM CORPORATION
Yosuke BEKKI
C07 - ORGANIC CHEMISTRY
Information
Patent Application
POLYMER, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF...
Publication number
20240043592
Publication date
Feb 8, 2024
Samsung Electronics Co., LTD.,
Minsang KIM
C07 - ORGANIC CHEMISTRY
Information
Patent Application
Onium Salt, Resist Composition, And Patterning Process
Publication number
20240036466
Publication date
Feb 1, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro FUKUSHIMA
C07 - ORGANIC CHEMISTRY