Constructional arrangements not provided for in groups G02F1/00 - G02F7/00

Industry

  • CPC
  • G02F2201/00
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Sub Industries

G02F2201/02fibre G02F2201/04monomode G02F2201/05multimode G02F2201/06integrated waveguide G02F2201/063ridge rib strip loaded G02F2201/066channel buried G02F2201/07buffer layer G02F2201/08light absorbing layer G02F2201/083infra-red absorbing G02F2201/086UV absorbing G02F2201/12electrode G02F2201/121common or background G02F2201/122having a particular pattern G02F2201/123pixel G02F2201/124interdigital G02F2201/125delta-beta G02F2201/126push-pull G02F2201/127travelling wave G02F2201/128field shaping G02F2201/14asymmetric G02F2201/15periodic G02F2201/16series tandem G02F2201/17Multi-pass arrangements, i.e. arrangements to pass light a plurality of times through the same element G02F2201/18parallel G02F2201/20delay line G02F2201/205of fibre type G02F2201/30grating G02F2201/302grating coupler G02F2201/305diffraction grating G02F2201/307Reflective grating G02F2201/34reflector G02F2201/343cholesteric liquid crystal reflector G02F2201/346distributed (Bragg) reflector G02F2201/36Airflow channels G02F2201/38Anti-reflection arrangements G02F2201/40Arrangements for improving the aperture ratio G02F2201/42Arrangements for providing conduction through an insulating substrate G02F2201/44Arrangements combining different electro-active layers G02F2201/46Fixing elements G02F2201/465Snap -fit G02F2201/48Flattening arrangements G02F2201/50Protective arrangements G02F2201/501Blocking layers G02F2201/503Arrangements improving the resistance to shock G02F2201/505Arrangements improving the resistance to acoustic resonance like noise G02F2201/506Repairing G02F2201/508Pseudo repairing G02F2201/52RGB geometrical arrangements G02F2201/54Arrangements for reducing warping-twist G02F2201/56Substrates having a particular shape G02F2201/58Arrangements comprising a monitoring photodetector