containing also one or more halogen atoms

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CPC
C01B21/088

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CCHEMISTRY METALLURGY C01Inorganic chemistry C01BNON-METALLIC ELEMENTS COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C C01B21/00Nitrogen Compounds thereof

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C01B21/088containing also one or more halogen atoms

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Patents Grantslast 30 patents

Information Patent Grant
Si-containing film forming precursors and methods of using the same
- Patent number 11,820,654
- Issue date Nov 21, 2023
- L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GE...
- Jean-Marc Girard
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Si-containing film forming precursors and methods of using the same
- Patent number 11,699,584
- Issue date Jul 11, 2023
- L'Air Liquide, Société Anonyme pour l'Edute ed l'Exploitation des Procédés Ge...
- Jean-Marc Girard
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
SiH-free vinyldisilanes
- Patent number 11,485,642
- Issue date Nov 1, 2022
- DDP Specialty Electronic Materials US 9, LLC
- Brian D. Rekken
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Si-containing film forming precursors and methods of using the same
- Patent number 11,124,876
- Issue date Sep 21, 2021
- L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GE...
- Jean-Marc Girard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Purified hydrogen bis(fluorosulfonyl)imide (HFSI) products, methods...
- Patent number 10,734,664
- Issue date Aug 4, 2020
- SES Holdings Pte. Ltd.
- Rajendra P. Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Si-containing film forming precursors and methods of using the same
- Patent number 10,403,494
- Issue date Sep 3, 2019
- L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GE...
- Jean-Marc Girard
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Si-containing film forming precursors and methods of using the same
- Patent number 9,777,025
- Issue date Oct 3, 2017
- L'Air Liquide, Société pour l'Étude et l'Éxploitation des Procédés Georges Cl...
- Jean-Marc Girard
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Compounds and methods for depositing pure thin films of gallium nit...
- Patent number 6,207,844
- Issue date Mar 27, 2001
- Arizona Board of Regents
- John Kouvetakis
- C30 - CRYSTAL GROWTH
Information Patent Grant
Production of tetrafluorammonium bifluoride and tetrafluorammonium...
- Patent number 4,160,811
- Issue date Jul 10, 1979
- TRW Inc.
- Joseph A. Neff
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Method of synthesizing triazanium perchlorate monohydrate
- Patent number 3,976,753
- Issue date Aug 24, 1976
- Rockwell International Corporation
- Louis R. Grant
- C06 - EXPLOSIVES MATCHES

Patents Applicationslast 30 patents

Information Patent Application
SI-CONTAINING FILM FORMING PRECURSORS AND METHODS OF USING THE SAME
- Publication number 20210395890
- Publication date Dec 23, 2021
- L'air Liquide, Societe Anonyme Pour L'Etude et L'Exploitation Des Procedes Ge...
- Jean-Marc GIRARD
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Si-CONTAINING FILM FORMING PRECURSORS AND METHODS OF USING THE SAME
- Publication number 20210225635
- Publication date Jul 22, 2021
- L'air Liquide, Societe Anonyme Pour L'Etude et L'Exploitation Des Procedes Ge...
- Jean-Marc GIRARD
- C01 - INORGANIC CHEMISTRY
Information Patent Application
Si-CONTAINING FILM FORMING PRECURSORS AND METHODS OF USING THE SAME
- Publication number 20190362961
- Publication date Nov 28, 2019
- L'air Liquide, Societe Anonyme Pour L'Etude et L'Exploitation Des Procedes Ge...
- Jean-Marc GIRARD
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Si-CONTAINING FILM FORMING PRECURSORS AND METHODS OF USING THE SAME
- Publication number 20190311894
- Publication date Oct 10, 2019
- L'Air Liquide, Societe Anonyme pour I'Etude et I'Exploitation des procedes Ge...
- Jean-Marc GIRARD
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SiH-Free Vinyldisilanes
- Publication number 20190284055
- Publication date Sep 19, 2019
- Dow Silicones Corporation
- Brian D. REKKEN
- C01 - INORGANIC CHEMISTRY
Information Patent Application
Si-CONTAINING FILM FORMING PRECURSORS AND METHODS OF USING THE SAME
- Publication number 20180022761
- Publication date Jan 25, 2018
- L'Air Liquide, Societe Anonyme pour I'Etude et l'Exploitation des Procedes Ge...
- Jean-Marc GIRARD
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Si-CONTAINING FILM FORMING PRECURSORS AND METHODS OF USING THE SAME
- Publication number 20150376211
- Publication date Dec 31, 2015
- L'air Liquide, Societe Anonyme Pour L'Etude et L'Exploitation Des Procedes Ge...
- Jean-Marc GIRARD
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

containing also one or more halogen atoms

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Si-containing film forming precursors and methods of using the same

Si-containing film forming precursors and methods of using the same

SiH-free vinyldisilanes

Si-containing film forming precursors and methods of using the same

Purified hydrogen bis(fluorosulfonyl)imide (HFSI) products, methods...

Si-containing film forming precursors and methods of using the same

Si-containing film forming precursors and methods of using the same

Compounds and methods for depositing pure thin films of gallium nit...

Production of tetrafluorammonium bifluoride and tetrafluorammonium...

Method of synthesizing triazanium perchlorate monohydrate

Patents Applicationslast 30 patents

SI-CONTAINING FILM FORMING PRECURSORS AND METHODS OF USING THE SAME

Si-CONTAINING FILM FORMING PRECURSORS AND METHODS OF USING THE SAME

Si-CONTAINING FILM FORMING PRECURSORS AND METHODS OF USING THE SAME

Si-CONTAINING FILM FORMING PRECURSORS AND METHODS OF USING THE SAME

SiH-Free Vinyldisilanes

Si-CONTAINING FILM FORMING PRECURSORS AND METHODS OF USING THE SAME

Si-CONTAINING FILM FORMING PRECURSORS AND METHODS OF USING THE SAME