containing halogen atoms bound to the carbon skeleton

Industry

CPC
C07C309/39

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Parent Industries

CCHEMISTRY METALLURGY C07Organic chemistry C07CACYCLIC OR CARBOCYCLIC COMPOUNDS C07C309/00Sulfonic acids Halides, esters, or anhydrides thereof

Current Industry

C07C309/39containing halogen atoms bound to the carbon skeleton

Industries

Patents Grantslast 30 patents

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- Issue date Dec 19, 2023
- International Business Machines Corporation
- Gerhard Ingmar Meijer
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Photoresist pattern trimming compositions and pattern formation met...
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- Rohm and Haas Electronic Materials LLC
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- C07 - ORGANIC CHEMISTRY
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Corrosion inhibiting coating additive
- Patent number 11,365,321
- Issue date Jun 21, 2022
- Battelle Memorial Institute
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Resist composition and resist patterning process
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- Issue date Sep 28, 2021
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- Takahiro Suzuki
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Salt of quinazoline derivative, preparation method therefor and app...
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- Issue date Dec 22, 2020
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- Guangxin Xia
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Resist composition and patterning process
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- Issue date Apr 7, 2020
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
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Resist composition and patterning process
- Patent number 10,613,436
- Issue date Apr 7, 2020
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
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Resist composition and patterning process
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- Issue date Mar 31, 2020
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
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Colored composition
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Titanium ligand-modified black phosphorus and preparation method an...
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Photoresist pattern trimming compositions and methods
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- Irvinder Kaur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Stilbazolium derivative and nonlinear optical material using the same
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Bronsted acid compound, manufacturing method of condensation compou...
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- Fuji Xerox Co., Ltd.
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- C07 - ORGANIC CHEMISTRY
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Actinic ray-sensitive or radiation-sensitive resin composition and...
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- Issue date Dec 2, 2014
- FUJIFILM Corporation
- Tomotaka Tsuchimura
- C07 - ORGANIC CHEMISTRY
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Anion-exchange displacement chromatography process and anionic orga...
- Patent number 8,496,835
- Issue date Jul 30, 2013
- Sachem, Inc.
- Charles Little
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Bronsted acid compound, manufacturing method of condensation compou...
- Patent number 8,003,821
- Issue date Aug 23, 2011
- Fuji Xerox Co., Ltd.
- Yuki Sasaki
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive composition, compound for use in the photosensitive...
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- Issue date Mar 11, 2008
- FUJIFILM Corporation
- Kenji Wada
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Terphenyl dihalide monomers having sulfonate groups and process for...
- Patent number 7,173,155
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- Gwangju Institute of Science and Technology
- Jae-Suk Lee
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Process for producing bisthiophenolperfluoroalkylidene compound
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- Nippon Mektron, Limited
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Herbicide intermediates
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- Zeneca Limited
- Richard D. Gless
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Herbicide intermediates
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- Richard D. Gless
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Distyrylbiphenyl compounds
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Halogenated-naphthalenetriyltris(sulfonylimino)-aryl disulfonic aci...
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- American Cyanamid Company
- Seymour Bernstein
- C07 - ORGANIC CHEMISTRY
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Bis-stilbene compounds
- Patent number 3,984,399
- Issue date Oct 5, 1976
- Ciba-Geigy AG
- Kurt Weber
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Information Patent Grant
Sulfur containing amino and imino pyridines
- Patent number 3,957,799
- Issue date May 18, 1976
- E. R. Squibb & Sons, Inc.
- Harry Louis Yale
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
N-.beta.-(2-acetyl-4-chlorophenoxy)-ethyl-N,N-dimethyl-N-benzyl-amm...
- Patent number 3,956,369
- Issue date May 11, 1976
- Natalia Nikolaevna Ozeretskovskaya
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Process for preparing 6H-pyrido[1,2-c][1,3,5]benzothiadiazepines an...
- Patent number 3,946,025
- Issue date Mar 23, 1976
- E. R. Squibb & Sons, Inc.
- Harry Louis Yale
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
3923878
- Patent number 3,923,878
- Issue date Dec 2, 1975
- D06 - TREATMENT OF TEXTILES OR THE LIKE LAUNDERING FLEXIBLE MATERIALS NOT OTH...

Patents Applicationslast 30 patents

Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD
- Publication number 20240152048
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- JSR Corporation
- Ken MARUYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTOACID GENERATOR
- Publication number 20240069442
- Publication date Feb 29, 2024
- International Business Machines Corporation
- Gerhard Ingmar Meijer
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTOACID GENERATOR
- Publication number 20220163886
- Publication date May 26, 2022
- International Business Machines Corporation
- Gerhard Ingmar Meijer
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SALT OF QUINAZOLINE DERIVATIVE, PREPARATION METHOD THEREFOR AND APP...
- Publication number 20190300491
- Publication date Oct 3, 2019
- SHANGHAI PHARMACEUTICALS HOLDING CO., LTD.
- Guangxin XIA
- C07 - ORGANIC CHEMISTRY
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CORROSION INHIBITING COATING ADDITIVE
- Publication number 20190256719
- Publication date Aug 22, 2019
- Joshua P. James
- C07 - ORGANIC CHEMISTRY
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RESIST COMPOSITION AND RESIST PATTERNING PROCESS
- Publication number 20190010119
- Publication date Jan 10, 2019
- Shin-Etsu Chemical Co., Ltd.
- Takahiro SUZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHO...
- Publication number 20170038679
- Publication date Feb 9, 2017
- JSR Corporation
- Hiroshi TOMIOKA
- C07 - ORGANIC CHEMISTRY
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STILBAZOLIUM DERIVATIVE AND NONLINEAR OPTICAL MATERIAL USING THE SAME
- Publication number 20160016905
- Publication date Jan 21, 2016
- ARKRAY, Inc.
- Kazuyoshi Aoki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
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NOVEL SULFONATE-BASED TRIMEBUTINE SALTS
- Publication number 20150057316
- Publication date Feb 26, 2015
- GICARE PHARMA INC.
- Jean-Francois Meunier
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Bronsted acid compound, manufacturing method of condensation compou...
- Publication number 20110269066
- Publication date Nov 3, 2011
- FUJI XEROX CO., LTD
- Yuki Sasaki
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND...
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- C07 - ORGANIC CHEMISTRY
Information Patent Application
Bronsted acid compound, manufacturing method of condensation compou...
- Publication number 20070287088
- Publication date Dec 13, 2007
- FUJI XEROX CO., LTD
- Yuki Sasaki
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ANION-EXCHANGE DISPLACEMENT CHROMATOGRAPHY PROCESS AND ANIONIC ORGA...
- Publication number 20070125712
- Publication date Jun 7, 2007
- Charles Little
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Information Patent Application
Photosensitive composition, compound for use in the photosensitive...
- Publication number 20050123859
- Publication date Jun 9, 2005
- Fuji Photo Film Co., Ltd.
- Kenji Wada
- C07 - ORGANIC CHEMISTRY

containing halogen atoms bound to the carbon skeleton

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Photoacid generator

Photoresist pattern trimming compositions and pattern formation met...

Corrosion inhibiting coating additive

Resist composition and resist patterning process

Salt of quinazoline derivative, preparation method therefor and app...

Resist composition and patterning process

Resist composition and patterning process

Resist composition and patterning process

Colored composition

Titanium ligand-modified black phosphorus and preparation method an...

Thermal acid generators and photoresist pattern trimming compositio...

Photoresist pattern trimming compositions and methods

Stilbazolium derivative and nonlinear optical material using the same

Bronsted acid compound, manufacturing method of condensation compou...

Actinic ray-sensitive or radiation-sensitive resin composition and...

Anion-exchange displacement chromatography process and anionic orga...

Bronsted acid compound, manufacturing method of condensation compou...

Photosensitive composition, compound for use in the photosensitive...

Terphenyl dihalide monomers having sulfonate groups and process for...

Process for producing bisthiophenolperfluoroalkylidene compound

Crosslinkable composition of fluoroelastomer and bisthiophenolperfl...

Herbicide intermediates

Herbicide intermediates

Distyrylbiphenyl compounds

Halogenated-naphthalenetriyltris(sulfonylimino)-aryl disulfonic aci...

Bis-stilbene compounds

Sulfur containing amino and imino pyridines

N-.beta.-(2-acetyl-4-chlorophenoxy)-ethyl-N,N-dimethyl-N-benzyl-amm...

Process for preparing 6H-pyrido[1,2-c][1,3,5]benzothiadiazepines an...

3923878

Patents Applicationslast 30 patents

RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD

PHOTOACID GENERATOR

PHOTOACID GENERATOR

SALT OF QUINAZOLINE DERIVATIVE, PREPARATION METHOD THEREFOR AND APP...

CORROSION INHIBITING COATING ADDITIVE

RESIST COMPOSITION AND RESIST PATTERNING PROCESS

RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHO...

STILBAZOLIUM DERIVATIVE AND NONLINEAR OPTICAL MATERIAL USING THE SAME

NOVEL SULFONATE-BASED TRIMEBUTINE SALTS

Bronsted acid compound, manufacturing method of condensation compou...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND...

Bronsted acid compound, manufacturing method of condensation compou...

ANION-EXCHANGE DISPLACEMENT CHROMATOGRAPHY PROCESS AND ANIONIC ORGA...

Photosensitive composition, compound for use in the photosensitive...